专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4564281A Signal selector for automatic exposure apparatus of camera 失效
标题翻译：相机自动曝光装置的信号选择器
公开(公告)号：US4564281A
公开(公告)日：1986-01-14
申请号：US671024
申请日：1984-11-14
申请人： Mikio Takemae , Sakuji Watanabe , Yuji Okubo
发明人： Mikio Takemae , Sakuji Watanabe , Yuji Okubo
IPC分类号： G03B7/087 , G03B7/081 , G03B17/18 , H03K5/22
CPC分类号： G03B7/087
摘要： A camera includes an exposing device for exposing a photosensitive member with light from an object through an aperture, a detecting device for detecting an object brightness, a controlling device for controlling the exposing device and the aperture so as to obtain a proper exposure of the photosensitive member, a first signal producing device for producing a first signal, a second signal producing device for producing a second signal, a third signal producing device for producing a third signal, and a signal selecting device for selecting one of the first, second and third signals. The controlling device sets an aperture diameter and an exposure time to have a first, second or third relation in accordance with the first, second or third signal when the signal selecting device selects the first, second or third signal, in the order named.
摘要翻译：照相机包括曝光装置，用于通过光圈使来自物体的光曝光感光构件，用于检测物体亮度的检测装置，用于控制曝光装置和光圈的控制装置，以便获得感光体的适当曝光用于产生第一信号的第一信号产生装置，用于产生第二信号的第二信号产生装置，用于产生第三信号的第三信号产生装置，以及用于选择第一，第二和第三信号中的一个的信号选择装置，信号。当信号选择装置按照命名的顺序选择第一信号，第二信号或第三信号时，控制装置根据第一，第二或第三信号，设定开口直径和曝光时间以具有第一，第二或第三信号。

2. 发明授权

US4509847A Automatic exposure control camera having a low brightness warning device 失效
标题翻译：具有低亮度警告装置的自动曝光控制摄像机
公开(公告)号：US4509847A
公开(公告)日：1985-04-09
申请号：US491303
申请日：1983-05-03
申请人： Osamu Maida , Mikio Takemae , Yuji Okubo
发明人： Osamu Maida , Mikio Takemae , Yuji Okubo
IPC分类号： G03G15/20 , G03B7/081 , G03B7/087 , G03B17/18
CPC分类号： G03B7/083
摘要： A camera in which light-sensing means is exposed to the light from an object to be photographed passed through stop means includes means for setting the aperture value of the stop means, means for driving the stop means in a direction in which the aperture value of the stop means is coincident with the aperture value by the setting means, prior to the exposure of the light-sensing means, metering means including a light-receiving element adapted to receive the light from the object passed through the stop means and produce an output corresponding to the intensity of the received light, the metering means producing a metering output corresponding to the brightness of the object on the basis of the output of the light-receiving element, means for controlling the exposure time of the light-sensing means in order that the light-sensing means may obtain a proper exposure, on the basis of the metering output after the stop means has been driven by the driving means, and discriminating means for discriminating, prior to the driving of the stop means, that the intensity of the light received by the light-receiving element after the termination of the driving of the stop means is lower than a predetermined value, on the basis of the metering output before the stop means is driven by the driving means, and putting out a discrimination signal.
摘要翻译：其中光检测装置暴露于待拍摄对象的光通过停止装置的照相机包括用于设定停止装置的光圈值的装置，用于沿光圈值的方向驱动停止装置的装置，停止装置与设置装置的孔径值一致，在曝光光检测装置之前，计量装置包括适于接收来自通过停止装置的物体的光的光接收元件，并产生输出对应于所接收的光的强度，所述计量装置根据所述光接收元件的输出产生对应于所述物体的亮度的计量输出，用于依次控制所述光感测装置的曝光时间的装置光敏装置可以在停止装置被驱动装置驱动之后的计量输出的基础上获得适当的曝光，以及鉴别装置用于在停止装置的驱动之前鉴别在停止装置的驱动终止之后由光接收元件接收的光的强度低于预定值，基于之前的计量输出停止装置由驱动装置驱动，并且放出鉴别信号。

3. 发明授权

US4497564A Exposure mode setting device in an exposure control apparatus of a camera 失效
标题翻译：照相机的曝光控制装置中的曝光模式设定装置
公开(公告)号：US4497564A
公开(公告)日：1985-02-05
申请号：US513406
申请日：1983-07-14
申请人： Hiroshi Meguro , Yuji Okubo , Sakuji Watanabe
发明人： Hiroshi Meguro , Yuji Okubo , Sakuji Watanabe
IPC分类号： G03B7/083 , G03B7/089 , G03B17/00
CPC分类号： G03B7/083
摘要： An exposure control apparatus of a camera comprises exposure control device adjusted to control the quantity of light applied onto a photosensitive film, a device for preparing a photometering output responsive to the quantity of light from an object to be photographed, the preparing device effective to prepare on the basis of the photometering output a first output used to adjust the exposure control device so that the quantity of light applied onto the film is proper, a device for setting the exposure amount by manual operation, the setting device being effective to prepare a second output used to adjust the exposure control device so that the set exposure amount is obtained, selecting device having a first selecting position for making the first output effective and a second selecting position for making the second output effective, in order to adjust the exposure control device, and operating device operated to store the photometering output, the operating device including change-over means operated when the selecting device is in the second selecting position to thereby act on the selecting device and make the first output instead of the second output effective.
摘要翻译：照相机的曝光控制装置包括被调整以控制施加到感光膜上的光量的曝光控制装置，响应于待拍摄物体的光量来制备测光输出的装置，有效准备的制备装置基于所述测光输出，用于调节所述曝光控制装置的第一输出使得施加到所述胶片上的光量适当，用于通过手动操作设定曝光量的装置，所述设定装置有效地准备第二输出用于调节曝光控制装置以获得设定曝光量，具有用于使第一输出有效的第一选择位置的选择装置和用于使第二输出有效的第二选择位置，以便调节曝光控制装置，并且操作装置操作以存储测光输出，所述操作装置包括变化o 当选择装置处于第二选择位置时，ver装置操作，从而作用于选择装置，并使第一输出代替第二输出有效。

4. 发明申请

US20140273400A1 RECLAIMING PROCESSING METHOD FOR DELAMINATED WAFER 有权
标题翻译：用于分层波的回收处理方法
公开(公告)号：US20140273400A1
公开(公告)日：2014-09-18
申请号：US14349133
申请日：2012-08-29
申请人： Toru Ishizuka , Yuji Okubo , Takuya Sasaki , Akira Araki , Nobuhiko Noto
发明人： Toru Ishizuka , Yuji Okubo , Takuya Sasaki , Akira Araki , Nobuhiko Noto
IPC分类号： H01L21/02
CPC分类号： H01L21/02032 , H01L21/02087 , H01L21/76254
摘要： The invention provides a reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-produce at the time of producing a bonded wafer is subjected to reclaiming polishing and is again available as a bond wafer or a base wafer, wherein, in the reclaiming polishing, the delaminate wafer is polished with use of a double-side polisher in a state that oxide film is not formed on a delaminated surface of the delaminated wafer and oxide film is formed on a back side which is the opposite side of the delaminated surface. As a result, the reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-product at the time of manufacturing a bonded wafer based on an ion implantation delamination method is subjected to the reclaiming polishing, which enables sufficiently improving quality.
摘要翻译：本发明提供了一种用于分层晶片的回收处理方法，通过该回收处理方法将在制造接合晶片时作为副产物获得的分层晶片进行回收抛光，并且再次可用作接合晶片或基底晶片，其中在回收抛光中，在分层晶片的分层表面上没有形成氧化膜的状态下，使用双面抛光机对分层晶片进行研磨，氧化膜形成在相反侧的背面的分层表面。结果，对剥离晶片的回收处理方法进行回收抛光，通过该剥离处理方法可以将基于离子注入分层方法制造接合晶片时的副产品作为副产物晶片进行回收抛光，从而能够充分改善质量。

5. 发明授权

US4615601A Exposure control apparatus of a camera 失效
标题翻译：相机的曝光控制装置
公开(公告)号：US4615601A
公开(公告)日：1986-10-07
申请号：US685301
申请日：1984-12-24
申请人： Yuji Okubo
发明人： Yuji Okubo
IPC分类号： G03B7/28 , G03B7/089
CPC分类号： G03B7/089
摘要： An automatic exposure control apparatus for a camera has the shutter release button and the memory shutter release button as switches with slidable contacts, a photodetector for detecting brightness of an object, a capacitor for holding the detected photometric value of the photodetector, and a bias circuit. When the shutter release button is depressed by a first stroke, power is turned on. After framing for a memory lock, the first stroke depression of the shutter release button is released, and the memory lock button is depressed. An exposure memory lock is completed. After framing for photography, the memory lock button is depressed again. Thereafter, the shutter release button is depressed by the first stroke, and a picture is taken. When the shutter release button is released and the memory clock button is released, the exposure memory lock is maintained. The exposure value held by the capacitor can be cancelled when the shutter release button is depressed by the first stroke while the memory lock button is released.
摘要翻译：用于相机的自动曝光控制装置具有快门释放按钮和存储器快门释放按钮作为具有可滑动触点的开关，用于检测对象的亮度的光电检测器，用于保持检测到的光电检测器的测光值的电容器和偏置电路。当第一行程按下快门释放按钮时，电源打开。在成帧记忆锁定之后，快门释放按钮的第一次按压被释放，并且按下存储器锁定按钮。曝光记忆锁完成。在拍摄框架后，再次按下记忆锁定按钮。此后，通过第一行程按下快门释放按钮，并拍摄照片。当释放快门释放按钮并释放记忆时钟按钮时，会保持曝光记忆锁定。当存储器锁定按钮被释放时，当通过第一行程按下快门释放按钮时，可以取消由电容器保持的曝光值。

6. 发明授权

US4540266A Camera in which exposure is electrically and mechanically controllable 失效
标题翻译：曝光电气和机械可控的相机
公开(公告)号：US4540266A
公开(公告)日：1985-09-10
申请号：US579375
申请日：1984-02-13
申请人： Yuji Okubo
发明人： Yuji Okubo
IPC分类号： G03B7/00 , G03B7/091 , G03B7/26 , G03B7/08
CPC分类号： G03B7/093 , G03B7/0807
摘要： A camera in which exposure is controlled by the supply of power from a power source includes a first control device for electrically controlling the time of the exposure, a second control device for mechanically controlling the time of the exposure, a member for selecting one of the first and second control devices, the member being operable to set the time of the exposure, a device for making a binary code in response to the operating member, the binary code including information indicative of one of the first and second control devices selected by the operating member and information indicative of the time of the exposure set by the operating member, and a device for supplying a power from the power source to the first control device when the binary code indicates that the first control device has been selected by the operating member, the first control device being capable of controlling the time of the exposure when the power supply device supplies a power to the first control device.
摘要翻译：通过从电源供给来控制曝光的照相机包括用于电控制曝光时间的第一控制装置，用于机械地控制曝光时间的第二控制装置，用于选择曝光时间的部件第一和第二控制装置，该成员可操作以设定曝光的时间，响应于操作部件而制作二进制代码的装置，二进制代码包括指示由第一和第二控制装置选择的第一和第二控制装置之一的信息操作构件和指示由操作构件设定的曝光时间的信息，以及用于当二进制代码指示第一控制装置已被操作构件选择时从电源向第一控制装置供电的装置所述第一控制装置能够在所述电源装置向所述第一控制偏差提供电力时控制所述曝光的时间 ce。

7. 发明申请

US20070087421A1 Transformant and process for producing polyester using the same 审中-公开
标题翻译：使用该方法生产聚酯的转化剂和方法
公开(公告)号：US20070087421A1
公开(公告)日：2007-04-19
申请号：US10554934
申请日：2004-05-14
申请人： Yuji Okubo , Tetsuya Nagaoka , Satoru Yokomizo , Keiji Matsumoto , Masamichi Takagi , Akinori Ohta
发明人： Yuji Okubo , Tetsuya Nagaoka , Satoru Yokomizo , Keiji Matsumoto , Masamichi Takagi , Akinori Ohta
IPC分类号： C12P7/62 , C12N9/18 , C07H21/04 , C12N15/74 , C12N1/21
CPC分类号： C12N9/1025 , C12P7/625
摘要： A gene expression cassette comprising an Aeromonas caviae-origin polyhydroxyalkanoic acid (PHA) synthase gene having a mutation introduced thereinto and a promoter and a terminator acting in a yeast; a transformant constructed by transferring the above gene expression cassette into a yeast; and a process for producing a polyester using the above transformant. Thus, it becomes possible to efficiently produce a copolymerized polyester having a high biodegradability and excellent properties by copolymerizing 3-hydroxyalkanoic acids in a yeast.
摘要翻译：一种基因表达盒，其包含导入其中的突变的气单胞菌来源的聚羟基链烷酸（PHA）合酶基因和启动子和在酵母中起作用的终止子; 通过将上述基因表达盒转移到酵母中构建的转化体; 以及使用上述转化体生产聚酯的方法。因此，通过在酵母中共聚3-羟基链烷酸，能够有效地制造具有高生物降解性和优异性能的共聚聚酯。

8. 发明授权

US5902877A Adsorbent of interleukins, process for removing the same, and adsorber for the same 失效
标题翻译：白细胞介素的吸附剂，其除去方法和吸附剂
公开(公告)号：US5902877A
公开(公告)日：1999-05-11
申请号：US646266
申请日：1996-05-20
申请人： Fumiyasu Hirai , Nobutaka Tani , Takamune Yasuda , Takashi Asahi , Yuji Okubo , Osamu Odawara , Michio Nomura
发明人： Fumiyasu Hirai , Nobutaka Tani , Takamune Yasuda , Takashi Asahi , Yuji Okubo , Osamu Odawara , Michio Nomura
IPC分类号： B01J20/26 , B01J20/32 , C07K14/54 , A23J1/00
CPC分类号： B01J20/3212 , B01J20/26 , B01J20/3204 , B01J20/321 , B01J20/3251 , C07K14/54
摘要： The present invention relates to an adsorbent being capable of efficiently adsorbing and removing interleukins in a body fluid and to a method for adsorbing and removing, if necessary, and recovering interleukins in a body fluid with the above-mentioned adsorbent. According to the present invention, there are provided an adsorbent of interleukins which comprises a water-insoluble carrier having an anionic functional group, a method for adsorbing, removing and recovering interleukins using the same and an adsorber using the same.
摘要翻译： PCT No.PCT / JP95 / 01859 Sec。 371日期：1996年5月20日 102（e）日期1996年5月20日PCT提交1995年9月18日PCT公布。出版物WO96 / 09115 日期：1996年3月28日本发明涉及能够有效吸附和去除体液中的白细胞介素的吸附剂，如果需要，涉及吸附和除去体液中的白细胞介素的方法。根据本发明，提供一种白细胞介素的吸附剂，其包含具有阴离子官能团的水不溶性载体，使用其的吸附，除去和回收白细胞介素的方法和使用该吸附剂的吸附剂。

9. 发明授权

US09496130B2 Reclaiming processing method for delaminated wafer 有权
标题翻译：剥离晶片回收处理方法
公开(公告)号：US09496130B2
公开(公告)日：2016-11-15
申请号：US14349133
申请日：2012-08-29
申请人： Toru Ishizuka , Yuji Okubo , Takuya Sasaki , Akira Araki , Nobuhiko Noto
发明人： Toru Ishizuka , Yuji Okubo , Takuya Sasaki , Akira Araki , Nobuhiko Noto
IPC分类号： H01L21/02 , H01L21/762
CPC分类号： H01L21/02032 , H01L21/02087 , H01L21/76254
摘要： The invention provides a reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-produce at the time of producing a bonded wafer is subjected to reclaiming polishing and is again available as a bond wafer or a base wafer, wherein, in the reclaiming polishing, the delaminate wafer is polished with use of a double-side polisher in a state that oxide film is not formed on a delaminated surface of the delaminated wafer and oxide film is formed on a back side which is the opposite side of the delaminated surface. As a result, the reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-product at the time of manufacturing a bonded wafer based on an ion implantation delamination method is subjected to the reclaiming polishing, which enables sufficiently improving quality.
摘要翻译：本发明提供了一种用于分层晶片的回收处理方法，通过该回收处理方法将在制造接合晶片时作为副产物获得的分层晶片进行回收抛光，并且再次可用作接合晶片或基底晶片，其中在回收抛光中，在分层晶片的分层表面上没有形成氧化膜的状态下，使用双面抛光机对分层晶片进行研磨，氧化膜形成在相反侧的背面的分层表面。结果，对剥离晶片的回收处理方法进行回收抛光，通过该剥离处理方法可以将基于离子注入分层方法制造接合晶片时的副产品作为副产物晶片进行回收抛光，从而能够充分改善质量。

10. 发明授权

US06458205B1 Silicon epitaxial wafer and its manufacturing method 失效
标题翻译：硅外延片及其制造方法
公开(公告)号：US06458205B1
公开(公告)日：2002-10-01
申请号：US09719995
申请日：2000-12-19
申请人： Koichi Hasegawa , Yuji Okubo
发明人： Koichi Hasegawa , Yuji Okubo
IPC分类号： C30B2518
CPC分类号： H01L21/30604 , C30B25/02 , C30B29/06 , H01L21/02381 , H01L21/02433 , H01L21/02532 , H01L21/0262
摘要： By forming a silicon single-crystal thin film direct on a chemically etched substrate, a time required for all the process can be effectively shortened, which largely contributes to reduction in production cost of a silicon epitaxial wafer and improvement on production efficiency thereof, with the result that a reduced wafer price at a user's end and a short delivery time are ensured. In a technical aspect, an etching removal in a chemical etching treatment is set to be 60 &mgr;m or more and thereby, a glossiness of a front main surface of a chemically etched substrate can be ensured to be 95% or higher. With such a glossiness of the front main surface of the substrate employed, a surface glossiness of a silicon single-crystal thin film formed on the front main surface of the chemically etched substrate can be increased to 95% or higher, thereby, enabling an auto-alignment treatment in a lithographic step coming later with no trouble.
摘要翻译：通过直接在化学蚀刻的基板上形成硅单晶薄膜，可以有效地缩短所有工艺所需的时间，这大大有助于降低硅外延晶片的生产成本并提高其生产效率，导致在用户结束时减少的晶片价格和短的交货时间被确保。在技术方面，化学蚀刻处理中的蚀刻去除设定为60μm以上，从而可以确保化学蚀刻基板的前主表面的光泽度为95％以上。利用所用基板的前主表面的这种光泽度，可以将形成在化学蚀刻基板的前主表面上的硅单晶薄膜的表面光泽度提高到95％以上，从而使自动在光刻步骤中的对准处理后来没有麻烦。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式