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    • 4. 发明申请
    • Method and apparatus for producing a crucible of quartz glass
    • 用于生产石英玻璃坩埚的方法和装置
    • US20090277223A1
    • 2009-11-12
    • US12319592
    • 2009-01-09
    • Thomas KayserWalter LehmannHilmar Laudahn
    • Thomas KayserWalter LehmannHilmar Laudahn
    • C03B20/00C03C10/00
    • C30B15/10C03B19/095C30B35/002
    • The invention starts from a method for producing a crucible of quartz glass in that SiO2 inner layer granules are vitrified in a rotating melting mold, which is covered at least in part by a heat shield, in a light gas-containing atmosphere under the action of a plasma to obtain a transparent inner layer, at least part of the light gas being supplied to the melting mold through a gas inlet of the heat shield. In order to form an inner layer with a particularly low bubble content and with minimal efforts in terms of energy and material, it is proposed that in a layer forming step preceding the vitrifying step a granule layer consisting of the SiO2 inner layer granules is formed on the inner wall of the crucible, and that the plasma zone and the heat shield are movable together with the gas inlet and are moved laterally in the direction of the granule layer during the vitrifying step taken for vitrifying the granule layer.
    • 本发明从生产石英玻璃坩埚的方法开始,其中SiO 2内层颗粒在含有轻质气体的气氛中的旋转熔融模具中被至少部分地被隔热罩覆盖,在 用于获得透明内层的等离子体,至少部分轻质气体通过隔热罩的气体入口供入熔化模具。 为了形成具有特别低的气泡含量并且在能量和材料方面的最小努力的内层,提出在玻璃化步骤之前的层形成步骤中,由SiO 2内层颗粒组成的颗粒层形成在 坩埚的内壁,等离子体区域和隔热罩与气体入口一起可移动,并且在用于玻璃化颗粒层的玻璃化步骤期间沿着颗粒层的方向横向移动。
    • 6. 发明申请
    • Method of producing a quartz glass crucible
    • 生产石英玻璃坩埚的方法
    • US20090320521A1
    • 2009-12-31
    • US12459225
    • 2009-06-29
    • Walter LehmannAchim HofmannThomas Kayser
    • Walter LehmannAchim HofmannThomas Kayser
    • C03B19/09
    • C03B19/095C30B15/10
    • A method of producing a quartz glass crucible for pulling a single crystal comprising: providing a melting mold comprising a wall having passages between outside and inside; providing an outer layer granulation consisting of first coarser SiO2 particles and forming an outer granulation layer from the outer layer granulation on the inside of the melting mold wall; providing a barrier layer granulation consisting of second finer SiO2 particles and forming a barrier granulation layer from the barrier layer granulation on the outer granulation layer; applying a negative pressure to the outside of the melting mold wall; and heating the barrier granulation layer and the outer granulation layer with formation of a quartz glass crucible with transparent inner layer. In order to produce a sealing layer that is as thin and uniform as possible it is suggested that the SiO2 particles of the barrier layer granulation should have a mean particle size (D50 value) of less than 50 μm and that the formation of the barrier granulation layer should include a measure for fixing the barrier layer granulation to the outer granulation layer.
    • 一种制造用于拉制单晶的石​​英玻璃坩埚的方法,包括:提供熔融模具,所述熔融模具包括在外部和内部之间具有通道的壁; 提供由第一较粗SiO 2颗粒组成的外层造粒物,并从熔融模具壁内侧的外层造粒形成外部造粒层; 提供由第二细微SiO 2颗粒组成的阻挡层制粒,并从外部造粒层上的阻挡层造粒形成阻挡造粒层; 对熔融模具壁的外部施加负压; 并且通过形成具有透明内层的石英玻璃坩埚加热阻挡制粒层和外部造粒层。 为了产生尽可能薄且均匀的密封层,建议阻隔层造粒的SiO 2颗粒应具有小于50μm的平均粒度(D50值),并且形成阻挡颗粒 层应包括将阻挡层造粒固定到外部造粒层的措施。
    • 8. 发明授权
    • Method of producing a quartz glass crucible
    • 生产石英玻璃坩埚的方法
    • US08347650B2
    • 2013-01-08
    • US12459225
    • 2009-06-29
    • Walter LehmannAchim HofmannThomas Kayser
    • Walter LehmannAchim HofmannThomas Kayser
    • C03B19/09
    • C03B19/095C30B15/10
    • A method of producing a quartz glass crucible for pulling a single crystal comprising: providing a melting mold comprising a wall having passages between outside and inside; providing an outer layer granulation consisting of first coarser SiO2 particles and forming an outer granulation layer from the outer layer granulation on the inside of the melting mold wall; providing a barrier layer granulation consisting of second finer SiO2 particles and forming a barrier granulation layer from the barrier layer granulation on the outer granulation layer; applying a negative pressure to the outside of the melting mold wall; and heating the barrier granulation layer and the outer granulation layer with formation of a quartz glass crucible with transparent inner layer. In order to produce a sealing layer that is as thin and uniform as possible it is suggested that the SiO2 particles of the barrier layer granulation should have a mean particle size (D50 value) of less than 50 μm and that the formation of the barrier granulation layer should include a measure for fixing the barrier layer granulation to the outer granulation layer.
    • 一种制造用于拉制单晶的石​​英玻璃坩埚的方法,包括:提供熔融模具,其包括在外部和内部之间具有通道的壁; 提供由第一较粗SiO 2颗粒组成的外层造粒物,并从熔融模具壁内侧的外层造粒形成外部造粒层; 提供由第二细微SiO 2颗粒组成的阻挡层制粒,并从外部造粒层上的阻挡层造粒形成阻挡造粒层; 对熔融模具壁的外部施加负压; 并且通过形成具有透明内层的石英玻璃坩埚加热阻挡制粒层和外部造粒层。 为了制造尽可能薄且均匀的密封层,建议阻隔层造粒的SiO 2颗粒的平均粒径(D50值)小于50μm,阻挡制粒的形成 层应包括将阻挡层造粒固定到外部造粒层的措施。