专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20180239266A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180239266A1
公开(公告)日：2018-08-23
申请号：US15956000
申请日：2018-04-18
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus includes a projection system provided with a final element which has a first outer surface that is liquid repellent, and a component disposed adjacent to the final element and having a second outer surface which is liquid repellent, the first outer surface and the second outer surface facing each other with a gap between the first and second outer surfaces. A substrate is exposed with exposure light from the projection system through immersion liquid between an end surface of the final element and the substrate, the immersion liquid covering a portion of an upper surface of the substrate. The gap is formed above the end surface of the final element.

2. 发明申请

US20180149984A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 审中-公开
公开(公告)号：US20180149984A1
公开(公告)日：2018-05-31
申请号：US15884634
申请日：2018-01-31
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/70341 , G03F7/70725
摘要： A liquid immersion exposure apparatus includes a projection system having a final optical element; a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a removal outlet facing downward and a liquid supply inlet; a substrate stage having a substrate holding portion, which is movable below and relative to the projection system; and a controller. The controller controls movement of the substrate stage, so that when the substrate is moved from a first position to a second position in a plane perpendicular to an optical axis of the final optical element, the controller limits the movement of the substrate stage based on a positional relation between the first position and the second position.

3. 发明申请

US20170068176A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20170068176A1
公开(公告)日：2017-03-09
申请号：US15354396
申请日：2016-11-17
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： A device manufacturing method forms a liquid immersion area under a projection system via which an exposure light is projected, while supplying a liquid via a liquid supply inlet of a liquid retaining member and collecting the supplied liquid along with a gas via a liquid recovery outlet of the liquid retaining member. The liquid retaining member surrounds a tip portion of the projection system, which has a last optical element having a surface. The liquid retaining member has a surface opposite to the surface of the last optical element with a gap between the surfaces. A substrate is exposed with the exposure light through the liquid of the liquid immersion area, while moving the substrate below and relative to the projection system and the liquid retaining member. One of the liquid and the gas is separated from the other which have been collected via the liquid recovery outlet.
摘要翻译：装置制造方法在投影系统下面形成液浸区域，通过该投影系统投射曝光光，同时通过液体保持构件的液体供给入口供给液体，并将供应的液体与气体一起通过液体回收口液体保持构件。液体保持构件围绕投影系统的尖端部分，其具有具有表面的最后一个光学元件。液体保持构件具有与最后光学元件的表面相对的表面，其表面之间具有间隙。在使衬底在投影系统和液体保持构件下方并相对于投影系统和液体保持构件移动的同时，衬底被曝光光通过液浸区域的液体曝光。液体和气体中的一个与通过液体回收出口收集的另一个分离。

4. 发明申请

US20160097982A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20160097982A1
公开(公告)日：2016-04-07
申请号：US14823673
申请日：2015-08-11
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

5. 发明申请

US20140307238A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20140307238A1
公开(公告)日：2014-10-16
申请号：US14314664
申请日：2014-06-25
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hirotaka KOHNO , Takeshi OKUYAMA , Hiroyuki NAGASAKA , Katsushi NAKANO
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.
摘要翻译：液浸曝光装置通过形成在基板表面的一部分上的液浸区域，用曝光光束使基板曝光。该装置包括一个投影系统，一个具有一个孔的第一喷嘴构件，该曝光光束通过该孔突出，该第一喷嘴构件具有一个液体供应入口和一个液体回收出口，第二喷嘴构件具有气体供应入口，在暴露期间被供应到围绕液浸区域的空间，使第二喷嘴构件相对于第一喷嘴构件移动的驱动系统，以及具有保持基板并且可相对于第一喷嘴构件可移动的支架的台架系统投影系统，第一喷嘴构件和第二喷嘴构件。

6. 发明申请

US20130194560A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
公开(公告)号：US20130194560A1
公开(公告)日：2013-08-01
申请号：US13734683
申请日：2013-01-04
申请人： NIKON CORPORATION
发明人： Yasuhiro OMURA , Takaya OKADA , Hiroyuki NAGASAKA
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

7. 发明申请

US20210023779A1 PROCESSING APPARATUS, PROCESSING METHOD, COMPUTER PROGRAM, RECORDING MEDIUM, AND CONTROL APPARATUS 有权
公开(公告)号：US20210023779A1
公开(公告)日：2021-01-28
申请号：US16964689
申请日：2019-01-29
申请人： NIKON CORPORATION
发明人： Takeshi MATSUDA , Hiroyuki NAGASAKA , Masayuki SHIRAISHI , Shigeki EGAMI , Takehiro YAMAMOTO
IPC分类号： B29C64/153 , B23K26/342 , B23K15/00 , B23K26/08 , B33Y30/00 , B29C64/268 , B33Y10/00
摘要： A processing apparatus with: an irradiation apparatus that emits an energy beam; and a supply apparatus that supplies materials to an irradiation position of the energy beam, the processing apparatus forms a build object by moving the irradiation position from a first position on a first object to a second position that is away from the first object.

8. 发明申请

US20180173107A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20180173107A1
公开(公告)日：2018-06-21
申请号：US15897271
申请日：2018-02-15
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20 , G03B27/42
摘要： A liquid immersion exposure apparatus and method expose a substrate with illumination light via liquid. A projection optical system has plural optical elements that include a lens contacting the liquid and a barrel supporting the optical elements, the lens provided on a front end part of the projection optical system and exposed from the barrel. A liquid immersion member around the lens forms a liquid immersion area between the lens and part of the substrate. A drive device having a magnetic floating type of motor moves a substrate stage below the projection optical system. The liquid immersion member has a supply port to supply the liquid below the projection optical system and a recovery port to recover the liquid. The supply port is outside the projection area, the recovery port surrounds the projection area and the supply port, and each of the supply and recovery ports faces the substrate stage.

9. 发明申请

US20180011411A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20180011411A1
公开(公告)日：2018-01-11
申请号：US15706244
申请日：2017-09-15
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

10. 发明申请

US20170371253A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20170371253A1
公开(公告)日：2017-12-28
申请号：US15697750
申请日：2017-09-07
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus includes a projection optical system having a last optical element via which an exposure beam is projected to a projection area, and a liquid supply system having a first supply port and a second supply port via which an immersion liquid is supplied to form a liquid immersion area. The first supply port is arranged on one side of the projection area in a scanning direction, and the second supply port is arranged on the other side of the projection area in the scanning direction, the first and second supply ports facing downwardly. A plurality of shot areas of a substrate are successively exposed with the exposure beam through the liquid immersion area covering only a portion of an upper surface of the substrate.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式