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    • 1. 发明授权
    • Methods and apparatus for separating a substrate
    • 用于分离衬底的方法和装置
    • US09440311B2
    • 2016-09-13
    • US14878973
    • 2015-10-08
    • Michael Xiaoxuan Yang
    • Michael Xiaoxuan Yang
    • H01L21/46H01L21/67H01L21/463B28D5/00H01L31/04H01L21/78B23K26/00B23K26/073B23K26/40C30B29/06C30B33/06B23K26/38B32B37/28B32B38/00
    • B23K26/364B23K26/0736B23K26/359B23K26/38B23K26/40B23K26/402B23K2103/50B23K2103/56B28D5/00B32B37/28B32B38/0004B32B38/0008C30B29/06C30B33/06H01L21/46H01L21/463H01L21/67H01L21/78H01L31/04Y10T29/41
    • This invention relates to slicing a thin semiconductor substrate from side wall into two substrates of half thickness. The substrate slicing process involves a laser irradiation step. The substrate slicing process can also involve a mechanical cleaving process after the laser irradiation step. The apparatus for substrate slicing comprises two opposite-facing substrate chucks, with a gap in between for the substrate to pass through. One portion of the two substrate chucks are in parallel to each other to center the substrate sidewall. The gap can increase between the second portion of the two substrate chucks after the location for substrate separation, to spread out the resulting two substrates after the slicing and to facilitate the continuous substrate separation process. The present invention is further directed to methods and apparatus of separating a continuous thin layer of materials from side wall of a rotating ingot. It can be accomplished by a laser irradiation on the ingot side wall from a tangential direction for materials ablation. In an alternative method, a high-intensity short-pulse laser irradiates on the ingot side wall from a radial direction and converges under the ingot sidewall surface to form a plane of modified region inside the substrate, and a thin layer of materials is separated from the ingot side wall along the plane of modified region in a subsequent mechanical cleaving step. A film can be deposited/bonded to the ingot side wall prior to the separation of the thin film layers. The resulting thin layer of materials can be pulled away from the ingot by a substrate chuck.
    • 本发明涉及将薄半导体衬底从侧壁切割成半厚度的两个衬底。 基板切片工艺涉及激光照射步骤。 衬底切片工艺也可以涉及激光照射步骤之后的机械切割过程。 用于衬底切片的装置包括两个相对的衬底卡盘,其间有间隙以使衬底通过。 两个基板卡盘的一部分彼此平行以使基板侧壁居中。 在基板分离位置之后,两个基板卡盘的第二部分之间的间隙可以增加,以便在切片之后展开所得到的两个基板,并且便于连续的基板分离过程。 本发明还涉及从连续铸锭的侧壁分离材料的连续薄层的方法和装置。 可以通过从材料切割的切线方向对锭侧壁进行激光照射来实现。 在替代方法中,高强度短脉冲激光从径向辐射在晶锭侧壁上并在晶锭侧壁表面下会聚,以在衬底内部形成改质区域的平面,并将薄层材料从 在随后的机械切割步骤中沿着改质区域的平面的锭侧壁。 在分离薄膜层之前,可以将膜沉积/粘合到锭侧壁。 所得到的薄层材料可以通过基板卡盘从铸锭中拉出。
    • 5. 发明申请
    • Apparatus for Sunlight Collection and Solar Energy Generation
    • 阳光收集和太阳能发电装置
    • US20160336897A1
    • 2016-11-17
    • US15175737
    • 2016-06-07
    • Michael Xiaoxuan Yang
    • Michael Xiaoxuan Yang
    • H02S20/32H01L31/054
    • H02S40/22H02S20/30Y02E10/52
    • This invention relates to photovoltaic (PV) systems with solar trackers. Retractable auxiliary panels are positioned at opposite sides of a solar panel along its tilt direction. The auxiliary panels do not obstruct the direct solar irradiation onto the solar panels, but rather redirect additional solar irradiation to the solar panels, including both direct beam and diffuse sunlight. While solar panels tilt to track the sun, configurations of the auxiliary panels can be adjusted to avoid shading on adjacent solar panels. Compared to conventional PV systems on solar trackers, the proposed PV system can significantly improve overall sunlight collection and PV system output throughout a day.
    • 本发明涉及具有太阳能跟踪器的光伏(PV)系统。 可伸缩辅助面板沿其倾斜方向定位在太阳能电池板的相对侧。 辅助面板不会阻碍直接太阳能照射到太阳能电池板上,而是将额外的太阳辐射引向太阳能电池板,包括直射光束和漫射阳光。 虽然太阳能电池板倾斜跟踪太阳,但是可以调整辅助面板的配置,以避免相邻的太阳能电池板上的阴影。 与太阳能跟踪器的传统光伏系统相比,所提出的光伏系统可以在一天内显着提高整体的阳光收集和光伏系统的输出。
    • 6. 发明申请
    • Methods and Apparatus for Separating a Substrate
    • 分离底物的方法和装置
    • US20160059356A1
    • 2016-03-03
    • US14878973
    • 2015-10-08
    • Michael Xiaoxuan Yang
    • Michael Xiaoxuan Yang
    • B23K26/364B32B37/28B32B38/00B23K26/402B23K26/38
    • B23K26/364B23K26/0736B23K26/359B23K26/38B23K26/40B23K26/402B23K2103/50B23K2103/56B28D5/00B32B37/28B32B38/0004B32B38/0008C30B29/06C30B33/06H01L21/46H01L21/463H01L21/67H01L21/78H01L31/04Y10T29/41
    • This invention relates to slicing a thin semiconductor substrate from side wall into two substrates of half thickness. The substrate slicing process involves a laser irradiation step. The substrate slicing process can also involve a mechanical cleaving process after the laser irradiation step. The apparatus for substrate slicing comprises two opposite-facing substrate chucks, with a gap in between for the substrate to pass through. One portion of the two substrate chucks are in parallel to each other to center the substrate sidewall. The gap can increase between the second portion of the two substrate chucks after the location for substrate separation, to spread out the resulting two substrates after the slicing and to facilitate the continuous substrate separation process. The present invention is further directed to methods and apparatus of separating a continuous thin layer of materials from side wall of a rotating ingot. It can be accomplished by a laser irradiation on the ingot side wall from a tangential direction for materials ablation. In an alternative method, a high-intensity short-pulse laser irradiates on the ingot side wall from a radial direction and converges under the ingot sidewall surface to form a plane of modified region inside the substrate, and a thin layer of materials is separated from the ingot side wall along the plane of modified region in a subsequent mechanical cleaving step. A film can be deposited/bonded to the ingot side wall prior to the separation of the thin film layers. The resulting thin layer of materials can be pulled away from the ingot by a substrate chuck.
    • 本发明涉及将薄半导体衬底从侧壁切割成半厚度的两个衬底。 基板切片工艺涉及激光照射步骤。 衬底切片工艺也可以涉及激光照射步骤之后的机械切割过程。 用于衬底切片的装置包括两个相对的衬底卡盘,其间有间隙以使衬底通过。 两个基板卡盘的一部分彼此平行以使基板侧壁居中。 在基板分离位置之后,两个基板卡盘的第二部分之间的间隙可以增加,以便在切片之后展开所得到的两个基板,并且便于连续的基板分离过程。 本发明还涉及从连续铸锭的侧壁分离材料的连续薄层的方法和装置。 可以通过从材料切割的切线方向对锭侧壁进行激光照射来实现。 在替代方法中,高强度短脉冲激光从径向辐射在晶锭侧壁上并在晶锭侧壁表面下会聚,以在衬底内部形成改质区域的平面,并将薄层材料从 在随后的机械切割步骤中沿着改质区域的平面的锭侧壁。 在分离薄膜层之前,可以将膜沉积/粘合到锭侧壁。 所得到的薄层材料可以通过基板卡盘从铸锭中拉出。