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1. 发明授权

US07531821B2 Imprint apparatus and imprint method including dual movable image pick-up device 有权
标题翻译：印刷装置和压印方法，包括双移动图像拾取装置
公开(公告)号：US07531821B2
公开(公告)日：2009-05-12
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01N21/86
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

2. 发明申请

US20090108483A1 ALIGNMENT METHOD, IMPRINT METHOD, ALIGNMENT APPARATUS, AND POSITION MEASUREMENT METHOD 有权
标题翻译：对准方法，印刷方法，对准装置和位置测量方法
公开(公告)号：US20090108483A1
公开(公告)日：2009-04-30
申请号：US11719878
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/703 , G03F9/7049 , G03F9/7088
摘要： In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to each other. A first area and a second area are provided at mutually nonoverlapping positions in an image pickup area for being observed through an image pickup device. Images of the first and second alignment marks are picked up by the image pickup device from a direction substantially perpendicular to an in-plane direction of the first and second plate-like objects. Alignment control is effected by using first information about a deviation of the first alignment mark from a predetermined position in the first area and second information about a deviation of the second alignment mark from a predetermined position in the second area.
摘要翻译：在用于实现两个板状物体之间的对准的对准方法中，设置有第一对准标记的第一板状物体和提供有彼此相对设置的第二对准标记的第二板状物体。第一区域和第二区域设置在图像拾取区域中的相互非重叠位置，以便通过图像拾取装置观察。第一和第二对准标记的图像由图像拾取装置从基本上垂直于第一和第二板状物体的面内方向的方向拾取。通过使用关于第一对准标记与第一区域中的预定位置的偏差的第一信息和关于第二对准标记与第二区域中的预定位置的偏差的第二信息来实现对准控制。

3. 发明授权

US08845317B2 Alignment method, imprint method, alignment apparatus, and position measurement method 有权
标题翻译：校准方法，压印方法，校准装置和位置测量方法
公开(公告)号：US08845317B2
公开(公告)日：2014-09-30
申请号：US11719878
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00 , B29C43/58 , B82Y10/00 , G03F9/00 , B82Y40/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/703 , G03F9/7049 , G03F9/7088
摘要： An imprint apparatus for performing alignment between a mold and a substrate and imprinting a pattern of the mold to a layer of the substrate. A holder holds the mold. A stage holds the substrate opposite to the mold held by the holder. A microscope, including an image pickup device, detects a first alignment mark formed in the mold, via a first image pickup area of the image pickup device, and detects a second alignment mark formed in the substrate, via a second image pickup area of the image pickup device. The first and second image pickup areas do not overlap with each other. A contrast of signals obtained by the image pickup device is adjusted with respect to each of the first and second image pickup areas, and the alignment is performed by changing relative positions of the holder and the stage based on first information about a deviation of the detected first alignment mark from a predetermined position in the first image pickup area and second information about a deviation of the detected second alignment mark from a predetermined position in the second image pickup area.
摘要翻译：一种用于在模具和基板之间进行对准并将模具的图案压印到基板的层的压印装置。持有人持有模具。阶段保持与由保持器保持的模具相对的基板。包括图像拾取装置的显微镜经由图像拾取装置的第一图像拾取区域检测在模具中形成的第一对准标记，并且经由第二图像拾取区域检测形成在基板中的第二对准标记图像拾取装置。第一和第二摄像区域彼此不重叠。基于图像拾取装置获得的信号的对比度相对于第一和第二图像拾取区域中的每一个被调整，并且通过基于关于检测到的偏移的第一信息来改变保持器和台的相对位置来执行对准第一对准标记从第一图像拾取区域中的预定位置开始，以及关于所检测到的第二对准标记与第二图像拾取区域中的预定位置的偏差的第二信息。

4. 发明授权

US07884935B2 Pattern transfer apparatus, imprint apparatus, and pattern transfer method 有权
标题翻译：图案转印装置，压印装置和图案转印方法
公开(公告)号：US07884935B2
公开(公告)日：2011-02-08
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00 , G01B15/00 , G01N21/86 , G01V8/00 , B41F1/34 , B41F21/12 , B41F21/14 , B41L1/02 , B29C45/76 , B29C35/08 , B29C35/12 , B29C47/92 , B29C47/96 , B29B13/00 , B29B15/00 , B28B17/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.
摘要翻译：图案转印装置将形成在具有对准标记的模具上的印模图案转印到具有对准标记的基板上的树脂材料上。第一图像拾取装置获取位于第一对象位置的对象的图像。第二图像拾取装置获取位于第二对象位置的对象的图像。第二物体位置比第一物体位置更远离模具的对准标记。光学系统形成位于第一物体位置的物体的图像和位于第二物体位置的物体的图像。基于获得的关于参考基板的对准标记的图像的位置和基板的对准标记获得的第一和第二信息进行对准，以将印刷图案转印到树脂材料上。

5. 发明申请

US20080073604A1 IMPRINT APPARATUS AND IMPRINT METHOD 有权
标题翻译： IMPRINT设备和印刷方法
公开(公告)号：US20080073604A1
公开(公告)日：2008-03-27
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G06K9/00
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

6. 发明申请

US20070242272A1 PATTERN TRANSFER APPARATUS, IMPRINT APPARATUS, AND PATTERN TRANSFER METHOD 有权
标题翻译：图案转印装置，印刷装置和图案转印方法
公开(公告)号：US20070242272A1
公开(公告)日：2007-10-18
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer method for transferring an imprinting pattern formed on a mold provided with an alignment mark onto a substrate provided with an alignment mark or a resin material interposed between the substrate and the mold includes a first step for obtaining a first image by disposing the alignment mark provided to the mold and an alignment mark provided to a reference substrate at a first object position and observing the alignment marks through a first image pickup portion, a second step for obtaining a second image by disposing the alignment mark provided to the reference substrate at a second object position spaced apart from the first object position and observing the alignment mark through a second image pickup portion, and a third step for obtaining information about a difference in image position between the alignment marks by using the first and second images.
摘要翻译：用于将形成在具有对准标记的模具上形成的压印图案转印到设置有在基板和模具之间的对准标记或树脂材料的基板上的图案转印方法包括：第一步骤，通过设置对准来获得第一图像提供给模具的标记和在第一物体位置处提供给参考基板的对准标记，并且通过第一图像拾取部分观察对准标记;第二步骤，通过将设置在参考基板上的对准标记设置在第二图像与第一对象位置间隔开的第二对象位置，并通过第二图像拾取部分观察对准标记;以及第三步骤，通过使用第一和第二图像来获得关于对准标记之间的图像位置差异的信息。

7. 发明授权

US07123414B2 Method for producing library 有权
标题翻译：图书馆制作方法
公开(公告)号：US07123414B2
公开(公告)日：2006-10-17
申请号：US10869558
申请日：2004-06-16
申请人： Koichi Sentoku , Hideki Ina
发明人： Koichi Sentoku , Hideki Ina
IPC分类号： G02B27/44 , G02B5/18
CPC分类号： G01B11/24
摘要： A method for producing a library includes the steps of calculating a plurality of conditions for a reflection light from a periodic pattern by changing the sectional shape of the periodic pattern, a condition of an incident light which is emitted to the periodic pattern, an optical constant of a material which forms the periodic pattern, relating a plurality of the libraries to the plurality of the reflection light's conditions, and the optical constant corresponding to the plurality of the reflection light's conditions respectively.
摘要翻译：一种用于制作库的方法包括以下步骤：通过改变周期性图案的截面形状，发射到周期图案的入射光的条件，光学常数来计算来自周期性图案的反射光的多个条件形成周期性图案的材料，将多个库与多个反射光的条件相关联，以及分别对应于多个反射光的条件的光学常数。

8. 发明授权

US07110116B2 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices 有权
标题翻译：对准装置，使用其的曝光装置以及制造装置的方法
公开(公告)号：US07110116B2
公开(公告)日：2006-09-19
申请号：US10279924
申请日：2002-10-25
申请人： Satoru Oishi , Hideki Ina , Takehiko Suzuki , Koichi Sentoku
发明人： Satoru Oishi , Hideki Ina , Takehiko Suzuki , Koichi Sentoku
IPC分类号： G01B21/00 , G03B27/42
CPC分类号： G03F9/7065 , G03F7/70233 , G03F7/70283 , G03F9/7011 , G03F9/7015 , G03F9/7088
摘要： An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.
摘要翻译：用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。

9. 发明授权

US07067826B2 Position detection method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US07067826B2
公开(公告)日：2006-06-27
申请号：US10151151
申请日：2002-05-21
申请人： Takehiko Suzuki , Hideki Ina , Koichi Sentoku , Satoru Oishi
发明人： Takehiko Suzuki , Hideki Ina , Koichi Sentoku , Satoru Oishi
IPC分类号： G01N21/00
CPC分类号： G03F9/7015 , G03F7/70233 , G03F9/7011 , G03F9/7065 , G03F9/7088
摘要： A reticle stage reference mark 3 of material having high reflectivity to alignment illumination light is provided on a reticle 5, and a chuck mark 8 of material having high reflectivity to the alignment illumination light is provided on a wafer chuck 11. A relative position of the reticle stage reference mark 3 to the chuck mark 8 is detected by using a first position detection optical system 1 and a first illumination optical system 2, and relative alignment is performed between the reticle 5 and a wafer 10.
摘要翻译：在掩模版5上设置有对齐照明光具有高反射率的材料的标线片基准标记3，并且在晶片卡盘11上设置具有对准照明光的高反射率的材料的卡盘8。通过使用第一位置检测光学系统1和第一照明光学系统2来检测标线片基准标记3与卡盘标记8的相对位置，并且在标线片5和晶片10之间进行相对对准。

10. 发明申请

US20060050274A1 Management system, apparatus, and method, exposure apparatus, and control method therefor 有权
标题翻译：管理系统，装置和方法，曝光装置及其控制方法
公开(公告)号：US20060050274A1
公开(公告)日：2006-03-09
申请号：US11218538
申请日：2005-09-06
申请人： Takahiro Matsumoto , Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Satoru Oishi
发明人： Takahiro Matsumoto , Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Satoru Oishi
IPC分类号： G01B11/00
CPC分类号： G03F9/7092 , G03F7/70633
摘要： An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.
摘要翻译：曝光装置通过使用形成在晶片上的预定取样组进行AGA测量，并且确定对准参数。曝光装置通过使用对准参数来执行晶片对准处理和曝光处理。曝光装置向中央处理单元通知AGA测量结果和对准参数。覆盖检查装置测量曝光的晶片上的实际曝光位置，并向中央处理单元通知测量结果。中央处理单元根据AGA测量结果，对准参数和实际测量的曝光位置优化对准处理。

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