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    • 5. 发明申请
    • ACOUSTIC TRANSDUCER AND MICROPHONE
    • 声学传感器和麦克风
    • US20160094918A1
    • 2016-03-31
    • US14859474
    • 2015-09-21
    • OMRON Corporation
    • Yuki UCHIDAKoji MOMOTANITakashi KASAI
    • H04R19/04H03F3/181H04R3/00B06B1/02
    • H04R19/005H04R19/013H04R19/016H04R2201/003
    • An acoustic transducer includes a slit having higher passage resistance than in conventional structures and having a lower rate of decrease in the passage resistance than in conventional structures when, for example, the vibration electrode plate warps. The acoustic transducer includes a stationary electrode plate, and a vibration electrode plate facing the stationary electrode plate with a space between the electrode plates. The vibration electrode plate includes a slit that allows sound to pass through. The vibration electrode plate includes a resistance increasing section including at least one pair of high-resistance surfaces that constitute side surfaces of the slit in a width direction thereof, and are thicker than a middle portion of the vibration electrode plate.
    • 声传感器包括具有比常规结构更高的通过电阻的狭缝,并且当例如振动电极板翘曲时,具有比常规结构中更低的通道阻力率。 声换能器包括固定电极板和面对固定电极板的振动电极板,在电极板之间具有空间。 振动电极板包括允许声音通过的狭缝。 该振动电极板包括电阻增加部分,该电阻增加部分包括至少一对构成狭缝在其宽度方向上的侧表面的高电阻表面,并且比振动电极板的中间部分更厚。
    • 7. 发明申请
    • ACOUSTIC SENSOR AND MANUFACTURING METHOD OF THE SAME
    • 声学传感器及其制造方法
    • US20160192082A1
    • 2016-06-30
    • US14972354
    • 2015-12-17
    • OMRON CORPORATION
    • Yuki UCHIDAKoji MOMOTANITakashi KASAI
    • H04R19/00H04R31/00H04R19/04
    • H04R19/005H04R19/04H04R31/00H04R2201/003H04S7/00H04S2420/01
    • An acoustic sensor is provided for improving shock resistance performance, along with a method for manufacturing the acoustic sensor. In the acoustic sensor, a fixing plate is provided by a semiconductor manufacturing process, a frame wall has a curved shape in at least a portion of the periphery of the fixing plate, the frame wall being coupled to the semiconductor substrate. A sacrifice layer removed from the inner side of the fixing plate in the manufacturing process remains at least on a portion of the inner side of the frame wall. Roughness of the remaining sacrifice layer is smaller than roughness of a sound shape reflecting structure in which a shape similar to the external shape of sound holes is repeated. Roughness of the sound shape reflecting structure is formed when removing the sacrifice layer using etching liquid supplied from the plurality of sound holes in the semiconductor manufacturing process.
    • 提供一种用于改善抗冲击性能的声学传感器以及用于制造声学传感器的方法。 在声学传感器中,通过半导体制造工艺提供固定板,框架壁在固定板的周边的至少一部分中具有弯曲形状,框架壁耦合到半导体衬底。 在制造过程中从固定板的内侧移除的牺牲层至少保留在框架壁的内侧的一部分上。 剩余牺牲层的粗糙度小于重复与声孔的外部形状相似的形状的声音形状反射结构的粗糙度。 使用在半导体制造工序中从多个声孔供给的蚀刻液除去牺牲层时,形成声音形状反射结构的粗糙度。