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1. 发明申请

US20080037005A1 System for measuring a sample with a layer containing a periodic diffracting structure 有权
$System for measuring a sample with a layer containing a periodic diffracting structure$
标题翻译：用含有周期性衍射结构的层测量样品的系统
公开(公告)号：US20080037005A1
公开(公告)日：2008-02-14
申请号：US11329500
申请日：2006-01-10
申请人： Noah Bareket , Daniel Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel Wack , Guoheng Zhao
IPC分类号： G01N21/00 , G01J3/28
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

2. 发明授权

US07515253B2 System for measuring a sample with a layer containing a periodic diffracting structure 有权
$System for measuring a sample with a layer containing a periodic diffracting structure$
标题翻译：用含有周期性衍射结构的层测量样品的系统
公开(公告)号：US07515253B2
公开(公告)日：2009-04-07
申请号：US11329500
申请日：2006-01-10
申请人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
IPC分类号： G01B11/02
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

3. 发明申请

US20090190141A1 SYSTEM FOR MEASURING A SAMPLE WITH A LAYER CONTAINING A PERIODIC DIFFRACTING STRUCTURE 审中-公开
标题翻译：用于测量具有周期性差分结构的层的样品的系统
公开(公告)号：US20090190141A1
公开(公告)日：2009-07-30
申请号：US12419158
申请日：2009-04-06
申请人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
发明人： Noah Bareket , Daniel C. Wack , Guoheng Zhao
IPC分类号： G01B11/06
CPC分类号： G01N21/211 , G01N21/8422 , G01N2021/213
摘要： To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.
摘要翻译：为了测量膜的一维或二维衍射结构的临界尺寸和其它参数，可以通过首先进行薄膜厚度的测量来简化计算，使用不改变临界尺寸的膜模型或与结构的其他特征相关的参数。可以使用膜模型来充分准确地估计膜的厚度，使得可以采用这种估计来简化用于导出临界尺寸和与二维衍射结构相关的其它参数的结构模型。

4. 发明申请

US20080084567A1 System for Scatterometric Measurements and Applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20080084567A1
公开(公告)日：2008-04-10
申请号：US11945949
申请日：2007-11-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B9/02 , G01B11/24 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

5. 发明申请

US20050274901A1 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20050274901A1
公开(公告)日：2005-12-15
申请号：US11192056
申请日：2005-07-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/00 , G01B11/30 , G01N21/21 , G01N21/27 , G01N21/47 , G01N21/95 , G02B5/18 , G03F1/08 , H01L21/027 , H01L21/66 , G06F19/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

6. 发明申请

US20130293888A1 Composite Polarizer With Adjustable Polarization Angles 有权
标题翻译：具有可调极化角度的复合偏振器
公开(公告)号：US20130293888A1
公开(公告)日：2013-11-07
申请号：US13883988
申请日：2012-02-14
申请人： Guoheng Zhao
发明人： Guoheng Zhao
IPC分类号： G02B27/28 , G01N21/21
CPC分类号： G02B27/286 , G01N21/21 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G02B5/3066 , G02B27/283
摘要： An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.
摘要翻译：可调节的复合偏振器可以包括第一和第二板偏振器和调节装置。调节装置可以在保持这些板之间预定的最小距离的同时，调整第一和第二板偏振器的俯仰角和滚动角。在这种配置中，可调整的复合偏振器可以提供相对于入射平面的镜对称极化，同时提供任何偏振的柔性。

7. 发明申请

US20120026489A1 Multi-Spot Illumination for Wafer Inspection 有权
标题翻译：晶圆检测的多点照明
公开(公告)号：US20120026489A1
公开(公告)日：2012-02-02
申请号：US13187375
申请日：2011-07-20
申请人： Guoheng Zhao , Azmi Kadkly
发明人： Guoheng Zhao , Azmi Kadkly
IPC分类号： G01N21/01
CPC分类号： F21V5/008 , G01N21/8806 , G01N21/9501 , G01N21/9505
摘要： Illumination subsystems for multi-spot wafer inspection are provided.
摘要翻译：提供了多点晶圆检查的照明子系统。

8. 发明授权

US07869023B2 System for detecting anomalies and/or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US07869023B2
公开(公告)日：2011-01-11
申请号：US12123393
申请日：2008-05-19
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

9. 发明授权

US07607647B2 Stabilizing a substrate using a vacuum preload air bearing chuck 有权
标题翻译：使用真空预压空气轴承卡盘稳定基板
公开(公告)号：US07607647B2
公开(公告)日：2009-10-27
申请号：US11688720
申请日：2007-03-20
申请人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
IPC分类号： B25B11/00
CPC分类号： B25B11/005 , F16C29/025 , F16C32/0603 , H01L21/67784 , H01L21/6838
摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.
摘要翻译：公开了基板处理方法和装置。基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

10. 发明申请

US20080229811A1 STABILIZING A SUBSTRATE USING A VACUUM PRELOAD AIR BEARING CHUCK 有权
标题翻译：使用真空预紧空气轴承座稳定基板
公开(公告)号：US20080229811A1
公开(公告)日：2008-09-25
申请号：US11688720
申请日：2007-03-20
申请人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： B25B11/005 , F16C29/025 , F16C32/0603 , H01L21/67784 , H01L21/6838
摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.
摘要翻译：公开了基板处理方法和装置。基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

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