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1. 发明授权

US4611314A Method for accessing to a rotating record medium and an access control system 失效
标题翻译：用于访问旋转记录介质和访问控制系统的方法
公开(公告)号：US4611314A
公开(公告)日：1986-09-09
申请号：US483175
申请日：1983-04-08
申请人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki
发明人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki
IPC分类号： G06F3/06 , G11B7/004 , G11B7/085 , G11B17/00 , G11B20/12 , G11B20/18 , G11B27/10 , G11B27/30 , G11B7/013
CPC分类号： G11B20/1883 , G06F3/06 , G11B17/005 , G11B20/1252 , G11B20/1833 , G11B27/105 , G11B27/3027 , G11B7/004 , G11B7/08505 , G11B20/1879 , G11B2220/20 , G11B2220/2537
摘要： In an information storage system including a rotating recording medium having a number of information tracks, a head positioning mechanism for switching access position between adjacent tracks and a plurality of buffer memories each capable of storing one track of data, an alternate record area for storing data in substitution for an error data block is provided at an end of each of the tracks of the recording medium, and if an error data block is detected by a read-after-write check of the data during the rotation of the disc after the data has been written in one of the tracks from one of the buffer memories during the previous rotation of the disc, the data from the other buffer memory is written in the adjacent track or the data is read from the adjacent track and checked during a disc rotation waiting time required before the data write operation to the alternate record area is started.
摘要翻译：在包括具有多个信息轨道的旋转记录介质的信息存储系统中，用于切换相邻轨道之间的存取位置的头部定位机构以及能够存储数据轨道的多个缓冲存储器，用于存储数据的备用记录区域代替在记录介质的每个轨道的末端提供错误数据块，并且如果在数据的旋转之后通过盘的旋转期间的数据的读写后检查来检测到错误数据块已经在盘的先前旋转期间从缓冲存储器中的一个缓冲存储器中的一个轨迹写入，来自另一个缓冲存储器的数据被写入相邻轨道中，或者数据从相邻轨道读取并且在盘旋转期间被检查在开始对备用记录区进行数据写入操作之前所需的等待时间。

2. 发明授权

US4677606A Data recording and reproducing method 失效
标题翻译：数据记录和再现方法
公开(公告)号：US4677606A
公开(公告)日：1987-06-30
申请号：US641176
申请日：1984-08-15
申请人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki
发明人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki
IPC分类号： G11B7/013 , G11B20/12 , G11B20/18 , G11B27/30 , G11B15/52 , H04N5/76
CPC分类号： G11B7/24085 , G11B20/1252 , G11B20/1809 , G11B27/3027 , G11B2220/20 , G11B2220/2537
摘要： A data recording/reproducing method for a non-rewritable recording medium of a rotating type, each of tracks on the recording medium is divided into a plurality of blocks which are allotted with respective addresses. Each block includes a data recording area and a deletion flag area which is divided into a plurality of sub-areas. One of the sub-areas in a given block is associated with other block which is in a predetermined address relation with the given block. When the content in the data recording area of one block on the recording medium is to be rendered invalid, deletion flag information is also recorded in the sub-area of the other block having the predetermined address relation with the one block. Upon reading, the data of the blocks read out from the recording medium exclusive of the data of the block determined to be invalid on the basis of the flag information is transferred to a high-rank system.
摘要翻译：用于旋转型不可重写记录介质的数据记录/再现方法，记录介质上的每个磁道被分成多个分配有相应地址的块。每个块包括被划分成多个子区域的数据记录区域和删除标志区域。给定块中的一个子区域与与给定块处于预定地址关系的其他块相关联。当记录介质上的一个块的数据记录区域中的内容将被无效时，删除标志信息也被记录在具有与该块的预定地址关系的另一个块的子区域中。在读取时，除了基于标志信息确定为无效的块的数据之外，从记录介质读出的块的数据被传送到高等级系统。

3. 发明授权

US4638472A Information recording system and method for using alternative record area in writing and reading of data on optical disk 失效
标题翻译：信息记录系统和方法，用于在光盘上写入和读取数据时使用替代记录区
公开(公告)号：US4638472A
公开(公告)日：1987-01-20
申请号：US587961
申请日：1984-03-09
申请人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki , Takafumi Oka
发明人： Mikito Ogata , Masahito Mori , Takashi Doi , Michio Miyazaki , Takafumi Oka
IPC分类号： G11B20/18 , G11B20/12
CPC分类号： G11B20/1883 , G11B20/1816 , G11B20/1833 , G11B2020/183 , G11B2220/20
摘要： An information recording method and system for writing information onto a recording medium. If an error area is detected in a check of the information read out of the medium after writing, the information is rewritten onto an alternative area on the recording medium using a buffer memory while the information in the error area is kept valid. Loss time accessing the alternative area is eliminated until the error checking and correction in the error checking and correction circuit is not available for the information read out of the error area through a reading circuit.
摘要翻译：一种用于将信息写入记录介质的信息记录方法和系统。如果在写入之后在从介质读出的信息的检查中检测到错误区域，则在误差区域中的信息保持有效的同时，使用缓冲存储器将信息重写到记录介质上的替代区域上。消除访问替代区域的丢失时间，直到错误检查和校正电路中的错误检查和校正不能通过读取电路读出错误区域的信息。

4. 发明授权

US08546266B2 Plasma processing method and plasma processing apparatus 有权
公开(公告)号：US08546266B2
公开(公告)日：2013-10-01
申请号：US13212909
申请日：2011-08-18
申请人： Masahito Mori , Naoyuki Kofuji , Naoshi Itabashi
发明人： Masahito Mori , Naoyuki Kofuji , Naoshi Itabashi
IPC分类号： H01L21/302
CPC分类号： H01J37/32798 , C23F4/00 , H01J37/32009 , H01J37/32183 , H01J37/32706 , H01L21/31116 , H01L21/31138 , H01L21/32136 , H01L21/32137 , H01L29/517
摘要： The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor 107, a lower electrode 113 placed within a processing chamber of the vacuum reactor and having a wafer 112 to be etched mounted on the upper surface thereof, bias supplying units 118 and 120 for supplying high frequency power for forming a bias potential to the lower electrode 113, a gas supply means 111 for feeding reactive gas into the processing chamber, an electric field supplying means 101 through 103 for supplying a magnetic field for generating plasma in the processing chamber, and a control unit 127 for controlling the distribution of ion energy in the plasma being incident on the wafer 112 via the high frequency power.

5. 发明申请

US20080038329A1 T-CELL ACTIVATING AGENT 审中-公开
标题翻译： T细胞活化剂
公开(公告)号：US20080038329A1
公开(公告)日：2008-02-14
申请号：US11836514
申请日：2007-08-09
申请人： Tetsuya Uchida , Masahito Mori , Hiroshi Oda
发明人： Tetsuya Uchida , Masahito Mori , Hiroshi Oda
IPC分类号： A61K9/127 , A61K39/00 , A61P37/00
CPC分类号： A61K9/127 , A61K39/385 , A61K39/39 , A61K2039/55555 , Y02A50/386 , Y02A50/388 , Y02A50/39 , Y02A50/412 , Y02A50/466
摘要： The present invention provides a T cell activator comprising an antigen-bound phospholipid membrane, wherein the phospholipid membrane comprises a phospholipid having an acyl group having one unsaturated bond and 14 to 24 carbon atoms or a hydrocarbon group having one unsaturated bond and 14 to 24 carbon atoms, and a phospholipid membrane stabilizer, and wherein the antigen is bound to the surface of the phospholipid membrane.
摘要翻译：本发明提供一种包含抗原结合磷脂膜的T细胞活化剂，其中磷脂膜包含具有一个不饱和键和14-24个碳原子的酰基或具有一个不饱和键的烃基和14-24个碳原子的磷脂原子和磷脂膜稳定剂，并且其中所述抗原结合到磷脂膜的表面。

6. 发明申请

US20070232067A1 Semiconductor Fabrication Method and Etching System 审中-公开
标题翻译：半导体制造方法和蚀刻系统
公开(公告)号：US20070232067A1
公开(公告)日：2007-10-04
申请号：US11692241
申请日：2007-03-28
申请人： Kousa Hirota , Masahito Mori , Naoyuki Kofuji , Naoshi Itabashi , Toshio Masuda
发明人： Kousa Hirota , Masahito Mori , Naoyuki Kofuji , Naoshi Itabashi , Toshio Masuda
IPC分类号： H01L21/302
CPC分类号： H01L21/32139 , H01L21/28123
摘要： The invention provides a semiconductor fabrication method comprising a deposition step for depositing a laminated film on a semiconductor substrate having a region in which a mask pattern is formed sparsely and a region in which the mask pattern is formed densely, a lithography step s1 for forming a mask pattern, a cleaning step S11C for removing deposits in the apparatus, a trimming step S3 for trimming the mask pattern, and dry etching steps S4 and S5 for transferring the mask pattern on the laminated film, wherein a seasoning step S11S followed by a deposition step S2 is introduced either before or after the trimming step S3.
摘要翻译：本发明提供了一种半导体制造方法，包括：沉积步骤，用于在具有稀疏形成掩模图案的区域的半导体衬底上沉积层压膜，以及密集形成掩模图案的区域;用于形成的光刻步骤s1 掩模图案，用于去除设备中的沉积物的清洁步骤S111，用于修整掩模图案的修整步骤S3以及用于将掩模图案转印到层压膜上的干蚀刻步骤S 4和S 5，其中调味在修整步骤S 3之前或之后引入步骤S11A，然后进行沉积步骤S2。

7. 发明授权

US06927173B2 Plasma processing method 失效
标题翻译：等离子体处理方法
公开(公告)号：US06927173B2
公开(公告)日：2005-08-09
申请号：US10315054
申请日：2002-12-10
申请人： Masahito Mori , Shinichi Tachi , Kenetsu Yokogawa
发明人： Masahito Mori , Shinichi Tachi , Kenetsu Yokogawa
IPC分类号： H01L21/3065 , H01J37/32 , H01L21/311 , H01L21/3213 , H01L21/302
CPC分类号： H01J37/32871 , H01L21/31116 , H01L21/32136
摘要： Because of environmental pollution prevention laws, PFC (perfluorocarbon) and HFC (hydrofluorocarbon), both etching gases for silicon oxide and silicon nitride films, are expected to be subjected to limited use or become difficult to obtain in the future. An etching gas containing fluorine atoms is introduced into a plasma chamber. In a region where plasma etching takes place, the fluorine-containing gas plasma is made to react with solid-state carbon in order to produce molecular chemical species such as CF4, CF2, CF3 and C2F4 for etching. This method assures a high etch rate and high selectivity while keeping a process window wide.
摘要翻译：由于环境污染防治法，PFC（全氟化碳）和HFC（氢氟碳化合物）两种氧化硅和氮化硅膜的蚀刻气体预计将受到有限的使用或将来难以获得。含有氟原子的蚀刻气体被引入到等离子体室中。在进行等离子体蚀刻的区域中，使含氟气体等离子体与固态碳反应，以产生分子化学物质，例如CF 4，CF 2， SUB 3，CF 3 3和C 2 F 4 S 3用于蚀刻。该方法确保了高蚀刻速率和高选择性，同时保持了工艺窗口宽。

8. 发明授权

US06770357B2 Precoated skin material for automobile interior part 有权
标题翻译：汽车内饰部分预涂皮肤材料
公开(公告)号：US06770357B2
公开(公告)日：2004-08-03
申请号：US10304068
申请日：2002-11-26
申请人： Hirokazu Okamoto , Masahito Mori
发明人： Hirokazu Okamoto , Masahito Mori
IPC分类号： B32B712
CPC分类号： C08F8/30 , C08L23/10 , C08L23/147 , C08L51/00 , C08L51/06 , C08L53/02 , C08L79/02 , C08L2205/03 , C08L2312/00 , Y10T428/249982 , Y10T428/249983 , Y10T428/249985 , C08L2666/02 , C08L2666/20
摘要： A precoated skin material for an automobile interior part comprising (a) a skin material for an automobile interior part and (b) a one-pack type thermally crosslinkable polymer composition comprising (i) a thermoplastic olefinic polymer having a carboxylic acid group or an acid anhydride group, (ii) a latent curing agent, (iii) a carbonyl compound as a solvent and (iv) a tackifier, which composition is coated on the back surface of the skin material, wherein the latent curing agent is a solid polyamine having a melting point of 80 to 200° C. which form hydrolyzable reaction products by a condensation reaction with the carbonyl compound used as the solvent, or a hydrolyzable reaction product of a diamine with a carbonyl compound.
摘要翻译：一种用于汽车内部部件的预涂皮肤材料，其包含（a）用于汽车内部部件的表皮材料和（b）单组分型热交联聚合物组合物，其包含（i）具有羧酸基或酸的热塑性烯烃聚合物酸酐基，（ii）潜在性固化剂，（iii）作为溶剂的羰基化合物和（iv）增粘剂，所述组合物涂覆在表皮材料的背面，其中所述潜在性固化剂是具有通过与用作溶剂的羰基化合物进行缩合反应形成可水解反应产物，或二胺与羰基化合物的可水解反应产物的熔点为80-200℃。

9. 发明授权

US5891252A Plasma processing apparatus 失效
公开(公告)号：US5891252A
公开(公告)日：1999-04-06
申请号：US766818
申请日：1996-12-13
申请人： Ken'etsu Yokogawa , Tetsuo Ono , Kazunori Tsujimoto , Naoshi Itabashi , Masahito Mori , Shinichi Tachi , Keizo Suzuki
发明人： Ken'etsu Yokogawa , Tetsuo Ono , Kazunori Tsujimoto , Naoshi Itabashi , Masahito Mori , Shinichi Tachi , Keizo Suzuki
IPC分类号： C23C16/00 , H01J37/32
CPC分类号： H01J37/3222 , H01J37/32082 , H01J37/32678 , H01J2237/3341
摘要： A plasma processing apparatus in which power consumption is reduced, which can generate uniform plasma in a large range and in which minute processing in high etching selectivity and in high aspect ratio is enabled is disclosed. High density plasma is generated in a vacuum vessel housing a processed sample utilizing an electron cyclotron resonance phenomenon caused by an electromagnetic wave in an ultra-high frequency band and a magnetic field and the surface of the processed sample is etched using this plasma. An electromagnetic wave in an ultra-high frequency band for generating plasma is radiated from a planar conductive plate consisting of graphite or silicon which is arranged opposite to the surface of the processed sample into space inside the vacuum vessel. High density plasma in the low degree of dissociation can be generated by using an electromagnetic wave in an ultra-high frequency band and as a result, the controllability of etching reaction can be enhanced. Further, a radical effective in etching can be increased by reaction between the surface of a planar conductive plate for radiating an electromagnetic wave and plasma.

10. 发明授权

US5112911A Moisture-crosslinkable primer composition 失效
标题翻译：水分可交联聚合物组合物
公开(公告)号：US5112911A
公开(公告)日：1992-05-12
申请号：US662499
申请日：1991-02-28
申请人： Masahito Mori , Kohske Torii , Hirokazu Okamoto
发明人： Masahito Mori , Kohske Torii , Hirokazu Okamoto
IPC分类号： C09D5/00 , C08F8/42 , C08G59/20 , C08G59/30 , C09D153/00 , C09J5/02 , C09J153/00 , C09J163/00
CPC分类号： C08F8/42 , C09J153/00
摘要： The invention relates to a moisture-curable primer composition comprising a reaction product between a maleic anhydride-modified styrene-ethylene-butene-styrene copolymer and an epoxysilane compound. This primer composition is particularly useful for the bonding of polyolefin adherents.
摘要翻译：本发明涉及包含马来酸酐改性的苯乙烯 - 乙烯 - 丁烯 - 苯乙烯共聚物和环氧硅烷化合物之间的反应产物的湿气固化底漆组合物。该底漆组合物特别可用于粘合聚烯烃粘合剂。

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