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    • 6. 发明授权
    • Epitaxially grown compound semiconductor film and compound semiconductor multi-layer structure
    • 外延生长复合半导体膜和化合物半导体多层结构
    • US06815792B2
    • 2004-11-09
    • US10401215
    • 2003-03-27
    • Hisao NagataYasunori ArimaNobuyuki Komaba
    • Hisao NagataYasunori ArimaNobuyuki Komaba
    • H01L2714
    • H01L31/105H01L31/184H01L31/1844Y02E10/544
    • The present invention provides an epitaxially grown compound semiconductor film having a low density of crystal defects which are generated during the course of crystal growth of a compound semiconductor. The present invention also provides a compound semiconductor multi-layer structure including an n-type InP substrate, an n-type InP buffer layer, an undoped InGaAs light-absorbing layer, and an n-type InP cap layer, the layers being successively grown on the substrate through MOCVD. In the InGaAs layer, the compositional ratio of In/Ga is cyclically varied in a thickness direction (cyclic intervals: 80 nm) so as to fall within a range of ±2% with respect to a predetermined compositional ratio that establishes lattice matching between InGaAs and InP; specifically, within a range between 0.54/0.46 (i.e., In0.54Ga0.46As) and 0.52/0.48 (i.e., In0.52Ga0.48As)
    • 本发明提供了在化合物半导体的晶体生长过程中产生的具有低密度晶体缺陷的外延生长化合物半导体膜。 本发明还提供了包括n型InP衬底,n型InP缓冲层,未掺杂的InGaAs光吸收层和n型InP覆盖层的化合物半导体多层结构,这些层依次生长 通过MOCVD在衬底上。 在InGaAs层中,In / Ga的组成比在厚度方向(循环间隔:80nm)中循环变化,以相对于在InGaAs之间建立晶格匹配的规定组成比落在±2%的范围内 和InP; 具体地,在0.54 / 0.46(即In0.54Ga0.4As)和0.52 / 0.48(即In0.52Ga0.48As)之间的范围内,