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    • 1. 发明授权
    • Power semiconductor device and method for manufacturing the same
    • 功率半导体器件及其制造方法
    • US5929482A
    • 1999-07-27
    • US61056
    • 1998-04-16
    • Minoru KawakamiMitsuhiro YanoYasunori YamashitaHidetoshi Souno
    • Minoru KawakamiMitsuhiro YanoYasunori YamashitaHidetoshi Souno
    • H01L29/36H01L21/28H01L21/308H01L21/322H01L21/336H01L29/78H01L21/324
    • H01L21/3083H01L29/7813H01L21/28167
    • An n.sup.+ semiconductor substrate (1) using a silicon wafer as a base material and including As includes oxygen of which the concentration is in the range of 12E17 atoms/cm.sup.3 to 20E17 atoms/cm.sup.3. The first epitaxial growth layer (2) of n type and a diffusion layer (3) of p type are formed in sequence on the second major surface (1S2) of the semiconductor substrate (1). The thickness of an epitaxial a growth layer (10) is set to be not more than 20 .mu.m. A trench (6) is formed so as to extend from a surface of the diffusion layer (3) to the inside of the first epitaxial growth layer (2). A gate oxide film (5) is formed on a bottom surface (6B) and a wall surface (6W) of the trench (6) and a conductive layer (11) fills the trench (6). An n-type source layer (4) is formed at a corner (6C) of the trench (6). After that, predetermined electrodes are formed and so on, to complete a device. With this structure, it is possible to reduce a leak current, prevent deterioration in main breakdown voltage and stabilize gate-oxide-film breakdown-voltage characteristics in a vertical MOSFET with trench gate.
    • 使用硅晶片作为基材并且包括As的n +半导体衬底(1)包括浓度在12E17原子/ cm3至20E17原子/ cm3范围内的氧。 在半导体衬底(1)的第二主表面(1S2)上依次形成n型第一外延生长层(2)和p型扩散层(3)。 外延生长层(10)的厚度设定为20μm以下。 沟槽(6)形成为从扩散层(3)的表面延伸到第一外延生长层(2)的内部。 在沟槽(6)的底表面(6B)和壁表面(6W)上形成栅极氧化膜(5),并且导电层(11)填充沟槽(6)。 在沟槽(6)的拐角(6C)处形成n型源极层(4)。 之后,形成预定的电极等,以完成装置。 利用这种结构,可以减小泄漏电流,防止主要击穿电压的劣化并且在具有沟槽栅极的垂直MOSFET中稳定栅极氧化膜击穿电压特性。
    • 7. 发明授权
    • Method of manufacturing a glass passivation type semiconductor device
    • 制造玻璃钝化型半导体器件的方法
    • US4632728A
    • 1986-12-30
    • US788645
    • 1985-10-17
    • Minoru Kawakami
    • Minoru Kawakami
    • H01L21/316H01L21/56H01L21/306B44C1/22C03C15/00C03C25/06
    • H01L21/56H01L23/3178H01L2924/0002Y10S438/958
    • In a method of manufacturing a glass passivation type semiconductor device wherein a silicon semiconductor substrate of a first conductivity type is formed with a p-n junction by diffusing an impurity of a second conductivity type thereinto, recesses which reach the p-n junction are provided to expose the p-n junction in the recesses, and the exposed parts of the p-n junction are covered with a low-melting glass; a method of manufacturing a glass passivation type semiconductor device according to this invention consists in that, using a printing mask, a glass is deposited on a whole surface of a wafer except for an outer periphery of the wafer or predetermined parts thereof necessary for alingment at a subsequent step, with the glass films at the bottoms of said recesses and the p-n junction parts being rendered at least 10 .mu.m thick and glass films at the other parts being rendered 4-10 .mu.m thick, and that unnecessary portions of said glass films are thereafter removed by etching, using a photoresist as a mask.
    • 在制造玻璃钝化型半导体器件的方法中,其中通过将第二导电类型的杂质扩散到pn结中而形成第一导电类型的硅半导体衬底,设置到达pn结的凹部以露出pn 凹陷中的接合处,并且pn结的暴露部分被低熔点玻璃覆盖; 根据本发明的制造玻璃钝化型半导体器件的方法在于,使用印刷掩模,玻璃沉积在晶片的整个表面上,除了晶片的外周或其必需的预定部分 随后的步骤是将所述凹部的底部的玻璃膜和pn接合部分的厚度设为至少10微米,其他部分的玻璃膜的厚度为4-10微米,并且所述玻璃的不需要的部分 然后通过蚀刻,使用光致抗蚀剂作为掩模去除膜。
    • 8. 发明授权
    • Styryl phridyl compounds and their pharmaceutical compositions
    • 苯乙烯基短链烯基化合物及其药物组合物
    • US5198452A
    • 1993-03-30
    • US728128
    • 1991-07-10
    • Mitsuhiro KonishiMinoru KawakamiMichio TerasawaToshio Hamasaki
    • Mitsuhiro KonishiMinoru KawakamiMichio TerasawaToshio Hamasaki
    • C07D213/30C07D213/32C07D213/40C07D215/12C07D215/22C07D215/233C07D401/12C07D405/12
    • C07D213/30C07D213/32C07D213/40C07D215/12C07D215/233C07D401/12C07D405/12
    • A styryl compound of the formula(I): ##STR1## wherein each symbol is as defined in the specification, a pharmaceutically acceptable salt or an ester thereof is disclosed.Since the compounds of the present invention possess potent and long-lasting leukotriene-antagonistic actions and inhibitory actions against leukotriene, and exhibit better absorption by the oral administration.Further, the compounds of the present invention possess 5-lipoxygenase-inhibitory actions and/or cyclooxygenase-inhibitory actions, inhibitory actions to biosynthesis of LTB4, chemotactic actions against human leucoccyte, chymase-inhibitory actions, inhibitory actions to release of histamine or antihistamine actions.Therefore, they are useful as the prophylactic and therapeutic medicines for brochial asthma, chronic bronchitis, atopic dermatitis, allergic rhinitis, allergic arthritis, allergic conjunctivitis, hay fever, urticaria, alimentary allergy, pain, pyretolysis, rheumatoid, thrombosis, coronary vascular diseases, ischemic heart disease, peptic or duodenal ulcer and the like.
    • 公开了式(I)的苯乙烯基化合物:其中每个符号如说明书中所定义,其药学上可接受的盐或酯。 由于本发明的化合物具有强效的和持久的白三烯拮抗作用和对白细胞三烯的抑制作用,并且通过口服给药表现出更好的吸收。 此外,本发明的化合物具有5-脂氧合酶抑制作用和/或环加氧酶抑制作用,对LTB4的生物合成的抑制作用,对人类白细胞的趋化作用,糜酶抑制作用,释放组胺或抗组织胺作用的抑制作用 。 因此,它们可用作小儿哮喘,慢性支气管炎,特应性皮炎,过敏性鼻炎,过敏性关节炎,过敏性结膜炎,花粉症,荨麻疹,消化道变态反应,疼痛,并发症,类风湿,血栓形成,冠状动脉血管疾病等预防和治疗药物。 缺血性心脏病,消化性溃疡或十二指肠溃疡等。
    • 9. 发明授权
    • Benzo[h]cinnoline compound, a method of preparing said compound and a
pharmaceutical composition
    • 苯并[h]噌啉化合物,制备所述化合物的方法和药物组合物
    • US4782057A
    • 1988-11-01
    • US848371
    • 1986-03-25
    • Tetsuya TaharaMinoru KawakamiShuzo TakeharaMasamitsu Sakamori
    • Tetsuya TaharaMinoru KawakamiShuzo TakeharaMasamitsu Sakamori
    • C07D237/26A61K31/50A61K31/502A61P7/02A61P7/10A61P25/20A61P39/02C07D237/36C07D401/04
    • C07D401/04C07D237/36
    • A benzo[h]cinnoline compound of the formula: ##STR1## wherein each of X and Y is hydrogen, halogen, trifluoromethyl, hydroxy, alkyl having 1 to 4 carbon atoms, alkoxy having 1 to 4 carbon atoms, amino, alkanoylamido having 2 to 4 carbon atoms, nitro, cyano, alkanoyl having 2 to 4 carbon atoms; Ar is phenyl or pyridyl which may be optionally substituted by at least one substituent selected from the group consisting of halogen, trifluoromethyl, hydroxy, alkyl having 1 to 4 carbon atoms, alkoxy having 1 to 4 carbon atoms, amino, alkanoylamido having 2 to 4 carbon atoms, nitro and cyano; and the bond position indicated by dotted line is single bond or double bond, a method of preparing said compound and a pharmaceutical composition containing said compound.Since these compounds possess high affinity for benzodiazepine receptor and antianxiety activity, they are useful as neutralizers to an excess dose of antianxiety agents or as antianxiety agents.
    • PCT No.PCT / JP85 / 00471 Sec。 371日期:1986年3月25日 102(e)1986年3月25日PCT提交1985年8月26日PCT公布。 公开号WO86 / 01506 日本公报1986年3月13日。具有下式的苯并[h]噌啉化合物:其中X和Y各自为氢,卤素,三氟甲基,羟基,具有1至4个碳原子的烷基,具有1至4个碳原子的烷氧基 具有2至4个碳原子的氨基,烷酰氨基,硝基,氰基,具有2至4个碳原子的烷酰基; Ar是苯基或吡啶基,其可任选被至少一个选自卤素,三氟甲基,羟基,具有1至4个碳原子的烷基,具有1至4个碳原子的烷氧基,氨基,具有2至4个碳原子的烷酰氨基 碳原子,硝基和氰基; 并且由虚线表示的键位置是单键或双键,制备所述化合物的方法和含有所述化合物的药物组合物。 由于这些化合物对苯并二氮杂受体具有高亲和力和抗焦虑活性,因此它们可用作过量剂量的抗焦虑剂或作为抗焦虑剂的中和剂。