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1. 发明授权

US07382527B2 EUV multilayer mirror with phase shifting layer 有权
标题翻译：具有相移层的EUV多层反射镜
公开(公告)号：US07382527B2
公开(公告)日：2008-06-03
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

2. 发明授权

US07706058B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07706058B2
公开(公告)日：2010-04-27
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

3. 发明申请

US20090097104A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20090097104A1
公开(公告)日：2009-04-16
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

4. 发明申请

US20060192147A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
公开(公告)号：US20060192147A1
公开(公告)日：2006-08-31
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

5. 发明授权

US07440182B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07440182B2
公开(公告)日：2008-10-21
申请号：US11907798
申请日：2007-10-17
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

6. 发明申请

US20050157384A1 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same 审中-公开
标题翻译：用于EUV的多层反射镜，用于其的波前像差校正方法以及包含该反射镜的EUV光学系统
公开(公告)号：US20050157384A1
公开(公告)日：2005-07-21
申请号：US11025002
申请日：2004-12-28
申请人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
发明人： Masayuki Shiraishi , Katsuhiko Murakami , Hiroyuki Kondo , Noriaki Kandaka
IPC分类号： G02B5/08 , G03F7/20
CPC分类号： G03F7/706 , G02B5/08 , G03F7/70216 , G03F7/70258 , G03F7/70316
摘要： Multilayer mirrors are disclosed for use especially in “Extreme Ultraviolet” (“soft X-ray,” or “EUV”) optical systems. Each multilayer mirror includes a stack of alternating layers of a first material and a second material, respectively, to form an EUV-reflective surface. The first material has a refractive index substantially the same as a vacuum, and the second material has a refractive index that differs sufficiently from the refractive index of the first material to render the mirror reflective to EUV radiation. The wavefront profile of EUV light reflected from the surface is corrected by removing (“machining” away) at least one surficial layer of the stack in selected region(s) of the surface of the stack. Machining can be performed such that machined regions have smooth tapered edges rather than abrupt edges. The stack can include first and second layer groups that allow the unit of machining to be very small, thereby improving the accuracy with which wavefront-aberration correction can be conducted. Also disclosed are various at-wavelength techniques for measuring reflected-wavelength profiles of the mirror. The mirror surface can include a cover layer of a durable material having high transparency and that reduces variations in reflectivity of the surface caused by machining the selected regions.
摘要翻译：公开了多层反射镜用于特别是在“极光紫外线”（“软X射线”或“EUV”）光学系统中。每个多层反射镜分别包括第一材料和第二材料的交替层叠，以形成EUV反射表面。第一材料具有与真空基本相同的折射率，并且第二材料具有与第一材料的折射率充分不同的折射率，以使反射镜反射成EUV辐射。通过在堆叠的表面的选定区域中移除（“加工”）去除堆叠的至少一个表面层来校正从表面反射的EUV光的波前轮廓。可以进行加工，使得加工区域具有平滑的锥形边缘而不是突然的边缘。堆叠可以包括允许加工单元非常小的第一和第二层组，从而提高可以进行波前像差校正的精度。还公开了用于测量反射镜的反射波长分布的各种一般波长技术。镜面可以包括具有高透明度的耐用材料的覆盖层，并且减少由加工所选择的区域引起的表面的反射率的变化。

7. 发明申请

US20080049307A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20080049307A1
公开(公告)日：2008-02-28
申请号：US11907798
申请日：2007-10-17
申请人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/09
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full- width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与单独提供的Ru / Si相比，具有比仅提供Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

8. 发明申请

US20080123073A1 Optical element, exposure apparatus using the same, and device manufacturing method 审中-公开
标题翻译：光学元件，使用其的曝光装置和装置制造方法
公开(公告)号：US20080123073A1
公开(公告)日：2008-05-29
申请号：US11984616
申请日：2007-11-20
申请人： Masayuki Shiraishi , Katsuhiko Murakami
发明人： Masayuki Shiraishi , Katsuhiko Murakami
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G03B27/54 , G03F1/24 , G03F7/70316 , G03F7/70783 , G03F7/70941
摘要： There is disclosed an optical element, comprising, a supporting substrate, a multilayer film being supported on the substrate and reflecting extreme ultraviolet light, and an alloy layer provided between the multilayer film and the substrate.
摘要翻译：公开了一种光学元件，包括：支撑基板，支撑在基板上并反射极紫外光的多层膜，以及设置在多层膜和基板之间的合金层。

9. 发明授权

US06507641B1 X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same 有权
标题翻译： X射线产生装置，包括该X射线产生装置的X射线微光刻装置以及利用其的微电子器件制造方法
公开(公告)号：US06507641B1
公开(公告)日：2003-01-14
申请号：US09684872
申请日：2000-10-06
申请人： Hiroyuki Kondo , Katsuhiko Murakami , Masayuki Shiraishi , Katsumi Sugisaki
发明人： Hiroyuki Kondo , Katsuhiko Murakami , Masayuki Shiraishi , Katsumi Sugisaki
IPC分类号： H01I3700
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： X-ray-generation devices are disclosed that generate X-rays in a stable manner over extended periods of time. An exemplary device includes an anode electrode and a cathode electrode coaxially arranged, and an insulating member. A nozzle connected to a reservoir of fluid target material directs a flow of fluid target material to the anode electrode. Meanwhile, a pulsed high voltage is applied between the anode electrode and cathode electrode in coordination with the supply of target material. The pulses are timed such that, whenever a unit of target material reaches a tip of the anode electrode, a plasma sheath generated at the surface of the insulating member also reaches the tip of the anode electrode. Hence, the target material is supplied automatically as required to produce X-rays continuously over an extended time period. Intense X-ray fluxes can be produced in a stable manner by monitoring the rate at which target material is supplied to the plasma, relative to the timing of discharge pulses.
摘要翻译：公开了在长时间内以稳定的方式产生X射线的X射线产生装置。示例性装置包括同轴布置的阳极电极和阴极电极以及绝缘构件。连接到流体目标材料的储存器的喷嘴将流体目标材料流引导到阳极电极。同时，与目标材料的供应协调，在阳极和阴极之间施加脉冲高压。脉冲被定时，使得当目标材料的单位到达阳极电极的尖端时，在绝缘构件的表面处产生的等离子体鞘也到达阳极电极的尖端。因此，根据需要自动提供目标材料以在延长的时间段内连续地产生X射线。相对于放电脉冲的定时，可以通过监测向等离子体供给目标材料的速率，以稳定的方式产生强烈的X射线通量。

10. 发明授权

US06441963B2 Multi-layered mirror 有权
标题翻译：多层镜
公开(公告)号：US06441963B2
公开(公告)日：2002-08-27
申请号：US09867191
申请日：2001-05-30
申请人： Katsuhiko Murakami , Masayuki Shiraishi
发明人： Katsuhiko Murakami , Masayuki Shiraishi
IPC分类号： G02B110
CPC分类号： B82Y10/00 , G03F7/70058 , G03F7/70233 , G21K1/062
摘要： A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.
摘要翻译：多层反射镜具有基板，第一物质的第一层和第二物质的第二层。所使用的波长区域中的第一物质的折射率与第二物质的折射率不同。第一层和第二层交替层叠在基板上。为了获得高反射率和优异的光学特性，使用至少两种在所使用的波长区域中的复数折射率的实部大致相同的物质，在第一层或第二层内形成多层结构。或者，在形成下一层之前使层表面平滑。使用本发明的多层反射镜的曝光装置以更高的效率使用光。

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