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    • 6. 发明授权
    • Semiconductor device and method for forming the same
    • 半导体装置及其形成方法
    • US07994569B2
    • 2011-08-09
    • US12186966
    • 2008-08-06
    • Florin UdreaChih-Wei Hsu
    • Florin UdreaChih-Wei Hsu
    • H01L29/76
    • H01L29/7397H01L29/0834H01L29/66348
    • A bipolar high voltage/power semiconductor device having a low voltage terminal and a high voltage terminal is disclosed. The bipolar high voltage/power semiconductor is a vertical insulated gate bipolar transistor with injection efficiency adjustment formed by highly doped n+ islands in a p+ anode layer. The device has a vertical drift region of a first conductivity type and having vertical first and second ends. In one example, a region of the second conductivity type is provided at the second end of the vertical drift region connected directly to the vertical high voltage terminal. In another example, a vertical buffer region of the first conductivity type is provided at the vertical second end of the vertical drift region and a vertical region of a second conductivity type is provided on the other side of the vertical buffer region and connected to the vertical high voltage terminal. A plurality of electrically floating lateral island regions are provided within the vertical drift region at or towards the vertical second end of the vertical drift region, the plurality of electrically floating lateral island regions being of the first conductivity type and being more highly doped than the drift region.
    • 公开了一种具有低电压端子和高电压端子的双极型高压/功率半导体器件。 双极性高压/功率半导体是垂直绝缘栅双极晶体管,其具有由p +阳极层中的高掺杂n +岛形成的注入效率调节。 该器件具有第一导电类型的垂直漂移区,并具有垂直的第一和第二端。 在一个示例中,第二导电类型的区域设置在直接连接到垂直高压端子的垂直漂移区域的第二端。 在另一示例中,第一导电类型的垂直缓冲区域设置在垂直漂移区域的垂直第二端,并且第二导电类型的垂直区域设置在垂直缓冲区域的另一侧并连接到垂直方向 高压端子。 多个电浮动横向岛区域设置在垂直漂移区域内或垂直于垂直漂移区域的垂直第二端处,多个电浮动横向岛区域是第一导电类型并且比漂移更高的掺杂 地区。
    • 10. 发明申请
    • DOUBLE GATE INSULATED GATE BIPOLAR TRANSISTOR
    • 双门绝缘门双极晶体管
    • US20090008674A1
    • 2009-01-08
    • US11863231
    • 2007-09-27
    • Florin Udrea
    • Florin Udrea
    • H01L29/745H01L21/331
    • H01L29/7397H01L29/0696H01L29/4232H01L29/66348H01L29/7396
    • Double gate IGBT having both gates referred to a cathode in which a second gate is for controlling flow of hole current. In on-state, hole current can be largely suppressed. While during switching, hole current is allowed to flow through a second channel. Incorporating a depletion-mode p-channel MOSFET having a pre-formed hole channel that is turned ON when 0V or positive voltages below a specified threshold voltage are applied between second gate and cathode, negative voltages to the gate of p-channel are not used. Providing active control of holes amount that is collected in on-state by lowering base transport factor through increasing doping and width of n well or by reducing injection efficiency through decreasing doping of deep p well. Device includes at least anode, cathode, semiconductor substrate, n− drift region, first & second gates, n+ cathode region; p+ cathode short, deep p well, n well, and pre-formed hole channel.
    • 具有两个栅极的双栅极IGBT指的是其中第二栅极用于控制空穴电流的阴极。 在导通状态下,可以大大抑制空穴电流。 在切换期间,允许空穴电流流过第二通道。 结合具有预形成的空穴通道的耗尽型p沟道MOSFET,当0V或者低于特定阈值电压的正电压被施加在第二栅极和阴极之间时,其导通的电压不被用于p沟道栅极的负电压 。 通过增加n阱的掺杂和宽度降低碱运输因子,或者通过减少深阱的掺杂降低注入效率,提供通过积极收集的空穴量的主动控制。 器件至少包括阳极,阴极,半导体衬底,n-漂移区,第一和第二栅极,n +阴极区域; p +阴极短,深p阱,n阱和预形成的孔道。