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1. 发明授权

US07026581B2 Apparatus for positioning an elevator tube 失效
标题翻译：用于定位电梯管的装置
公开(公告)号：US07026581B2
公开(公告)日：2006-04-11
申请号：US10646228
申请日：2003-08-22
申请人： Michel Pharand , Thomas L. Durant , Ari Eiriksson , Richard Gueler
发明人： Michel Pharand , Thomas L. Durant , Ari Eiriksson , Richard Gueler
IPC分类号： F27B5/14 , F27D11/00
CPC分类号： H01L21/67126 , H01L21/324 , H01L21/67748 , H01L21/67751
摘要： A wafer support position control mechanism selectively positions a semiconductor wafer along an axis of excursion within a process chamber. An elevator tube protrudes through an orifice in the chamber surface and is connected at a first distal end to the wafer support. A compliant, dynamic seal within the orifice engages the elevator tube to form a gas curtain within a gap between the seal and the elevator tube to seal the process chamber. A moveable carriage is connected to the elevator tube at a second distal end for moving the wafer support along the axis of excursion. Rigid mechanical structure couples the second distal end of the elevator tube to the moveable carriage.
摘要翻译：晶片支撑位置控制机构选择性地将半导体晶片沿着处理室内的偏移轴定位。电梯管通过腔室表面中的孔突出，并且在第一远端处连接到晶片支撑件。孔内的柔性动态密封件接合电梯管，以在密封件和电梯管之间的间隙内形成气帘，以密封处理室。可移动的托架在第二远端处连接到电梯管，用于沿着偏移轴线移动晶片支撑件。刚性机械结构将电梯管的第二远端连接到可移动的托架上。

2. 发明授权

US07070661B2 Uniform gas cushion wafer support 失效
标题翻译：均匀气垫片支架
公开(公告)号：US07070661B2
公开(公告)日：2006-07-04
申请号：US10646249
申请日：2003-08-22
申请人： Ari Eiriksson , Richard Gueler , Michel Pharand
发明人： Ari Eiriksson , Richard Gueler , Michel Pharand
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01L21/6838
摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.
摘要翻译：工件被支撑在气垫上，以减少加工过程中工件的机械应力。具有用于接收工件的工件支撑凸缘的气室连接到气体供应。当气体流入增压室并且压力增加到足以提升工件时，工件被提升，并且气体在凸缘和工件边缘之间流出增压室。因此，工件在加工过程中被气体支撑在法兰上方。

3. 发明申请

US20050039685A1 Uniform gas cushion wafer support 失效
标题翻译：均匀气垫片支架
公开(公告)号：US20050039685A1
公开(公告)日：2005-02-24
申请号：US10646249
申请日：2003-08-22
申请人： Ari Eiriksson , Richard Gueler , Michel Pharand
发明人： Ari Eiriksson , Richard Gueler , Michel Pharand
IPC分类号： H01L21/683 , C23C16/00
CPC分类号： H01L21/6838
摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.
摘要翻译：工件被支撑在气垫上，以减少加工过程中工件的机械应力。具有用于接收工件的工件支撑凸缘的气室连接到气体供应。当气体流入增压室并且压力增加到足以提升工件时，工件被提升，并且气体在凸缘和工件边缘之间流出增压室。因此，工件在加工过程中被气体支撑在法兰上方。

4. 发明申请

US20050042807A1 Method of positioning an elevator tube 失效
标题翻译：定位电梯管的方法
公开(公告)号：US20050042807A1
公开(公告)日：2005-02-24
申请号：US10646228
申请日：2003-08-22
申请人： Michel Pharand , Thomas Durant , Ari Eiriksson , Richard Gueler
发明人： Michel Pharand , Thomas Durant , Ari Eiriksson , Richard Gueler
IPC分类号： H01L21/00 , H01L21/324 , H01L21/677 , H01L21/335
CPC分类号： H01L21/67126 , H01L21/324 , H01L21/67748 , H01L21/67751
摘要： A wafer support position control mechanism selectively positions a semiconductor wafer along an axis of excursion within a process chamber. An elevator tube protrudes through an orifice in the chamber surface and is connected at a first distal end to the wafer support. A compliant, dynamic seal within the orifice engages the elevator tube to form a gas curtain within a gap between the seal and the elevator tube to seal the process chamber. A moveable carriage is connected to the elevator tube at a second distal end for moving the wafer support along the axis of excursion. Rigid mechanical structure couples the second distal end of the elevator tube to the moveable carriage.
摘要翻译：晶片支撑位置控制机构选择性地将半导体晶片沿着处理室内的偏移轴定位。电梯管通过腔室表面中的孔突出，并且在第一远端处连接到晶片支撑件。孔内的柔性动态密封件接合电梯管，以在密封件和电梯管之间的间隙内形成气帘，以密封处理室。可移动的托架在第二远端处连接到电梯管，用于沿着偏移轴线移动晶片支撑件。刚性机械结构将电梯管的第二远端连接到可移动的托架上。

5. 发明授权

US07560705B2 Workpiece handling scan arm for ion implantation system 有权
标题翻译：用于离子植入系统的工件处理扫描臂
公开(公告)号：US07560705B2
公开(公告)日：2009-07-14
申请号：US11840888
申请日：2007-08-17
申请人： Ari Eiriksson , Donovan Beckel , Robert Mitchell , Michel Pharand , Marvin LaFontaine , Ashwin Purohit , Steven Weed , Wayne Arseneault , Shantanu Pathak , Joseph Daniel Foley
发明人： Ari Eiriksson , Donovan Beckel , Robert Mitchell , Michel Pharand , Marvin LaFontaine , Ashwin Purohit , Steven Weed , Wayne Arseneault , Shantanu Pathak , Joseph Daniel Foley
IPC分类号： H01J37/317
CPC分类号： H01L21/6831 , H01L21/68764
摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
摘要翻译：提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态电动和流体旋转连接。静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

6. 发明授权

US07100759B2 Magnetic support structure for an elevator tube of a vertical rapid thermal processing unit 失效
标题翻译：垂直快速热处理装置的电梯管的磁支撑结构
公开(公告)号：US07100759B2
公开(公告)日：2006-09-05
申请号：US10914343
申请日：2004-08-09
申请人： Michel Pharand , Dennis Normandin , Ari Eiriksson
发明人： Michel Pharand , Dennis Normandin , Ari Eiriksson
IPC分类号： B65G35/00
CPC分类号： H01L21/68792
摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.
摘要翻译：垂直快速热处理系统包括处理室和提供工件在处理室内的垂直移动的升降机结构。电梯结构包括用于支撑工件的工件支撑件和联接到工件支撑件并从处理室外部延伸的升降机轴。电梯井的在处理室外部的端部具有选定的磁极性。电梯结构还包括联接到轴的可移动的托架，以提供工件在处理室内的垂直移动。托架包括具有所选极性的轴支撑件。轴支撑件邻近电梯井的极化端部定位，使得当轴支撑件和电梯井沿行进路径垂直移动时，排斥磁力在电梯井的端部和轴支撑件之间保持间隙。

7. 发明申请

US20060027440A1 Magnetic support structure for an elevator tube of a vertical rapid thermal processing unit 失效
公开(公告)号：US20060027440A1
公开(公告)日：2006-02-09
申请号：US10914343
申请日：2004-08-09
申请人： Michel Pharand , Dennis Normandin , Ari Eiriksson
发明人： Michel Pharand , Dennis Normandin , Ari Eiriksson
IPC分类号： B65G35/00
CPC分类号： H01L21/68792
摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.

8. 发明申请

US20080105836A1 WORKPIECE HANDLING SCAN ARM FOR ION IMPLANTATION SYSTEM 有权
标题翻译：用于离子植入系统的工作处理扫描臂
公开(公告)号：US20080105836A1
公开(公告)日：2008-05-08
申请号：US11840888
申请日：2007-08-17
申请人： Ari Eiriksson , Donovan Beckel , Robert Mitchell , Michel Pharand , Marvin LaFontaine , Ashwin Purohit , Steven Weed , Wayne Arseneault , Shantanu Pathak , Joseph Foley
发明人： Ari Eiriksson , Donovan Beckel , Robert Mitchell , Michel Pharand , Marvin LaFontaine , Ashwin Purohit , Steven Weed , Wayne Arseneault , Shantanu Pathak , Joseph Foley
IPC分类号： H01J29/02
CPC分类号： H01L21/6831 , H01L21/68764
摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
摘要翻译：提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态电动和流体旋转连接。静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

9. 发明授权

US08974731B2 Sample carrier and/or sample carrier processing apparatus 有权
标题翻译：样品载体和/或样品载体处理装置
公开(公告)号：US08974731B2
公开(公告)日：2015-03-10
申请号：US13197969
申请日：2011-08-04
申请人： Ari Eiriksson
发明人： Ari Eiriksson
IPC分类号： G01N27/00 , G01N31/00 , G01N33/00 , B01L3/00 , G01N33/559 , G01N1/00 , G01N1/22
CPC分类号： G01N27/44743
摘要： A sample processing apparatus includes a sample carrier receiving region configured to receive a sample carrier. The sample carrier includes at least one sample channel carrying at least one sample, at least one agent chamber carrying at least one agent to be moved to the at least one sample channel to facilitate processing of the at least one sample, and the at least one agent chamber includes at least one chamber cover covering at least one opening of the at least one agent chamber, inhibiting flow of the at least one agent from the at least one agent chamber to the at least one sample channel. The sample processing apparatus further includes a chamber opener configured to facilitate opening the at least one chamber cover. The sample processing apparatus further includes a fluid mover that moves the agent out of the at least one agent chamber after the at least one chamber cover is opened and into the at least one sample channel.
摘要翻译：样品处理装置包括被配置为接收样品载体的样品载体接收区域。样品载体包括至少一个样品通道，其携带至少一个样品，至少一个试剂室，其携带至少一种待移动至所述至少一个样品通道的试剂，以促进至少一种样品的处理，并且所述至少一种代理室包括覆盖所述至少一个试剂室的至少一个开口的至少一个室盖，其阻止所述至少一个试剂从所述至少一个试剂室流到所述至少一个样品通道。样品处理设备还包括构造成便于打开至少一个室盖的室开启器。样品处理设备还包括流体移动器，其在所述至少一个室盖打开之后将所述试剂移出所述至少一个试剂室，并进入所述至少一个样品通道。

10. 发明授权

US08795592B2 Sample thermal cycling 有权
标题翻译：样品热循环
公开(公告)号：US08795592B2
公开(公告)日：2014-08-05
申请号：US12888818
申请日：2010-09-23
申请人： Ari Eiriksson
发明人： Ari Eiriksson
IPC分类号： G01N33/00 , B01L9/06 , C12M1/38 , C12M3/00 , C12M1/36
CPC分类号： B01L7/52 , B01L2200/146 , B01L2200/147 , B01L2300/1822 , B01L2300/1827
摘要： A sample processing apparatus includes a sample carrier receiving region configured to receive sample carrier carrying one or more samples for processing by the sample processing apparatus, and a thermal control system that controls a thermal cycling of the one or more samples for processing by the sample processing apparatus by selectively varying a pressure over a fluid in substantial thermal communication with the sample carrier, thereby varying a boiling point temperature of the fluid.
摘要翻译：样本处理装置包括：样本载体接收区域，被配置为接收承载一个或多个样品以供样品处理装置处理的样本载体;以及热控制系统，其控制所述一个或多个样品的热循环以进行样品处理通过选择性地改变与样品载体基本上热连通的流体的压力，从而改变流体的沸点温度。

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