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1. 发明授权

US06878559B2 Measurement of lateral diffusion of diffused layers 有权
公开(公告)号：US06878559B2
公开(公告)日：2005-04-12
申请号：US10253121
申请日：2002-09-23
申请人： Peter G. Borden , G. Jonathan Kluth , Eric Paton
发明人： Peter G. Borden , G. Jonathan Kluth , Eric Paton
IPC分类号： G01N21/21 , G01N21/84 , G01N21/95 , G01N21/956 , G01R31/311 , H01L23/544 , H01L21/66
CPC分类号： H01L22/34 , G01N21/21 , G01N21/9501 , G01N21/95607 , G01N2021/8416 , G01N2201/0691 , G01R31/311 , H01L2924/0002 , H01L2924/3011 , H01L2924/00
摘要： Any semiconductor wafer fabrication process may be changed to monitor lateral abruptness of doped layers as an additional step in the wafer fabrication process. In one embodiment, a test structure including one or more doped regions is formed in a production wafer (e.g. simultaneously with one or more transistors) and one or more dimension(s) of the test structure are measured, and used as an estimate of lateral abruptness in other doped regions in the wafer, e.g. in the simultaneously formed transistors. Doped regions in test structures can be located at regularly spaced intervals relative to one another, or alternatively may be located with varying spacings between adjacent doped regions. Alternatively or in addition, multiple test structures may be formed in a single wafer, with doped regions at regular spatial intervals in each test structure, while different test structures have different spatial intervals.

2. 发明申请

US20130063929A1 HANDS-FREE VISION AID 有权
标题翻译：无障碍的视觉援助
公开(公告)号：US20130063929A1
公开(公告)日：2013-03-14
申请号：US13410189
申请日：2012-03-01
申请人： Peter G. Borden , Peter H. Muller
发明人： Peter G. Borden , Peter H. Muller
IPC分类号： G02C11/04 , F21L4/02
CPC分类号： G02C11/04
摘要： Described herein are hands-free vision aids that may be used for low-vision reading. These vision aids may be beneficial for individuals with low-vision disorders such as age-related macular degeneration, retinitis pigmentosa, and other visual disorders. The vision aids described here comprise an optical system with one or more light sources configured to provide a rectangular field of illumination with high illuminance levels bounded by high contrast perimeter. Such an illumination field greatly illuminates a targeted viewing region while reducing glare that arises from illuminating peripheral regions. Some vision aids use green light with high illuminance values for improving visual acuity and comfort for long-duration reading. The optical system of a vision aid may be configured to fit onto and/or integrate with eyeglass frames.
摘要翻译：这里描述的是可以用于低视力阅读的免提视力辅助器。这些视力援助对于具有低视力障碍的个体，如年龄相关性黄斑变性，色素性视网膜炎和其他视觉障碍可能是有益的。这里描述的视觉辅助设备包括具有一个或多个光源的光学系统，其被配置为提供具有由高对比度周界限定的高照度水平的矩形照明场。这样的照明领域大大地照亮目标观看区域，同时减少由照射周边区域引起的眩光。一些视力辅助工具使用具有高照度值的绿灯，以提高长时间阅读的视力和舒适度。视力辅助装置的光学系统可以被配置成装配在眼镜框架上和/或与眼镜框架整合。

3. 发明申请

US20110162706A1 PASSIVATED POLYSILICON EMITTER SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：被分解的多晶硅发射体太阳能电池及其制造方法
公开(公告)号：US20110162706A1
公开(公告)日：2011-07-07
申请号：US12983846
申请日：2011-01-03
申请人： Peter G. Borden , Li Xu , Tristan R. Holtam , Vinay K. Shah
发明人： Peter G. Borden , Li Xu , Tristan R. Holtam , Vinay K. Shah
IPC分类号： H01L31/0216 , H01L31/18
CPC分类号： H01L31/03682 , H01L31/03921 , H01L31/068 , H01L31/182 , H01L31/1864 , H01L31/1868 , Y02E10/546 , Y02E10/547 , Y02P70/521
摘要： A method for manufacturing a polysilicon emitter solar cell with a passivating layer over its polysilicon emitter layer is disclosed. The method includes steps of preparing a substrate, forming a first polysilicon layer over the substrate, and forming a first passivating layer over the first polysilicon layer. Another embodiment of the present invention discloses a solar cell apparatus. The solar cell apparatus includes a substrate, a first polysilicon layer over the substrate, and a first passivating layer on first polysilicon layer.
摘要翻译：公开了一种在其多晶硅发射极层上制造具有钝化层的多晶硅发射极太阳能电池的方法。该方法包括制备衬底，在衬底上形成第一多晶硅层，以及在第一多晶硅层上形成第一钝化层的步骤。本发明的另一实施例公开了一种太阳能电池装置。太阳能电池装置包括衬底，衬底上的第一多晶硅层和第一多晶硅层上的第一钝化层。

4. 发明申请

US20100326797A1 CARRIER FOR TRANSPORTING SOLAR CELL SUBSTRATES 审中-公开
标题翻译：用于运输太阳能电池基板的载体
公开(公告)号：US20100326797A1
公开(公告)日：2010-12-30
申请号：US12766263
申请日：2010-04-23
申请人： Peter G. Borden
发明人： Peter G. Borden
IPC分类号： B65G17/00 , B65H1/00
CPC分类号： B65G15/42 , H01L21/67706 , H01L21/67721
摘要： A carrier for transporting a plurality of solar cell substrates comprising a peripheral frame defined by a pair of side members connected by first and second complementary end members, a plurality of cross struts, a plurality of standoffs for supporting the substrates, and at least one drive member coupled to one of the end members. The end members have alternating bends that provide a wave-like pattern of projections and indentations, are arranged in a spaced and substantially parallel orientation, and are constructed from metal wire. Each cross strut is connected to the first end member and the second end member between complementary projections and indentations. Rotation of the drive member causes both end members to rotate in a circular motion.
摘要翻译：一种用于传送多个太阳能电池基板的载体，包括由由第一和第二互补端部构件连接的一对侧构件限定的外围框架，多个横向支柱，用于支撑基板的多个支座，以及至少一个驱动成员与其中一个终端成员相连。端部构件具有交替的弯曲，其提供波浪状图案的突出和凹陷，以间隔且基本上平行的方向布置，并且由金属线构成。每个交叉支柱连接到第一端构件和第二端构件之间的互补突起和凹槽之间。驱动构件的旋转导致两个端部构件以圆周运动旋转。

5. 发明申请

US20100203742A1 Negatively Charged Passivation Layer in a Photovoltaic Cell 失效
标题翻译：光伏电池中带负电的钝化层
公开(公告)号：US20100203742A1
公开(公告)日：2010-08-12
申请号：US12367064
申请日：2009-02-06
申请人： Peter G. Borden , Christopher Sean Olsen
发明人： Peter G. Borden , Christopher Sean Olsen
IPC分类号： H01L21/31
CPC分类号： H01L31/02167 , H01L31/1868 , Y02E10/50 , Y02P70/521
摘要： Embodiments of the invention are directed to methods and apparatus for processing of a solar substrate for making a photovoltaic device. In particular, methods and apparatus for creating a negatively charged passivation layer by are provided.
摘要翻译：本发明的实施例涉及用于制造太阳能电池的太阳能基板的处理方法和装置。特别地，提供了用于产生带负电荷的钝化层的方法和装置。

6. 发明授权

US06958814B2 Apparatus and method for measuring a property of a layer in a multilayered structure 有权
标题翻译：用于测量多层结构中的层的性质的装置和方法
公开(公告)号：US06958814B2
公开(公告)日：2005-10-25
申请号：US10090316
申请日：2002-03-01
申请人： Peter G. Borden , Ji Ping Li
发明人： Peter G. Borden , Ji Ping Li
IPC分类号： G01N21/00 , G01N21/17 , G01N21/55 , G01N21/59 , G01N21/88 , G01N27/04 , G01R31/26 , H01L20060101 , H01L21/66
CPC分类号： G01N27/041 , G01N21/1717
摘要： An apparatus measures a property of a layer (such as the sheet resistance of a conductive layer) by performing the following method: (1) focusing the heating beam on the heated a region (also called “heated region”) of the conductive layer (2) modulating the power of the heating beam at a predetermined frequency that is selected to be sufficiently low to ensure that at any time the temperature of the optically absorbing layer is approximately equal to (e.g., within 90% of) a temperature of the optically absorbing layer when heated by an unmodulated beam, and (3) measuring the power of another beam that is (a) reflected by the heated region, and (b) modulated in phase with modulation of the heating beam. The measurement in act (3) can be used directly as a measure of the resistance (per unit area) of a conductive pad formed by patterning the conductive layer. Acts (1)-(3) can be repeated during fabrication of a semiconductor wafer, at each of a number of regions on a conductive layer, and any change in measurement indicates a corresponding change in resistance of the layer. When the measurement changes by more than a predetermined amount (e.g., by 10%), a process parameter that controls the fabrication process is changed to return the measurement to normal in the next wafer.
摘要翻译：一种装置通过以下方法测量层的性质（例如导电层的薄层电阻）：（1）将加热束聚焦在加热的导电层的加热区域（也称为“加热区域”）上 2）以预定的频率调制加热束的功率，该预定频率被选择为足够低以确保在任何时候光学吸收层的温度近似等于（例如，90％以内）光学的温度并且（3）测量由（a）被加热区域反射的另一个光束的功率，和（b）通过加热光束的调制相位调制。作用（3）中的测量可以直接用作通过图案化导电层形成的导电焊盘的电阻（每单位面积）的量度。在制造半导体晶片期间，在导电层上的多个区域的每一个处可以重复使用（1） - （3），并且测量的任何变化表示层的电阻的相应变化。当测量改变超过预定量（例如，10％）时，改变控制制造过程的处理参数，以使测量在下一个晶片中恢复正常。

7. 发明授权

US06911349B2 Evaluating sidewall coverage in a semiconductor wafer 有权
标题翻译：评估半导体晶片中的侧壁覆盖
公开(公告)号：US06911349B2
公开(公告)日：2005-06-28
申请号：US09788273
申请日：2001-02-16
申请人： Jiping Li , Peter G. Borden
发明人： Jiping Li , Peter G. Borden
IPC分类号： G01N21/55 , G01R31/307 , G01R31/26 , H01L21/66
CPC分类号： G01N21/55 , G01R31/307
摘要： A sidewall or other feature in a semiconductor wafer is evaluated by illuminating the wafer with at least one beam of electromagnetic radiation, and measuring intensity of a portion of the beam reflected by the wafer. Change in reflectance between measurements provides a measure of a property of the feature. The change may be either a decrease in reflectance or an increase in reflectance, depending on the embodiment. A single beam may be used if it is polarized in a direction substantially perpendicular to a longitudinal direction of the sidewall. A portion of the energy of the beam is absorbed by the sidewall, thereby to cause a decrease in reflectance when compared to reflectance by a flat region. Alternatively, two beams may be used, of which a first beam applies heat to the feature itself or to a region adjacent to the feature, and a second beam is used to measure an increase in reflectance caused by an elevation in temperature due to heat transfer through the feature. The elevation in temperature that is measured can be either of the feature itself, or of a region adjacent to the feature.
摘要翻译：通过用至少一束电磁辐射照射晶片并测量由晶片反射的光束的一部分的强度来评估半导体晶片中的侧壁或其它特征。测量之间的反射率变化提供了特征属性的量度。根据实施例，该变化可以是反射率的降低或反射率的增加。如果沿着与侧壁的纵向方向基本垂直的方向极化，则可以使用单个光束。光束的能量的一部分被侧壁吸收，从而当与平坦区域的反射率相比时，反射率降低。或者，可以使用两个光束，其中第一光束对特征本身或与特征相邻的区域施加热量，并且第二光束用于测量由于热传递引起的温度升高引起的反射率的增加通过功能。所测量的温度升高可以是特征本身，也可以是与特征相邻的区域。

8. 发明授权

US6154280A System and method for measuring the microroughness of a surface of a substrate 失效
标题翻译：用于测量衬底表面的微粗糙度的系统和方法
公开(公告)号：US6154280A
公开(公告)日：2000-11-28
申请号：US204330
申请日：1998-12-02
申请人： Peter G. Borden
发明人： Peter G. Borden
IPC分类号： G01B11/30 , G02F1/1333 , G11B5/84 , G01B11/24
CPC分类号： G01B11/303
摘要： A system for measuring an amount of microroughness of a surface of a substrate, wherein a first beam of electromagnetic radiation and a second beam of electromagnetic radiation are generated, the first and second beams being substantially parallel and spaced apart from each other so that the first and second beams are substantially non-overlapping, and the first and second beams are focused onto the substrate so that the beams impinge upon a selected area of the surface of the substrate having a surface contour, the surface contour of the substrate causing a scattering of both beams. The scattering of the first and second beams is detected, the amount of scattering corresponding to a microroughness value of the selected area of the substrate, and the microroughness value of the selected area of the substrate is determined from the amount of scattering of the first and second beams. The microroughness measuring system may also be used for controlling a fabrication process.
摘要翻译：一种用于测量基板表面的微粗糙度的系统，其中产生第一电磁辐射束和第二电磁辐射束，所述第一和第二光束基本上平行并彼此间隔开，使得所述第一并且第二光束基本上不重叠，并且第一和第二光束聚焦到基板上，使得光束撞击具有表面轮廓的基板的表面的选定区域，基板的表面轮廓导致散射两束。检测第一和第二光束的散射，对应于衬底的选定区域的微粗度值的散射量和衬底的选定区域的微粗糙度值由第一和第二光束的散射量确定，第二梁。微粗糙度测量系统也可用于控制制造工艺。

9. 发明授权

US6049220A Apparatus and method for evaluating a wafer of semiconductor material 失效
公开(公告)号：US6049220A
公开(公告)日：2000-04-11
申请号：US95804
申请日：1998-06-10
申请人： Peter G. Borden , Regina G. Nijmeijer , Jiping Li
发明人： Peter G. Borden , Regina G. Nijmeijer , Jiping Li
IPC分类号： G01N21/00 , G01N21/17 , G01R31/26 , G01R31/265 , G01R31/311 , H01L21/265 , H01L21/66 , G01N21/41
CPC分类号： G01N21/1717 , G01R31/311 , G01R31/2648 , G01R31/2656 , H01L22/12
摘要： An apparatus and method uses diffusive modulation (without generating a wave of carriers) for measuring a material property (such as any one or more of: mobility, doping, and lifetime) that is used in evaluating a semiconductor wafer. The measurements are carried out in a small area, for use on wafers having patterns for integrated circuit dice. The measurements are based on measurement of reflectance, for example as a function of carrier concentration. In one implementation, the semiconductor wafer is illuminated with two beams, one with photon energy above the bandgap energy of the semiconductor, and another with photon energy near or below the bandgap. The diameters of the two beams relative to one another are varied to extract additional information about the semiconductor material, for use in measuring, e.g. lifetime.

10. 发明授权

US4894529A Real-time particle counter for liquids with nebulizer and dryer 失效
标题翻译：具有雾化器和烘干机的液体实时粒子计数器
公开(公告)号：US4894529A
公开(公告)日：1990-01-16
申请号：US267205
申请日：1988-11-03
申请人： Peter G. Borden , Jon Munson
发明人： Peter G. Borden , Jon Munson
IPC分类号： G01N15/00 , G01N15/02 , G01N15/06 , G01N15/10
CPC分类号： G01N15/10 , G01N2015/0053 , G01N2015/0238 , G01N2015/0681
摘要： A real-time particle counter apparatus for monitoring contaminant particles in liquids includes a nebulizer, a drying chamber and a counter. The nebulizer provides an aerosol of droplets containing particles to the drying chamber, and the droplets are evaporated leaving solid particles to be counted and sized by the counter. Liquid is recirculated in a closed loop by pumping means that moves the liquid between the liquid source and the nebulizer. A constant air flow containing particles is provided to the counter and the apparatus is self-regulating so that no operator is required to maintain the level of liquid in the nebulizer.
摘要翻译：用于监测液体中的污染物颗粒的实时粒子计数装置包括雾化器，干燥室和计数器。喷雾器提供含有颗粒的液滴的气溶胶到干燥室，并且蒸发出液滴，留下固体颗粒以通过计数器计数和定尺寸。液体通过在液体源和雾化器之间移动液体的泵送装置在闭合回路中再循环。包含颗粒的恒定空气流被提供给计数器，并且该装置是自调节的，因此不需要操作者来保持喷雾器中液体的水平。

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