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1. 发明授权

US08121254B2 Optical element, exposure apparatus using this, and device manufacturing method 有权
标题翻译：光学元件，使用它的曝光装置和装置制造方法
公开(公告)号：US08121254B2
公开(公告)日：2012-02-21
申请号：US12509292
申请日：2009-07-24
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G21K1/06 , G21K5/00
CPC分类号： G02B17/0657 , B82Y10/00 , G02B5/0816 , G02B5/0891 , G02B5/26 , G03F7/70308 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
摘要翻译：在多层膜反射镜上形成在深度方向上具有不同组成的保护层。保护层包括形成在薄膜层上的界面侧层，即多层膜的最外层，设置在作为光学元件的最外表面的界面侧层上的表面侧层和中间层。界面侧层具有诸如提供来自光源的非曝光光的相对吸收的性质。表面侧层抑制多层膜的表面的氧化。

2. 发明授权

US07382527B2 EUV multilayer mirror with phase shifting layer 有权
标题翻译：具有相移层的EUV多层反射镜
公开(公告)号：US07382527B2
公开(公告)日：2008-06-03
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

3. 发明申请

US20080266651A1 OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：光学装置，多层反射镜，曝光装置和装置
公开(公告)号：US20080266651A1
公开(公告)日：2008-10-30
申请号：US12034585
申请日：2008-02-20
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G02B5/08
CPC分类号： G03F7/70958 , G02B5/0833 , G02B5/0891 , G03F7/70233
摘要： An optical apparatus comprises a plurality of multilayer-film reflective mirrors that are capable of reflecting a electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting, wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region.
摘要翻译：光学装置包括能够在极紫外区域反射电磁波的多个多层膜反射镜。多层膜反射镜沿着电磁波的光轴布置，并且至少两个多层膜反射镜在除了极紫外区域之外的波长区域中具有彼此不同的反射波长特性。

4. 发明申请

US20100190113A1 OPTICAL ELEMENT, EXPOSURE APPARATUS USING THIS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：光学元件，使用这种曝光装置，以及器件制造方法
公开(公告)号：US20100190113A1
公开(公告)日：2010-07-29
申请号：US12509292
申请日：2009-07-24
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： G03F7/20 , G03B27/54 , G02B5/22
CPC分类号： G02B17/0657 , B82Y10/00 , G02B5/0816 , G02B5/0891 , G02B5/26 , G03F7/70308 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
摘要翻译：在多层膜反射镜上形成在深度方向上具有不同组成的保护层。保护层包括形成在薄膜层上的界面侧层，即多层膜的最外层，设置在作为光学元件的最外表面的界面侧层上的表面侧层和中间层。界面侧层具有诸如提供来自光源的非曝光光的相对吸收的性质。表面侧层抑制多层膜的表面的氧化。

5. 发明申请

US20090097104A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20090097104A1
公开(公告)日：2009-04-16
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

6. 发明申请

US20080268380A1 OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：光学装置，多层反射镜，曝光装置和装置
公开(公告)号：US20080268380A1
公开(公告)日：2008-10-30
申请号：US12098238
申请日：2008-04-04
申请人： Katsuhiko Murakami , Takaharu Komiya
发明人： Katsuhiko Murakami , Takaharu Komiya
IPC分类号： F21V9/06 , G03F7/20
CPC分类号： G03F7/70958 , G02B5/0833 , G02B5/0891 , G03F7/70233
摘要： An optical apparatus comprises a plurality of multilayer-film reflective mirrors that are capable of reflecting an electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region.
摘要翻译：光学装置包括能够在极紫外区域反射电磁波的多个多层膜反射镜。多层膜反射镜沿着电磁波的光轴布置，并且至少两个多层膜反射镜在除了极紫外区域之外的波长区域中具有彼此不同的反射波长特性。

7. 发明申请

US20060192147A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
公开(公告)号：US20060192147A1
公开(公告)日：2006-08-31
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

8. 发明授权

US07440182B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07440182B2
公开(公告)日：2008-10-21
申请号：US11907798
申请日：2007-10-17
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

9. 发明授权

US07706058B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07706058B2
公开(公告)日：2010-04-27
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

10. 发明申请

US20080049307A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20080049307A1
公开(公告)日：2008-02-28
申请号：US11907798
申请日：2007-10-17
申请人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Nariaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/09
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full- width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与单独提供的Ru / Si相比，具有比仅提供Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

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