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    • 1. 发明授权
    • Method for producing color filter
    • 彩色滤光片制作方法
    • US5665496A
    • 1997-09-09
    • US489817
    • 1995-06-13
    • Hiroyoshi OmikaYutaka OtsukiHitoshi YuasaEiji YodaToru NakamuraMasayuki AndoTeruhisa KurokiNorikatsu Ono
    • Hiroyoshi OmikaYutaka OtsukiHitoshi YuasaEiji YodaToru NakamuraMasayuki AndoTeruhisa KurokiNorikatsu Ono
    • G03F7/00G03F9/00
    • G03F7/0007
    • A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming a light-irradiated region where a light irradiation amount is different in two steps; (c) developing a larger light-irradiated portion to lay-open the transparent electrically conductive layer followed by electrodepositing a light shielding layer thereon; (d) forming on the positive photosensitive coating film undeveloped in the step (c) a light-irradiated region where a light irradiation amount is different in two steps; (e) developing a larger light-irradiated portion of the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon; (f) forming on the positive photosensitive coating film undeveloped in the step (e) a light-irradiated region where a light irradiation amount is different in at least three steps; and (g) developing the photosensitive coating film to lay-open the transparent electrically conductive layer followed by electrodepositing a colored coating thereon, operation of the developing and electrodepositing being sequentially repeated at least twice in decreasing light irradiation amounts.
    • 制造滤色器的方法包括:(a)在透明基板的透明导电层上形成正性感光性涂膜; (b)在两个步骤中形成光照射量不同的光照射区域; (c)显影较大的光照射部分以打开透明导电层,随后在其上电沉积遮光层; (d)在步骤(c)中未显影的正光敏涂层上形成两个光照射量不同的光照射区域; (e)显影感光性涂膜的较大的光照射部分,以打开透明导电层,然后在其上电沉积着色涂层; (f)在步骤(e)中未显影的正光敏涂层上形成至少三个步骤中光照射量不同的光照射区域; 和(g)显影感光涂膜以打开透明导电层,随后在其上电沉积着色涂层,显影和电沉积的操作在减少光照射量下依次重复至少两次。
    • 2. 发明授权
    • Color liquid crystal display device and method for producing color
filter substrate
    • 彩色液晶显示装置及彩色滤光片基板的制造方法
    • US6057900A
    • 2000-05-02
    • US113999
    • 1998-07-10
    • Norikatsu OnoMasayuki AndoYutaka OtsukiHiroyoshi Omika
    • Norikatsu OnoMasayuki AndoYutaka OtsukiHiroyoshi Omika
    • G02F1/1335G02F1/1339G02F1/1333
    • G02F1/1339G02F1/133514
    • A color liquid crystal display device contains a color filter substrate, a counterelectrode substrate disposed to oppose the color filter substrate via a sealing material disposed in contact with peripheral portions of the color filter substrate and the counterelectrode substrate, and a liquid crystal layer sealed between the color filter substrate and the counterelectrode substrate and surrounded by the sealing material. The color filter substrate contains a transparent substrate, a black matrix and a plurality of colored layers of plural colors, the black matrix and the colored layers being formed in a predetermined pattern in a first region on the transparent substrate, and a resin layer having substantially same thickness as that of the black matrix and formed in a second peripheral region on the transparent substrate positioned peripherally adjacent to the first region. The sealing material is in contact with the resin layer and a black matrix portion in periphery of the first region. A method for producing the color filter substrate involves the steps for forming the resin layer having substantially the same thickness as that of the black matrix.
    • 彩色液晶显示装置包括滤色器基板,经由与滤色器基板和反电极基板的周边部分接触设置的密封材料与滤色器基板相对设置的反电极基板,以及密封在滤色器基板之间的液晶层 滤色器基板和反电极基板,并被密封材料包围。 滤色器基板包括透明基板,黑色矩阵和多个多色着色层,黑色矩阵和着色层在透明基板上的第一区域中以预定图案形成,并且具有基本上 形成在与第一区域周边相邻的透明基板上的第二周边区域中。 密封材料与第一区域的周围的树脂层和黑色矩阵部分接触。 用于制造滤色器基板的方法包括用于形成具有与黑矩阵基本上相同的厚度的树脂层的步骤。
    • 3. 发明授权
    • Method for producing color filter
    • 彩色滤光片制作方法
    • US5527648A
    • 1996-06-18
    • US352572
    • 1994-12-09
    • Yutaka OtsukiHitoshi YuasaHiroyoshi OmikaMasayuki Ando
    • Yutaka OtsukiHitoshi YuasaHiroyoshi OmikaMasayuki Ando
    • G02B5/20G02F1/1335G03F7/00G03F9/00
    • G03F7/0007G02F1/133516
    • A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming on the photosensitive coating film a first region where a light irradiation amount is different in two steps; (c) developing a light-irradiated portion of the first region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (d) forming on the remaining photosensitive coating film a second region where a light irradiation amount is different in two steps; (e) developing a light-irradiated portion of the second region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer; (f) removing the remaining photosensitive coating film not developed in the steps (c) and (e); (g) forming a positive or negative photosensitive coating film on the transparent substrate; (h) forming on the photosensitive coating film formed in the step (g) a third region where a light irradiation amount is different in at least three steps; and (i) developing the third region to lay-open the transparent conductive layer followed by electrodepositing a colored coating thereon to form a colored layer, the operation of the developing and electrodepositing being sequentially repeated in the order of decreasing or increasing light irradiation amounts to thereby form different colored layers.
    • 制造滤色器的方法包括:(a)在透明基板的透明导电层上形成正性感光性涂膜; (b)在所述感光性涂膜上形成光照射量在两个步骤中不同的第一区域; (c)显影第一区域的光照射部分以打开透明导电层,随后在其上电沉积着色涂层以形成着色层; (d)在剩余的感光性涂膜上形成光照射量在两个步骤中不同的第二区域; (e)显影第二区域的光照射部分以打开透明导电层,随后在其上电沉积着色涂层以形成着色层; (f)除去步骤(c)和(e)中未显影的剩余光敏涂层膜; (g)在透明基板上形成正或负的感光涂膜; (h)在步骤(g)中形成的感光涂层上形成至少三个步骤中光照射量不同的第三区域; 和(i)显影第三区域以打开透明导电层,随后在其上电沉积着色涂层以形成着色层,显影和电沉积的操作依次重复以减少或增加光照射量的顺序 从而形成不同的着色层。