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1. 发明授权

US06532134B1 Silicon coating on air bearing surface for magnetic thin film heads 失效
标题翻译：用于磁性薄膜头的空气轴承表面上的硅涂层
公开(公告)号：US06532134B1
公开(公告)日：2003-03-11
申请号：US08686567
申请日：1996-07-26
申请人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
发明人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
IPC分类号： G11B560
CPC分类号： G11B5/3106 , G11B5/255 , G11B5/40 , G11B5/6082
摘要： A silicon coating on an air bearing surface for magnetic thin film heads. A thick silicon layer is provided to replace metallic layers such as TiW as an overcoat for thin film heads. The silicon layer will provide a durable head-disk interface and act as a reflective surface for fly height measurement. The silicon layer can be planarized with the pole tips to avoid any magnetic spacing loss. The thickness of the silicon coating is preferably between 125 and 6500 angstroms thick. The slider body may be fabricated from silicon such that the silicon coating is substantially identical to the silicon slider body, thereby preventing thermal mismatch therebetween. The silicon coating is preferably applied using a magnetron sputtering technique which provides a high rate of deposition of silicon to form a dense, low stress silicon layer.
摘要翻译：用于磁性薄膜头的空气轴承表面上的硅涂层。提供厚硅层以代替诸如TiW的金属层作为薄膜头的外涂层。硅层将提供耐用的头盘接口，并作为飞高测量的反射表面。硅层可以用极尖平面化，以避免任何磁间隙损失。硅涂层的厚度优选为125至6500埃厚。滑块体可以由硅制成，使得硅涂层基本上与硅滑块体相同，从而防止硅片之间的热失配。硅涂层优选使用磁控溅射技术来施加，其提供硅的高沉积速率以形成致密的低应力硅层。

2. 发明授权

US6023840A Method of manufacturing a thin film magnetic head having an ultrathin silicon wear coating 有权
标题翻译：制造具有超薄硅耐磨涂层的薄膜磁头的方法
公开(公告)号：US6023840A
公开(公告)日：2000-02-15
申请号：US144000
申请日：1998-08-31
申请人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
发明人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
IPC分类号： G11B5/10 , G11B5/187 , G11B5/255 , G11B5/31 , G11B5/40 , G11B5/60 , G11B21/21 , G11B5/42
CPC分类号： G11B5/40 , G11B5/10 , G11B5/255 , G11B5/3106 , G11B5/6005 , Y10T29/49041 , Y10T29/49044
摘要： A single layer wear coating is provided for a magnetic head assembly. The single layer is silicon or silicon-based material with a thickness in the range of 30-75 .ANG.. The single layer may be formed by a single step of deposition employing a DC magnetron. The single layer wear coating improves the wear performance of the magnetic head assembly and protects one or more sensitive elements of a magnetic head without significant reduction of spacing loss.
摘要翻译：为磁头组件提供单层耐磨涂层。单层是硅或硅基材料，其厚度在30-75范围内。单层可以通过使用DC磁控管的单个沉积步骤形成。单层耐磨涂层改善了磁头组件的磨损性能，并保护了磁头的一个或多个敏感元件，而不会明显地减小间隔损耗。

3. 发明授权

US5808832A Ultrathin silicon wear coating for a slider and thin film magnetic head elements at an ABS 失效
标题翻译：超薄硅耐磨涂层用于滑块和薄膜磁头元件的ABS
公开(公告)号：US5808832A
公开(公告)日：1998-09-15
申请号：US607892
申请日：1996-02-27
申请人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
发明人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
IPC分类号： G11B5/10 , G11B5/187 , G11B5/255 , G11B5/31 , G11B5/40 , G11B5/60 , G11B21/21
CPC分类号： G11B5/40 , G11B5/10 , G11B5/255 , G11B5/3106 , G11B5/6005 , Y10T29/49041 , Y10T29/49044
摘要： A single layer wear coating is provided for a magnetic head assembly. The single layer is silicon or silicon-based material with a thickness in the range of 30-75 .ANG.. The single layer may be formed by a single step of deposition employing a DC magnetron. The single layer wear coating improves the wear performance of the magnetic head assembly and protects one or more sensitive elements of a magnetic head without significant reduction of spacing loss.
摘要翻译：为磁头组件提供单层耐磨涂层。单层是硅或硅基材料，其厚度在30-75范围内。单层可以通过使用DC磁控管的单个沉积步骤形成。单层耐磨涂层改善了磁头组件的磨损性能，并保护了磁头的一个或多个敏感元件，而不会明显地减小间隔损耗。

4. 发明授权

US6117283A Silicon coating on air bearing surface for magnetic thin film heads 失效
标题翻译：用于磁性薄膜头的空气轴承表面上的硅涂层
公开(公告)号：US6117283A
公开(公告)日：2000-09-12
申请号：US759479
申请日：1996-12-05
申请人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
发明人： Pei C. Chen , Grace Lim Gorman , Cherngye Hwang , Vedantham Raman , Randall George Simmons
IPC分类号： G11B5/31 , C23C14/34 , C23C16/00 , G11B5/255 , G11B5/60 , G11B5/71 , G11B17/32 , G11B21/21
CPC分类号： G11B5/3106 , G11B5/255 , G11B5/40 , G11B5/6082
摘要： A silicon coating on an air bearing surface for magnetic thin film heads. A thick silicon layer is provided to replace metallic layers such as TiW as an overcoat for thin film heads. The silicon layer will provide a durable head-disk interface and act as a reflective surface for fly height measurement. The silicon layer can be planarized with the pole tips to avoid any magnetic spacing loss. The thickness of the silicon coating is preferably between 125 and 6500 Angstroms thick. The slider body may be fabricated from silicon such that the silicon coating is substantially identical to the silicon slider body, thereby preventing thermal mismatch therebetween. The silicon coating is preferably applied using a magnetron sputtering technique which provides a high rate of deposition of silicon to form a dense, low stress silicon layer.
摘要翻译：用于磁性薄膜头的空气轴承表面上的硅涂层。提供厚硅层以代替诸如TiW的金属层作为薄膜头的外涂层。硅层将提供耐用的头盘接口，并作为飞高测量的反射表面。硅层可以用极尖平面化，以避免任何磁间隙损失。硅涂层的厚度优选为125至6500埃厚。滑块体可以由硅制成，使得硅涂层基本上与硅滑块体相同，从而防止硅片之间的热失配。硅涂层优选使用磁控溅射技术来施加，其提供硅的高沉积速率以形成致密的低应力硅层。

5. 发明授权

US5943187A Carbon overcoat for a slider with improved step coverage 失效
标题翻译：用于滑块的碳涂层，具有改进的台阶覆盖
公开(公告)号：US5943187A
公开(公告)日：1999-08-24
申请号：US878976
申请日：1997-06-18
申请人： Pei C. Chen , Cherngye Hwang , Vedantham Raman , Jila Tabib
发明人： Pei C. Chen , Cherngye Hwang , Vedantham Raman , Jila Tabib
IPC分类号： G11B5/10 , G11B5/255 , G11B5/31 , G11B5/39 , G11B5/60 , G11B5/72 , G11B5/82 , G11B5/84
CPC分类号： G11B5/6005 , G11B5/10 , G11B5/255 , G11B5/3106 , G11B5/3967 , G11B5/72 , G11B5/82 , G11B5/8408
摘要： A method is provided for applying an overcoat to a slider and sensitive elements of a magnetic head which has improved coverage, reduced spacing loss and improved corrosion resistance. After lapping, an overcoat material is sputter deposited on the air bearing surface (ABS) of the slider, followed by a step of sputter etching the overcoat. The sputter etching redeposits material from high points on the slider and fills in trenches formed during the lapping process. The redeposition of the overcoat from the high places to the low places of the slider decreases the overall thickness of the overcoat, thereby decreasing spacing loss. The filling of the trenches implements increased coverage which increases wear resistance of the slider and more adequately protects the sensitive elements of the magnetic head from corrosion. In a preferred embodiment, a portion of the overcoat is left on the high places to ensure that the sputter etching does not damage the sensitive elements of the magnetic head. If the overcoat is completely etched from the high places an optional second overcoat may be applied which is thinner than the first overcoat. This method may also be applied to other articles such as a magnetic disk.
摘要翻译：提供了一种将外涂层施加到滑块和磁头的敏感元件的方法，其具有改进的覆盖范围，减小的间隔损耗和改善的耐腐蚀性。研磨后，将外涂层材料溅射沉积在滑块的空气轴承表面（ABS）上，随后溅射蚀刻外涂层。溅射蚀刻从滑块上的高点重新沉积材料，并填充研磨过程中形成的沟槽。外涂层从滑块的高处重新沉积到滑块的低处降低了外涂层的总厚度，从而减小了间隔损耗。沟槽的填充实现增加的覆盖，增加滑块的耐磨性，并更充分地保护磁头的敏感元件不被腐蚀。在优选实施例中，外涂层的一部分留在高处，以确保溅射蚀刻不会损坏磁头的敏感元件。如果外涂层从高处完全蚀刻，则可以施加比第一外涂层更薄的任选的第二外涂层。该方法也可以应用于诸如磁盘的其它物品。

6. 发明授权

US06427319B1 Method for protecting magnetic read/write transducers against electrostatic discharge during disk drive manufacturing 失效
标题翻译：在磁盘驱动器制造期间保护磁读/写转换器防止静电放电的方法
公开(公告)号：US06427319B1
公开(公告)日：2002-08-06
申请号：US09570620
申请日：2000-05-15
申请人： Jack Dana Cook , Grace Lim Gorman , Cherngye Hwang
发明人： Jack Dana Cook , Grace Lim Gorman , Cherngye Hwang
IPC分类号： G11B5127
CPC分类号： G11B5/3903 , G11B5/3133 , G11B5/3163 , G11B5/3967 , G11B5/40 , G11B5/4806 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49064
摘要： A method for protecting magnetic read/write head assembly against electrostatic discharge during disk drive manufacturing are disclosed. The magnetic head assembly is supported on a substrate having a magnetoresistive sensor element disposed in spaced relationship between several magnetic shield elements. Before a focused ion beam fabrication operation, at least a portion of an air bearing surface of the magnetic head assembly is coated with a thin and transparent layer of conductive material. This layer of conductive material is subsequent removed after the focused ion beam fabrication operation.
摘要翻译：公开了一种在磁盘驱动器制造期间保护磁读/写头组件防止静电放电的方法。磁头组件被支撑在具有以几个磁屏蔽元件之间隔开的关系设置的磁阻传感器元件的基板上。在聚焦离子束制造操作之前，磁头组件的空气轴承表面的至少一部分涂覆有薄且透明的导电材料层。在聚焦离子束制造操作之后，该导电材料层随后被去除。

7. 发明授权

US5948532A Cermet adhesion layer with carbonaceous wear layer for head/disk interfaces 失效
标题翻译：用于头/磁盘接口的碳质磨损层的金属陶瓷附着层
公开(公告)号：US5948532A
公开(公告)日：1999-09-07
申请号：US763265
申请日：1996-12-10
申请人： Cherngye Hwang , Vedantham Raman , John Walter Raniseski
发明人： Cherngye Hwang , Vedantham Raman , John Walter Raniseski
IPC分类号： C23C14/06 , G11B5/10 , G11B5/127 , G11B5/187 , G11B5/255 , G11B5/31 , G11B5/39 , G11B5/48 , G11B5/58 , B32B9/00
CPC分类号： G11B5/484 , C23C14/06 , G11B5/10 , G11B5/58 , G11B5/1278 , G11B5/187 , G11B5/255 , G11B5/3106 , G11B5/3903 , G11B5/3916 , Y10T428/1164 , Y10T428/30
摘要： We disclose a bi-layer wear pad, for use in a slider/magnetic media interface, comprising a wear layer and an adhesion layer. The wear material is either carbon or a carbonaceous material. Typical carbonaceous materials useful for wear layers include elements such as hydrogen, fluorine, nitrogen, boron, and silicon dioxide. The adhesion layer is a thin cermet such as nichrome oxide (NiCrOx) or chromium silicon oxide (CrSiOx). Use of the cermet adhesion layer allows a relatively thick wear layer to be deposited with good adhesion and superior durability.
摘要翻译：我们公开了一种双层耐磨垫，用于滑动/磁性介质界面，包括耐磨层和粘合层。磨损材料是碳或碳质材料。用于耐磨层的典型含碳材料包括诸如氢，氟，氮，硼和二氧化硅的元素。粘合层是诸如氧化铬（NiCrOx）或氧化铬（CrSiO x）的薄金属陶瓷。使用金属陶瓷粘合层允许沉积相对较厚的耐磨层，具有良好的粘合性和优异的耐久性。

8. 发明授权

US5926350A Dual gap horizontal thin film inductive head 失效
标题翻译：双间隙水平薄膜感应头
公开(公告)号：US5926350A
公开(公告)日：1999-07-20
申请号：US616607
申请日：1996-03-15
申请人： Andrew Chiu , Cherngye Hwang , Randall George Simmons
发明人： Andrew Chiu , Cherngye Hwang , Randall George Simmons
IPC分类号： G11B5/23 , G11B5/245 , G11B5/31 , G11B5/29 , G11B5/147
CPC分类号： G11B5/3153 , G11B5/3163 , G11B5/3183 , G11B5/23 , G11B5/2455
摘要： A dual gap horizontal thin film inductive head is provided which writes wide and reads narrow so as to avoid noise problems when reading an information track on a magnetic medium. The head has first and second gap layers between first and second horizontal pole tips. The pole tips and the corresponding pole pieces of the head are constructed of a high magnetic moment material, such as NiFe (Permalloy). The first gap layer is constructed of a magnetic insulator, such as tungsten, and the second gap layer is constructed of a low magnetic moment material, such as NiFeCr. Accordingly, the magnetic moment of the second gap layer is lower than the magnetic moment of the first and second pole tips and the corresponding first and second pole pieces. During recording both gap layers function as a gap because the second gap layer is saturated and behaves as a magnetic insulator. During playback only the first gap layer functions a gap because the second gap layer is not saturated causing it to behave as a magnetic conductor. Accordingly, during record the head "writes wide" and during playback the head "reads narrow." A unique method is provided for making the head which employs a vertical edge of a photoresist layer for forming the first and second gap layers.
摘要翻译：提供双间隙水平薄膜感应头，其写入宽且读取窄，以便在磁介质上读取信息轨道时避免噪声问题。头部在第一和第二水平极尖之间具有第一和第二间隙层。磁头尖端和磁头的对应极片由高磁矩材料（如NiFe（坡莫合金））构成。第一间隙层由诸如钨的磁绝缘体构成，第二间隙层由诸如NiFeCr的低磁矩材料构成。因此，第二间隙层的磁矩低于第一和第二极尖以及对应的第一和第二极靴的磁矩。在记录期间，两个间隙层用作间隙，因为第二间隙层是饱和的并且表现为磁绝缘体。在回放期间，只有第一间隙层起间隙的作用，因为第二间隙层不饱和导致其作为磁导体。因此，在记录期间，头部“写入宽”，并且在播放期间，头部“读取狭窄”。提供了一种独特的方法来制造采用光致抗蚀剂层的垂直边缘以形成第一和第二间隙层的头部。

9. 发明授权

US07560225B2 Method of forming uniform features using photoresist 失效
标题翻译：使用光刻胶形成均匀特征的方法
公开(公告)号：US07560225B2
公开(公告)日：2009-07-14
申请号：US10448501
申请日：2003-05-29
申请人： Omar Eduardo Montero Camacho , Pei-C Chen , Cherngye Hwang , Diana Perez , Eric Yongjian Sun
发明人： Omar Eduardo Montero Camacho , Pei-C Chen , Cherngye Hwang , Diana Perez , Eric Yongjian Sun
IPC分类号： G03F7/40 , B44C1/22
CPC分类号： G11B5/3173 , G03F7/40 , G03F7/405 , G11B5/102
摘要： A process for ion milling using photoresist as a mask is described. In a preferred embodiment the invention is used in the fabricating air-bearing features on sliders for use in magnetic storage devices. According to the invention the photoresist (liquid or dry) is applied, developed and removed as in the prior art which includes baking steps. The embodiment of the invention includes an additional baking step beyond whatever baking steps are used in the photolithography process. The additional baking step is preferably performed immediately prior to ion milling. The additional baking step according to the invention yields increased uniformity of the depth of the ion milling which is believed to result from reduction of volatile material such as water in the photoresist. When the invention is used as part of the manufacturing process for ion milling the air-bearing features on a slider, the features are more uniform which improves the overall quality and performance.
摘要翻译：描述使用光致抗蚀剂作为掩模的离子铣削的方法。在优选实施例中，本发明用于制造用于磁存储装置的滑块上的空气轴承特征。根据本发明，如在包括烘烤步骤的现有技术中，应用，显影和去除光致抗蚀剂（液体或干燥）。本发明的实施例包括除了在光刻工艺中使用的任何烘烤步骤之外的额外的烘烤步骤。额外的烘烤步骤优选在离子研磨之前立即进行。根据本发明的另外的烘烤步骤产生离子研磨深度的均匀性，这被认为是通过光致抗蚀剂中的挥发性物质例如水的还原引起的。当将本发明用作离子铣削制造过程的一部分时，滑块上的空气轴承特征更加均匀，这提高了整体的质量和性能。

10. 发明授权

US09349395B2 System and method for differential etching 有权
标题翻译：差分蚀刻的系统和方法
公开(公告)号：US09349395B2
公开(公告)日：2016-05-24
申请号：US13601739
申请日：2012-08-31
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
IPC分类号： G11B5/31 , H01J37/32
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译：根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。

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