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1. 发明授权

US5596596A Narrow band excimer laser 失效
标题翻译：窄带准分子激光器
公开(公告)号：US5596596A
公开(公告)日：1997-01-21
申请号：US573593
申请日：1995-12-15
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： G03F7/20 , H01S3/08 , H01S3/1055 , H01S3/225
CPC分类号： G03F7/70025 , H01S3/08009 , H01S3/1055 , H01S3/225
摘要： A narrow-band excimer laser employing a diffraction grating as a wavelength selective element, which is particularly suited for a light source of a reduction projection aligner. The grating used in the narrow-band excimer laser of the invention is so disposed that the ruling direction of the grating is nearly perpendicular to the direction of laser discharge. When a beam expander is used to expand laser beam falling on the beam expander is so disposed that the direction of beam expansion is nearly perpendicular to that of discharge of the laser. Further, when an aperture is to be used in the laser cavity, the aperture is placed so that the longitudinal direction may be parallel to the direction of laser discharge. Moreover, the front mirror of the laser cavity is a cylindrical one, whose mechanical axis is in parallel with the direction of laser discharge. This makes it possible to provide a narrow-band excimer laser having very high efficiency and excellent durability.
摘要翻译：采用衍射光栅作为波长选择元件的窄带准分子激光器，其特别适用于还原投影对准器的光源。在本发明的窄带准分子激光器中使用的光栅被布置成使得光栅的光栅方向几乎垂直于激光放电的方向。当使用光束扩展器来扩展落在光束扩展器上的激光束时，光束扩展的方向几乎垂直于激光放电的方向。此外，当在激光腔中使用孔时，孔被放置成使得纵向方向可以平行于激光放电的方向。此外，激光腔的前镜是圆柱形的，其机械轴与激光放电的方向平行。这使得可以提供非常高的效率和优异的耐久性的窄带准分子激光器。

2. 再颁专利

USRE38372E1 Narrow band excimer laser and wavelength detecting apparatus 失效
标题翻译：窄带准分子激光器和波长检测装置
公开(公告)号：USRE38372E1
公开(公告)日：2003-12-30
申请号：US08833251
申请日：1997-04-04
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： H01S313
CPC分类号： G03F7/70566 , G01J9/0246 , G03F7/70575 , G03F7/70583 , H01S3/0014 , H01S3/08004 , H01S3/08009 , H01S3/1394 , H01S3/225
摘要： A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is constructed to input a reference light and a light to be detected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detecting the wavelength of the laser beam based on interference fringe detected by the light detector.

3. 发明授权

US5218421A Wavelength detecting apparatus 失效
标题翻译：波长检测装置
公开(公告)号：US5218421A
公开(公告)日：1993-06-08
申请号：US768730
申请日：1991-10-08
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： G01J3/10 , G01J9/02 , H01L21/027 , H01L21/30 , H01S3/00
CPC分类号： G01J9/0246
摘要： A wavelength detecting apparatus which assures that the wavelength of a laser light can be detected with accuracy is disclosed. In the subject invention, the temperature of the vapor obtained from an element such as a mercury which contains plural isotopes is elevated in excess of a predetermined temperature so that an emission line of the element becomes plural emission lines. One of the divided emission lines is used as a reference light for the detection of the wavelength of the light to be detected. In addition, a specific isotope of the element may be selected from plural isotopes of a reference element to thereby provide a narrowed emission line for use as a reference light.
摘要翻译： PCT No.PCT / JP91 / 00185 Sec。 371日期1991年10月8日 102（e）日期1991年10月8日PCT 1991年2月15日提交PCT公布。 WO91 / 12499 PCT出版物日期：1991年8月22日。公开了一种能够准确地检测出激光的波长的波长检测装置。在本发明中，从含有多个同位素的汞等元素得到的蒸气的温度升高超过规定的温度，使得该元素的发射线成为多个发射线。其中一条划分的发射线用作检测被检测光的波长的参考光。此外，元素的特定同位素可以从参考元素的多个同位素中选择，从而提供用作参考光的变窄的发射线。

4. 发明授权

US5404366A Narrow band excimer laser and wavelength detecting apparatus 失效
标题翻译：窄带准分子激光器和波长检测装置
公开(公告)号：US5404366A
公开(公告)日：1995-04-04
申请号：US194803
申请日：1994-02-14
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： G01J9/02 , G03F7/20 , H01S3/00 , H01S3/08 , H01S3/139 , H01S3/225 , H01S3/13
CPC分类号： G03F7/70566 , G01J9/0246 , G03F7/70575 , G03F7/70583 , H01S3/08009 , H01S3/1394 , H01S3/225 , H01S3/0014 , H01S3/08004
摘要： A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is constructed to input a reference light and a light to be detected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detecting the wavelength of the laser beam based on interference fringe detected by the light detector.
摘要翻译：窄带准分子激光器和波长检测装置适合用作半导体器件制造装置的还原投影对准器的光源。在准分子激光器中，使棱镜扩束器的排列方向和光束扩展方向基本上一致，并且引起与棱镜束的光束扩展方向基本平行的线偏振光波的选择性振荡的偏振元件扩张器包含在激光腔中。设置在激光室的前侧或后侧的窗口，使得窗口在包含棱镜扩展器的光束扩展方向和激光束轴线的平面中相对于激光束的轴线形成布鲁斯特角。选择性地防止基本上平行于棱镜扩束器的光束扩展方向的偏振光成分的反射的防反射膜被涂覆在构成棱镜扩束器的棱镜的一个表面上。波长检测装置被构造成在标准具上输入要检测的参考光和光。通过标准具透射的光被聚集在光检测器上，用于基于由光检测器检测到的干涉条纹来检测激光束的波长。

5. 发明授权

US5198872A Apparatus for detecting the wavelength of laser light 失效
标题翻译：用于检测激光的波长的装置
公开(公告)号：US5198872A
公开(公告)日：1993-03-30
申请号：US640431
申请日：1991-04-22
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： H01S3/00 , G01J3/26 , G01J9/02 , H01S3/137
CPC分类号： G01J9/0246 , G01J3/26
摘要： The present invention provides a wavelength detecting apparatus for detecting the wavelength of a light (11) to be detected with reference to a reference light (31) by allowing the reference light (31) generated and transmitted from a light source (30) and the light (11) to be detected to be irradiated toward an etalon (62) and then detecting the light which has permeated through the etalon (62) by optical detecting means (64). The reference light and the light to be detected are incident on the focusing surface (50) which is located in front of a collimeter lens (61). The incident light is transformed into a parallel light in the collimeter lens (61) and the parallel light is then irradiated toward the etalon (62). The reference light and the light to be detected both of which have permeated through the etalon (62) reach the detecting surface of optical detecting means to build their images thereon with the aid of image building lens means (63), whereby interference fringes corresponding to the reference light and the light to be detected are formed on the detecting surface of the optical detecting means. The optical detecting means detects a relative wavelength of the light to be detected relative to the reference light, i.e., an absolute wavelength of the light to be detected by detecting the interference fringes.

6. 发明授权

US5802094A Narrow band excimer laser 失效
标题翻译：窄带准分子激光器
公开(公告)号：US5802094A
公开(公告)日：1998-09-01
申请号：US728448
申请日：1996-10-10
申请人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
发明人： Osamu Wakabayashi , Masahiko Kowaka , Yukio Kobayashi
IPC分类号： G03F7/20 , H01S3/08 , H01S3/106 , H01S3/225 , H01S3/22
CPC分类号： H01S3/106 , H01S3/08009 , H01S3/225
摘要： A narrow band excimer laser capable of easily adjusting the rotation of the laser beam by an image rotator provided between a laser chamber and a grating and on the laser beam optical axis. The image rotator is supported with freedom of rotation on the laser beam optical axis and rotates the laser beam about the optical axis so that the plane containing the direction in which the width of the laser beam incident upon the beam expander is narrower is parallel with the plane containing the beam-expansion direction of the beam expander, and the beam expansion direction of the laser beam incident upon the grating is perpendicular to the direction of the grooves of the grating. With this arrangement, a laser beam of narrowed bandwidth can be obtained with high efficiency.
摘要翻译：一种窄带准分子激光器，其能够通过设置在激光室和光栅之间的图像旋转体和激光束光轴容易地调节激光束的旋转。图像旋转器在激光束光轴上具有旋转自由度并且围绕光轴旋转激光束，使得包含入射到扩束器上的激光束的宽度窄的方向的平面平行于包含光束扩展器的光束扩展方向的平面，并且入射到光栅上的激光束的光束扩展方向垂直于光栅的凹槽的方向。利用这种布置，可以以高效率获得带宽变窄的激光束。

7. 发明授权

US5373515A Laser wavelength controlling apparatus 失效
标题翻译：激光波长控制装置
公开(公告)号：US5373515A
公开(公告)日：1994-12-13
申请号：US721929
申请日：1991-06-21
申请人： Osamu Wakabayashi , Yasuo Itakura , Masahiko Kowaka , Yoshino Amada
发明人： Osamu Wakabayashi , Yasuo Itakura , Masahiko Kowaka , Yoshino Amada
IPC分类号： G01J3/46 , G02B27/42 , G05D25/02 , H01S3/137 , H01S3/225 , H01S3/13
CPC分类号： H01S3/137 , H01S3/08004 , H01S3/225
摘要： A laser wavelength controlling apparatus adapted for controlling the wavelength of a narrow-band oscillation laser beam at a high accuracy for long period of time even if environmental conditions such as the atmospheric temperature and pressure changes to some degree. This wavelength controlling apparatus includes a wavelength selective element (2) for narrowing the band width of the oscillating laser beam; a wavelength selection controller 9 and a wavelength selective element driver for changing the wavelength to be selected by the wavelength selective element (2); a reference light source (7) for generating a reference light for measuring the wavelength of the oscillating laser beam; a wavelength detector (8) for leading said oscillating laser beam and said reference light into a spectroscope and detecting the absolute wavelength of said oscillating laser beam on the basis of the detected value of the reference light; and a wavelength detecting driver (8a) for controlling the wavelength to be selected by said wavelength selective element in cooperation with said wavelength controller (9) so as to correspond the absolute wavelength detected by the wavelength detector with the preset wavelength.
摘要翻译：一种激光波长控制装置，即使在大气温度和压力等环境条件有一定程度的变化的情况下，也可以长时间高精度地控制窄带振荡激光的波长。该波长控制装置包括用于使振荡激光束的带宽变窄的波长选择元件（2）波长选择控制器9和用于改变由波长选择元件（2）选择的波长的波长选择元件驱动器; 用于产生用于测量所述振荡激光束的波长的参考光的参考光源（7）; 用于将所述振荡激光束和所述参考光引导到分光镜中的波长检测器（8），并且基于所述参考光的检测值来检测所述振荡激光束的绝对波长; 以及波长检测驱动器（8a），用于与所述波长控制器（9）协作控制由所述波长选择元件选择的波长，以便将波长检测器检测到的绝对波长与预设波长相对应。

8. 发明授权

US4856018A Light source for reduced projection 失效
标题翻译：减少投影的光源
公开(公告)号：US4856018A
公开(公告)日：1989-08-08
申请号：US5226
申请日：1987-01-20
申请人： Yasuhiro Nozue , Koichi Kajiyama , Kaoru Saito , Osamu Wakabayashi , Masahiko Kowaka , Yasuo Itakura
发明人： Yasuhiro Nozue , Koichi Kajiyama , Kaoru Saito , Osamu Wakabayashi , Masahiko Kowaka , Yasuo Itakura
IPC分类号： H01S3/08 , H01S3/098 , H01S3/225
CPC分类号： H01S3/08036 , H01S3/08004 , H01S3/225 , H01S3/2256
摘要： A reduced projection light source comprises a laser device for emitting laser light having a transverse mode of multimodes, and an etalon located between a chamber of the laser device and a total reflection mirror. The light source is used as an exposure light source for transfer printing an ultrafine pattern on a semiconductor wafer.
摘要翻译：减少的投影光源包括用于发射具有横向模式的多模式的激光的激光装置，以及位于激光装置的室和全反射镜之间的标准具。光源用作用于在半导体晶片上转印印刷超细图案的曝光光源。

9. 发明授权

US4829536A Multi-mode narrow-band oscillation excimer laser 失效
标题翻译：多模窄带振荡准分子激光器
公开(公告)号：US4829536A
公开(公告)日：1989-05-09
申请号：US144000
申请日：1987-11-30
申请人： Koichi Kajiyama , Kaoru Saito , Yasuhiro Nozue , Noritoshi Ito , Osamu Wakabayashi , Junichi Fujimoto , Masahiko Kowaka , Yasao Itakura
发明人： Koichi Kajiyama , Kaoru Saito , Yasuhiro Nozue , Noritoshi Ito , Osamu Wakabayashi , Junichi Fujimoto , Masahiko Kowaka , Yasao Itakura
IPC分类号： G03F7/20 , H01S3/106 , H01S3/225
CPC分类号： G03F7/70575 , G03F7/70583 , H01S3/1062 , H01S3/225
摘要： Specification of an etalon included in a multimode, narrow-band oscillation excimer laster used as a light source for light exposure in photolithography are set to satisfy a relation S.lambda.W.lambda.R.lambda. (u,v)d.lambda..gtoreq..alpha., where .alpha. is an optical transfer function necessary for light exposure of resist according to a reticle pattern, R.lambda.(u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, W.lambda. is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength .lambda.. Further, an inclination angle .lambda. of the etalon in its normal direction with respect to an optical axis when the etalon is provided between the chamber and rear mirror is set to satisfy a relation .theta.>tan.sup.-1 S/2A, where S is a dimension of a beam at a beam output mirror and A is a distance between the etalon and beam output mirror, and an oscillation linewidth K is set to satisfy relations K=1/.lambda..sub.o [1/{cos (.theta.+.theta.')}-1/cos .theta.} and also K.ltoreq.x, where .lambda..sub.o is a selected wavelength when the beam is directed onto the etalon at a normal angle, .theta.' is a beam divergence angle, and x is an allowable linewidth of a light exposure system using the excimer laser as a light source.

10. 发明授权

US5142543A Method and system for controlling narrow-band oscillation excimer laser 失效
标题翻译：用于控制窄带振荡激光器的方法和系统
公开(公告)号：US5142543A
公开(公告)日：1992-08-25
申请号：US439356
申请日：1989-09-20
申请人： Osamu Wakabayashi , Masahiko Kowaka
发明人： Osamu Wakabayashi , Masahiko Kowaka
IPC分类号： H01S3/104 , H01S3/106 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/225
CPC分类号： H01S3/134 , H01S3/104 , H01S3/1062 , H01S3/136 , H01S3/137 , H01S3/225
摘要： A method for controlling a narrow-band oscillation excimer laser which is suitable for control of an excimer laser used as a light source of a reduced projection exposer, and a system thereof. At least two wavelength selective element are disposed within a laser oscillator. There are provided a center wavelength control for causing an oscillation center wavelength determined by these wavelength selective elements to coincide with a desired value, an overlapping control for overlapping the transmission wavelengths of these wavelength selective elements, and a power control for controlling a voltage applied to electrodes located within a laser chamber to thereby control a laser output. Partial gas replacement is carried out when the application voltage to the electrodes within the laser chamber becomes high. After execution of the partial gas replacement, such control is carried out that the control period of the overlapping control is set to be substantially equal to that of the power control or that the overlapping control is inhibitd during the power control. At the time of activating the laser, the overlapping control is first carried out and then the center wavelength control is carried out.
摘要翻译： PCT No.PCT / JP89 / 00080 Sec。 371日期：一九八九年十一月二十二日 102（e）1989年11月22日PCT PCT 1月27日PCT PCT。出版物WO89 / 07353 日期1989年8月10日。一种用于控制适用于控制用作减少投影曝光器的光源的准分子激光器的窄带振荡准分子激光器的方法及其系统。至少两个波长选择元件设置在激光振荡器内。提供了一种用于使由这些波长选择元件确定的振荡中心波长与期望值一致的中心波长控制，用于与这些波长选择元件的发射波长重叠的重叠控制，以及用于控制施加到电极位于激光室内，从而控制激光输出。当对激光室内的电极的施加电压变高时，进行部分气体替换。在执行部分气体替换之后，执行这样的控制：将重叠控制的控制周期设置为基本上等于功率控制的控制周期，或者在功率控制期间禁止重叠控制。在激活激光器时，首先进行重叠控制，然后进行中心波长控制。

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