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1. 发明申请

US20070258085A1 Substrate illumination and inspection system 审中-公开
标题翻译：基板照明和检查系统
公开(公告)号：US20070258085A1
公开(公告)日：2007-11-08
申请号：US11417297
申请日：2006-05-02
申请人： Michael Robbins , Paul Forderhase , Joel Bailey , Kevin Nguyen
发明人： Michael Robbins , Paul Forderhase , Joel Bailey , Kevin Nguyen
IPC分类号： G01N21/00
CPC分类号： G01N21/9503 , G01N21/4738
摘要： A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.
摘要翻译：衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。光学元件保持与表面法线成一定角度，以避免来自基板的镜面的反射伪影。光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。多个光可以调制光的颜色和强度，以增强基板对缺陷的检查。

2. 发明申请

US20080011332A1 Method and apparatus for cleaning a wafer substrate 审中-公开
标题翻译：清洗晶片基板的方法和装置
公开(公告)号：US20080011332A1
公开(公告)日：2008-01-17
申请号：US11825676
申请日：2007-07-06
申请人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
发明人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
IPC分类号： B08B3/02
CPC分类号： H01L21/6708 , G01C25/00 , H01J37/32366 , H01L21/31116 , H01L21/31612 , H01L21/67069 , H01L21/681
摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate.
摘要翻译：公开了一种基板处理装置的边缘区域。正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度基板朝向基板边缘区域，从而处理基板边缘区域。含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。

3. 发明申请

US20080011421A1 Processing chamber having labyrinth seal 审中-公开
标题翻译：具有迷宫式密封的加工室
公开(公告)号：US20080011421A1
公开(公告)日：2008-01-17
申请号：US11825669
申请日：2007-07-06
申请人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
发明人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
IPC分类号： C23F1/00
CPC分类号： G01C25/00 , H01L21/67069 , H01L21/681
摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.
摘要翻译：公开了一种基板处理装置的边缘区域。正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度基板朝向基板边缘区域，从而处理基板边缘区域。含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。为处理室提供密封装置。

4. 发明申请

US20070062647A1 Method and apparatus for isolative substrate edge area processing 审中-公开
标题翻译：用于隔离衬底边缘区域处理的方法和装置
公开(公告)号：US20070062647A1
公开(公告)日：2007-03-22
申请号：US11230263
申请日：2005-09-19
申请人： Joel Bailey , Jonathan Doan , Paul Forderhase , Johnny Ortiz , Michael Robbins
发明人： Joel Bailey , Jonathan Doan , Paul Forderhase , Johnny Ortiz , Michael Robbins
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/67063 , G03F7/168 , H01L21/02087 , H01L21/6708
摘要： An isolative substrate edge area processing method and apparatus is described. The apparatus has an isolator for isolating and processing by dry chemical technique a portion of a substrate including a substrate edge region. The isolator has nozzles for directing a flow of reactive species towards the edge area of the substrate and a purge plenum for biasing flow of reactive species towards an exhaust plenum while the substrate rotates on a chuck. Tuned flow control prevents migration of reactive species and reaction byproducts out of the processing area. A method for processing a substrate with the isolator involves directing a flow of reactive species at an angle towards an edge area of the substrate while forming a boundary around the processing area with flow control provided by the purge plenum, and exhaust plenum.
摘要翻译：描述了隔离衬底边缘区域处理方法和装置。该装置具有用于通过干化学技术隔离和处理包括衬底边缘区域的衬底的一部分的隔离器。隔离器具有用于将反应物质流引导到基底的边缘区域的喷嘴和用于在衬底在卡盘上旋转的同时将反应物质的流动偏向排气室的吹扫气室。调节流量控制可防止反应物质和反应副产物迁离加工区域。用隔离器处理衬底的方法包括以一定角度朝向衬底的边缘区域引导反应物种的流动，同时通过由净化气室和排气室提供的流动控制在处理区域周围形成边界。

5. 发明申请

US20080017316A1 Clean ignition system for wafer substrate processing 审中-公开
标题翻译：清洁点火系统用于晶圆衬底加工
公开(公告)号：US20080017316A1
公开(公告)日：2008-01-24
申请号：US11825671
申请日：2007-07-06
申请人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
发明人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
IPC分类号： C23F1/00 , F23Q7/22
CPC分类号： H01L21/67069 , G01C25/00 , H01J37/32366 , H01L21/31116 , H01L21/31612 , H01L21/6708 , H01L21/681
摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A clean ignition system is used to ignite the combustion flame.
摘要翻译：公开了一种基板处理装置的边缘区域。正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度基板朝向基板边缘区域，从而处理基板边缘区域。含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。使用干净的点火系统点燃燃烧火焰。

6. 发明申请

US20080010845A1 Apparatus for cleaning a wafer substrate 审中-公开
标题翻译：用于清洁晶片基板的装置
公开(公告)号：US20080010845A1
公开(公告)日：2008-01-17
申请号：US11825670
申请日：2007-07-06
申请人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
发明人： Joel Bailey , Jean-Michel Huret , Paul Forderhase , Satish Sadam , Scott Stratton , Michael Robbins
IPC分类号： G01C25/00 , G01D21/00 , G06F17/17 , H01L21/68
CPC分类号： G01C25/00 , H01J37/32366 , H01L21/31116 , H01L21/31612 , H01L21/67069 , H01L21/6708 , H01L21/681
摘要： A method and apparatus for dry chemical processing a wafer at atmospheric pressure is disclosed. The edge area of a substrate is placed in isolation from the remainder of the substrate. According to the present teachings, a method for centering a wafer on a rotatable chuck is provided. The method includes the steps of positioning a wafer adjacent to a micrometer. The wafer is then rotated and a plurality of wafer edge locations and rotational increments are measured. A center offset value for the value of the wafer center with respect to a chuck is calculated. The wafer is then moved with respect to a center position of the chuck.
摘要翻译：公开了一种用于在大气压下干燥化学处理晶片的方法和装置。将衬底的边缘区域与衬底的其余部分隔离放置。根据本教导，提供了一种用于将晶片定心在可旋转卡盘上的方法。该方法包括将晶片定位在与千分尺相邻的步骤。然后旋转晶片，并且测量多个晶片边缘位置和旋转增量。计算晶片中心相对于卡盘的值的中心偏移值。然后晶片相对于卡盘的中心位置移动。

7. 发明申请

US20080030731A1 Automatic wafer edge inspection and review system 失效
标题翻译：自动晶圆边缘检查和审查系统
公开(公告)号：US20080030731A1
公开(公告)日：2008-02-07
申请号：US11891657
申请日：2007-08-09
申请人： Ju Jin , Satish Sadam , Vishal Verma , Zhiyan Huang , Siming Lin , Michael Robbins , Paul Forderhase
发明人： Ju Jin , Satish Sadam , Vishal Verma , Zhiyan Huang , Siming Lin , Michael Robbins , Paul Forderhase
IPC分类号： G01J4/00 , G01N21/25 , G01N21/47
CPC分类号： G01N21/4738 , G01N21/9503
摘要： A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.
摘要翻译：衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。

8. 发明申请

US20070066076A1 Substrate processing method and apparatus using a combustion flame 审中-公开
标题翻译：使用燃烧火焰的基板加工方法和装置
公开(公告)号：US20070066076A1
公开(公告)日：2007-03-22
申请号：US11230261
申请日：2005-09-19
申请人： Joel Bailey , Johnny Ortiz , Michael Robbins , Richard Rock
发明人： Joel Bailey , Johnny Ortiz , Michael Robbins , Richard Rock
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/32136 , H01L21/02087 , H01L21/0209 , H01L21/3065 , H01L21/31116 , H01L21/31138 , H01L21/6708
摘要： A substrate processing method and apparatus using a combustion flame of a gaseous mixture of hydrogen and a non-oxygen oxidizer is described. The method uses the hydrogen and non-oxygen oxidizer combustion flame to impinge upon a substrate surface for chemically reacting with a thin film on the surface and thus etching the substrate. The method is performed in a substantially inert and non-ionized environment at a substantially atmospheric pressure. An apparatus for processing a substrate with the method has a processing chamber for containing the inert environment and a nozzle head for directing the combustion flame towards a substrate retained upon a substrate holder. In an embodiment, an edge nozzle assembly is angled towards the edge of the wafer for treating the near-edge and edge of the wafer. In this embodiment, a heater preheats the substrate in the near-edge region to be processed.
摘要翻译：描述了使用氢气和非氧氧化剂的气体混合物的燃烧火焰的衬底处理方法和装置。该方法使用氢和非氧氧化剂燃烧火焰撞击在衬底表面上以与表面上的薄膜发生化学反应，从而蚀刻衬底。该方法在基本上为惰性和非电离的环境中在基本上大气压下进行。用该方法处理衬底的装置具有用于容纳惰性环境的处理室和用于将燃烧火焰引向保持在衬底保持器上的衬底的喷嘴头。在一个实施例中，边缘喷嘴组件朝向晶片的边缘成角度，用于处理晶片的近边缘和边缘。在该实施例中，加热器预热待加工的近边缘区域中的基板。

9. 发明授权

US08636192B2 Surgical instrument and loading unit for use therewith 有权
标题翻译：手术器械和与其一起使用的装载单元
公开(公告)号：US08636192B2
公开(公告)日：2014-01-28
申请号：US13589234
申请日：2012-08-20
申请人： David Farascioni , Dino Kasvikis , Paul A. Scirica , Danyel Racenet , Michael Robbins
发明人： David Farascioni , Dino Kasvikis , Paul A. Scirica , Danyel Racenet , Michael Robbins
IPC分类号： A61B17/068
CPC分类号： A61B17/068 , A61B17/072 , A61B17/07207 , A61B17/115 , A61B18/1442 , A61B2017/0023 , A61B2017/07214 , A61B2017/07221 , A61B2017/07235 , A61B2017/07242 , A61B2017/07278 , A61B2017/07285 , A61B2017/2945 , A61B2018/1432
摘要： A surgical instrument is disclosed. The surgical instrument includes a handle assembly, a drive assembly, an endoscopic portion, a pair of jaw members, a dynamic clamping member, and a tissue stop. The drive assembly is disposed in mechanical cooperation with a movable handle of the handle assembly. The endoscopic portion defines a first longitudinal axis. The jaw members are each longitudinally curved with respect to the longitudinal axis. The dynamic clamping member is disposed in mechanical cooperation with a distal portion of the drive assembly and includes an upper beam, a lower beam, and a vertical beam having a cutting edge on a distal portion thereof. At least a portion of the dynamic clamping member is longitudinally curved with respect to the longitudinal axis. The tissue stop is disposed adjacent a distal portion of the first jaw member and configured to impede tissue from distally escaping the jaw members.
摘要翻译：公开了一种外科器械。手术器械包括手柄组件，驱动组件，内窥镜部分，一对钳口构件，动态夹紧构件和组织止挡件。驱动组件与手柄组件的可移动手柄机械配合设置。内窥镜部分限定第一纵向轴线。钳口构件各自相对于纵向轴线纵向弯曲。动态夹紧构件与驱动组件的远端部分机械配合设置，并且包括上梁，下梁和在其远端部分上具有切割边缘的垂直梁。动态夹紧构件的至少一部分相对于纵向轴线纵向弯曲。所述组织止挡件邻近所述第一钳口构件的远端部分设置，并且构造成阻止组织远离所述钳口构件。

10. 发明申请

US20100072258A1 Surgical Instrument And Loading Unit For Use Therewith 有权
标题翻译：手术器械和装载单元
公开(公告)号：US20100072258A1
公开(公告)日：2010-03-25
申请号：US12553174
申请日：2009-09-03
申请人： David Farascioni , Dino Kasvikis , Paul A. Scirica , Danyel Racenet , Michael Robbins
发明人： David Farascioni , Dino Kasvikis , Paul A. Scirica , Danyel Racenet , Michael Robbins
IPC分类号： A61B17/068
CPC分类号： A61B17/068 , A61B17/072 , A61B17/07207 , A61B17/115 , A61B18/1442 , A61B2017/0023 , A61B2017/07214 , A61B2017/07221 , A61B2017/07235 , A61B2017/07242 , A61B2017/07278 , A61B2017/07285 , A61B2017/2945 , A61B2018/1432
摘要： A surgical instrument is disclosed. The surgical instrument includes a handle assembly, a drive assembly, an endoscopic portion, a pair of jaw members, a dynamic clamping member, and a tissue stop. The drive assembly is disposed in mechanical cooperation with a movable handle of the handle assembly. The endoscopic portion defines a first longitudinal axis. The jaw members are each longitudinally curved with respect to the longitudinal axis. The dynamic clamping member is disposed in mechanical cooperation with a distal portion of the drive assembly and includes an upper beam, a lower beam, and a vertical beam having a cutting edge on a distal portion thereof. At least a portion of the dynamic clamping member is longitudinally curved with respect to the longitudinal axis. The tissue stop is disposed adjacent a distal portion of the first jaw member and configured to impede tissue from distally escaping the jaw members.
摘要翻译：公开了一种外科器械。手术器械包括手柄组件，驱动组件，内窥镜部分，一对钳口构件，动态夹紧构件和组织止挡件。驱动组件与手柄组件的可移动手柄机械配合设置。内窥镜部分限定第一纵向轴线。钳口构件各自相对于纵向轴线纵向弯曲。动态夹紧构件与驱动组件的远端部分机械配合设置，并且包括上梁，下梁和在其远端部分上具有切割边缘的垂直梁。动态夹紧构件的至少一部分相对于纵向轴线纵向弯曲。所述组织止挡件邻近所述第一钳口构件的远端部分设置，并且构造成阻止组织远离所述钳口构件。

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