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    • 3. 发明申请
    • POSITION DETECTOR AND EXPOSURE APPARATUS
    • 位置检测器和曝光装置
    • US20100227263A1
    • 2010-09-09
    • US12716368
    • 2010-03-03
    • Mitsuya Sato
    • Mitsuya Sato
    • G03F7/20G01B11/14G03B27/58
    • G03F9/7049G03B27/58G03F9/7003G03F9/7011G03F9/7019G03F9/7026G03F9/7088
    • A position detector includes a first planar encoder including a first encoder head unit mounted on a test object that is a movable member, and a first grating unit mounted on a fixed member, the first planar encoder being configured to detect a position of the test object in two directions by measuring a position of the first grating unit using the first encoder head unit, and a second planar encoder including a second encoder head unit mounted on the fixed member, and a second grating unit mounted on the movable member, the second planar encoder being used to generate data for calibrating the position of the first grating unit measured by the first encoder head unit.
    • 位置检测器包括:第一平面编码器,包括安装在作为可动构件的被测物体上的第一编码器头单元和安装在固定构件上的第一光栅单元,所述第一平面编码器被配置为检测被测物体的位置 通过使用第一编码器头单元测量第一光栅单元的位置,以及第二平面编码器,其包括安装在固定构件上的第二编码器头单元和安装在可动构件上的第二光栅单元,在两个方向上, 编码器用于生成用于校准由第一编码器头单元测量的第一光栅单元的位置的数据。
    • 6. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US07245349B2
    • 2007-07-17
    • US11449812
    • 2006-06-09
    • Mitsuya Sato
    • Mitsuya Sato
    • G03B27/42G03B27/58
    • G03F9/7003G03B27/42G03B27/58G03F7/70716G03F7/70733G03F9/7011G03F9/7088
    • An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.
    • 曝光装置,其将基板暴露于主板上的图案。 该装置包括保持基板的第一,第二和第三卡盘,保持第一卡盘进行精细驱动的第一微调台,保持第二卡盘进行精细驱动的第二微调台,粗调调阶段, 安装第一和第二微调台,并且可以在基本上垂直于光轴的XY平面中移动;对由第一卡盘保持的基板执行曝光操作的曝光单元,对基板执行测量操作的测量单元 由第二卡盘保持的控制器和驱动粗调阶段并使测量和曝光单元分别执行测量和曝光操作的控制器。
    • 8. 发明授权
    • Wafer prober
    • 晶圆探测器
    • US4864227A
    • 1989-09-05
    • US158736
    • 1988-02-23
    • Mitsuya Sato
    • Mitsuya Sato
    • G01R1/067G01R1/073G01R31/28
    • G01R31/2886G01R1/06794G01R1/07342
    • Wafer prober usable for examining, in a predetermined sequence, integrated microcircuits formed on a semiconductor wafer, is disclosed. The prober includes a contact plate which is movable in a Z-axis direction (the direction of height). The contact of the contact plate to a probe needle group is detected by detecting deformation of the contact plate. From the position of the contact plate at the time of deformation, the position of the needle tips of the probe needle group in the Z-axis direction is detected automatically. In another aspect, a laser beam source and a photosensor are provided as a unit with a wafer stage which is movable in each of an X-axis direction, a Y-axis direction and a .theta. (rotational) direction while carrying thereon a semiconductor wafer. With the aid of the movement of the wafer stage, the laser beam emitted from the laser beam source toward the photosensor is crossed by the probe needle group. On the basis of an output of the photosensor and the position of the wafer stage, at the time of the crossing, the position of the probe needle group with respect to each of the X-axis direction, the Y-axis direction and the .theta. direction is detected automatically. In a further aspect, automatization of the positioning of a probe card occurs when it is introduced into a wafer prober.
    • 公开了可用于以预定顺序检查形成在半导体晶片上的集成微电路的晶片探针。 探测器包括可沿Z轴方向(高度方向)移动的接触板。 通过检测接触板的变形来检测接触板与探针针组的接触。 从变形时的接触板的位置开始,自动检测探针组的针尖Z轴方向的位置。 在另一方面,提供激光束源和光电传感器作为具有可在X轴方向,Y轴方向和θ(旋转)方向中的每一个中移动的晶片台的单元,同时承载半导体晶片 。 借助于晶片台的移动,从激光束源向光电传感器发射的激光束被探针针组交叉。 基于光传感器的输出和晶片台的位置,在交叉时,探针针组相对于X轴方向,Y轴方向和θ的每一个的位置 自动检测方向。 在另一方面,当探针卡被引入晶片探针时,其定位的自动化发生。