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    • 8. 发明授权
    • Foam generating apparatus
    • 泡沫发生装置
    • US5066428A
    • 1991-11-19
    • US564368
    • 1990-08-08
    • David ManlowePaul A. Kittle
    • David ManlowePaul A. Kittle
    • B01F3/04B09B1/00
    • B01F3/04992Y10S261/26
    • A foam generating apparatus is disclosed which generates foam from a foamable liquid by pumping the liquid by means of a high pressure pump from a storage tank to a combining device in which the liquid is combined with compressed air. The apparatus is capable of both operation and storage under extremely cold ambient conditions without the components of the apparatus becoming frozen. When the apparatus is not generating the product foam, a foamable liquid is recirculated throughout the apparatus to prevent the components of the apparatus from becoming frozen. The recirculation system is especially useful in preventing the high pressure pump from becoming frozen during storage in cold environments, while also reducing the amount of wear on the pump.
    • 公开了一种泡沫发生设备,其通过将高压泵从储罐泵送到液体与压缩空气结合的组合装置中,从可发泡液体产生泡沫。 该装置能够在极冷的环境条件下操作和存储,而不会使装置的部件冻结。 当设备不产生产品泡沫时,可发泡的液体在整个设备中再循环,以防止设备的部件冻结。 再循环系统特别适用于防止高压泵在寒冷环境中储存期间冻结,同时也减少了泵上的磨损量。
    • 10. 发明授权
    • Surface treatment of semiconductor substrates
    • 半导体衬底的表面处理
    • US06296715B1
    • 2001-10-02
    • US09496537
    • 2000-02-02
    • Paul A. Kittle
    • Paul A. Kittle
    • B08B308
    • H01L21/67028Y10S134/902
    • Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving contact therewith. Drying of the substrate is carried out, using a water solution of carbon dioxide in a pressurizable vessel. By releasing the pressure in the vessel, a layer of foam is established on the surface of the solution. The solution is discharged from the vessel, causing the foam layer to pass over the substrate in moving contact therewith. The carbon dioxide reduces the surface tension of the water, thereby enabling the foam layer to be produced and also assisting in the elimination of water from the surface of the substrate. In both cases, the use of foam reduces materials requirements and also reduces the quantity of particles deposited onto the substrate in the treatment process.
    • 半导体衬底的表面清洁,化学处理和干燥使用泡沫作为介质而不是冷凝液介质进行。 在清洁和化学处理中,通过将泡沫引入溢流容器中,使泡沫通过基板与其移动接触。 使用可加压容器中的二氧化碳水溶液进行基材的干燥。 通过释放容器中的压力,在溶液的表面上形成一层泡沫。 溶液从容器中排出,导致泡沫层与基底移动接触而越过基底。 二氧化碳降低了水的表面张力,从而能够生产泡沫层,并且还有助于从基材表面去除水分。 在这两种情况下,泡沫的使用减少了材料的需求并且还减少了在处理过程中沉积到基底上的颗粒的量。