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    • 3. 发明授权
    • Coating apparatus with rotation module
    • 带旋转模块的涂装设备
    • US09353436B2
    • 2016-05-31
    • US12388214
    • 2009-02-18
    • Michael KoenigStefan BangertUwe SchuesslerReiner Gertmann
    • Michael KoenigStefan BangertUwe SchuesslerReiner Gertmann
    • C23C14/04C23C16/04C23C14/56C23C16/54C23C14/50C23C14/12H01L21/67
    • C23C14/56C23C14/042C23C14/12C23C14/50C23C14/566C23C14/568C23C16/54H01L21/67155
    • The present invention refers to a method for coating a substrate, a coating apparatus for carrying out the method and a handling module for coating apparatuses. The handling module comprises a moveable support for a substrate to be coated the support being movable between at least two positions. Further, a mask arranging device for at least one of attaching and detaching a mask to the substrate, and a mask alignment device for aligning the mask with respect to the substrate are provided for, wherein the mask alignment device is attached to the movable support so as to be movable together with the support. Alternatively, the handling module comprises a vacuum chamber, a moveable support for a substrate to be coated, the support being arranged in the vacuum chamber and being rotatable between at least two positions, wherein a mask arranging device for at least one of attaching and detaching a mask to the substrate is arranged within the vacuum chamber of the handling module.
    • 本发明涉及一种基材的涂布方法,实施该方法的涂布装置和涂布装置的处理模块。 处理模块包括用于待涂覆的基底的可移动支撑件,其可在至少两个位置之间移动。 另外,提供了一种用于将掩模附着和分离至基板的掩模布置装置和用于使掩模相对于基板对准的掩模对准装置,其中掩模对准装置附接到可移动支撑件 以便与支撑件一起移动。 或者,处理模块包括真空室,用于待涂覆的基底的可移动支撑件,所述支撑件布置在真空室中并且可在至少两个位置之间旋转,其中,用于至少一个附着和分离的掩模排列装置 在处理模块的真空室内布置有衬底的掩模。