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    • 7. 发明授权
    • Polymers containing aromatic-azo-aliphatic moieties capable of
generating photoinitiated free radicals
    • 含有能产生光引发自由基的芳族 - 偶氮 - 脂族部分的聚合物
    • US5037925A
    • 1991-08-06
    • US492701
    • 1990-03-13
    • Richard A. WolfPaul V. Grosso
    • Richard A. WolfPaul V. Grosso
    • C07C245/06C08F12/26
    • C07C245/06C08F12/26
    • Compounds of the formula: ##STR1## where Q is a polymerizable olefin substituent;Ar is an aromatic moiety;C.sup..alpha. is the .alpha. carbon;R.sup.1 and R.sup.2 are independently hydrogen or aliphatic groups; andZ is a halogen, oxygen-containing, nitrogen-containing or sulfur-containing substituent complying with one of the formulae: --X, --OR, --SR or --NR.sub.2, wherein X is a halogen and each R is independently a hydrogen atom or an aliphatic moiety;contain azo groups which are stable with respect to thermal decompositon at high temperatures (180.degree. C. to 240.degree. C. and beyond) in the absence of moderate light, so that such compounds may be polymerized and processed at ordinary polystyrene process temperatures. However, the azo group in those compounds or in polymers made from them decomposes to initiate free radical polymerization at temperatures of 100.degree. C. to 120.degree. C. or less in the presence of moderate light.
    • 下式的化合物:其中Q是可聚合烯烃取代基; Ar是芳族部分; C alpha是α碳; R1和R2独立地是氢或脂族基团; 并且Z是符合以下通式之一的卤素,含氧,含氮或含硫取代基:-X,-OR,-SR或-NR2,其中X是卤素,并且每个R独立地是氢原子 或脂族部分; 包含在不存在中等光照的情况下在高温(180℃至240℃以上)相对于热分解稳定的偶氮基团,使得这些化合物可以在普通聚苯乙烯工艺温度下聚合和加工。 然而,这些化合物中的偶氮基团或由它们制备的聚合物中的偶氮基团在温和的光照下在100℃至120℃或更低的温度下分解引发自由基聚合。
    • 8. 发明授权
    • Polymerizable aromatic-azo-aliphatic compounds capable of generating
photoinitiated free radicals
    • 能够产生光引发自由基的可聚合的芳族 - 偶氮 - 脂族化合物
    • US4929721A
    • 1990-05-29
    • US213208
    • 1988-06-29
    • Richard A. WolfPaul V. Grosso
    • Richard A. WolfPaul V. Grosso
    • C07C245/06C08F12/26
    • C08F12/26C07C245/06
    • Compounds of the formula: ##STR1## wherein Q is a polymerizable olefin substituent;Ar is an aromatic moiety;C.sup..alpha. is the .alpha. carbon;R.sup.1 and R.sup.2 are independently hydrogen or aliphatic groups; andZ is a halogen, oxygen-containing, nitrogen-containing or sulfur-containing substituent complying with one of the formulae: --X, --OR, --SR or --NR.sub.2, wherein X is a halogen and each R is independently a hydrogen atom or an aliphatic moiety;contain azo groups which are stable with respect to thermal decomposition at high temperature (180.degree. to 240.degree. C. and beyond) in the absence of moderate light, so that such compounds may be polymerized and processed at ordinary polystyrene process temperatures. However, the azo group in those compounds or in polymers made from them decomposes to initiate free radical polymerization at temperature of 100.degree. C. to 120.degree. C. or less in the presence of moderate light.
    • 下式的化合物:其中Q是可聚合烯烃取代基; Ar是芳族部分; C alpha是α碳; R1和R2独立地是氢或脂族基团; 并且Z是符合以下通式之一的卤素,含氧,含氮或含硫取代基:-X,-OR,-SR或-NR2,其中X是卤素,并且每个R独立地是氢原子 或脂族部分; 含有在不存在中等光照的情况下相对于高温(180〜240℃以上)的热分解稳定的偶氮基,使得这些化合物可以在普通聚苯乙烯工艺温度下聚合和加工。 然而,这些化合物中的偶氮基团或由它们制备的聚合物中的偶氮基团在温和的光照条件下,在100℃至120℃或更低的温度下分解引发自由基聚合。