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1. 发明授权

US07212091B2 Micro-electro-mechanical RF switch 有权
标题翻译：微机电RF开关
公开(公告)号：US07212091B2
公开(公告)日：2007-05-01
申请号：US11053732
申请日：2005-02-08
申请人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
发明人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
IPC分类号： H01H51/22
CPC分类号： H01H59/0009 , H01H2001/0078
摘要： A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
摘要翻译：一种微机电开关，包括：至少一对致动器电极; 分别输入和输出射频信号的至少一个输入电极和至少一个输出电极; 以及可由所述至少一对致动器电极之间的吸引部移动的光束，所述可移动光束具有至少一部分电连接到所述至少一个输入电极，并且当所述至少一个输入电极在所述至少一个输入电极之间被所述吸引力移动时，至少一对致动器电极，用于在所述至少一个输入和输出电极之间形成电连接; 其中所述至少一对致动器电极与所述至少一个输入和输出电极中的每一个电隔离。微机电开关可以配置为单极或多极和/或单掷或多掷。

2. 发明授权

US06876282B2 Micro-electro-mechanical RF switch 失效
标题翻译：微机电RF开关
公开(公告)号：US06876282B2
公开(公告)日：2005-04-05
申请号：US10150285
申请日：2002-05-17
申请人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
发明人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
IPC分类号： H01H59/00 , H01H51/22
CPC分类号： H01H59/0009 , H01H2001/0078
摘要： A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
摘要翻译：一种微机电开关，包括：至少一对致动器电极; 分别输入和输出射频信号的至少一个输入电极和至少一个输出电极; 以及可由所述至少一对致动器电极之间的吸引部移动的光束，所述可移动光束具有至少一部分电连接到所述至少一个输入电极，并且当所述至少一个输入电极在所述至少一个输入电极之间被所述吸引力移动时，至少一对致动器电极，用于在所述至少一个输入和输出电极之间形成电连接; 其中所述至少一对致动器电极与所述至少一个输入和输出电极中的每一个电隔离。微机电开关可以配置为单极或多极和/或单掷或多掷。

3. 发明授权

US5908732A Polymer compositions for high resolution resist applications 失效
标题翻译：用于高分辨抗蚀剂应用的聚合物组合物
公开(公告)号：US5908732A
公开(公告)日：1999-06-01
申请号：US717644
申请日：1996-09-23
申请人： Ari Aviram , Karen Elizabeth Petrillo , Andrew T. S. Pomerene , David Earle Seeger
发明人： Ari Aviram , Karen Elizabeth Petrillo , Andrew T. S. Pomerene , David Earle Seeger
IPC分类号： G03F7/039 , G03F7/26 , G03F7/32 , G03F7/30 , G03F7/38
CPC分类号： G03F7/26 , G03F7/039 , G03F7/322 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.
摘要翻译：通过将甲基丙烯酸2-羟基烷基酯和/或丙烯酸2-羟烷基酯与甲基丙烯酸烷基酯和/或丙烯酸烷基酯成像曝光于光化光，X-射线或电子束共聚物，然后在显影剂中显影该聚合物，从而产生正光刻图案。

4. 发明授权

US6103145A Crosslinked water-soluble electrically conducting polymers 失效
标题翻译：交联的水溶性导电聚合物
公开(公告)号：US6103145A
公开(公告)日：2000-08-15
申请号：US478468
申请日：1995-06-07
申请人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
发明人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
IPC分类号： C08G61/12 , C08G61/10 , C08G75/02 , C08G75/04 , C08J3/28 , C08L33/00 , C08L33/02 , C08L41/00 , C08L79/00 , C08L101/00 , C08L101/02 , C08L101/12 , G03F7/038 , G03F7/09 , H01B1/12
CPC分类号： G03F7/093 , G03F7/038 , H01B1/128
摘要： Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
摘要翻译：公开了一种包含多酸和含有含有一个或多个碱性原子的重复单元的聚合物的新物质组合物。该复合物是水溶性和导电性的。该复合物可用于提供用于电子应用和制造的有机放电层。

5. 发明授权

US07166241B1 Water-soluble electrically conducting polymers, their synthesis and use 失效
标题翻译：水溶性导电聚合物，其合成和用途
公开(公告)号：US07166241B1
公开(公告)日：2007-01-23
申请号：US08478469
申请日：1995-06-07
申请人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
发明人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
IPC分类号： H01B1/12
CPC分类号： H01B1/127 , H01B1/128 , Y10S428/922
摘要： Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
摘要翻译：公开了一种包含多酸和含有含有一个或多个碱性原子的重复单元的聚合物的新物质组合物。该复合物是水溶性和导电性的。该复合物可用于提供用于电子应用和制造的有机放电层。

6. 发明授权

US6100011A High sensitivity, photo-active polymer and developers for high resolution resist applications 失效
标题翻译：高灵敏度，光敏聚合物和显影剂，用于高分辨率抗蚀剂应用
公开(公告)号：US6100011A
公开(公告)日：2000-08-08
申请号：US179423
申请日：1998-10-27
申请人： Ari Aviram , Andrew T. S. Pomerene , David Earle Seeger
发明人： Ari Aviram , Andrew T. S. Pomerene , David Earle Seeger
IPC分类号： G03F7/039 , G03F7/32 , G03F7/38
CPC分类号： G03F7/38 , G03F7/039 , G03F7/322 , Y10S430/168
摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001% to about 1% by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.
摘要翻译：通过成像曝光于光化光，X射线或电子束来形成正极光刻图案，该聚合物具有选自-COO-CH 2 -CH（OH） - （CH 2）x H的侧基重复基团，其中x为0- 20; -COO-CH 2 -CH（OH） - （CH 2）y-HE-（CH 2）z -H; 及其混合物; 其中HE为O或S; 每个y和z分别为1-18; 及其混合物; 然后在含水碱性显影剂中显影聚合物。开发人员可以是常规或常用的任何开发者以及下面讨论的特殊开发者。通过成像暴露于光化光，X射线或电子束光敏聚合物材料以提供游离羧酸基团也产生正光刻图案。然后通过与含有至少一个氨基的化合物和至少两个选自碱金属磺酸盐基团，硫酸铵基团，硫酸铵基团，及其混合物; 或通过与蒸气形式的胺接触并与水性溶剂接触来显影。

7. 发明授权

US06010645A Water-soluble electrically conducting polymers, their synthesis and use 失效
公开(公告)号：US06010645A
公开(公告)日：2000-01-04
申请号：US306654
申请日：1994-09-15
申请人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
发明人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
IPC分类号： C08G61/12 , C08G61/10 , C08G75/02 , C08G75/04 , C08J3/28 , C08L33/00 , C08L33/02 , C08L41/00 , C08L79/00 , C08L101/00 , C08L101/02 , C08L101/12 , G03F7/038 , G03F7/09 , H01B1/12 , H01B1/20
CPC分类号： G03F7/093 , G03F7/038 , H01B1/128
摘要： Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

8. 发明授权

US5770345A Photoresist having increased sensitivity and use thereof 失效
标题翻译：光敏剂具有增加的灵敏度和使用
公开(公告)号：US5770345A
公开(公告)日：1998-06-23
申请号：US680668
申请日：1996-07-16
申请人： Edward Darko Babich , Karen Elizabeth Petrillo , John Patrick Simons , David Earle Seeger
发明人： Edward Darko Babich , Karen Elizabeth Petrillo , John Patrick Simons , David Earle Seeger
IPC分类号： G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , G03F7/09 , G03F7/30 , H01L21/027
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/115 , Y10S430/116 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
摘要翻译：通过添加某些染料可以改善光致抗蚀剂对光化光的敏感性。光致抗蚀剂包括聚合物基质，光敏酸产生剂和至少一种选自包含至少一个杂硫原子的染料的化合物，例如2,21,51,2“ - 三噻吩及其衍生物; 噻吩及其衍生物和4,6-二苯基噻吩并（3,4-d）-1,3-二氧杂环戊烯-2-酮-5,5-二氧化物; 苯砜及其衍生物; 和4,5-二苯基-1,3-二氧杂环戊烯-2-酮; 3,4-二（乙酰氧基甲基）呋喃; 螯合酸及其衍生物; 和5,7,12,14-五硝基四酮。由组合物形成基底上的抗蚀剂图像。

9. 发明授权

US5759637A Water-Soluable electrically conducting polymers, their synthesis and use 失效
标题翻译：水溶性导电聚合物，其合成和用途
公开(公告)号：US5759637A
公开(公告)日：1998-06-02
申请号：US478467
申请日：1995-06-07
申请人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
发明人： Marie Angelopoulos , Jeffrey Donald Gelorme , Thomas Harold Newman , Niranjan Mohanlal Patel , David Earle Seeger
IPC分类号： C08G61/12 , C08G61/10 , C08G75/02 , C08G75/04 , C08J3/28 , C08L33/00 , C08L33/02 , C08L41/00 , C08L79/00 , C08L101/00 , C08L101/02 , C08L101/12 , G03F7/038 , G03F7/09 , H01B1/12 , B05D3/06
CPC分类号： G03F7/093 , G03F7/038 , H01B1/128
摘要： Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
摘要翻译：公开了一种包含多酸和含有含有一个或多个碱性原子的重复单元的聚合物的新物质组合物。该复合物是水溶性和导电性的。该复合物可用于提供用于电子应用和制造的有机放电层。

10. 发明授权

US5753412A Photoresist having increased sensitivity and use thereof 失效
标题翻译：光敏剂具有增加的灵敏度和使用
公开(公告)号：US5753412A
公开(公告)日：1998-05-19
申请号：US659675
申请日：1996-06-05
申请人： Edward Darko Babich , Karen Elizabeth Petrillo , John Patrick Simons , David Earle Seeger
发明人： Edward Darko Babich , Karen Elizabeth Petrillo , John Patrick Simons , David Earle Seeger
IPC分类号： G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , G03F7/09 , G03F7/30 , H01L21/027 , G03F7/38
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/115 , Y10S430/116 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
摘要翻译：通过添加某些染料可以改善光致抗蚀剂对光化光的敏感性。光致抗蚀剂包括聚合物基质，光敏酸产生剂和至少一种选自包含至少一个杂硫原子的染料的化合物，例如2,21,51,2“ - 三噻吩及其衍生物; 噻吩及其衍生物和4,6-二苯基噻吩并（3,4-d）-1,3-二氧杂环戊烯-2-酮-5,5-二氧化物; 苯砜及其衍生物; 和4,5-二苯基-1,3-二氧杂环戊烯-2-酮; 3,4-二（乙酰氧基甲基）呋喃; 螯合酸及其衍生物; 和5,7,12,14-五硝基四酮。抗蚀剂基材上的图像由组合物形成。

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