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1. 发明授权

US06589869B2 Film thickness control using spectral interferometry 失效
公开(公告)号：US06589869B2
公开(公告)日：2003-07-08
申请号：US10131726
申请日：2002-04-23
申请人： Moshe Sarfaty , Lalitha S. Balasubramhanya , Jed E. Davidow , Dimitris P. Lymberopoulos
发明人： Moshe Sarfaty , Lalitha S. Balasubramhanya , Jed E. Davidow , Dimitris P. Lymberopoulos
IPC分类号： H01L21302
CPC分类号： H01L22/26 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A process for controlling a substrate processing operation such as a plasma etch operation. One embodiment of the method of the present invention forms a plasma within a substrate processing chamber to etch a wafer disposed within the chamber. The plasma emission is used by the process as a broadband light source. During the plasma etch process, a plurality of wavelengths of radiation reflected from the surface of the wafer being etched are measured with a spectrometer. These measurements are then compared using pattern recognition techniques to previous measurements taken during a previous plasma etch operation. Certain embodiments of the invention use principal component analysis (PCA) techniques to perform pattern recognition while other embodiment use programmed neural net pattern recognition techniques.

2. 发明授权

US06413867B1 Film thickness control using spectral interferometry 有权
标题翻译：使用光谱干涉测量的膜厚度控制
公开(公告)号：US06413867B1
公开(公告)日：2002-07-02
申请号：US09470828
申请日：1999-12-23
申请人： Moshe Sarfaty , Lalitha S. Balasubramhanya , Jed E. Davidow , Dimitris P. Lymberopoulos
发明人： Moshe Sarfaty , Lalitha S. Balasubramhanya , Jed E. Davidow , Dimitris P. Lymberopoulos
IPC分类号： H01L21302
CPC分类号： H01L22/26 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A process for controlling a substrate processing operation such as a plasma etch operation. One embodiment of the method of the present invention forms a plasma within a substrate processing chamber to etch a wafer disposed within the chamber. The plasma emission is used by the process as a broadband light source. During the plasma etch process, a plurality of wavelengths of radiation reflected from the surface of the wafer being etched are measured with a spectrometer. These measurements are then compared using pattern recognition techniques to previous measurements taken during a previous plasma etch operation. Certain embodiments of the invention use principal component analysis (PCA) techniques to perform pattern recognition while other embodiment use programmed neural net pattern recognition techniques.
摘要翻译：用于控制诸如等离子体蚀刻操作之类的衬底处理操作的过程。本发明的方法的一个实施例在衬底处理室内形成等离子体，以蚀刻设置在腔室内的晶片。该等离子体发射被用作宽带光源。在等离子体蚀刻工艺期间，用光谱仪测量从正在蚀刻的晶片的表面反射的多个波长的辐射。然后使用模式识别技术将这些测量值与之前的等离子体蚀刻操作期间的先前测量值进行比较。本发明的某些实施例使用主成分分析（PCA）技术来执行模式识别，而其他实施例使用编程的神经网络模式识别技术。

3. 发明授权

US07046019B1 Direct non contact measurement 有权
标题翻译：直接非接触测量
公开(公告)号：US07046019B1
公开(公告)日：2006-05-16
申请号：US11034122
申请日：2005-01-12
申请人： Moshe Sarfaty , Sven Hermann
发明人： Moshe Sarfaty , Sven Hermann
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： G01N23/2251
摘要： A method of measuring a lower similar layer that is separated from an upper similar layer by an intervening dissimilar layer in an integrated circuit. A first electron beam having a first relatively lower landing energy is directed at the integrated circuit. The first relatively lower landing energy is sufficient to completely penetrate the upper similar layer and insufficient to completely penetrate the intervening dissimilar layer, thereby producing first readings that are characteristic of the upper similar layer. A second electron beam having a second relatively higher landing energy is directed at the integrated circuit, the second relatively higher landing energy is sufficient to completely penetrate the upper similar layer, the intervening dissimilar layer, and the lower similar layer, thereby producing second readings that are characteristic of both the upper similar layer and the lower similar layer. The first readings that are characteristic of the upper similar layer are subtracted from the second readings that are characteristic of both the upper similar layer and the lower similar layer, to produce third readings that are characteristic of only the lower similar layer.
摘要翻译：一种测量通过集成电路中的中间不相似层与上部相似层分离的下部相似层的方法。具有第一相对较低着陆能量的第一电子束被引导到集成电路。第一相对较低的着陆能量足以完全穿透上部相似层并且不足以完全穿透介入的不同层，从而产生上部相似层的特征的第一读数。具有第二较高着陆能量的第二电子束指向集成电路，第二相对较高的着陆能足以完全穿透上部相似层，中间不相似层和下部相似层，从而产生第二读数，是上相似层和下相似层的特征。从上部相似层和下部相似层的特征的第二个读数中减去上部相似层的特征的第一个读数，以产生只有较低相似层的特征的第三个读数。

4. 发明授权

US06855569B1 Current leakage measurement 失效
标题翻译：电流泄漏测量
公开(公告)号：US06855569B1
公开(公告)日：2005-02-15
申请号：US10719570
申请日：2003-11-21
申请人： Moshe Sarfaty
发明人： Moshe Sarfaty
IPC分类号： G01N23/225 , G01R31/02 , H01L21/00 , G01R31/305
CPC分类号： G01R31/025 , G01N23/2252
摘要： A method for detecting current leakage of a film on a substrate. The film is repeatedly irradiated with an electron beam, thereby causing the film to emit x-rays. The emitted x-rays are detected with an x-ray detector, the detected x-rays emitted with each repeated irradiation of the film are counted to produce an x-ray count rate. The trend of the x-ray count rate is determined, and the current leakage of the film is determined from the trend of the x-ray count rate.
摘要翻译：一种用于检测基板上的膜的电流泄漏的方法。用电子束反复照射该膜，从而使膜发射x射线。用x射线检测器检测发射的x射线，对每次重复照射的膜照射的检测到的x射线进行计数，以产生x射线计数率。确定x射线计数率的趋势，并根据x射线计数率的趋势确定膜的电流泄漏。

5. 发明授权

US06368975B1 Method and apparatus for monitoring a process by employing principal component analysis 有权
标题翻译：采用主成分分析法监测过程的方法和装置
公开(公告)号：US06368975B1
公开(公告)日：2002-04-09
申请号：US09348972
申请日：1999-07-07
申请人： Lalitha Balasubramhanya , Moshe Sarfaty , Jed Davidow , Dimitris Lymberopoulos
发明人： Lalitha Balasubramhanya , Moshe Sarfaty , Jed Davidow , Dimitris Lymberopoulos
IPC分类号： H01L21302
CPC分类号： G05B23/024 , G01N21/274 , G01N21/3563 , G01N21/359 , G01N2201/1293
摘要： A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component. Preferably the at least one production principal component is compared to the calibration principal component by computing the inner product of the calibration and production principal components.
摘要翻译：提供了一种通过采用主成分分析来监测过程的方法和装置。测量要监控的过程（生产过程）的相关属性。然后对测量的相关属性执行主成分分析，以便生成至少一个生产主成分; 并且将至少一个生产主成分与与校准过程（校准主成分）相关联的主成分进行比较。通过测量校准过程的相关属性以及通过对所测量的相关属性执行主成分分析以获得至少一个主成分来获得校准主成分。识别具有指示期望的处理状态，处理事件和室状态中的至少一个的特征的主要成分，并将其指定为校准主成分。优选地，通过计算校准和生产主要部件的内积来将至少一个生产主成分与校准主成分进行比较。

6. 发明授权

US09566030B2 Optical system for detection and characterization of abnormal tissue and cells 有权
标题翻译：用于检测和表征异常组织和细胞的光学系统
公开(公告)号：US09566030B2
公开(公告)日：2017-02-14
申请号：US12525006
申请日：2008-01-31
申请人： Moshe Sarfaty , Amir Lev
发明人： Moshe Sarfaty , Amir Lev
IPC分类号： A61B6/00 , A61B5/00 , G01N21/65 , G01J3/44 , G01J3/02
CPC分类号： A61B5/415 , A61B5/0075 , A61B5/0084 , A61B5/0091 , A61B5/418 , A61B2562/0233 , A61B2562/16 , G01J3/0218 , G01J3/0291 , G01J3/44 , G01N21/658
摘要： An optical system and apparatus for the diagnosis of a biological sample is disclosed. An embodiment of the apparatus includes an optical probe, a probe head distally connectable to the optical probe, the optical probe further comprising at least one optical element for applying an electromagnetic radiation of a first wavelength to the biological sample, and one or more collection elements positioned proximate the at least one optical element; and an analyzer for analyzing a signal received from the biological sample by the one or more collection elements.
摘要翻译：公开了用于诊断生物样品的光学系统和装置。所述装置的一个实施例包括光学探针，可远端连接到光学探针的探针头，所述光学探针还包括用于将第一波长的电磁辐射施加到所述生物样品的至少一个光学元件，以及一个或多个收集元件定位在所述至少一个光学元件附近; 以及用于分析由一个或多个收集元件从生物样品接收的信号的分析器。

7. 发明申请

US20100121173A1 ELECTRICAL SYSTEMS FOR DETECTION AND CHARACTERIZATION OF ABNORMAL TISSUE AND CELLS 有权
标题翻译：用于异常组织和细胞的检测和表征的电气系统
公开(公告)号：US20100121173A1
公开(公告)日：2010-05-13
申请号：US12524973
申请日：2008-01-31
申请人： Moshe Sarfaty , Amir Lev
发明人： Moshe Sarfaty , Amir Lev
IPC分类号： A61B5/05 , G01R27/08
CPC分类号： G01N27/327 , A61B5/05 , A61B5/053 , A61B5/0536 , A61B5/0538 , A61B5/415 , A61B5/418 , A61B2562/0209 , A61B2562/046
摘要： An apparatus for the diagnosis of a biological sample is disclosed. An embodiments of the apparatus includes a probe, a probe head distally connectable to the probe, the probe head further comprising a plurality of electrode elements thereby forming an electrode array where each electrode element is variably actuatable to apply an electrical signal to the biological sample; an RF signal source for applying the electrical signal to the electrode array; an electrode selector adapted and configured to switch the electrical signal from the RF signal source between the plurality of electrode elements; and a detection circuit for analyzing a dielectric property received from the biological sample. Methods and kits for diagnosing a biological sample are also disclosed.
摘要翻译：公开了用于诊断生物样品的装置。该装置的一个实施例包括一个探针，一个探针头可远端连接到该探针上，该探针头还包括多个电极元件，从而形成电极阵列，其中每个电极元件可变地致动以向生物样品施加电信号; 用于将电信号施加到电极阵列的RF信号源; 电极选择器，适于和配置为在多个电极元件之间切换来自RF信号源的电信号; 以及用于分析从生物样品接收的介电特性的检测电路。还公开了用于诊断生物样品的方法和试剂盒。

8. 发明授权

US07668702B2 Method, system and medium for controlling manufacturing process using adaptive models based on empirical data 失效
标题翻译：使用基于经验数据的自适应模型控制制造过程的方法，系统和介质
公开(公告)号：US07668702B2
公开(公告)日：2010-02-23
申请号：US10377654
申请日：2003-03-04
申请人： Yuri Kokotov , Alexander T. Schwarm , Efim Entin , Jacques Seror , Jehuda Hartman , Yossi Fisher , Arulkumar P. Shanmugasundram , Moshe Sarfaty
发明人： Yuri Kokotov , Alexander T. Schwarm , Efim Entin , Jacques Seror , Jehuda Hartman , Yossi Fisher , Arulkumar P. Shanmugasundram , Moshe Sarfaty
IPC分类号： G06F17/10
CPC分类号： G05B13/048 , G05B17/02
摘要： A method, system, and medium of modeling and/or for controlling a manufacturing process is disclosed. The method includes the steps of identifying one or more input parameters that cause a change in output characteristics, defining global nodes using estimated maximum and minimum values of the input parameters, and defining a mathematical equation that calculates a predicted output characteristic for each node. The method also includes the steps of receiving at least one empirical data point having one or more input parameter values and at least one empirical output value and adjusting the predicted output values at the nodes based on a difference between the at least one empirical output value and the predicted output characteristic calculated using the mathematical equation based on the one or more input parameter values.
摘要翻译：公开了建模和/或控制制造过程的方法，系统和介质。该方法包括以下步骤：识别导致输出特性变化的一个或多个输入参数，使用估计的输入参数的最大值和最小值定义全局节点，并且定义计算每个节点的预测输出特性的数学方程式。该方法还包括以下步骤：接收具有一个或多个输入参数值和至少一个经验输出值的至少一个经验数据点，并且基于所述至少一个经验输出值和基于一个或多个输入参数值使用数学方程计算的预测输出特性。

9. 发明授权

US07042558B1 Eddy-optic sensor for object inspection 失效
标题翻译：用于物体检查的涡流传感器
公开(公告)号：US07042558B1
公开(公告)日：2006-05-09
申请号：US10619171
申请日：2003-07-10
申请人： Moshe Sarfaty , Ramaswamy Sreenivasan , Jaim Nulman
发明人： Moshe Sarfaty , Ramaswamy Sreenivasan , Jaim Nulman
IPC分类号： G01N21/00 , G01R19/00
CPC分类号： G01N27/904 , G01B7/105 , G01B11/0625 , G01N27/023
摘要： A sensor enables simultaneous or sequential eddy current and optical reflectance measurements of conducting film by providing an eddy current inspection coil and a first and a second optical fiber extending axially through the coil. The eddy current inspection coil is excited by a radio frequency generator and induces eddy currents in the conducting film which are sensed using a detector. The conducting film is illuminated by a first optical fiber, and light which is reflected from the conducting film is transmitted by a second optical fiber to a detector. The combined use of electrical and optical reflectance signals provides a single probe unit that measures both dielectric and conducting transparent and semi-transparent films.
摘要翻译：传感器通过提供涡流检测线圈和轴向延伸穿过线圈的第一和第二光纤，可以实现导电膜的同时或连续的涡流和光学反射率测量。涡流检测线圈由射频发生器激发，并在导电膜中感应出涡流，使用检测器检测。导电膜被第一光纤照射，并且从导电膜反射的光被第二光纤传输到检测器。电光反射信号的组合使用可以测量电介质和导电透明和半透明膜的单个探针单元。

10. 发明授权

US06633391B1 Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy 失效
标题翻译：使用光发射光谱法监测等离子体半导体处理期间的膜特性
公开(公告)号：US06633391B1
公开(公告)日：2003-10-14
申请号：US09708258
申请日：2000-11-07
申请人： Hakeem Oluseyi , Moshe Sarfaty
发明人： Hakeem Oluseyi , Moshe Sarfaty
IPC分类号： G01N2173
CPC分类号： G01N21/71
摘要： A method and system to monitor characteristics of films by sensing the spectral emissions of a plasma to which the films are exposed. As a result, the method includes sensing optical energy produced by the plasma. The optical energy has a plurality of spectral bands associated therewith, a subset of which is identified as including information corresponding to the film characteristics. The film characteristics are then measured as a function of this information. To increase the accuracy of the measurements, in one embodiment of the present invention a subgroup of the plurality of spectral bands is observed that has data associated that is substantially independent of the characteristics of interest. The characteristics are then measured as a function of both the information and the data.
摘要翻译：通过感测膜暴露于其中的等离子体的光谱发射来监测膜的特性的方法和系统。结果，该方法包括感测由等离子体产生的光能。光能具有与其相关联的多个光谱带，其一部分被识别为包括对应于胶片特性的信息。然后根据该信息测量胶片特性。为了提高测量的准确度，在本发明的一个实施例中，观察到具有与感兴趣特征基本上独立的数据相关联的多个频谱带的子组。然后，根据信息和数据的不同，测量特征。

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