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1. 发明申请

US20060223008A1 Composition for forming antireflection film, laminate, and method for forming resist pattern 有权
标题翻译：用于形成抗反射膜的组合物，层压体和形成抗蚀剂图案的方法
公开(公告)号：US20060223008A1
公开(公告)日：2006-10-05
申请号：US11376146
申请日：2006-03-16
申请人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
发明人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
IPC分类号： G03F7/00 , G03C5/00
CPC分类号： G03F7/091 , G03F7/0046
摘要： An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.
摘要翻译：提供了具有优异的涂布性的防反射膜形成组合物，其能够显着抑制微细微泡的产生并且能够形成具有足够降低的驻波效应的抗反射膜，并且在水和碱性显影剂中具有优异的溶解性。该组合物包含在侧链上具有至少一个具有含羟基有机基团的聚合单元的聚合物，优选具有至少一个下式（2）的重复单元的共聚物和/或至少一种重复单元下式（3）和至少一个下式（4）的重复单元和/或其盐：其中R 1和R 2代表氢原子氟原子或一价有机基团，m为1-20的整数，A表示二价键合机构。

2. 发明授权

US07514205B2 Composition for forming antireflection film, laminate, and method for forming resist pattern 有权
标题翻译：用于形成抗反射膜的组合物，层压体和形成抗蚀剂图案的方法
公开(公告)号：US07514205B2
公开(公告)日：2009-04-07
申请号：US11376146
申请日：2006-03-16
申请人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
发明人： Nakaatsu Yoshimura , Keiji Konno , Norihiro Natsume
IPC分类号： G03F1/00 , C08F20/26
CPC分类号： G03F7/091 , G03F7/0046
摘要： An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.
摘要翻译：提供了具有优异的涂布性的防反射膜形成组合物，其能够显着抑制微细微泡的产生并且能够形成具有足够降低的驻波效应的抗反射膜，并且在水和碱性显影剂中具有优异的溶解性。该组合物包含在侧链上具有至少一个具有含羟基有机基团的聚合单元的聚合物，优选具有至少一个下式（2）的重复单元的共聚物和/或至少一种重复单元下式（3）和至少一个下式（4）的重复单元和/或其盐：其中R 1和R 2表示氢原子，氟原子或一价有机基团，m是 1-20，A表示二价键合装置。

3. 发明授权

US07709182B2 Composition for forming antireflection film, layered product, and method of forming resist pattern 有权
标题翻译：用于形成抗反射膜的组合物，层叠体，以及形成抗蚀剂图案的方法
公开(公告)号：US07709182B2
公开(公告)日：2010-05-04
申请号：US11792077
申请日：2005-11-28
申请人： Nakaatsu Yoshimura , Keiji Konno
发明人： Nakaatsu Yoshimura , Keiji Konno
IPC分类号： G03F7/11 , G03F7/30
CPC分类号： G03F7/091 , G03F7/0046 , Y10T428/24802
摘要： An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.
摘要翻译：显着地抑制了具有优异适用性的抗反射膜形成组合物，从而产生超细微泡，得到能够充分降低驻波效应的抗反射膜，并且在水和碱性显影液中具有优异的溶解性。防反射膜形成组合物包含：（A）由例如2-（甲基）丙烯酰胺基-2-甲基丙磺酸和含氟烷基的丙烯酸酯表示的含磺酸基的丙烯酰胺衍生物的共聚物（盐）衍生物，例如（甲基）丙烯酸2,2,3,3,3-五氟丙酯; 和（B）表面活性剂，其0.1重量％％水溶液在25℃下测得的表面张力为45mN / m以下。

4. 发明申请

US20080124524A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern 有权
标题翻译：用于形成抗反射膜，分层产品和形成抗蚀剂图案的方法的组合物
公开(公告)号：US20080124524A1
公开(公告)日：2008-05-29
申请号：US11792077
申请日：2005-11-28
申请人： Nakaatsu Yoshimura , Keiji Konno
发明人： Nakaatsu Yoshimura , Keiji Konno
IPC分类号： C08F20/56 , B32B5/00 , G03F7/039
CPC分类号： G03F7/091 , G03F7/0046 , Y10T428/24802
摘要： An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.
摘要翻译：显着地抑制了具有优异适用性的抗反射膜形成组合物，从而产生超细微泡，得到能够充分降低驻波效应的抗反射膜，并且在水和碱性显影液中具有优异的溶解性。防反射膜形成组合物包含：（A）由例如2-（甲基）丙烯酰胺基-2-甲基丙磺酸和含氟烷基的丙烯酸酯表示的含磺酸基的丙烯酰胺衍生物的共聚物（盐）衍生物，例如（甲基）丙烯酸2,2,3,3,3-五氟丙酯; 和（B）表面活性剂，其0.1重量％％水溶液在25℃下测得的表面张力为45mN / m以下。

5. 发明授权

US07037994B2 Acenaphthylene derivative, polymer, and antireflection film-forming composition 有权
标题翻译：苊烯衍生物，聚合物和抗反射膜形成组合物
公开(公告)号：US07037994B2
公开(公告)日：2006-05-02
申请号：US10624678
申请日：2003-07-23
申请人： Hikaru Sugita , Keiji Konno , Masato Tanaka , Tsutomu Shimokawa
发明人： Hikaru Sugita , Keiji Konno , Masato Tanaka , Tsutomu Shimokawa
IPC分类号： C08F32/08 , C08F12/32 , C08F132/08
CPC分类号： C07C69/14 , C07C33/38 , C07C2603/20 , G03F7/091
摘要： Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R1 is a hydrogen atom and R2and R3 individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.
摘要翻译：公开了新型化合物乙酰氧基甲基苊烯和羟甲基苊。由含有式（3）结构单元的这些新化合物制备的聚合物，其中R 1是氢原子，R 2和R 3， SUP>分别表示一价原子或一价有机基团。聚合物适合作为抗反射膜形成组合物的组分，其具有高抗反射效果并且不会与抗蚀剂膜混合。

6. 发明授权

US06300465B1 Process for producing phenylene-containing polymer and film-forming material 有权
标题翻译：用于生产含亚苯基的聚合物和成膜材料的方法
公开(公告)号：US06300465B1
公开(公告)日：2001-10-09
申请号：US09355314
申请日：1999-07-30
申请人： Toshiyuki Akiike , Tadahiro Shiba , Keiji Konno , Igor Rozhanskii , Kohei Goto
发明人： Toshiyuki Akiike , Tadahiro Shiba , Keiji Konno , Igor Rozhanskii , Kohei Goto
IPC分类号： C08G6110
CPC分类号： C08G61/10
摘要： The present invention is a process for producing a phenylene-containing polymer in the presence of a catalyst system containing a transition metal compound, and a film-forming material comprising the phenylene-containing polymer.
摘要翻译：本发明是在含有过渡金属化合物的催化剂体系和含有亚苯基的聚合物的成膜材料的存在下制造含亚苯基的聚合物的方法。

7. 发明授权

US08968458B2 Composition for resist underlayer film and process for producing same 有权
标题翻译：抗蚀剂下层膜的组合物及其制造方法
公开(公告)号：US08968458B2
公开(公告)日：2015-03-03
申请号：US12715406
申请日：2010-03-02
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： C07F7/08 , G03F7/075 , G03F7/11 , H01L21/027 , H01L21/033
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

8. 发明授权

US4406711A Method for the production of homogeneous steel 失效
标题翻译：均质钢生产方法
公开(公告)号：US4406711A
公开(公告)日：1983-09-27
申请号：US315347
申请日：1981-10-26
申请人： Michihiko Nagumo , Takeshi Kubota , Keiji Konno
发明人： Michihiko Nagumo , Takeshi Kubota , Keiji Konno
IPC分类号： C21D8/00
CPC分类号： C21D8/00
摘要： A method for the production of a homogeneous steel with reduced segregation of its ingredients by providing a continuous steel cast or steel ingot, the steel consisting of C.ltoreq.1.0%, Si.ltoreq.1.0% and Mn=0.2-3.0% plus one or more than two elements consisting of V.ltoreq.0.2%, Nb.ltoreq.0.2%, Mo.ltoreq.1.0%, Cu.ltoreq.2.0%, Cr.ltoreq.2.0%, Ni.ltoreq.3.0%, B.ltoreq.0.002%, Ti.ltoreq.0.1%, Al.ltoreq.0.1%, and Ca.ltoreq.0.01%, and the balance Fe and other unavoidable impurities, all percentages being by weight, subjecting the steel casting to a primary hot working at more than 20% reduction of area at an austenitic temperature range of less than 1200.degree. C. or at a temperature in the range from the Ar.sub.1 temperature to the Ac.sub.3 temperature in which two phases of austenite and ferrite coexist, and then to a soaking step wherein the core temperature of the steel casting stays at 1000.degree. C. or higher for a period of 30 minutes or longer.
摘要翻译：通过提供连续的钢铸或钢锭来制备具有较低成分偏析的均质钢的方法，该钢由C 1.0％，Si 1.0％，Mn = 0.2-3.0％ Nb≤0.2％，Mo≤1.0％，Cu≤2.0％，Cr≤2.0％，Ni≤3.0％组成的一种或多种元素， B≤0.002％，Ti≤0.1％，Al≤0.1％和Ca≤0.01％，余量为Fe和其他不可避免的杂质，所有百分数均为重量百分数，将钢铸件初级热加工在奥氏体温度范围小于1200℃或在两相奥氏体和铁素体共存的Ar1温度至Ac3温度范围内的温度范围内，面积减少20％以上，然后到其中钢铸件的芯温保持在1000℃以上30分钟以上的均热步骤。

9. 发明授权

US08808446B2 Composition for resist underlayer film and process for producing same 有权
标题翻译：抗蚀剂下层膜的组合物及其制造方法
公开(公告)号：US08808446B2
公开(公告)日：2014-08-19
申请号：US11816642
申请日：2006-02-24
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： C09D4/00 , G03F7/075 , C07F7/08 , H01L21/027 , G03F7/11 , H01L21/033
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

10. 发明授权

US08263315B2 Pattern-forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08263315B2
公开(公告)日：2012-09-11
申请号：US12814476
申请日：2010-06-13
申请人： Keiji Konno
发明人： Keiji Konno
IPC分类号： G03F7/20 , G03F7/30 , G03F7/40 , G03F7/42
CPC分类号： G03F7/40 , C08F12/22 , C08F12/24 , C08F12/32 , C09D125/18
摘要： A pattern-forming method includes selectively exposing a resist layer formed using a positive-tone radiation-sensitive resin composition including a resin component and an acid generator. The resist layer is developed to form a first pattern. An uncrosslinked embedded section is formed adjacent the first the pattern using a pattern-forming resin composition including a polymer. The polymer has a carbon content higher than that of the resin component, does not include silicon atom in a molecule, and is crosslinkable due to an acid generated from the acid generator. The uncrosslinked embedded section is crosslinked in an area around an interface with the first pattern to form an array structure. The first pattern, a first crosslinked section, the uncrosslinked embedded section, and a second crosslinked section are repeatedly arranged in the array structure in this order. The first pattern and the uncrosslinked embedded section are removed to form a second pattern.
摘要翻译：图案形成方法包括选择性地曝光使用包含树脂组分和酸产生剂的正色散辐射敏感性树脂组合物形成的抗蚀剂层。抗蚀剂层被显影以形成第一图案。使用包含聚合物的图案形成树脂组合物在第一图案附近形成未交联的嵌入部分。聚合物的碳含量高于树脂成分，不包括分子中的硅原子，并且由酸产生剂产生的酸可交联。未交联的嵌入部分在与第一图案的界面周围的区域中交联以形成阵列结构。第一图案，第一交联部分，未交联嵌入部分和第二交联部分依次重复排列在阵列结构中。去除第一图案和未交联的嵌入部分以形成第二图案。

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