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1. 发明申请

US20120321786A1 SYSTEM FOR MULTI-REGION PROCESSING 有权
标题翻译：多区域处理系统
公开(公告)号：US20120321786A1
公开(公告)日：2012-12-20
申请号：US13162707
申请日：2011-06-17
申请人： Peter Satitpunwaycha , Kent Child
发明人： Peter Satitpunwaycha , Kent Child
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/4401 , C23C16/4408 , C23C16/45519 , C23C16/46 , C23C16/52
摘要： A gas distribution structure for supplying reactant gases and purge gases to independent process cells to deposit thin films on separate regions of a substrate is described. Each process cell has an associated ring purge and exhaust manifold to prevent reactive gases from forming deposits on the surface of the wafer between the isolated regions. Each process cell has an associated showerhead for conveying the reactive gases to the substrate. The showerheads can be independently rotated to simulate the rotation parameter for the deposition process.
摘要翻译：描述了用于将反应气体和吹扫气体供应到独立过程单元以在衬底的分离区域上沉积薄膜的气体分配结构。每个处理单元具有相关联的清洗和排出歧管，以防止反应气体在隔离区域之间在晶片表面上形成沉积物。每个处理单元具有用于将反应性气体输送到基底的相关联的淋浴头。淋浴头可独立旋转以模拟沉积过程的旋转参数。

2. 发明授权

US09175392B2 System for multi-region processing 有权
标题翻译：多区域处理系统
公开(公告)号：US09175392B2
公开(公告)日：2015-11-03
申请号：US13162707
申请日：2011-06-17
申请人： Peter Satitpunwaycha , Kent Child
发明人： Peter Satitpunwaycha , Kent Child
IPC分类号： C23C16/455 , C23C16/44 , C23C16/46 , C23C16/52
CPC分类号： C23C16/45565 , C23C16/4401 , C23C16/4408 , C23C16/45519 , C23C16/46 , C23C16/52
摘要： A gas distribution structure for supplying reactant gases and purge gases to independent process cells to deposit thin films on separate regions of a substrate is described. Each process cell has an associated ring purge and exhaust manifold to prevent reactive gases from forming deposits on the surface of the wafer between the isolated regions. Each process cell has an associated showerhead for conveying the reactive gases to the substrate. The showerheads can be independently rotated to simulate the rotation parameter for the deposition process.
摘要翻译：描述了用于将反应气体和吹扫气体供应到独立过程单元以在衬底的分离区域上沉积薄膜的气体分配结构。每个处理单元具有相关联的清洗和排出歧管，以防止反应气体在隔离区域之间在晶片表面上形成沉积物。每个处理单元具有用于将反应性气体输送到基底的相关联的淋浴头。淋浴头可独立旋转以模拟沉积过程的旋转参数。

3. 发明申请

US20080163891A1 METHOD AND APPARATUS OF MULTI STEPS ATOMIZATION FOR GENERATING SMALLER DIW DROPPLETS FOR WAFER CLEANING 审中-公开
标题翻译：用于生成用于清洁的小型二极管的多步骤原理的方法和装置
公开(公告)号：US20080163891A1
公开(公告)日：2008-07-10
申请号：US11621855
申请日：2007-01-10
申请人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin
发明人： JIANSHE TANG , Wei Lu , Bo Xie , Elias Martinez , Zhiyong Li , Kent Child , Richard Endo , Konstantin Smekalin
IPC分类号： B08B3/00
CPC分类号： H01L21/02065 , H01L21/02057 , H01L21/67051
摘要： An apparatus for cleaning a wafer has a first chamber and a component coupled to the first chamber. The first chamber has a first input to form de-ionized water droplets. The component is coupled to the first chamber to further atomize and apply the atomized de-ionized water droplets on the wafer.
摘要翻译：用于清洁晶片的装置具有第一室和耦合到第一室的部件。第一室具有形成去离子水滴的第一输入。该组件耦合到第一室以进一步雾化并将雾化的去离子水滴施加在晶片上。

4. 发明申请

US20070254098A1 Apparatus for single-substrate processing with multiple chemicals and method of use 审中-公开
标题翻译：具有多种化学品的单基板处理装置和使用方法
公开(公告)号：US20070254098A1
公开(公告)日：2007-11-01
申请号：US11413651
申请日：2006-04-28
申请人： Alexander Ko , Richard Endo , Brian Brown , Kent Child , Ralph Wadensweiller
发明人： Alexander Ko , Richard Endo , Brian Brown , Kent Child , Ralph Wadensweiller
IPC分类号： B05D3/12 , B05C13/02
CPC分类号： H01L21/67051 , B05D1/005 , B05D7/56
摘要： A single-substrate apparatus for wet chemical processing of one or multiple sides of a substrate is described. Embodiments of the present invention enable multiple chemicals to be applied to the substrate in succession and reclaimed substantially free of cross contamination between chemicals. In an embodiment of the present invention, a rotatable fluid diverter is positioned between a rotatable pedestal and a nonrotatable multi-level catch cup to funnel fluid shed from a substrate to a predetermined level of the catch cup. The rotatable fluid diverter is designed to expel fluid over a narrow spray angle and thereby enable the pitch of the levels in the catch cup to be reduced so that the chamber volume of the single-substrate apparatus is reduced. In another embodiment of the present invention, the rotatable pedestal is moveable so that the fluid shed from the substrate can be directed to away from the multi-level catch cup.
摘要翻译：描述了用于衬底的一个或多个侧面的湿化学处理的单衬底装置。本发明的实施方案使多种化学品能够连续地应用于基材并且基本上没有化学品之间的交叉污染而被回收。在本发明的一个实施例中，可转动的流体转向器位于可转动的底座和不可转动的多级夹紧杯之间，用于使流体从衬底排出到捕捉杯的预定水平。可旋转流体转向器被设计成在窄的喷雾角度上排出流体，从而使得捕获杯中的液位的间距减小，使得单基底装置的腔体积减小。在本发明的另一个实施例中，可旋转底座是可移动的，使得从衬底脱落的流体可以被引导离开多级抓杯。

5. 发明申请

US20050247686A1 System and method for aligning tubes in an orbital welder 失效
标题翻译：轨道焊机对准管道的系统和方法
公开(公告)号：US20050247686A1
公开(公告)日：2005-11-10
申请号：US10842208
申请日：2004-05-10
申请人： Kent Child
发明人： Kent Child
IPC分类号： B23K9/12 , B23K9/127 , B23K31/02 , B23K37/00 , B23K37/053
CPC分类号： B23K9/1274 , B23K37/0533 , B23K2101/06
摘要： A novel orbital welder includes a body defining a tube passage, a weld tip, a rotor, a light source disposed to emit light toward the tube passage such that the emitted light will impinge upon one or more tubes placed in the tube passage, and a detector to detect the light emitted by the light source from the tube passage. The intensity of the detected light depends on the position of the tube. The detector can either be disposed to detect light reflected by the tube(s) or light transmitted past the tube(s). A method is also disclosed for aligning tubes in an orbital welder including the steps of emitting light from the light source into the tube passage, monitoring the light from the tube passage with the detector, and providing a signal indicative of the position of the tube(s) based on the intensity of the detected light.
摘要翻译：一种新型的轨道焊机包括限定管通道的主体，焊接尖端，转子，设置成朝向管通道发光的光源，使得发射的光将撞击放置在管通道中的一个或多个管，以及检测器，以检测来自管道的光源发射的光。检测到的光的强度取决于管的位置。检测器可以被设置为检测由管反射的光或透过管的光。还公开了一种用于在轨道焊机中对准管的方法，包括以下步骤：将来自光源的光发射到管通道中，用检测器监测来自管通道的光，并提供指示管位置的信号（ s）基于检测到的光的强度。

6. 发明申请

US20130146451A1 Magnetic Confinement and Directionally Driven Ionized Sputtered Films For Combinatorial Processing 审中-公开
标题翻译：用于组合处理的磁限制和定向驱动的电离溅射膜
公开(公告)号：US20130146451A1
公开(公告)日：2013-06-13
申请号：US13313275
申请日：2011-12-07
申请人： Kent Child
发明人： Kent Child
IPC分类号： C23C14/35 , C23C14/46
CPC分类号： H01J37/3266 , C23C14/351 , C23C14/352 , C23C14/354 , H01J37/34
摘要： A combinatorial processing chamber having an integrated magnetic confinement system is described herein. The chamber comprises source magnetic confinement assemblies that are configured to shape ion beams produced by associated sputter sources. The chamber further comprises magnetic confinement assemblies that are configured to drive a combined ion beam onto an exposed surface of the substrate to combinatorial process regions of the substrate.
摘要翻译：本文描述了具有集成磁约束系统的组合处理室。该腔室包括源极限制组件，其被配置成使由相关联的溅射源产生的离子束成形。腔室还包括磁限制组件，其被配置为将组合的离子束驱动到衬底的暴露表面上，以将衬底的组合工艺区域驱动。

7. 发明申请

US20070210047A1 System and method for automatically clamping a tube in an orbital welder 审中-公开
标题翻译：在轨道焊机中自动夹紧管子的系统和方法
公开(公告)号：US20070210047A1
公开(公告)日：2007-09-13
申请号：US11518852
申请日：2006-09-11
申请人： Kent Child
发明人： Kent Child
IPC分类号： B23P17/00 , G06F19/00
CPC分类号： B23K9/1274 , B23K37/0533 , B23K2101/06 , Y10T29/4943
摘要： A novel orbital welder includes a body defining a tube passage, a weld tip, a light source disposed to emit light toward the tube passage such that the emitted light will impinge upon one or more tubes placed in the tube passage, a detector to detect the light emitted by the light source from the tube passage, a clamp adjacent the tube passage, and a control unit operative to close the clamp responsive to a signal from the detector. A method is also disclosed for automatically clamping tubes in an orbital welder when they are properly aligned. The method includes the steps of emitting light from the light source into the tube passage, monitoring the light from the tube passage with the detector, receiving a signal indicative of the position of the tube(s) based on the intensity of the detected light, and automatically closing a clamp depending on the signal from the detector.
摘要翻译：一种新型轨道焊机包括限定管通道的主体，焊接尖端，设置成朝向管通道发光的光源，使得发射的光将撞击置于管通道中的一个或多个管，检测器光源从管通道发射的光，邻近管通道的夹具，以及控制单元，用于响应于来自检测器的信号而闭合夹具。还公开了一种在轨道焊接机适当对准时自动夹紧管道的方法。该方法包括以下步骤：将来自光源的光发射到管通道中，用检测器监测来自管通道的光，基于检测到的光的强度接收指示管的位置的信号，并根据来自检测器的信号自动关闭一个夹具。

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