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1. 发明授权

US5756757A Process for the preparation of 3-hydroxy-N-benzimidazolon-5-yl-2-naphthamide in the high purity required of azo pigments 失效
标题翻译：制备高纯度3-偶氮颜料的3-羟基-N-苯并咪唑-5-基-2-萘甲酰胺的方法
公开(公告)号：US5756757A
公开(公告)日：1998-05-26
申请号：US559551
申请日：1995-11-16
申请人： Michael Meier , Heinrich Volk , Rudolf Neeb
发明人： Michael Meier , Heinrich Volk , Rudolf Neeb
IPC分类号： C07D235/26 , C09B29/20
CPC分类号： C07D235/26
摘要： The invention relates to a process for the preparation of 3-hydroxy-N-benzimidazolon-5-yl-2-naphthamide, which comprises reacting 5-aminobenzimidazolone and sodium carbonate in N-methylpyrrolidone with a solution of 3-hydroxy-2-naphthoyl chloride in xylene or toluene, filtering, washing with xylene or toluene, introducing the filter cake into water to which sodium carbonate has been added and steam-distilling, filtering off the residue with suction, washing and drying.
摘要翻译：本发明涉及一种制备3-羟基-N-苯并咪唑-5-基-2-萘甲酰胺的方法，该方法包括使5-氨基苯并咪唑酮与碳酸钠在N-甲基吡咯烷酮中的溶液与3-羟基-2-萘甲酰基氯化物在二甲苯或甲苯中，过滤，用二甲苯或甲苯洗涤，将滤饼引入加入碳酸钠的水中，蒸汽蒸馏，抽吸滤出残留物，洗涤和干燥。

2. 发明授权

US11073350B2 Firearm system and methods of assembly and disassembly 有权
公开(公告)号：US11073350B2
公开(公告)日：2021-07-27
申请号：US16577760
申请日：2019-09-20
申请人： Michael Meier
发明人： Michael Meier
IPC分类号： F41A3/66 , F41A3/72 , F41A5/18 , F41A17/38 , F41A5/20 , F41A5/26 , F41A11/00 , F41A19/06 , F41A19/10 , F41A19/12 , F41A19/14 , F41C23/04 , F41C23/16 , F41C23/20 , F41A11/04
摘要： A firearm is described herein. The firearm comprises a receiver assembly adapted to receive a cartridge, a bolt assembly including a firing device operable to fire the cartridge, a barrel adapted to receive the projectile after the cartridge is fired, and a gas assembly including a gas tube. The receiver assembly includes an upper receiver portion, a lower receiver portion, and an upper receiver cover. The upper receiver portion defines a longitudinal axis, and an indexing slot operable to receive the gas tube. The upper receiver portion includes at least one integrated exterior track extending generally parallel to the longitudinal axis adapted to slidably couple with the upper receiver cover and a plurality of interior tracks extending generally parallel to the longitudinal axis adapted to slidably couple with the bolt assembly. The upper and lower receiver portions are pivotally connected to one another.

3. 外观设计

USD757202S1 Rifle locking component 有权
标题翻译：步枪锁定组件
公开(公告)号：USD757202S1
公开(公告)日：2016-05-24
申请号：US29508078
申请日：2014-11-03
申请人： Michael Meier
设计人： Michael Meier

4. 外观设计

USD757201S1 Rifle component 有权
标题翻译：步枪部件
公开(公告)号：USD757201S1
公开(公告)日：2016-05-24
申请号：US29508076
申请日：2014-11-03
申请人： Michael Meier
设计人： Michael Meier

5. 发明申请

US20130202842A1 REINFORCEMENT ALIGNED WITH AXIS OF LOAD 审中-公开
标题翻译：加载轴与负载轴对齐
公开(公告)号：US20130202842A1
公开(公告)日：2013-08-08
申请号：US13811366
申请日：2011-07-19
申请人： Michael Meier
发明人： Michael Meier
IPC分类号： B62D29/00
CPC分类号： B62D29/00 , B62D29/002 , Y10T428/24008 , Y10T428/24744
摘要： An exemplary reinforcement includes a carrier having an array of cylinders. The carrier is configured to be disposed in a structure, and each of the cylinders defines an axis aligned with a structural load applied to the structure. The axes defined by the cylinders are parallel to one another and define a plane. A bonding material is disposed on the carrier and is configured to connect the carrier to the structure.
摘要翻译：示例性的加固件包括具有气缸阵列的载体。载体被配置为设置在结构中，并且每个气缸限定与施加到结构的结构负载对齐的轴。由气缸限定的轴彼此平行并限定一个平面。接合材料设置在载体上并且构造成将载体连接到结构。

6. 发明申请

US20100051109A1 CO2 dialer and manifold apparatus and system 审中-公开
标题翻译：二氧化碳拨号器和歧管装置和系统
公开(公告)号：US20100051109A1
公开(公告)日：2010-03-04
申请号：US12584297
申请日：2009-09-03
申请人： Michael Meier
发明人： Michael Meier
IPC分类号： F17D1/00
CPC分类号： F17C13/045 , F17C2205/0142 , F17C2205/0146 , F17C2205/0326 , F17C2205/0329 , F17C2205/0335 , F17C2205/0338 , F17C2221/013 , F17C2223/0123 , F17C2223/033 , F17C2223/035 , F17C2227/043 , F17C2227/047 , F17C2250/032 , F17C2250/043 , F17C2260/015 , F17C2265/04 , F17C2270/05 , Y10T137/0318 , Y10T137/86196
摘要： A system and method for notifying a supplier of gas when a system has changed from a first gas tank to a second gas tank. The system includes a selecting valve, an initiating apparatus, and a calling apparatus. The initiating apparatus is coupled to a selecting valve which is coupled to at least two gas tanks. When the selecting valve moves from the first tank to the second tank the initiating apparatus is activated which initiates the calling apparatus. The calling apparatus notifies a gas supplier or a third party that the user has switched from a first gas tank to a second gas tank allowing the supplier to know when to deliver a replacement gas tank or refill the existing gas tank.
摘要翻译：一种系统和方法，用于当系统已经从第一气罐改变到第二气罐时通知供应商的气体。该系统包括选择阀，启动装置和呼叫装置。起动装置联接到选择阀，该选择阀联接到至少两个气罐。当选择阀从第一罐移动到第二罐时，起动装置被启动，起动装置。通话装置向燃气供应商或第三方通知用户已经从第一气罐切换到第二气罐，允许供应商知道何时交付更换的气罐或者重新填充现有的气罐。

7. 发明授权

US07431858B2 Nanoimprint resist 有权
标题翻译：纳米抗蚀剂
公开(公告)号：US07431858B2
公开(公告)日：2008-10-07
申请号：US10511402
申请日：2003-04-09
申请人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Peter W Oliveira , Helmut Schmidt
发明人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Peter W Oliveira , Helmut Schmidt
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G03F7/0757 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0047
摘要： The invention relates to a method for microstructuring electronic components, which yields high resolutions (≦200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF3/O2 plasma; vii) the bottom coat is plasma etched, preferably with O2 plasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas.
摘要翻译：本发明涉及一种用于微结构化电子部件的方法，其以良好的纵横比产生高分辨率（<= 200nm），同时显着地低于光刻方法。本发明的方法包括以下步骤：i）制备根据权利要求1的纳米复合组合物的平面未硬化溶胶膜; ii）制备由底涂层（b）和载体（c）组成的靶基材; iii）在步骤i）中获得的溶胶膜材料通过微结构转印压花印刷施加到在步骤ii）中获得的底涂层（b） iv）涂覆的溶胶膜材料硬化; v）分离转印压花印模，由此获得作为顶涂层（a）的压花微结构。制造微结构化半导体材料的方法包括以下附加步骤：vi）纳米复合溶胶膜的剩余层被等离子体蚀刻，优选地具有CHF 3 O 2 / O 2等离子体 ; vii）底涂层被等离子体蚀刻，优选为O 2等离子体; viii）蚀刻半导体材料或者在蚀刻区域中掺杂半导体材料。

8. 发明申请

US20050224452A1 Nanoimprint resist 有权
标题翻译：纳米抗蚀剂
公开(公告)号：US20050224452A1
公开(公告)日：2005-10-13
申请号：US10511402
申请日：2003-04-09
申请人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Helmut Schmidt
发明人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Helmut Schmidt
IPC分类号： G03F7/20 , B81C1/00 , G03F7/00 , G03F7/004 , G03F7/075 , H01L21/027 , H01L21/3065 , C23F1/00 , B05D5/00 , B44C1/22 , C03C15/00 , C03C25/68 , G03G15/00 , H01L21/311 , H01L29/06
CPC分类号： G03F7/0757 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0047
摘要： The invention relates to a method for microstructuring electronic components, which yields high resolutions (≦200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF3/O2 plasma; vii) the bottom coat is plasma etched, preferably with O2 plasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas.
摘要翻译：本发明涉及一种用于微结构化电子部件的方法，其以良好的纵横比产生高分辨率（<= 200nm），同时显着地低于光刻方法。本发明的方法包括以下步骤：i）制备根据权利要求1的纳米复合组合物的平面未硬化溶胶膜; ii）制备由底涂层（b）和载体（c）组成的靶基材; iii）在步骤i）中获得的溶胶膜材料通过微结构转印压花印刷施加到在步骤ii）中获得的底涂层（b） iv）涂覆的溶胶膜材料硬化; v）分离转印压花印模，由此获得作为顶涂层（a）的压花微结构。制造微结构化半导体材料的方法包括以下附加步骤：vi）纳米复合溶胶膜的剩余层被等离子体蚀刻，优选地具有CHF 3 O 2 / O 2等离子体 ; vii）底涂层被等离子体蚀刻，优选为O 2等离子体; viii）蚀刻半导体材料或者在蚀刻区域中掺杂半导体材料。

9. 发明授权

US5557005A Process for preparing 3-chloroanthranilic alkyl esters of high purity from 3-chloroanthranilic acid 失效
标题翻译：从3-氯邻氨基苯甲酸制备高纯度的3-氯邻氨基烷基酯的方法
公开(公告)号：US5557005A
公开(公告)日：1996-09-17
申请号：US449251
申请日：1995-05-24
申请人： G unther Semler , Michael Meier
发明人： G unther Semler , Michael Meier
IPC分类号： C07C227/18 , C07C227/22 , C07C229/56 , C07D265/26
CPC分类号： C07D265/26 , C07C227/18 , C07C227/22
摘要： Process for preparing 3-chloroanthranilic alkyl esters by reacting 3-chloroanthranilic acid, in an inert solvent, with from 0.8 to 5 parts by weight of phosgene, and reacting the 3-chloroisatoic anhydride which is formed with an alkanol, where appropriate in the presence of an esterification catalyst, to give the 3-chloroanthranilic alkyl ester.
摘要翻译：通过使3-氯邻氨基苯甲酸在惰性溶剂中与0.8至5重量份的光气反应制备3-氯邻氨基烷基酯的方法，并且在适当的情况下使形成的3-氯代酸酐与烷醇反应，的酯化催化剂，得到3-氯邻氨基烷基酯。

10. 发明授权

US5550286A Process for the preparation of aromatic carboxamides from aromatic carboxylic acids and urea 失效
标题翻译：从芳香族羧酸和尿素制备芳香族羧酰胺的方法
公开(公告)号：US5550286A
公开(公告)日：1996-08-27
申请号：US354206
申请日：1994-12-12
申请人： Yani Christidis , Michael Meier
发明人： Yani Christidis , Michael Meier
IPC分类号： B01J27/16 , C07B61/00 , C07C231/02 , C07C231/10 , C07C233/65 , C07C235/46 , C07C231/00
CPC分类号： C07C231/02
摘要： Process for the of aromatic carboxamides from aromatic carboxylic acids and ureaProcess for the preparation of aromatic carboxamides of the formula (I) ##STR1## in which R.sub.1, R.sub.2, and R.sub.3 are identical or different and are hydrogen, fluorine, chlorine or bromine atoms, or are alkyl(C.sub.1 -C.sub.4), hydroxyl or nitro groups, or R.sub.1 and R.sub.2 form an aromatic ring of 5 or 6 ring members, which ring may be substituted by fluorine, chlorine or bromine atoms or by alkyl(C.sub.1 -C.sub.4), hydroxyl or nitro groups, which involves reacting aromatic carboxylic acids of the formula (II) ##STR2## in which R.sub.1, R.sub.2 and R.sub.3 are as defined above with urea in an inert organic solvent with the addition of a catalytic amount of phosphorous acid.
摘要翻译：芳香羧酸和脲的芳族羧酰胺的制备方法制备式（I）的芳族羧酰胺其中R 1，R 2和R 3相同或不同，为氢，氟，氯或溴原子，或者是烷基（C 1 -C 4），羟基或硝基，或者R 1和R 2形成5或6个环成员的芳环，该环可被氟，氯或溴原子取代或被烷基（C1 -C4），羟基或硝基，其包括将式（II）的芳族羧酸（II）与惰性有机溶剂中的R 1，R 2和R 3如上所述与脲反应，加入催化量的亚磷酸。

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