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    • 6. 发明申请
    • Adamantane derivative and process for producing the same
    • 金刚烷衍生物及其制备方法
    • US20060149073A1
    • 2006-07-06
    • US10540547
    • 2003-12-18
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • C07C43/18
    • C07C43/12C07C43/192C07C49/517C07C2603/74G03F7/0045
    • Provided is an adamantane derivative represented by Formula (I) or (II): wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R1 to R4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R3 and R4 are a hydrogen atom at the same time. Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.
    • 提供由式(I)或(II)表示的金刚烷衍生物:其中X表示卤素原子; Y表示碳原子数1〜10的烷基,碳原子数1〜10的卤代烷基,卤原子或含杂原子的基团。 R 1至R 4独立地表示氢,卤素原子,具有1至10个碳原子的烷基或具有1至10个碳原子的卤代烷基; m表示0〜15的整数,n表示0〜10的整数。 并且排除是在式(I)中同时m和n同时为0并且R 3和R 4同时为氢原子的情况。 可以提供的是一种新颖的金刚烷衍生物,其可用作光刻胶树脂和光刻领域的干蚀刻抗蚀剂改性剂,农业和医疗中间体等各种工业产品的改性剂。
    • 7. 发明授权
    • Bis(3-amino-4-hydroxyphenyl)adamantane derivatives and process for production thereof
    • 双(3-氨基-4-羟基苯基)金刚烷衍生物及其制备方法
    • US07423180B2
    • 2008-09-09
    • US10547553
    • 2004-02-26
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • C07C211/00
    • C07C215/80C07C2603/74H05K3/285H05K3/4676
    • The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor devices, interlayer insulating film for use in multilayer wiring boards, cover coating in flexible printed circuits, or a liquid crystal alignment layer.The compounds are bis(3-amino-4-hydroxyphenyl)adamantane derivatives having a structure represented by formula (I) or (II): (each of R1 to R4 represents a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, a carboxyl group, or an alkoxycarbonyl group, each of m and a is an integer of 0 to 3, and each of n and b is an integer of 0 to 14, with the proviso that the case where the following three conditions in formula (I) are met is excluded: R2 is methyl and present at a bridgehead; m is 0; and n is 2).
    • 本发明提供了在耐热性,机械特性,电特性,物理性质等方面优异的化合物,其提供了用于例如用于半导体器件的层间绝缘膜或保护膜的新型材料,层间绝缘 用于多层布线板的膜,柔性印刷电路中的覆盖层或液晶取向层。 这些化合物是具有由式(I)或(II)表示的结构的双(3-氨基-4-羟基苯基)金刚烷衍生物:(R 1至R 4中的每一个) >表示卤素原子,羟基,烷基,烷氧基,羧基或烷氧基羰基,m和a分别为0〜3的整数,n和b分别为 0至14,条件是满足式(I)中的以下三个条件的情况除外:R 2是甲基并存在于桥头堡; m是0; n是2 )。
    • 9. 发明申请
    • Bis(3-amino-4-hydroxyphenyl)adamantane derivatives and process for production thereof
    • 双(3-氨基-4-羟基苯基)金刚烷衍生物及其制备方法
    • US20060161016A1
    • 2006-07-20
    • US10547553
    • 2004-02-26
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • C07C229/54C07C213/10
    • C07C215/80C07C2603/74H05K3/285H05K3/4676
    • The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor devices, interlayer insulating film for use in multilayer wiring boards, cover coating in flexible printed circuits, or a liquid crystal alignment layer. The compounds are bis(3-amino-4-hydroxyphenyl)adamantane derivatives having a structure represented by formula (I) or (II): (each of R1 to R4 represents a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, a carboxyl group, or an alkoxycarbonyl group, each of m and a is an integer of 0 to 3, and each of n and b is an integer of 0 to 14, with the proviso that the case where the following three conditions in formula (I) are met is excluded: R2 is methyl and present at a bridgehead; m is 0; and n is 2).
    • 本发明提供了在耐热性,机械特性,电特性,物理性质等方面优异的化合物,其提供了用于例如用于半导体器件的层间绝缘膜或保护膜的新型材料,层间绝缘 用于多层布线板的膜,柔性印刷电路中的覆盖层或液晶取向层。 这些化合物是具有由式(I)或(II)表示的结构的双(3-氨基-4-羟基苯基)金刚烷衍生物:(R 1至R 4中的每一个) >表示卤素原子,羟基,烷基,烷氧基,羧基或烷氧基羰基,m和a分别为0〜3的整数,n和b分别为 0至14,条件是满足式(I)中的以下三个条件的情况除外:R 2是甲基并存在于桥头堡; m是0; n是2 )。
    • 10. 发明授权
    • Adamantane derivative and process for producing the same
    • 金刚烷衍生物及其制备方法
    • US07470824B2
    • 2008-12-30
    • US10540547
    • 2003-12-18
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • Shinji TanakaHidetoshi OnoKouichi KodoiNaoyoshi Hatakeyama
    • C07C43/18
    • C07C43/12C07C43/192C07C49/517C07C2603/74G03F7/0045
    • Provided is an adamantane derivative represented by Formula (I) or (II): wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R1 to R4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R3 and R4 are a hydrogen atom at the same time. Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.
    • 提供由式(I)或(II)表示的金刚烷衍生物:其中X表示卤素原子; Y表示碳原子数1〜10的烷基,碳原子数1〜10的卤代烷基,卤原子或含杂原子的基团。 R 1〜R 4分别独立地表示氢,卤素原子,碳原子数1〜10的烷基或碳原子数1〜10的卤代烷基。 m表示0〜15的整数,n表示0〜10的整数。 并且排除是在式(I)中同时m和n同时为0且R3和R4同时为氢原子的情况。 可以提供的是一种新颖的金刚烷衍生物,其可用作光刻胶树脂和光刻领域的干蚀刻抗蚀剂改性剂,农业和医疗中间体等各种工业产品的改性剂。