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1. 发明授权

US06206441B1 Apparatus and method for transferring wafers by robot 有权
标题翻译：机器人传送晶片的装置及方法
公开(公告)号：US06206441B1
公开(公告)日：2001-03-27
申请号：US09366226
申请日：1999-08-03
申请人： Ming-Chien Wen , Chuan-Yuan Lu , Chi-Yun Tseng , Su-Yi Doung
发明人： Ming-Chien Wen , Chuan-Yuan Lu , Chi-Yun Tseng , Su-Yi Doung
IPC分类号： B25J1506
CPC分类号： H01L21/67259 , Y10S294/907 , Y10S414/141
摘要： An apparatus for transferring wafers by a robot blade and a method for using the apparatus are disclosed. In the apparatus, a robot blade that is equipped with distance sensors mounted in a bottom surface of the blade is provided which senses the distance between the bottom surface of the robot blade and an adjacent surface below the robot blade such that any possible scratching of the adjacent surface is eliminated. The adjacent surface below the robot blade may be a wafer surface in a wafer cassette, or a wafer pedestal surface in a process machine. The distance sensors are mounted in recesses in the bottom surface of the blade which may be suitably capacitance sensors, ultrasonic sensors or optical sensors. The distance sensed by the distance sensors is analyzed by a controller and compared to a predetermined value of a minimum allowable distance such that any danger of scratching the adjacent surface is eliminated.
摘要翻译：公开了一种通过机器人刀片传送晶片的装置和使用该装置的方法。在该装置中，设置有安装在叶片的底表面中的距离传感器的机器人叶片，其感测机器人叶片的底表面和机器人叶片下方的相邻表面之间的距离，使得可能划伤相邻表面被消除。机器人刀片下面的相邻表面可以是晶片盒中的晶片表面，或处理机器中的晶片基座表面。距离传感器安装在叶片底面的凹槽中，其可以是适当的电容传感器，超声波传感器或光学传感器。由距离传感器感测的距离由控制器分析，并与最小可允许距离的预定值进行比较，从而消除了刮擦相邻表面的任何危险。

2. 发明授权

US07316240B2 Exhaust system and mini-exhaust static pressure controlling apparatus thereof 有权
标题翻译：排气系统及微型排气静压控制装置
公开(公告)号：US07316240B2
公开(公告)日：2008-01-08
申请号：US11110779
申请日：2005-04-21
申请人： Po-Sung Kuo , Yung-Dar Chen , Dar-Rung Kuo , Ming-Chien Wen , Ming-Tsong Wang
发明人： Po-Sung Kuo , Yung-Dar Chen , Dar-Rung Kuo , Ming-Chien Wen , Ming-Tsong Wang
IPC分类号： F16K15/14
CPC分类号： F24F7/06 , F24F2007/001 , F24F2013/1493 , H01L21/67017 , H01L21/67253 , Y10T137/0396 , Y10T137/7881 , Y10T137/789
摘要： An exhaust system and a mini-exhaust static pressure controlling apparatus thereof for controlling a process area. The mini-exhaust static pressure controlling apparatus has an exhaust chamber and an auto release damping device. The exhaust chamber has an air inlet connected to the process area receiving air exhaust from the process area, and an air outlet venting the air exhaust. The auto release damping device has a diaphragm pre-stressed in an arc shape with a coefficient of elasticity and an adjusting device for applying a stress on the diaphragm to maintain the arc shape of the diaphragm, and is disposed on the exhaust chamber to control static pressure of the air exhaust in the exhaust chamber.
摘要翻译：一种用于控制处理区域的排气系统和微型排气静压控制装置。微型排气静压控制装置具有排气室和自动释放阻尼装置。排气室具有连接到处理区域的空气入口，其接收来自处理区域的空气排出物，以及排气口排出空气。自动释放阻尼装置具有预制应力为具有弹性系数的弧形的隔膜和用于在隔膜上施加应力以保持隔膜的弧形的调节装置，并且设置在排气室上以控制静电排气室中排气的压力。

3. 发明申请

US20060237073A1 Exhaust system and mini-exhaust static pressure controlling apparatus thereof 有权
标题翻译：排气系统及微型排气静压控制装置
公开(公告)号：US20060237073A1
公开(公告)日：2006-10-26
申请号：US11110779
申请日：2005-04-21
申请人： Po-Sung Kuo , Yung-Dar Chen , Dar-Rung Kuo , Ming-Chien Wen , Ming-Tsong Wang
发明人： Po-Sung Kuo , Yung-Dar Chen , Dar-Rung Kuo , Ming-Chien Wen , Ming-Tsong Wang
IPC分类号： F16K15/14
CPC分类号： F24F7/06 , F24F2007/001 , F24F2013/1493 , H01L21/67017 , H01L21/67253 , Y10T137/0396 , Y10T137/7881 , Y10T137/789
摘要： An exhaust system and a mini-exhaust static pressure controlling apparatus thereof for controlling a process area. The mini-exhaust static pressure controlling apparatus has an exhaust chamber and an auto release damping device. The exhaust chamber has an air inlet connected to the process area receiving air exhaust from the process area, and an air outlet venting the air exhaust. The auto release damping device has a diaphragm pre-stressed in an arc shape with a coefficient of elasticity and an adjusting device for applying a stress on the diaphragm to maintain the arc shape of the diaphragm, and is disposed on the exhaust chamber to control static pressure of the air exhaust in the exhaust chamber.
摘要翻译：一种用于控制处理区域的排气系统和微型排气静压控制装置。微型排气静压控制装置具有排气室和自动释放阻尼装置。排气室具有连接到处理区域的空气入口，其接收来自处理区域的空气排出物，以及排气口排出空气。自动释放阻尼装置具有预制应力为具有弹性系数的弧形的隔膜和用于在隔膜上施加应力以保持隔膜的弧形的调节装置，并且设置在排气室上以控制静电排气室中排气的压力。

4. 发明授权

US06775918B2 Wafer cassette pod equipped with position sensing device 失效
标题翻译：晶圆盒带有位置传感装置
公开(公告)号：US06775918B2
公开(公告)日：2004-08-17
申请号：US10072243
申请日：2002-02-06
申请人： Hisen-Hwa Tseng , Chia-Hung Chung , Ming-Chien Wen
发明人： Hisen-Hwa Tseng , Chia-Hung Chung , Ming-Chien Wen
IPC分类号： G01D2100
CPC分类号： H01L21/67259 , H01L21/67772 , Y10S414/14
摘要： A wafer cassette pod that is equipped with at least one position sensing device to avoid the accidental falling of a cassette pod door resulting in wafer breakage. The wafer cassette pod is provided with at least one position sensing device mounted in the sidewall of the cassette pod with a finger member protruding from the end surface of the sidewall forming the cassette pod opening. When the wafer cassette pod is not properly positioned, or docked on the loadport, the spring force of the position sensing device pushes the cassette pod away from the entrance of the loadport and thus, preventing the accidental falling of a cassette pod poor resulting in possible wafer breakage problems.
摘要翻译：配备有至少一个位置检测装置的晶片盒盒，以避免盒式荚门的意外坠落导致晶片断裂。晶片盒盒设置有至少一个位置感测装置，其安装在盒式盒的侧壁中，其中指状构件从形成盒式盒开口的侧壁的端面突出。当晶片盒盒未正确定位或对接在装载端口上时，位置检测装置的弹簧力将盒式盒体推离装载口的入口，从而防止盒式磁带盒意外掉落，从而导致可能的晶片破损问题。

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