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1. 发明授权

US08410460B2 Pattern defect inspection method and its apparatus 失效
标题翻译：图案缺陷检查方法及其装置
公开(公告)号：US08410460B2
公开(公告)日：2013-04-02
申请号：US11785432
申请日：2007-04-17
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01J3/10
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译：本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

2. 发明授权

US07463350B2 Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效
标题翻译：使用暗场信号和亮场信号来检测样本的缺陷的方法和装置
公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

3. 发明授权

US07359044B2 Method and apparatus for inspecting pattern defects 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07359044B2
公开(公告)日：2008-04-15
申请号：US11180536
申请日：2005-07-14
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译：检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。然后，在信号处理单元中检测到缺陷。此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。

4. 发明申请

US20050110988A1 Method and apparatus for inspecting defects of patterns 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20050110988A1
公开(公告)日：2005-05-26
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/956 , G01N21/88
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

5. 发明授权

US07295305B2 Method and its apparatus for inspecting a pattern 有权
标题翻译：检查图案的方法及其装置
公开(公告)号：US07295305B2
公开(公告)日：2007-11-13
申请号：US10914115
申请日：2004-08-10
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/4788 , G01N21/956
摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
摘要翻译：用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。

6. 发明申请

US20070195316A1 Pattern defect inspection method and its apparatus 失效
公开(公告)号：US20070195316A1
公开(公告)日：2007-08-23
申请号：US11785432
申请日：2007-04-17
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

7. 发明授权

US07205549B2 Pattern defect inspection method and its apparatus 有权
标题翻译：图案缺陷检查方法及其装置
公开(公告)号：US07205549B2
公开(公告)日：2007-04-17
申请号：US10765920
申请日：2004-01-29
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01J1/42
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译：本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

8. 发明申请

US20060012780A1 Method and apparatus for inspecting pattern defects 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060012780A1
公开(公告)日：2006-01-19
申请号：US11180536
申请日：2005-07-14
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译：检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。然后，在信号处理单元中检测到缺陷。此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。

9. 发明申请

US20050062963A1 Method and its apparatus for inspecting a pattern 有权
标题翻译：检查图案的方法及其装置
公开(公告)号：US20050062963A1
公开(公告)日：2005-03-24
申请号：US10914115
申请日：2004-08-10
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01B11/30 , G01N21/47 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/027 , H01L21/66 , G01N21/00 , G01J1/42
CPC分类号： G01N21/9501 , G01N21/4788 , G01N21/956
摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
摘要翻译：用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。

10. 发明授权

US08107717B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US08107717B2
公开(公告)日：2012-01-31
申请号：US13072102
申请日：2011-03-25
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： Arrangements for inspecting a specimen on which plural patterns are formed; capturing a first image of a first area; capturing a second image of a second area in which patterns which are essentially the same with the patterns formed in the first area; creating data relating to corresponding pixels of the first and second images, for each pixel; determining a threshold for each pixel for detecting defects directly in accordance with the first and second images; and detecting defects on the specimen by processing the first and second images by using the threshold for each pixel and information of a scattered diagram of brightness of the first and second images, wherein the threshold is determined by using information of brightness of a local region of at least one of the first and second images, with the local region including an aimed pixel and peripheral pixels of the aimed pixel.
摘要翻译：用于检查形成多个图案的样本的布置; 捕获第一区域的第一图像; 捕获与形成在第一区域中的图案基本上相同的图案的第二区域的第二图像; 为每个像素创建与第一和第二图像的相应像素有关的数据; 根据第一和第二图像确定用于检测缺陷的每个像素的阈值; 以及通过使用每个像素的阈值和第一和第二图像的亮度的散射图的信息来处理第一和第二图像来检测样本上的缺陷，其中，通过使用第一和第二图像的局部区域的亮度的信息来确定阈值第一和第二图像中的至少一个，其中局部区域包括目标像素和目标像素的外围像素。

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