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1. 发明申请

US20050110988A1 Method and apparatus for inspecting defects of patterns 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20050110988A1
公开(公告)日：2005-05-26
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/956 , G01N21/88
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

2. 发明授权

US07463350B2 Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效
标题翻译：使用暗场信号和亮场信号来检测样本的缺陷的方法和装置
公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

3. 发明申请

US20060012780A1 Method and apparatus for inspecting pattern defects 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060012780A1
公开(公告)日：2006-01-19
申请号：US11180536
申请日：2005-07-14
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译：检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。然后，在信号处理单元中检测到缺陷。此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。

4. 发明授权

US07359044B2 Method and apparatus for inspecting pattern defects 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07359044B2
公开(公告)日：2008-04-15
申请号：US11180536
申请日：2005-07-14
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译：检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。然后，在信号处理单元中检测到缺陷。此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。

5. 发明授权

US07400393B2 Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen 有权
标题翻译：用于利用关于样本的信息来检测样本中的缺陷的方法和装置
公开(公告)号：US07400393B2
公开(公告)日：2008-07-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

6. 发明申请

US20070058164A1 Method and apparatus for detecting defects 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20070058164A1
公开(公告)日：2007-03-15
申请号：US11478617
申请日：2006-07-03
申请人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
发明人： Yukihiro Shibata , Shunji Maeda , Hidetoshi Nishiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N2021/8822
摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.
摘要翻译：本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

7. 发明申请

US20060290930A1 Method and apparatus for inspecting pattern defects 审中-公开
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060290930A1
公开(公告)日：2006-12-28
申请号：US11434070
申请日：2006-05-16
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/95623
摘要： The present invention relates to a pattern defect inspection apparatus, wherein light emitted from an illumination source capable of outputting a plurality of wavelengths is linearly illuminated by an illuminating optical system. Diffracted or scattered light due to a circuit pattern or defect on a wafer is collected by an imaging optical system onto a line sensor and converted into a digital signal, and the defect is detected by a signal processing section. Then, the defect can be detected with high sensitivity since a surface to be formed by an optical axis of the illuminating optical system and an optical axis of the imaging optical system is almost collimated to a direction of a wiring pattern and further since an angle to be formed by the optical axis of the imaging optical system and the wafer is set to an angle with less diffracted light from the pattern. Thereby, the pattern defect inspection detecting various defects on the wafer with high sensitivity at high speed can be achieved.
摘要翻译：本发明涉及一种图案缺陷检查装置，其中从能够输出多个波长的照明源发射的光线由照明光学系统线性地照亮。由于晶片上的电路图案或缺陷导致的衍射或散射光被成像光学系统收集到线传感器上并转换成数字信号，并且由信号处理部分检测缺陷。然后，由于要由照明光学系统的光轴和成像光学系统的光轴形成的表面几乎准直到布线图案的方向，因此可以以高灵敏度检测缺陷，并且进一步由于与由成像光学系统的光轴形成，并且将晶片设置成与来自图案的较少衍射光的角度。由此，可以实现以高速度高灵敏度地检测晶片上的各种缺陷的图案缺陷检查。

8. 发明授权

US07508973B2 Method of inspecting defects 失效
标题翻译：检查缺陷的方法
公开(公告)号：US07508973B2
公开(公告)日：2009-03-24
申请号：US10809321
申请日：2004-03-26
申请人： Takafumi Okabe , Shunji Maeda , Yukihiro Shibata , Hidetoshi Nishiyama
发明人： Takafumi Okabe , Shunji Maeda , Yukihiro Shibata , Hidetoshi Nishiyama
IPC分类号： G06K9/00 , G06F3/048
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A method of inspecting detects includes assigning a plurality of sets of image acquisition conditions, executing inspection using each of the sets of conditions, classifying all detected defects into real defects and false defects by use of an automatic defect classification function, and selecting, from the plurality of sets of conditions, a set of conditions ideal for detection.
摘要翻译：检查检测方法包括：分配多组图像获取条件，使用每种条件执行检查，通过使用自动缺陷分类功能将所有检测到的缺陷分类为真实缺陷和假缺陷，并且从多组条件，一套条件理想的检测。

9. 发明申请

US20060078190A1 Method and apparatus for inspecting defects 审中-公开
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20060078190A1
公开(公告)日：2006-04-13
申请号：US11196396
申请日：2005-08-04
申请人： Yukihiro Shibata , Kei Shimura , Hidetoshi Nishiyama , Shunji Maeda
发明人： Yukihiro Shibata , Kei Shimura , Hidetoshi Nishiyama , Shunji Maeda
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： In order to detect defects without reducing the inspection speed, even when inspection is made by acquiring a high magnification image, defect inspection method is provided in which a surface of a sample is illuminated, via an illumination optical system, with light emitted by an illumination light source, an image of the sample illuminated with the light is picked up via a detection optical system, and the picked up image of the sample is compared with a previously stored image to detect defects. In illuminating the sample with the light, the area of the sample to be illuminated is varied according to an imaging magnification of the detection optical system.
摘要翻译：为了在不降低检查速度的情况下检测缺陷，即使通过获取高倍率图像进行检查，也提供了通过照明光学系统对样品的表面照射由照明发出的光的缺陷检查方法光源，通过检测光学系统拾取用光照射的样品的图像，并将样品的拾取图像与先前存储的图像进行比较以检测缺陷。在用光照射样品时，要照亮的样品的面积根据检测光学系统的成像倍率而变化。

10. 发明申请

US20060238760A1 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US20060238760A1
公开(公告)日：2006-10-26
申请号：US11475667
申请日：2006-06-26
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

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