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1. 发明授权

US5358894A Oxidation enhancement in narrow masked field regions of a semiconductor wafer 失效
标题翻译：半导体晶片的窄掩模场区域的氧化增强
公开(公告)号：US5358894A
公开(公告)日：1994-10-25
申请号：US175481
申请日：1993-12-30
申请人： Pierre Fazan , Viju Mathews , Gurtej S. Sandhu , Mohammed Anjum , Hiang C. Chan
发明人： Pierre Fazan , Viju Mathews , Gurtej S. Sandhu , Mohammed Anjum , Hiang C. Chan
IPC分类号： H01L21/316 , H01L21/762 , H01L21/76
CPC分类号： H01L21/02238 , H01L21/02299 , H01L21/31662 , H01L21/76213 , Y10S148/116 , Y10S148/163
摘要： A LOCOS process is enhanced by enhancing the depth of field oxide in regions having a narrow field oxide width. Subsequent to forming a pattern of nitride to define the field oxide and active area, photoresist is applied to selected areas of the wafer. An impurity is then applied to the underlying semiconductor substrate in areas not protected by photoresist and nitride. The impurity results in an enhanced oxidation rate and therefore compensates for a thinning effect in selected field oxide areas, such as those having a narrow width. Subsequent formation of the field oxide results in the doped material being consumed by the oxide.
摘要翻译：通过在具有窄场氧化物宽度的区域中增强场氧化物来增强LOCOS工艺。在形成氮化物图案以限定场氧化物和有源区域之后，将光致抗蚀剂施加到晶片的选定区域。然后在不受光致抗蚀剂和氮化物保护的区域中将杂质施加到下面的半导体衬底。杂质导致增强的氧化速率，因此补偿了选择的场氧化物区域（例如具有窄宽度的区域）中的稀化效应。随后形成场氧化物导致掺杂材料被氧化物消耗。

2. 发明授权

US5236860A Lateral extension stacked capacitor 失效
标题翻译：横向延伸堆叠电容器
公开(公告)号：US5236860A
公开(公告)日：1993-08-17
申请号：US799461
申请日：1991-11-26
申请人： Pierre Fazan , Gurtej S. Sandhu , Hiang C. Chan , Yauh-Ching Liu
发明人： Pierre Fazan , Gurtej S. Sandhu , Hiang C. Chan , Yauh-Ching Liu
IPC分类号： H01L27/108
CPC分类号： H01L27/10817
摘要： A lateral extension stacked capacitor (LESC) using a modified stacked capacitor storage cell fabrication process. The LESC is made up of polysilicon structure, having a spherical ended v-shaped cross-section. The storage node plate of the LESC is overlaid by polysilicon with a dielectric sandwiched in between and connects to an access device's active area via a buried contact. The plate extends to an adjacent storage node but is isolated from the adjacent node by less than the critical resolution dimension of a given lithographic technology. The addition of the polysilicon structure increases storage capability 50% without enlarging the surface area defined for a normal buried digit line stacked capacitor cell.
摘要翻译：一种侧向延伸堆叠电容器（LESC），采用改进的堆叠电容器存储单元制造工艺。 LESC由多晶硅结构组成，具有球形末端的V形横截面。 LESC的存储节点板由介质夹在其间的多晶硅覆盖，并通过埋入触点连接到接入设备的有源区。板延伸到相邻的存储节点，但是通过小于给定光刻技术的临界分辨率尺寸与相邻节点隔离。多晶硅结构的添加增加了存储能力50％，而不会扩大为正常埋地数字线叠层电容器电池定义的表面积。

3. 发明授权

US5122476A Double DRAM cell 失效
标题翻译：双DRAM单元
公开(公告)号：US5122476A
公开(公告)日：1992-06-16
申请号：US703185
申请日：1991-05-20
申请人： Pierre C. Fazan , Hiang C. Chan , Yauh-Ching Liu , Gurtej S. Sandhu , Howard E. Rhodes
发明人： Pierre C. Fazan , Hiang C. Chan , Yauh-Ching Liu , Gurtej S. Sandhu , Howard E. Rhodes
IPC分类号： H01L27/108
CPC分类号： H01L27/10829 , H01L27/10808
摘要： A double dynamic random access memory (DRAM) cell comprising two vertically stacked access transistors and storage capacitors. A first access transistor is formed on a silicon substrate. A seed contact to the first access transistor is then utilized for growing an intermediate silicon substrate by Confined Lateral Selective Epitaxial Overgrowth (CLSEG). A second access transistor is formed upon the intermediate silicon substrate. A storage capacitor for the first access transistor may be formed as a trench capacitor in the silicon substrate. A storage capacitor for the second access transistor may be stacked on the second access transistor. A common buried bit line connects the two access transistors.
摘要翻译：一种双动态随机存取存储器（DRAM）单元，包括两个垂直堆叠的存取晶体管和存储电容器。第一存取晶体管形成在硅衬底上。然后，通过限制横向选择性外延生长（CLSEG），将第一存取晶体管的种子接触用于生长中间硅衬底。第二存取晶体管形成在中间硅衬底上。可以在硅衬底中形成用于第一存取晶体管的存储电容器作为沟槽电容器。用于第二存取晶体管的存储电容器可以堆叠在第二存取晶体管上。公共埋地位线连接两个存取晶体管。

4. 发明授权

US5089986A Mushroom double stacked capacitor 失效
标题翻译：蘑菇双层电容器
公开(公告)号：US5089986A
公开(公告)日：1992-02-18
申请号：US637108
申请日：1991-01-02
申请人： Gurtej S. Sandhu , Pierre C. Fazan , Yauh-Ching Liu , Hiang C. Chan
发明人： Gurtej S. Sandhu , Pierre C. Fazan , Yauh-Ching Liu , Hiang C. Chan
IPC分类号： H01L27/04 , H01L21/822 , H01L21/8242 , H01L27/10 , H01L27/108
CPC分类号： H01L27/10817
摘要： A mushroom double stacked capacitor (mushroom cell) using a modified stacked capacitor storage cell fabrication process. The mushroom cell is made up of polysilicon structure, having a mushroom extended V-shaped cross-section. The storage node plate of the mushroom cell is overlaid by polysilicon with a dielectric sandwiched in between and connects to an access device's active area via a buried contact. The plate extends to an adjacent storage node but is isolated from the adjacent node by less than the critical resolution dimension of a given lithographic technology. The shape of the polysilicon structure increases storage capability 200% or more without enlarging the surface area defined for a normal buried digit line stacked capacitor cell.
摘要翻译：一种采用改进的堆叠式电容器蓄电池制造工艺的蘑菇双层电容器（蘑菇电池）。蘑菇细胞由多晶硅结构组成，具有蘑菇形延伸的V形横截面。蘑菇细胞的存储节点板被夹在其间的电介质多晶硅覆盖，并通过埋入接触连接到进入装置的有效区域。板延伸到相邻的存储节点，但是通过小于给定光刻技术的临界分辨率尺寸与相邻节点隔离。多晶硅结构的形状提高了200％以上的存储能力，而不会扩大为正常埋地数字线叠层电容器单元所限定的表面积。

5. 发明授权

US5057888A Double DRAM cell 失效
标题翻译：双DRAM单元
公开(公告)号：US5057888A
公开(公告)日：1991-10-15
申请号：US646261
申请日：1991-01-28
申请人： Pierre C. Fazan , Hiang C. Chan , Yauh-Ching Liu , Gurtej S. Sandhu , Howard E. Rhodes
发明人： Pierre C. Fazan , Hiang C. Chan , Yauh-Ching Liu , Gurtej S. Sandhu , Howard E. Rhodes
IPC分类号： H01L27/108
CPC分类号： H01L27/10829 , H01L27/10808
摘要： A double dynamic random access memory (DRAM) cell comprising two vertically stacked access transistors and storage capacitors. A first access transistor is formed on a silicon substrate. A seed contact to the first access transistor is then utilized for growing an intermediate silicon substrate by Confined Lateral Selective Epitaxial Overgrowth (CLSEG). A second access transistor is formed upon the intermediate silicon substrate. A storage capacitor for the first access transistor may be formed as a trench capacitor in the silicon substrate. A storage capacitor for the second access transistor may be stacked on the second access transistor. A common buried bit line connects the two access transistors.
摘要翻译：一种双动态随机存取存储器（DRAM）单元，包括两个垂直堆叠的存取晶体管和存储电容器。第一存取晶体管形成在硅衬底上。然后，通过限制横向选择性外延生长（CLSEG），将第一存取晶体管的种子接触用于生长中间硅衬底。第二存取晶体管形成在中间硅衬底上。可以在硅衬底中形成用于第一存取晶体管的存储电容器作为沟槽电容器。用于第二存取晶体管的存储电容器可以堆叠在第二存取晶体管上。公共埋地位线连接两个存取晶体管。

6. 发明授权

US5234855A Stacked comb spacer capacitor 失效
标题翻译：堆叠梳间隔电容器
公开(公告)号：US5234855A
公开(公告)日：1993-08-10
申请号：US633595
申请日：1990-12-21
申请人： Howard E. Rhodes , Hiang C. Chan , Charles H. Dennison , Yauh-Ching Liu , Pierre C. Fazan , Gurtej S. Sandhu
发明人： Howard E. Rhodes , Hiang C. Chan , Charles H. Dennison , Yauh-Ching Liu , Pierre C. Fazan , Gurtej S. Sandhu
IPC分类号： H01L21/02 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817 , H01L28/87 , H01L28/91
摘要： A stacked comb spacer capacitor (SCSC) using a modified stacked capacitor storage cell fabrication process. The SCSC is made up of polysilicon structure, having a spiked v-shaped (or comb-shaped) cross-section, located at a buried contact and extending to an adjacent storage node overlaid by polysilicon with a dielectric sandwiched in between. The creation of the spiked polysilicon structure increases storage capability 50% without enlarging the surface area defined for a normal buried digit line stacked capacitor cell. Removing the dielectric residing under the backside of the storage node cell plate and filling that area with polysilicon increases storage capacity by an additional 50% or more.
摘要翻译：使用改进的堆叠电容器存储单元制造工艺的堆叠梳状间隔电容器（SCSC）。 SCSC由多晶硅结构组成，具有加深的V形（或梳状）横截面，位于掩埋接触处，并延伸到由多晶硅覆盖的相邻存储节点和介于其间的电介质。掺杂多晶硅结构的产生增加了存储能力50％，而不会扩大为正常埋地数字线叠层电容器单元定义的表面积。去除位于存储节点单元板背面的电介质并用多晶硅填充该区域将存储容量提高了50％以上。

7. 发明授权

US5108943A Mushroom double stacked capacitor 失效
公开(公告)号：US5108943A
公开(公告)日：1992-04-28
申请号：US763845
申请日：1991-09-23
申请人： Gurtej S. Sandhu , Pierre C. Fazan , Yauh-Ching Liu , Hiang C. Chan
发明人： Gurtej S. Sandhu , Pierre C. Fazan , Yauh-Ching Liu , Hiang C. Chan
IPC分类号： H01L27/108
CPC分类号： H01L27/10817
摘要： A mushroom double stacked capacitor (mushroom cell) using a modified stacked capacitor storage cell fabrication process. The mushroom cell is made up of polysilicon structure, having a mushroom extended V-shaped cross-section. The storage node plate of the mushroom cell is overlaid by polysilicon with a dielectric sandwiched in between and connects to an access device's active area via a buried contact. The plate extends to an adjacent storage node but is isolated from the adjacent node by less than the critical resolution dimension of a given lithographic technology. The shape of the polysilicon structure increases storage capability 200% or more without enlarging the surface area defined for a normal buried digit line stacked capacitor cell.

8. 发明授权

US5082797A Method of making stacked textured container capacitor 失效
标题翻译：堆叠纹理容器电容器的制作方法
公开(公告)号：US5082797A
公开(公告)日：1992-01-21
申请号：US645086
申请日：1991-01-22
申请人： Hiang C. Chan , Pierre Fazan , Yauh-Ching Liu
发明人： Hiang C. Chan , Pierre Fazan , Yauh-Ching Liu
IPC分类号： H01L27/04 , H01L21/02 , H01L21/822 , H01L21/8242 , H01L27/10 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817 , H01L28/82 , H01L28/84 , H01L28/90
摘要： A stacked textured container capacitor (STCC) using a modified stacked capacitor storage cell fabrication process. The STCC is made up of a texturized polysilicon structure, having an elongated u-shaped cross-section, located at a buried contact and extending to an adjacent storage node overlaid by polysilicon with a dielectric sandwiched in between. With the 3-dimensional shape and texturized surface of a polysilicon storage node plate substantial capacitor plate surface area of 200% or more is gained at the storage node.
摘要翻译：使用改进的堆叠电容器存储单元制造工艺的堆叠纹理容器电容器（STCC）。 STCC由纹理化的多晶硅结构组成，具有细长的u形横截面，位于掩埋的接触处并且延伸到由多晶硅覆盖的相邻存储节点，介电夹在其间。在多晶硅储存节点板的3维形状和纹理化表面上，在存储节点处获得基本上电容器板表面积为200％以上的表面积。

9. 发明授权

US5262343A DRAM stacked capacitor fabrication process 失效
标题翻译： DRAM堆叠电容器制造工艺
公开(公告)号：US5262343A
公开(公告)日：1993-11-16
申请号：US852822
申请日：1992-03-06
申请人： Howard E. Rhodes , Pierre Fazan , Hiang C. Chan , Charles H. Dennison , Yauh-Ching Liu
发明人： Howard E. Rhodes , Pierre Fazan , Hiang C. Chan , Charles H. Dennison , Yauh-Ching Liu
IPC分类号： H01L21/02 , H01L21/8242 , H01L21/70
CPC分类号： H01L27/10852 , H01L28/40
摘要： This invention relates to semiconductor circuit memory storage devices and more particularly to a process to develop three-dimensional stacked capacitor cells using a high dielectric constant material as a storage cell dielectric and a combination of conductively doped polysilicon and metal silicide as the capacitor plates of a storage cell for use in high-density dynamic random access memory (DRAM) arrays. The present invention teaches how to fabricate three-dimensional stacked capacitors by modifying an existing stacked capacitor fabrication process to construct the three-dimensional stacked capacitor cell incorporating a high dielectric constant material as the cell dielectric that will allow denser storage cell fabrication with minimal increases of overall memory array dimensions. A capacitance gain of 3 to 10.times. or more over that of a conventional 3-dimensional storage cell is gained by using a high dielectric constant material as the storage cell dielectric.
摘要翻译：本发明涉及半导体电路存储器存储器件，更具体地说，涉及使用高介电常数材料作为存储单元电介质和导电掺杂多晶硅和金属硅化物的组合来开发三维叠层电容器单元的方法，作为电容器板用于高密度动态随机存取存储器（DRAM）阵列的存储单元。本发明教导了如何通过修改现有的层叠电容器制造工艺来制造三维层叠电容器，以构建结合有高介电常数材料的三维叠层电容器单元作为电池电介质，其将使得更密集的存储单元制造以最小的增加整体内存阵列尺寸。通过使用高介电常数材料作为存储单元电介质，获得比常规3维存储单元的电容增益高3至10倍或更多的电容增益。

10. 发明授权

US5137842A Stacked H-cell capacitor and process to fabricate same 失效
标题翻译：堆叠H电池电容器和工艺制造相同
公开(公告)号：US5137842A
公开(公告)日：1992-08-11
申请号：US699291
申请日：1991-05-10
申请人： Hiang C. Chan , Pierre Fazan
发明人： Hiang C. Chan , Pierre Fazan
IPC分类号： H01L27/04 , H01L21/02 , H01L21/822 , H01L21/8242 , H01L27/10 , H01L27/108
CPC分类号： H01L27/10852 , H01L27/10817 , H01L28/87 , H01L28/91
摘要： An existing stacked capacitor fabrication process is modified to construct a three-dimensional stacked capacitor, referred to as a Stacked H-Cell (SHC). The SHC design defines a capacitor storage cell that in the present invention is used in a DRAM process. The SHC is made up of a polysilicon storage node structure having a H-shaped cross-sectional upper portion with a lower portion extending downward and making contact to an active area via a buried contact. The polysilicon storage node structure is overlaid by polysilicon with a dielectric sandwiched in between to form a completed SHC capacitor. The novel 3-dimensional shaped polysilicon storage node plate having an H-shaped cross-section, allows substantial capacitor plate surface area of 200% or more to be gained at the storage node over that of a conventional STC.
摘要翻译：修改现有的堆叠电容器制造工艺以构建称为堆叠H电池（SHC）的三维叠层电容器。 SHC设计定义了在本发明中用于DRAM处理的电容器存储单元。 SHC由具有H形横截面上部的多晶硅存储节点结构构成，下部向下延伸并通过埋入触点与有源区接触。多晶硅存储节点结构由多晶硅覆盖，电介质夹在其间以形成完整的SHC电容器。具有H形横截面的新颖的三维多晶硅储存节点板允许在存储节点处获得大于常规STC的电容器板表面积为200％或更大的电容器板表面积。

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