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1. 发明申请

US20130069449A1 MODULAR COIL ARRAYS FOR PLANAR AND LINEAR MOTORS 审中-公开
标题翻译：用于平面和线性电机的模块化线圈阵列
公开(公告)号：US20130069449A1
公开(公告)日：2013-03-21
申请号：US13621669
申请日：2012-09-17
申请人： Nikon Corporation
发明人： Michel Pharand , Michael B. Binnard , Shigeru Morimoto , Chetan Mahadeswaraswamy , Rick K. Ingram , Christopher Edward Hatch , Alex Ka Tim Poon , Gaurav Keswani , Derek Coon , Yeong-Jun Choi
IPC分类号： H02K15/06 , H02K41/02
CPC分类号： H02K41/031 , H02K3/24 , H02K9/19 , H02K9/22 , H02K2201/18
摘要： Coil arrays are disclosed for a planar or linear motor. An exemplary coil array includes multiple coil modules. Each coil module includes at least one coil set, respective electrical circuitry to and from the coil set, at least one respective hydraulic cooling device for the coil set, and respective hydraulic conduitry to and from the cooling device. The coil modules are interchangeably mountable relative to each other in the array such that mounting the coil module to the array produces accompanying hydraulic and electrical connections between the array and coil module, and removing the coil module from the array severs the connections.
摘要翻译：公开了用于平面或线性电动机的线圈阵列。示例性线圈阵列包括多个线圈模块。每个线圈组件包括至少一个线圈组，到线圈组和来自线圈组的相应电路，用于线圈组的至少一个相应的液压冷却装置，以及往返于冷却装置的相应的液压导管。线圈模块相对于阵列中的彼此可互换地安装，使得将线圈模块安装到阵列上产生阵列和线圈模块之间的伴随的液压和电气连接，并且从阵列中去除线圈模块以切断连接。

2. 发明授权

US11092170B2 Dual valve fluid actuator assembly 有权
公开(公告)号：US11092170B2
公开(公告)日：2021-08-17
申请号：US16485406
申请日：2018-02-12
申请人： NIKON CORPORATION
发明人： Alex Ka Tim Poon , Yeong-Jun Choi , Pai-Hsueh Yang , Sandy Lee , Gaurav Keswani , Rocky Mai
IPC分类号： F15B9/08 , F15B9/03 , F15B11/00 , F15B11/028 , F15B11/042 , F15B13/04
摘要： A stage assembly (10) includes a stage (14), and a fluid actuator assembly (24) that moves the stage (14). The fluid actuator assembly (24) includes a piston housing (32) that defines a piston chamber (34); (ii) a piston (36) that separates the piston chamber (34) into a first chamber (34A) and a second chamber (34B); (iii) a supply valve (38C) that controls the flow of the working fluid (40) into the first chamber (34A); and (iv) an exhaust valve (38D) that controls the flow of the working fluid (40) out of the first chamber (34A). The supply valve (38C) has a supply orifice (250G) having a supply orifice area, and the exhaust valve (38D) has an exhaust orifice (352G) having an exhaust orifice area. Moreover, the supply orifice area is different from the exhaust orifice area. Further multiple valves of different sizes can be used in combination for the supply and exhaust for each chamber (34A), (34B).

3. 发明授权

US09217933B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权
标题翻译：在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
公开(公告)号：US09217933B2
公开(公告)日：2015-12-22
申请号：US14262058
申请日：2014-04-25
申请人： NIKON CORPORATION
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Daishi Tanaka
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.
摘要翻译：光刻投影装置包括具有基板台的载台组件，基板被支撑并且通过浸没液体从投影光学组件的最终光学元件的曝光光束暴露在基板台上。限制构件环绕曝光光束的路径的一部分并且具有曝光光束投射的孔。可动构件可在限制构件与衬底，衬底台或两者之间的空间中移动，使得空间的第一部分位于可动构件的第一表面和限制构件之间，第二部分的空间位于可移动部件的第二表面和基板，基板台之间或两者之间。

4. 发明申请

US20220057017A1 EXPANDABLE BARRIER ACTUATED VALVE 有权
公开(公告)号：US20220057017A1
公开(公告)日：2022-02-24
申请号：US17405793
申请日：2021-08-18
申请人： Nikon Corporation
发明人： Alex Ka Tim Poon , Michael Birk Binnard , Gaurav Keswani
IPC分类号： F16K99/00 , F16K51/02 , F16K3/14 , F16K3/18
摘要： A valve (10) for selectively opening and closing a flow passageway (12) includes (i) a valve body (14) that defines a body passageway (16); (ii) a first valve surface (18) that defines a first valve opening (18A); (iii) an expandable barrier (22); and (iv) an actuation system (24). The expandable barrier (22) is movable in the body passageway (16) between an open configuration (30) in which the barrier (22) is retracted and does not engage the first valve surface (18); and a closed configuration (28) in which the barrier (22) is expanded, engages the first valve surface (18), and blocks the first valve opening (18A). The actuation system (24) selectively moves the barrier (22) between the configurations (28) (30).

5. 发明授权

US09176394B2 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权
标题翻译：浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器
公开(公告)号：US09176394B2
公开(公告)日：2015-11-03
申请号：US14082739
申请日：2013-11-18
申请人： NIKON CORPORATION
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Derek Coon , Gaurav Keswani , Daishi Tanaka
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus that includes a substrate holder on which a substrate is held, a projection system having a final optical element and that projects an exposure beam onto the substrate through an immersion liquid, and a liquid confinement member having an aperture through which the exposure beam is projected, a lower surface including a non-fluid removal area surrounding the aperture, and a liquid recovery outlet from which the immersion liquid is recovered, also includes a movable member. The movable member is movable relative to the liquid confinement member in a substantially horizontal direction, and has an opening through which the exposure beam is projected. The movable member has upper and lower surfaces that surround the opening, and is movable while a portion of the upper surface faces the non-fluid removal area in the lower surface of the liquid confinement member.
摘要翻译：一种浸没式光刻设备，其包括其上保持有基板的基板保持器，具有最终光学元件的投影系统，并且通过浸没液体将曝光光束投影到所述基板上;以及液体限制部件，射束，包括围绕孔的非流体去除区域的下表面和回收浸液的液体回收出口也包括可移动构件。可移动部件在大致水平的方向上相对于液体限制部件是可移动的，并且具有暴露光束投射的开口。可移动部件具有围绕开口的上表面和下表面，并且在上表面的一部分面向液体限制部件的下表面中的非流体去除区域时可移动。

6. 发明授权

US08743343B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权
标题翻译：在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法
公开(公告)号：US08743343B2
公开(公告)日：2014-06-03
申请号：US13754111
申请日：2013-01-30
申请人： Nikon Corporation
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Daishi Tanaka
IPC分类号： G03B27/32 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.
摘要翻译：平版印刷投影设备包括具有最终光学元件的投影光学组件，舞台组件，其包括衬底台，支撑衬底，由衬底台支撑的衬底用来自突起的最终光学元件的曝光光束曝光通过浸没液体的光学组件，围绕曝光束的路径的一部分的限制构件，以及可移动构件，其可在限制构件和衬底，衬底台或两者之间的空间中移动，空间为由可动构件分成限制构件和可动构件之间的第一部分和可移动构件与衬底之间的第二部分，衬底台或两者。可移动部件具有回收出口，第二部分中的浸没液体从该回收口移除。

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