专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4948238A Optical projection system 失效
标题翻译：光学投影系统
公开(公告)号：US4948238A
公开(公告)日：1990-08-14
申请号：US321683
申请日：1989-03-10
申请人： Nobuhiro Araki , Takeo Sato , Koichi Kawata , Noboru Nomura , Keisuke Koga
发明人： Nobuhiro Araki , Takeo Sato , Koichi Kawata , Noboru Nomura , Keisuke Koga
IPC分类号： G02B13/00 , G02B13/18 , G02B13/24
CPC分类号： G02B13/18 , G02B13/00 , G02B13/24
摘要： A first lens, a second lens, means and a third lens means are arranged successively in a direction of travel of a ray. The first lens means each comprising a single lens element power. The second lens means has a predetermined negative refracting power. The third lens means has a predetermined positive refracting power. A fourth lens means consisting of a plurality of lens elements follows the third lens means in the direction of travel of the ray and has a predetermined positive refracting power. At least one surface of the first, second, third, and fourth lens elements is aspherical. The follwoing conditions (1), (2), and (3) are satisfied:4f

2. 发明授权

US4861148A Projection optical system for use in precise copy 失效
标题翻译：投影光学系统用于精确复印
公开(公告)号：US4861148A
公开(公告)日：1989-08-29
申请号：US24134
申请日：1987-03-11
申请人： Takeo Sato , Nobuhiro Araki , Koichi Kawata , Noboru Nomura , Atushi Ueno , Shotaro Yoshida
发明人： Takeo Sato , Nobuhiro Araki , Koichi Kawata , Noboru Nomura , Atushi Ueno , Shotaro Yoshida
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0888 , G02B17/084 , G02B17/0892 , G03F7/70225 , G03F7/70233 , G03F7/70308
摘要： A projection optical system for use in a precise copy which uses a pair of catadioptric optical systems consisting of convex mirrors, concave mirrors, and phase correction members is shown. Two catadioptric optical systems commonly use an entrance pupil on a coaxis and are coupled so as to respectively face the phase correction members. Each of the concave mirrors has an opening at the center. Each of the convex mirrors has no opening in one embodiment but has an opening portion at the center in another embodiment.
摘要翻译：示出了使用由凸面镜，凹面镜和相位校正构件组成的一对反射折射光学系统的精确复制用的投影光学系统。两个反折射光学系统通常在同轴线上使用入射光瞳，并且被耦合以分别面对相位校正构件。每个凹面镜在中心有开口。在另一实施例中，每个凸面镜在一个实施例中不具有开口，而在中心处具有开口部分。

3. 发明授权

US4757354A Projection optical system 失效
标题翻译：投影光学系统
公开(公告)号：US4757354A
公开(公告)日：1988-07-12
申请号：US43620
申请日：1987-04-28
申请人： Takeo Sato , Nobuhiro Araki , Koichi Kawata , Noboru Nomura , Atsushi Ueno , Shotaro Yoshida
发明人： Takeo Sato , Nobuhiro Araki , Koichi Kawata , Noboru Nomura , Atsushi Ueno , Shotaro Yoshida
IPC分类号： G02B17/08 , G03F7/20 , G03B27/42 , G02B17/00
CPC分类号： G02B17/0852 , G02B17/0808 , G02B17/0892 , G03F7/70225
摘要： A projection optical system for photolithography includes a refraction sub-system and a cata-dioptric sub-system optically connected to each other. The refraction sub-system extends at an object side. The cata-dioptric sub-system extends at an image side. The refraction sub-system is generally composed of refracting members. The cata-dioptric sub-system is generally composed of a phase compensating member, a concave mirror, and a convex mirror. The phase compensating member adjoins the refraction sub-system. At least the concave mirror has a central opening through which light passes. The light forms an image at a rear of the concave mirror.
摘要翻译：用于光刻的投影光学系统包括彼此光学连接的折射子系统和cata度数子系统。折射子系统在物体侧延伸。 cata-indiopt子系统在图像侧延伸。折射子系统通常由折射构件组成。数位子系统通常由相位补偿构件，凹面镜和凸面镜组成。相位补偿构件邻接折射子系统。至少凹面镜具有光通过的中心开口。光在凹面镜的后部形成图像。

4. 发明授权

US4771157A Electrical discharge machining apparatus for forming minute holes in a workpiece 失效
标题翻译：用于在工件中形成微小孔的放电加工装置
公开(公告)号：US4771157A
公开(公告)日：1988-09-13
申请号：US612012
申请日：1984-05-18
申请人： Takeo Sato , Nobuhiro Araki , Hisato Matsushita , Koichi Kawata
发明人： Takeo Sato , Nobuhiro Araki , Hisato Matsushita , Koichi Kawata
IPC分类号： B23H7/26 , B23H9/14 , B23Q17/24 , B23H1/00
CPC分类号： B23H7/265 , B23H9/14 , B23Q17/24
摘要： An electrical discharge machining apparatus for forming minute holes in a workpiece has a machining electrode supported in V-shaped grooves for forming a minute hole through an electrical discharge between the machining electrode and the workpiece. The machining electrode is movable toward and away from the workpiece. The workpiece is movable between a position below the machining electrode and a position below a microscope disposed in conjugate relation to the machining electrode. After a position to be machined has been set by the positioning means, the workpiece is moved to the position below the machining electrode for electrical discharge machining. The machining electrode is subjected to little displacement while it is being rotated, and the position to be machined can be determined with high accuracy. The electrical discharge machining apparatus can quickly form a neat minute hole of small out-of-roundness and reduced surface roughness in the workpiece at a correct position thereon.
摘要翻译：用于在工件中形成微小孔的放电加工装置具有一个加工电极，该加工电极被支撑在用于通过加工电极和工件之间的放电形成微孔的V形槽中。加工电极可以朝向和远离工件移动。工件可以在加工电极下方的位置和与加工电极共轭关系下放置的显微镜下方的位置之间移动。在通过定位装置设置了要加工的位置之后，将工件移动到放电加工用加工电极下方的位置。加工电极在旋转时受到小的位移，可以高精度地确定待加工的位置。放电加工装置可以在其上的正确位置处快速形成具有小的不圆度的精细微孔并减小工件中的表面粗糙度。

5. 发明授权

US4870289A Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：用于控制光掩模和晶片之间的位置关系的装置
公开(公告)号：US4870289A
公开(公告)日：1989-09-26
申请号：US248051
申请日：1988-09-23
申请人： Takeo Sato , Shinichiro Aoki , Katsumasa Yamaguchi , Tadashi Kaneko , Noboru Nomura , Keisuke Koga , Kazuhiro Yamashita
发明人： Takeo Sato , Shinichiro Aoki , Katsumasa Yamaguchi , Tadashi Kaneko , Noboru Nomura , Keisuke Koga , Kazuhiro Yamashita
IPC分类号： G03F9/00 , H01L21/68
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third difraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

6. 发明授权

US5194744A Compact reticle/wafer alignment system 失效
标题翻译： COMPACT RETICLE / WAFER ALIGNMENT SYSTEM
公开(公告)号：US5194744A
公开(公告)日：1993-03-16
申请号：US704406
申请日：1991-05-23
申请人： Shinichiro Aoki , Takeo Sato , Masaki Yamamoto , Hiroyuki Takeuchi , Nobuhiro Araki , Yoshiyuki Sugiyama
发明人： Shinichiro Aoki , Takeo Sato , Masaki Yamamoto , Hiroyuki Takeuchi , Nobuhiro Araki , Yoshiyuki Sugiyama
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A reticle/wafer alignment system provided with a laser beam source for emitting laser beams, a first optical system portion for a reticle/wafer alignment which consists of a first optical sub-system for receiving laser beams from the laser beam source and projecting the received laser beams onto alignment marks formed on a substrate and made up of diffraction gratings and a second optical sub-system for gathering laser beams diffracted by the alignment marks to form an image thereof, a photoelectric detection portion for performing a photoelectric conversion of the gathered laser beams, a position detecting portion for measuring the position of the substrate based on a signal outputted from the photoelectric detection portion, a second optical system portion for an image processing which consists of a third optical sub-system for illuminating the alignment marks and a fourth optical sub-system having a television camera for observing the image of the alignment marks, and an image processing portion for performing an image processing of video signals outputted from the television camera. The first and second optical system portions are made in such a manner to have a common part thereof. Thereby, an entire alignment system can be made to be compact. Consequently, a position measurement accuracy can be improved.

7. 发明授权

US5053628A Position signal producing apparatus for water alignment 失效
标题翻译：位置信号生成水对准装置
公开(公告)号：US5053628A
公开(公告)日：1991-10-01
申请号：US550925
申请日：1990-07-11
申请人： Masaki Yamamoto , Takeo Sato , Yoshiyuki Sugiyama , Shinichiro Aoki , Hiroyuki Takeuchi
发明人： Masaki Yamamoto , Takeo Sato , Yoshiyuki Sugiyama , Shinichiro Aoki , Hiroyuki Takeuchi
IPC分类号： G03F9/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A position signal producing apparatus, for an apparatus for project-printing a pattern on reticle onto a wafer through a project lens with ultraviolet light, for producing a position signal indicative of position of the wafer, comprises: a laser emitting two different frequency components polarized orthogonally with each other which are splitted by a polarizing beam splitter. The first and second components are reflected by first and second mirrors respectively to produce interference fringes at a given place being on an annular region within a circle defined by field angle of the project lens on the reticle through wave plates for circularly-polarizing. Another interference fringes is formed on a diffraction grating of the wafer in correspondence with the interference fringes through the project lens and a lens for achromatizing the project lens at wavelengths of the components. Another interference fringes reflected by the diffraction grating is detected by a photodetector for producing the position signal. The interference fringes may formed on the wafer by another diffraction grating on the reticle illuminated by the first and second components in combination with polarizing elements provided between the reticle and the wafer in replace with the polarizing beam splitter and wave plates.

8. 发明授权

US5025168A Alignment apparatus including three beams and three gratings 失效
标题翻译：对准装置包括三个光束和三个光栅
公开(公告)号：US5025168A
公开(公告)日：1991-06-18
申请号：US518420
申请日：1990-05-03
申请人： Shinichiro Aoki , Takeo Sato , Katsumasa Yamaguchi , Masaki Yamamoto
发明人： Shinichiro Aoki , Takeo Sato , Katsumasa Yamaguchi , Masaki Yamamoto
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A light source emits light having two components which ave slightly-different frequencies and which have different planes of polarization. The emitted light is separated into first, second, and third parts travelling along different paths respectively. First, second, and third reference gratings diffract the first, second, and third light parts respectively. First, second, and third illumination optical systems selectively transmit the diffracted first, second, and third light parts respectively. First, second, and third mark gratings having predetermined orientations are formed on a mask and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. Similarly, first, second, and third mark gratings are formed on a wafer and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. A first device detects first optical beat signals of the diffracted lights coming from the first mark grating on the mask and the first mark grating on the wafer. Similar detection is made for the diffracted lights coming from the other mark gratings on the mask and the wafer.

9. 发明授权

US5005938A Optical wavelength convertical apparatus 失效
标题翻译：光波长转换装置
公开(公告)号：US5005938A
公开(公告)日：1991-04-09
申请号：US347817
申请日：1989-05-04
申请人： Tatsuo Itoh , Shinichi Mizuguchi , Keishi Kubo , Takeo Sato
发明人： Tatsuo Itoh , Shinichi Mizuguchi , Keishi Kubo , Takeo Sato
IPC分类号： G02B6/34 , G02B6/42 , G02F1/37 , G02F1/377
CPC分类号： G02F1/377 , G02B6/34 , G02B6/42 , G02F2001/372 , G02F2001/374
摘要： An optical wavelength converting apparatus for converting the divergent lights by a compact apparatus into a parallel lights comprises a light source, a means for collecting the lights from the light source to introduce them into the optical waveguide of the wavelength converting element, a rotation symmetrical lens disposed on the end portion opposite to the end portion on the side irradiated with the collected lights, thereby to make it possible to convert the divergent lights like Cherenkov radiation lights into parallel lights by a compact apparatus.
摘要翻译：一种用于将小型装置的发散光转换为平行光的光波长转换装置包括光源，用于收集来自光源的光以将它们引入波长转换元件的光波导的装置，旋转对称透镜设置在与被收集的光照射的一侧的端部相对的端部上，从而能够通过紧凑的装置将诸如切伦科夫辐射光的发散光转换为平行光。

10. 发明申请

US20070066360A1 Wireless communication method and information processing apparatus storing different wireless modules in same apparatus 审中-公开
标题翻译：在同一装置中存储不同无线模块的无线通信方法和信息处理装置
公开(公告)号：US20070066360A1
公开(公告)日：2007-03-22
申请号：US11494882
申请日：2006-07-27
申请人： Takeo Sato , Hideo Izumi
发明人： Takeo Sato , Hideo Izumi
IPC分类号： H04B7/00 , H04B1/38
CPC分类号： H04W16/14 , H04L45/24
摘要： There is provided a wireless communication method and an information processing apparatus capable of preventing interference from occurring between different wireless communication modules such as a wireless LAN module and a Bluetooth (BT) module when different wireless modules using the same frequency band are stored and used in the same apparatus. The Bluetooth (BT) module 24 secures a frequency band used by the wireless LAN module 23 in case of communicating with other apparatus such as a headset for IP telephone not shown, and then communicates by using a frequency of channel available in the other frequency region other than the frequency band. The BT module 24 transmits channel information of the secured frequency band used by the wireless LAN module 23 to the wireless LAN module 23. In case of directly communicating with the other information processing apparatus 22 such as PDA, when the wireless LAN module 23 receives the used channel information, the wireless LAN module 23 communicates with the other information processing apparatus 22 by using a channel of the band informed from the BT module 24.
摘要翻译：提供了一种无线通信方法和信息处理装置，其能够在使用相同频带的不同无线模块被存储并使用时，防止在诸如无线LAN模块和蓝牙（BT）模块的不同无线通信模块之间发生干扰相同的装置。蓝牙（BT）模块24在与未示出的用于IP电话的头戴式耳机等通信的情况下，固定由无线LAN模块23使用的频带，然后通过使用另一频率区域中可用的信道的频率进行通信除频带外。 BT模块24将由无线LAN模块23使用的安全频带的信道信息发送到无线LAN模块23。在与PDA等其他信息处理装置22直接通信的情况下，无线LAN模块23在无线LAN模块23接收到使用的信道信息的情况下，通过使用从其他信息处理装置22通知的频带， BT模块24。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式