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1. 发明授权

US07580767B2 Methods of and apparatuses for maintenance, diagnosis, and optimization of processes 有权
标题翻译：过程的维护，诊断和优化的方法和设备
公开(公告)号：US07580767B2
公开(公告)日：2009-08-25
申请号：US11179440
申请日：2005-07-11
申请人： Paul Douglas MacDonald , Michiel V. P. Krüger , Michael Welch , Mason L. Freed , Costas J. Spanos
发明人： Paul Douglas MacDonald , Michiel V. P. Krüger , Michael Welch , Mason L. Freed , Costas J. Spanos
IPC分类号： G06F19/00
CPC分类号： G05B23/0235 , G05B13/04 , G05B13/045
摘要： One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.
摘要翻译：本发明的一个方面是监视处理工艺，优化处理和诊断处理工具处理工具的执行中的问题的方法。本发明的另一方面是被配置为用于监视处理，优化处理和诊断用于处理工件的处理工具的执行中的问题的系统。本发明的一个实施例包括可以在计算机中实现的用于优化用于处理工件的处理工具的性能的软件程序。

2. 发明申请

US20090292506A1 METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES 审中-公开
标题翻译：维护，诊断和过程优化的方法和装置
公开(公告)号：US20090292506A1
公开(公告)日：2009-11-26
申请号：US12538066
申请日：2009-08-07
申请人： Paul Douglas MacDonald , Michiel V.P. Kruger , Michael Welch , Mason L. Freed , Costas J. Spanos
发明人： Paul Douglas MacDonald , Michiel V.P. Kruger , Michael Welch , Mason L. Freed , Costas J. Spanos
IPC分类号： G06F15/00
CPC分类号： G05B23/0235 , G05B13/04 , G05B13/045
摘要： One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.
摘要翻译：本发明的一个方面是监视处理工艺，优化处理和诊断处理工具处理工具的执行中的问题的方法。本发明的另一方面是被配置为用于监视处理，优化处理和诊断用于处理工件的处理工具的执行中的问题的系统。本发明的一个实施例包括可以在计算机中实现的用于优化用于处理工件的处理工具的性能的软件程序。

3. 发明授权

US07299148B2 Methods and apparatus for low distortion parameter measurements 失效
标题翻译：用于低失真参数测量的方法和装置
公开(公告)号：US07299148B2
公开(公告)日：2007-11-20
申请号：US11177922
申请日：2005-07-08
申请人： Dean Hunt , Costas J. Spanos , Michael Welch , Kameshwar Poolla , Mason L. Freed
发明人： Dean Hunt , Costas J. Spanos , Michael Welch , Kameshwar Poolla , Mason L. Freed
IPC分类号： G01K1/12
CPC分类号： G01K1/18 , H05K1/147 , H05K1/148
摘要： This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.
摘要翻译：本发明寻求提供可以提高用于处理工件的测量参数数据的精度的方法和装置。本发明的一个方面包括测量由测量装置引起的测量的低变形的工艺条件的方法。这些测量包括应用程序的数据，例如用于监视，控制和优化流程和流程工具的数据。本发明的另一方面包括用于测量用于诸如生成用于监控，控制和优化过程和处理工具的数据的应用的基本上正确的数据的装置。

4. 发明申请

US20060144931A1 METHOD AND DEVICE TO SCAN AN OBJECT AND PERFORM SELECTED FUNCTIONS RELATED THERETO 有权
标题翻译：用于扫描对象并执行与之相关的选择的功能的方法和设备
公开(公告)号：US20060144931A1
公开(公告)日：2006-07-06
申请号：US10905375
申请日：2004-12-30
申请人： Michael Welch
发明人： Michael Welch
IPC分类号： G06K15/00 , G06K7/10
CPC分类号： G06Q30/0603
摘要： A device for communications may include a scanner to scan an object or code. The device for communications may also include a processor to perform a selected function related to the scanned object or.
摘要翻译：用于通信的设备可以包括用于扫描对象或代码的扫描仪。用于通信的设备还可以包括用于执行与被扫描对象相关的所选功能的处理器。

5. 发明申请

US20060098027A1 Method and apparatus for providing call-related personal images responsive to supplied mood data 审中-公开
标题翻译：用于响应所提供的心情数据提供与呼叫有关的个人图像的方法和装置
公开(公告)号：US20060098027A1
公开(公告)日：2006-05-11
申请号：US10984469
申请日：2004-11-09
申请人： Myra Rice , Michael Welch
发明人： Myra Rice , Michael Welch
IPC分类号： G09G5/00
CPC分类号： H04M3/42042 , H04M1/576 , H04M1/72555 , H04M3/42059 , H04M2203/2038 , H04M2250/12
摘要： The present invention describes a method and apparatus for providing an image in association with a call between two or more communication devices. In one exemplary embodiment of the present invention, a personal image of a user is either selected or modified responsive to supplied mood data. The resulting personal image is output to an output device in association with the call. In some embodiments, the personal image is output to a display in association with the call. In other embodiments, the personal image is output to a transceiver, which transmits the personal image to a remote communication device in association with the call.
摘要翻译：本发明描述了一种用于提供与两个或更多个通信设备之间的呼叫相关联的图像的方法和装置。在本发明的一个示例性实施例中，响应于所提供的心情数据，选择或修改用户的个人图像。所产生的个人图像与呼叫相关联地输出到输出设备。在一些实施例中，将个人图像与呼叫相关联地输出到显示器。在其他实施例中，将个人图像输出到收发器，收发器将个人图像发送到与呼叫相关联的远程通信设备。

6. 发明授权

US06774806B1 Monitoring an element of a plant 有权
标题翻译：监测植物的元素
公开(公告)号：US06774806B1
公开(公告)日：2004-08-10
申请号：US09396809
申请日：1999-09-14
申请人： John Lesly Kingsford Bannell , David Mark Falconer , Thomas Simon Colaco Osorio , Michael Welch
发明人： John Lesly Kingsford Bannell , David Mark Falconer , Thomas Simon Colaco Osorio , Michael Welch
IPC分类号： G08B2100
CPC分类号： G01D13/26 , G01D5/39 , G05B19/41875 , G05B23/0235 , G05B2219/37205 , Y02P90/22 , Y02P90/86
摘要： A method of monitoring an element of a plant is disclosed which comprises the steps of: (a) producing an image representing the state of the element and recording the image in the form of a data set; (b) comparing the data set with a norm in order to determine a change in the state of the element; and (c) producing a signal which represents the change in the state of the element.
摘要翻译：公开了一种监视工厂元件的方法，包括以下步骤：（a）产生表示元件状态并以数据集的形式记录图像的图像;（b）将数据集与规范，以确定元素状态的变化; 和（c）产生表示元件状态变化的信号。

7. 发明授权

US06232236B1 Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system 失效
标题翻译：用于控制半导体晶片处理系统中的等离子体均匀性的装置和方法
公开(公告)号：US06232236B1
公开(公告)日：2001-05-15
申请号：US09365999
申请日：1999-08-03
申请人： Hongqing Shan , Claes Bjorkman , Paul Luscher , Richard Mett , Michael Welch
发明人： Hongqing Shan , Claes Bjorkman , Paul Luscher , Richard Mett , Michael Welch
IPC分类号： H01L2100
CPC分类号： H01J37/32082 , H01J37/32165
摘要： An apparatus and method for controlling a plasma in a plasma processing system. The apparatus comprises a wafer support pedestal surrounded by a process kit that is driven by an RF signal. Both an electrode (cathode) in the pedestal and the process kit are driven with an RF signal to establish a primary plasma above the pedestal and a secondary plasma above the process kit.
摘要翻译：一种用于控制等离子体处理系统中的等离子体的装置和方法。该装置包括由RF信号驱动的处理套件包围的晶片支撑台座。基座中的电极（阴极）和处理套件都用RF信号驱动，以在基座上建立初级等离子体，并在工艺组件上方形成二次等离子体。

8. 发明授权

US5948168A Distributed microwave plasma reactor for semiconductor processing 失效
标题翻译：用于半导体加工的分布式微波等离子体反应器
公开(公告)号：US5948168A
公开(公告)日：1999-09-07
申请号：US947820
申请日：1997-10-09
申请人： Hongching Shan , Harald Herchen , Michael Welch
发明人： Hongching Shan , Harald Herchen , Michael Welch
IPC分类号： H05H1/46 , C23C16/44 , C23C16/452 , C23C16/455 , C23C16/50 , C23C16/511 , C23C16/52 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/452 , C23C16/511 , C23C16/52 , H01J37/32229 , H01J37/32357 , H01J37/3244 , Y10S438/935
摘要： A plasma reactor has plural dielectric gas injection tubes extending from a gas injection source and through a microwave guide and into the top of the reactor chamber. The semiconductor wafer rests near the bottom of the chamber on a wafer pedestal connected to a bias RF power source which is controlled independently of the microwave source coupled to the microwave guide. The microwaves from the waveguide ignite and maintain a plasma in each of the tubes. Gas flow through the tubes carries the plasmas in all the tubes into the chamber and into contact with the wafer surface.
摘要翻译：等离子体反应器具有多个介电气体注入管，其从气体注入源延伸并通过微波引导件并进入反应器室的顶部。半导体晶片位于连接到偏置RF电源的晶片基座上的室底部附近，偏置RF电源独立于耦合到微波引导件的微波源控制。来自波导的微波在每个管中点燃并保持等离子体。通过管的气体流将所有管中的等离子体携带到室中并与晶片表面接触。

9. 发明授权

US5865937A Broad-band adjustable power ratio phase-inverting plasma reactor 失效
标题翻译：宽带可调功率比相位等效电抗器
公开(公告)号：US5865937A
公开(公告)日：1999-02-02
申请号：US517177
申请日：1995-08-21
申请人： Hongching Shan , Hiroji Hanawa , Robert Wu , Michael Welch
发明人： Hongching Shan , Hiroji Hanawa , Robert Wu , Michael Welch
IPC分类号： H05H1/46 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , C23F1/08
CPC分类号： H01J37/32174
摘要： In a plasma reactor including a vacuum chamber for containing at least a reactant gas at a selected pressure and a semiconductor wafer to be processed, a pair of electrodes for capacitively coupling radio frequency power into the chamber and a radio frequency source having a radio frequency power terminal, a circuit for coupling the radio frequency source to the pair of electrodes includes a coil having plural conductive windings and a pair of terminals bounding plural ones of the windings, the pair of terminals coupled to respective ones of the pair of electrodes, one of the windings connected to the power terminal of the radio frequency source, and a grounded conductive tap contacting the coil and slidable along the plural ones of the windings between the pair of terminals for varying a ratio of power apportioned between the pair of electrodes.
摘要翻译：在包括用于在选定压力下容纳至少一种反应气体的真空室和待处理的半导体晶片的等离子体反应器中，将用于将射频功率电容耦合到腔室中的一对电极和具有射频功率的射频源端子，用于将射频源耦合到该对电极的电路包括具有多个导体绕组的线圈和限定多个绕组的一对端子，该对端子耦合到该对电极中的相应电极，连接到射频源的电源端子的绕组以及与线圈接触的接地导线，并且可以沿着一对端子之间的多个绕组滑动，以改变在该对电极之间分配的功率比。

10. 发明授权

US5780359A Polymer removal from top surfaces and sidewalls of a semiconductor wafer 失效
公开(公告)号：US5780359A
公开(公告)日：1998-07-14
申请号：US570058
申请日：1995-12-11
申请人： William Brown , Harald Herchen , Walter Merry , Michael Welch
发明人： William Brown , Harald Herchen , Walter Merry , Michael Welch
IPC分类号： H01L21/302 , H01L21/02 , H01L21/027 , H01L21/3065 , H01L21/311 , H01L21/3213
CPC分类号： H01L21/02071 , H01L21/31138
摘要： A process for producing a strip removes photoresist and extraneous deposits of polymer residue on the top surface and sidewalls of a post-metal etch wafer. The photoresist and residue are processed simultaneously by a chemical mechanism comprising reactive species derived from a microwave-excited fluorine-containing downstream gas, and a physical mechanism comprising ion bombardment that results from a radio frequency excited plasma and accompanying wafer self bias. A vacuum pump draws stripped photoresist and residues from the surface of the wafer and exhausts them from the chamber.

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