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    • 4. 发明申请
    • Cable operated drum brakes
    • 电缆式鼓式制动器
    • US20060151257A1
    • 2006-07-13
    • US10522856
    • 2003-07-30
    • David PeasleyLuigi TessitoreMichael MacDonaldWilliam Haines
    • David PeasleyLuigi TessitoreMichael MacDonaldWilliam Haines
    • F16D65/14
    • F16D65/14F16D2125/62
    • A cable operated drum brake has an internal brake operating lever (12) provided with an quick-attach device (10) for an operating cable (11). A cable attachment tube (21) projects from a backplate (17) of the brake and the operating cable has a cable inner (13) with a latching formation (14) on the end thereof and a cable outer sleeve (15). An end portion of the operating cable is slideable towards (X) the backplate (17) within the tube (21) up to a first position at which further movement towards the backplate is stopped by contact between an abutment (26) on the tube and a cooperating abutment (31a) on the cable outer sleeve. When in the first position the latching formation (14) has moved passed the quick-attach device (10). The cable is then subsequently moveable away from the backplate (Y) within the tube to a second position in which the latching formation (14) on the cable inner is fully engaged with the quick-attach device (10). A fastening means (39,40) is provided to lock the cable in the second position relative to the tube to maintain the latching formation (14) engaged with the quick-attach device (10) during subsequent operation of the brake. The invention also provides a method of attaching an operating cable to a quick-attach device on an internal brake operating lever of a drum brake.
    • 电缆操作的鼓式制动器具有内部制动操作杆(12),其设有用于操作电缆(11)的快速附接装置(10)。 电缆连接管(21)从制动器的背板(17)突出,并且操作电缆具有在其端部上具有闩锁结构(14)的电缆内部(13)和电缆外套筒(15)。 操作电缆的端部可以朝向管(21)内的背板(17)的方向(X)滑动到第一位置,在第一位置处,通过管上的邻接(26)和管 电缆外套上的协作基座(31a)。 当处于第一位置时,锁定结构(14)已经移动通过快速附接装置(10)。 然后电缆随后可以从管子内的背板(Y)移动到第二位置,在第二位置,电缆内部上的闩锁结构(14)与快速附接装置(10)完全接合。 提供紧固装置(39,40)以相对于管子将电缆锁定在第二位置,以在随后的制动器操作期间保持闩锁结构(14)与快速附接装置(10)接合。 本发明还提供了一种将操作电缆附接到鼓式制动器的内部制动操作杆上的快速连接装置的方法。
    • 7. 发明授权
    • Use of swellable material in an annular seal element to prevent leakage in a subterranean well
    • 在环形密封元件中使用可溶胀材料以防止地下井中的泄漏
    • US07841417B2
    • 2010-11-30
    • US12276790
    • 2008-11-24
    • David B. AllisonTimothy BozemanMichael MacDonaldAlf K. SevreEarl Webb
    • David B. AllisonTimothy BozemanMichael MacDonaldAlf K. SevreEarl Webb
    • E21B33/14
    • E21B33/1208
    • A method of sealing an annulus formed between a casing string and a surface in a well includes: positioning a seal element in the annulus, a swellable material of the seal element being positioned between the casing string and the surface; and flowing cement through a channel formed between the swellable material and the casing string. A method of sealing in a well includes the steps of: positioning an annular seal element comprising a swellable material in the well; and flowing cement into at least one channel formed longitudinally through the seal element. A method of sealing an annulus between two casing strings includes: providing multiple arcuate segments, each of the segments comprising a swellable material; and installing the segments in the annulus, each of the segments thereby occupying a respective circumferential portion of the annulus.
    • 密封形成在套管柱和井眼表面之间的环的方法包括:将密封元件定位在环空中,密封元件的可膨胀材料定位在套管柱和表面之间; 并且流动的水泥通过形成在可溶胀材料和套管柱之间的通道。 在井中密封的方法包括以下步骤:将包括可膨胀材料的环形密封元件定位在井中; 并将水泥流入通过密封元件纵向形成的至少一个通道。 密封两个套管柱之间的环的方法包括:提供多个弓形段,每个段包括可溶胀材料; 并且将节段安装在环形空间中,每个段由此占据环形空间的相应圆周部分。
    • 9. 发明申请
    • POLISHING INHIBITING LAYER FORMING ADDITIVE, SLURRY AND CMP METHOD
    • 抛光抑制层形成添加剂,浆液和CMP方法
    • US20060030154A1
    • 2006-02-09
    • US10710827
    • 2004-08-05
    • Michael MacDonald
    • Michael MacDonald
    • B24B49/00B24B51/00H01L21/302H01L21/461
    • H01L21/31053C09G1/02
    • A polishing inhibiting layer forming additive for a slurry, the slurry so formed, and a method of chemical mechanical polishing are disclosed. The polishing inhibiting layer is formed through application of the slurry to the surface being polished and is removable at a critical polishing pressure. The polishing inhibiting layer allows recessed or low pattern density locations to be protected until a critical polishing pressure is exceeded based on geometric and planarity considerations, rather than slurry or polishing pad considerations. With the additive, polishing rate is non-linear relative to polishing pressure in a recessed/less pattern dense location. In one embodiment, the additive has a chemical structure: [CH3(CH2)xN(R)]M, wherein M is selected from the group consisting of: Cl, Br and I, x equals an integer between 2 and 24, and the R includes three carbon-based functional groups, each having less than eight carbon atoms.
    • 公开了一种用于浆料的抛光抑制层形成添加剂,如此形成的浆料,以及化学机械抛光方法。 抛光抑制层通过将浆料施加到被抛光表面而形成,并且在临界抛光压力下可移除。 抛光抑制层允许凹陷或低图案密度位置被保护,直到基于几何和平面性考虑超过临界抛光压力,而不是浆料或抛光垫考虑。 使用添加剂,抛光速率相对于凹陷/较少图案密集位置中的抛光压力是非线性的。 在一个实施方案中,添加剂具有以下化学结构:[CH 3(CH 2)x N(R)] M,其中M为 选自:Cl,Br和I,x等于2至24之间的整数,并且R包括三个碳基官能团,每个碳基官能团各自具有少于8个碳原子。