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1. 发明授权

US08101531B1 Plasma-activated deposition of conformal films 有权
标题翻译：等离子体活化沉积的保形膜
公开(公告)号：US08101531B1
公开(公告)日：2012-01-24
申请号：US12889132
申请日：2010-09-23
申请人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
发明人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
IPC分类号： H01L21/469
CPC分类号： H01L21/02164 , C23C16/045 , C23C16/402 , C23C16/45538 , H01L21/02274
摘要： Methods and hardware for depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method for forming a thin conformal film comprises, in a first phase, generating precursor radicals off of a surface of the substrate and adsorbing the precursor radicals to the surface to form surface active species; in a first purge phase, purging residual precursor from the process station; in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the surface active species and generate the thin conformal film; and in a second purge phase, purging residual reactant from the process station.
摘要翻译：本文描述了使用等离子体激活的保形膜沉积（CFD）工艺沉积薄保形膜的方法和硬件。在一个实例中，形成薄保形膜的方法包括在第一阶段中从衬底的表面产生前体自由基并将前体基团吸附到表面以形成表面活性物质; 在第一清洗阶段，从处理站清除残余前体; 在第二阶段中，将反应性等离子体供应到所述表面，所述反应性等离子体被配置成与所述表面活性物质反应并产生所述薄的保形膜; 并且在第二吹扫阶段，从处理站清除残留的反应物。

2. 发明授权

US08728956B2 Plasma activated conformal film deposition 有权
标题翻译：等离子体激活的保形膜沉积
公开(公告)号：US08728956B2
公开(公告)日：2014-05-20
申请号：US13084399
申请日：2011-04-11
申请人： Adrien LaVoie , Shankar Swaminathan , Hu Kang , Ramesh Chandrasekharan , Tom Dorsh , Dennis M. Hausmann , Jon Henri , Thomas Jewell , Ming Li , Bryan Schlief , Antonio Xavier , Thomas W. Mountsier , Bart J. van Schravendijk , Easwar Srinivasan , Mandyam Sriram
发明人： Adrien LaVoie , Shankar Swaminathan , Hu Kang , Ramesh Chandrasekharan , Tom Dorsh , Dennis M. Hausmann , Jon Henri , Thomas Jewell , Ming Li , Bryan Schlief , Antonio Xavier , Thomas W. Mountsier , Bart J. van Schravendijk , Easwar Srinivasan , Mandyam Sriram
IPC分类号： H01L21/31
CPC分类号： H01L21/0228 , C23C16/045 , C23C16/345 , C23C16/402 , C23C16/45523 , C23C16/4554 , C23C16/56 , H01L21/02164 , H01L21/0217 , H01L21/02274 , H01L21/02348 , H01L21/28562 , H01L21/67017 , H01L21/6719 , H01L21/67201 , H01L21/76224 , H01L21/76825 , H01L21/76826 , H01L21/76829 , H01L21/76837 , H01L21/76898
摘要： Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
摘要翻译：在基材表面上沉积膜的方法包括表面介导的反应，其中膜在反应物吸附和反应的一个或多个循环上生长。在一个方面，该方法的特征在于以下操作：（a）在允许第一反应物吸附到基底表面上的条件下，将气相底物表面暴露于第一反应物; （b）当所述第一反应物吸附在所述基材表面上时，将所述基材表面暴露于气相中的第二反应物; 和（c）将衬底表面暴露于等离子体以驱动吸附在衬底表面上的第一和第二反应物之间的反应以形成膜。

3. 发明授权

US08524612B2 Plasma-activated deposition of conformal films 有权
标题翻译：等离子体活化沉积的保形膜
公开(公告)号：US08524612B2
公开(公告)日：2013-09-03
申请号：US13011569
申请日：2011-01-21
申请人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
发明人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
IPC分类号： H01L21/31 , H01L21/469 , H01L21/44
CPC分类号： H01L21/02104 , C23C16/401 , C23C16/45531 , C23C16/45534 , C23C16/45542 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/76898
摘要： Embodiments related to depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method of processing a substrate includes, applying photoresist to the substrate, exposing the photoresist to light via a stepper, patterning the resist with a pattern and transferring the pattern to the substrate, selectively removing photoresist from the substrate, placing the substrate into a process station, and, in the process station, in a first phase, generating radicals off of the substrate and adsorbing the radicals to the substrate to form active species, in a first purge phase, purging the process station, in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the active species and generate the film, and in a second purge phase, purging the process station.
摘要翻译：本文描述了使用等离子体激活的保形膜沉积（CFD）工艺沉积薄保形膜的实施例。在一个实例中，处理衬底的方法包括：将光致抗蚀剂施加到衬底，通过步进器将光致抗蚀剂曝光，将图案图案化并将图案转移到衬底，从衬底选择性地去除光致抗蚀剂，底物进入处理站，并且在处理站中，在第一阶段中，在第一阶段中产生自由基，并且将基团吸附到基底上以形成活性物质，在第一清洗阶段中，在第二阶段中以第二阶段净化处理站将反应性等离子体供应到所述表面，所述反应性等离子体被配置为与所述活性物质反应并产生所述膜，并且在第二清除阶段中清除所述处理站。

4. 发明申请

US20120077349A1 PLASMA-ACTIVATED DEPOSITION OF CONFORMAL FILMS 有权
标题翻译：等离子体活化沉积膜
公开(公告)号：US20120077349A1
公开(公告)日：2012-03-29
申请号：US13011569
申请日：2011-01-21
申请人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
发明人： Ming Li , Hu Kang , Mandyam Sriram , Adrien LaVoie
IPC分类号： H01L21/383
CPC分类号： H01L21/02104 , C23C16/401 , C23C16/45531 , C23C16/45534 , C23C16/45542 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/76898
摘要： Embodiments related to depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method of processing a substrate includes, applying photoresist to the substrate, exposing the photoresist to light via a stepper, patterning the resist with a pattern and transferring the pattern to the substrate, selectively removing photoresist from the substrate, placing the substrate into a process station, and, in the process station, in a first phase, generating radicals off of the substrate and adsorbing the radicals to the substrate to form active species, in a first purge phase, purging the process station, in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the active species and generate the film, and in a second purge phase, purging the process station.
摘要翻译：本文描述了使用等离子体激活的保形膜沉积（CFD）工艺沉积薄保形膜的实施例。在一个实例中，处理衬底的方法包括：将光致抗蚀剂施加到衬底，通过步进器将光致抗蚀剂曝光，将图案图案化并将图案转移到衬底，从衬底选择性地去除光致抗蚀剂，底物进入处理站，并且在处理站中，在第一阶段中，在第一阶段中产生自由基，并且将基团吸附到基底上以形成活性物质，在第一清洗阶段中，在第二阶段中以第二阶段净化处理站将反应性等离子体供应到所述表面，所述反应性等离子体被配置为与所述活性物质反应并产生所述膜，并且在第二清除阶段中清除所述处理站。

5. 发明申请

US20110256726A1 PLASMA ACTIVATED CONFORMAL FILM DEPOSITION 有权
标题翻译：等离子体激活的合成膜沉积
公开(公告)号：US20110256726A1
公开(公告)日：2011-10-20
申请号：US13084399
申请日：2011-04-11
申请人： Adrien LaVoie , Shankar Swaminathan , Hu Kang , Ramesh Chandrasekharan , Tom Dorsh , Dennis M. Hausmann , Jon Henri , Thomas Jewell , Ming Li , Bryan Schlief , Antonio Xavier , Thomas W. Mountsier , Bart J. van Schravendijk , Easwar Srinivasan , Mandyam Sriram
发明人： Adrien LaVoie , Shankar Swaminathan , Hu Kang , Ramesh Chandrasekharan , Tom Dorsh , Dennis M. Hausmann , Jon Henri , Thomas Jewell , Ming Li , Bryan Schlief , Antonio Xavier , Thomas W. Mountsier , Bart J. van Schravendijk , Easwar Srinivasan , Mandyam Sriram
IPC分类号： H01L21/311 , H01L21/31 , H01L21/306 , C23F1/02 , B05C5/00 , B32B38/08
CPC分类号： H01L21/0228 , C23C16/045 , C23C16/345 , C23C16/402 , C23C16/45523 , C23C16/4554 , C23C16/56 , H01L21/02164 , H01L21/0217 , H01L21/02274 , H01L21/02348 , H01L21/28562 , H01L21/67017 , H01L21/6719 , H01L21/67201 , H01L21/76224 , H01L21/76825 , H01L21/76826 , H01L21/76829 , H01L21/76837 , H01L21/76898
摘要： Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.
摘要翻译：在基材表面上沉积膜的方法包括表面介导的反应，其中膜在反应物吸附和反应的一个或多个循环上生长。在一个方面，该方法的特征在于以下操作：（a）在允许第一反应物吸附到基底表面上的条件下，将气相底物表面暴露于第一反应物; （b）当所述第一反应物吸附在所述基材表面上时，将所述基材表面暴露于气相中的第二反应物; 和（c）将衬底表面暴露于等离子体以驱动吸附在衬底表面上的第一和第二反应物之间的反应以形成膜。

6. 发明授权

US08349222B2 Twisted π-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices 有权
标题翻译：具有非常大的分子超极化率和相关组成和装置的双绞电极系发色团化合物
公开(公告)号：US08349222B2
公开(公告)日：2013-01-08
申请号：US13169638
申请日：2011-06-27
申请人： Tobin J. Marks , Hu Kang
发明人： Tobin J. Marks , Hu Kang
IPC分类号： G02B5/23 , F21V9/00
CPC分类号： C09B23/148 , C09B23/105 , C09B23/145
摘要： Unconventional twisted π-electron system electro-optic (EO) chromophores/compounds, compositions and related device structures. Crystallographic analysis of several non-limiting chromophores reveals, for instance, large ring-ring dihedral twist angles and a highly charge-separated zwitterionic structure in the ground state, in both solution phase and solid-state.
摘要翻译：非常规扭曲和电子系统电光（EO）发色团/化合物，组合物和相关器件结构。几种非限制性发色团的晶体学分析揭示了在溶液相和固体状态下，在基态下，大环环二面扭转角和高电荷分离的两性离子结构。

7. 发明申请

US20110278512A1 Twisted Pi-Electron System Chromophore Compounds with Very Large Molecular Hyperpolarizabilities and Related Compositions and Devices 有权
标题翻译：具有非常大的分子超极化性和相关组合物和器件的双绞π电子系统发色团化合物
公开(公告)号：US20110278512A1
公开(公告)日：2011-11-17
申请号：US13169638
申请日：2011-06-27
申请人： Tobin J. Marks , Hu Kang
发明人： Tobin J. Marks , Hu Kang
IPC分类号： G02B5/23 , C07D213/57
CPC分类号： C09B23/148 , C09B23/105 , C09B23/145
摘要： Unconventional twisted π-electron system electro-optic (EO) chromophores/compounds, compositions and related device structures. Crystallographic analysis of several non-limiting chromophores reveals, for instance, large ring-ring dihedral twist angles and a highly charge-separated zwitterionic structure in the ground state, in both solution phase and solid-state.
摘要翻译：非常规扭曲和电子系统电光（EO）发色团/化合物，组合物和相关器件结构。几种非限制性发色团的晶体学分析揭示了在溶液相和固体状态下，在基态下，大环环二面扭转角和高电荷分离的两性离子结构。

8. 发明授权

US07824582B2 Twisted π-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices 有权
标题翻译：具有非常大的分子超极化率和相关组成和装置的双绞电极系发色团化合物
公开(公告)号：US07824582B2
公开(公告)日：2010-11-02
申请号：US11389429
申请日：2006-03-24
申请人： Tobin J. Marks , Hu Kang
发明人： Tobin J. Marks , Hu Kang
IPC分类号： G02B5/23 , F21V9/00
CPC分类号： C09B23/148 , C09B23/105 , C09B23/145
摘要： Unconventional twisted π-electron system electro-optic (EO) chromophores/compounds, compositions and related device structures. Crystallographic analysis of several non-limiting chromophores reveals, for instance, large ring-ring dihedral twist angles and a highly charge-separated zwitterionic structure in the ground state, in both solution phase and solid-state.
摘要翻译：非常规扭曲和电子系统电光（EO）发色团/化合物，组合物和相关器件结构。几种非限制性发色团的晶体学分析揭示了在溶液相和固体状态下，在基态下，大环环二面扭转角和高电荷分离的两性离子结构。

9. 发明授权

US07968016B2 Twisted π-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices 有权
标题翻译：具有非常大的分子超极化率和相关组成和装置的双绞电极系发色团化合物
公开(公告)号：US07968016B2
公开(公告)日：2011-06-28
申请号：US12814966
申请日：2010-06-14
申请人： Tobin J. Marks , Hu Kang
发明人： Tobin J. Marks , Hu Kang
IPC分类号： G02B5/23 , F21V9/00
CPC分类号： C09B23/148 , C09B23/105 , C09B23/145
摘要： Unconventional twisted π-electron system electro-optic (EO) chromophores/compounds, compositions and related device structures. Crystallographic analysis of several non-limiting chromophores reveals, for instance, large ring-ring dihedral twist angles and a highly charge-separated zwitterionic structure in the ground state, in both solution phase and solid-state.
摘要翻译：非常规扭曲和电子系统电光（EO）发色团/化合物，组合物和相关器件结构。几种非限制性发色团的晶体学分析揭示了在溶液相和固体状态下，在基态下，大环环二面扭转角和高电荷分离的两性离子结构。

10. 发明申请

US20100273919A1 TWISTED PI-ELECTRON SYSTEM CHROMOPHORE COMPOUNDS WITH VERY LARGE MOLECULAR HYPERPOLARIZABILITIES AND RELATED COMPOSITIONS AND DEVICES 有权
标题翻译：具有非常大的分子高分子化合物和相关组合物和器件的双向PI电子系统色素化合物
公开(公告)号：US20100273919A1
公开(公告)日：2010-10-28
申请号：US12814966
申请日：2010-06-14
申请人： Tobin J. Marks , Hu Kang
发明人： Tobin J. Marks , Hu Kang
IPC分类号： C08K5/3432 , C07D213/24 , C07D213/55
CPC分类号： C09B23/148 , C09B23/105 , C09B23/145
摘要： Unconventional twisted π-electron system electro-optic (EO) chromophores/compounds, compositions and related device structures. Crystallographic analysis of several non-limiting chromophores reveals, for instance, large ring-ring dihedral twist angles and a highly charge-separated zwitterionic structure in the ground state, in both solution phase and solid-state.
摘要翻译：非常规扭曲和电子系统电光（EO）发色团/化合物，组合物和相关器件结构。几种非限制性发色团的晶体学分析揭示了在溶液相和固体状态下，在基态下，大环环二面扭转角和高电荷分离的两性离子结构。

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