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1. 发明申请

US20130293872A1 MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES 有权
公开(公告)号：US20130293872A1
公开(公告)日：2013-11-07
申请号：US13936795
申请日：2013-07-08
申请人： Nova Measuring Instruments Ltd.
发明人： Giora DISHON , Moshe FINAROV , Zvi NIREL , Yoel COHEN
IPC分类号： G01N21/88 , G01B11/14
CPC分类号： G03F7/70058 , G01B11/14 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8867 , G03F7/3028 , G03F7/70525 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70675 , G03F7/7075 , G03F7/70991 , H01L21/67155
摘要： Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

2. 发明申请

US20140320837A1 MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES 有权
标题翻译：监测装置和方法特别适用于光刻加工基板
公开(公告)号：US20140320837A1
公开(公告)日：2014-10-30
申请号：US14328199
申请日：2014-07-10
申请人： Nova Measuring Instruments Ltd.
发明人： Giora DISHON , Moshe FINAROV , Zvi NIREL , Yoel COHEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G01B11/14 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8867 , G03F7/3028 , G03F7/70525 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70675 , G03F7/7075 , G03F7/70991 , H01L21/67155
摘要： Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
摘要翻译：用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站的光刻工艺。

3. 发明申请

US20140142869A1 METHOD AND SYSTEM FOR USE IN MONITORING PROPERTIES OF PATTERNED STRUCTURES 有权
标题翻译：用于监测图形结构特性的方法和系统
公开(公告)号：US20140142869A1
公开(公告)日：2014-05-22
申请号：US14139913
申请日：2013-12-24
申请人： NOVA MEASURING INSTRUMENTS LTD.
发明人： Yoel COHEN , Boaz BRILL
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01B11/0625 , G01B11/24 , G06F15/00
摘要： A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
摘要翻译：提供了一种用于表征具有包括多个不同周期图案的位置的结构的物品的性质的方法和系统，其中方法包括提供指示由几何和材料参数限定的不同叠层的光学性质的预测的理论模型所述位置在几何参数和材料参数中的至少一个中是常见的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

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