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    • 8. 发明授权
    • Methods and systems for substrate surface evaluation
    • 用于衬底表面评估的方法和系统
    • US07312866B2
    • 2007-12-25
    • US11243866
    • 2005-10-05
    • Daniel R. FashantThomas A. SavardTracy L. SellinSteven P. Ecklund
    • Daniel R. FashantThomas A. SavardTracy L. SellinSteven P. Ecklund
    • G01N21/00
    • G02B21/0016
    • A method for determining a surface quality of a substrate sample using a differential interference contrast microscope is described. The microscope includes an eyepiece, an eyepiece focus adjustment, a microscope focus adjustment, a light source, at least one of an aperture or reticule, a camera view, a prism and an eyepiece. The method includes calibrating the focus of the eyepiece with the focus of the camera and determining a peak response ratio for the microscope through adjustment of phase between differential beams of the microscope. The substrate sample is placed under the microscope, illuminated with the light source, and brought into focus with the microscope focus. Phase between differential beams is adjusted, at least one image of the substrate sample is captured and processed to determine a level of surface structure on the substrate sample.
    • 描述了使用微分干涉对比显微镜来确定衬底样品的表面质量的方法。 显微镜包括目镜,目镜对焦调整,显微镜焦点调节,光源,孔径或网状物,照相机视图,棱镜和目镜中的至少一个。 该方法包括用相机的焦点校准目镜的焦点,并通过调整显微镜的差分光束之间的相位来确定显微镜的峰值响应比。 将基板样品置于显微镜下,用光源照射,并用显微镜聚焦。 调整差分光束之间的相位,捕获并处理衬底样品的至少一个图像,以确定衬底样品上的表面结构的水平。