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    • 6. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08525195B2
    • 2013-09-03
    • US12873662
    • 2010-09-01
    • Hajime NagoKoichi TachibanaToshiki HikosakaShigeya KimuraShinya Nunoue
    • Hajime NagoKoichi TachibanaToshiki HikosakaShigeya KimuraShinya Nunoue
    • H01L33/02
    • H01L33/12B82Y20/00H01L33/04H01L33/32H01S5/34333
    • According to one embodiment, a semiconductor light emitting device includes n-type and p-type semiconductor layers, a light emitting portion, a multilayered structural body, and an n-side intermediate layer. The light emitting portion is provided between the semiconductor layers. The light emitting portion includes barrier layers containing GaN, and a well layer provided between the barrier layers. The well layer contains Inx1Ga1-x1N. The body is provided between the n-type semiconductor layer and the light emitting portion. The body includes: first layers containing GaN, and a second layer provided between the first layers. The second layer contains Inx2Ga1-x2N. Second In composition ratio x2 is not less than 0.6 times of first In composition ratio x1 and is lower than the first In composition x1. The intermediate layer is provided between the body and the light emitting portion and includes a third layer containing Aly1Ga1-y1N (0
    • 根据一个实施例,半导体发光器件包括n型和p型半导体层,发光部分,多层结构体和n侧中间层。 发光部分设置在半导体层之间。 发光部分包括含有GaN的阻挡层,以及设置在阻挡层之间的阱层。 阱层包含Inx1Ga1-x1N。 本体设置在n型半导体层和发光部之间。 主体包括:包含GaN的第一层,以及设置在第一层之间的第二层。 第二层包含Inx2Ga1-x2N。 第二组成比x2不小于第一In组成比x1的0.6倍,并且低于第一In组成x1。 中间层设置在主体和发光部分之间,并且包括含有Aly1Ga1-y1N(0
    • 10. 发明申请
    • SEMICONDUCTOR LIGHT-EMITTING DEVICE
    • 半导体发光器件
    • US20110215291A1
    • 2011-09-08
    • US12873586
    • 2010-09-01
    • Toshihide ItoKoichi TachibanaShinya Nunoue
    • Toshihide ItoKoichi TachibanaShinya Nunoue
    • H01L31/0256H01L31/0352
    • H01L31/022466B82Y20/00H01L31/035236H01L33/42
    • According to one embodiment, a semiconductor light-emitting device using an ITON layer for a transparent conductor and realizing low drive voltage, high luminance efficiency, and uniformed light emission intensity distribution is provided. The semiconductor light-emitting device includes: a substrate; an n-type semiconductor layer formed on the substrate; an active layer formed on the n-type semiconductor layer; a p-type semiconductor layer formed on the active layer and whose uppermost part is a p-type GaN layer; an ITON (Indium Tin Oxynitride) layer formed on the p-type GaN layer; an ITO (Indium Tin Oxide) layer formed on the ITON layer; a first metal electrode formed on a part on the ITO layer; and a second metal electrode formed in contact with the n-type semiconductor layer.
    • 根据一个实施例,提供了一种使用用于透明导体的ITON层并实现低驱动电压,高亮度效率和均匀的发光强度分布的半导体发光器件。 半导体发光器件包括:衬底; 在该基板上形成的n型半导体层; 形成在所述n型半导体层上的有源层; 在有源层上形成的p型半导体层,其最上部是p型GaN层; 形成在p型GaN层上的ITON(铟锡氧氮化物)层; 形成在ITON层上的ITO(氧化铟锡)层; 形成在所述ITO层的一部分上的第一金属电极; 以及形成为与n型半导体层接触的第二金属电极。