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    • 1. 发明授权
    • Determining an option for decommissioning or consolidating software
    • 确定退役或整合软件的选项
    • US08639561B2
    • 2014-01-28
    • US13222349
    • 2011-08-31
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • G06Q10/00G06Q30/00G06F17/00G06G7/00
    • G06Q10/063
    • Embodiments include a computer system, method and program product for managing a software program installed on a computer hardware system, the software program subject to a software license. A retrieval of data is performed in which the data indicates actual usage of the software program and the computer hardware system, and processor power of the computer hardware system. In addition, a retrieval of licensing data from the software license is performed in which the licensing data indicates a permitted number of or fee for installations of the software program and a permitted amount of or fee for processor power of the computer hardware system in which the software program is installed. Whether to decommission a copy of the software program based on the data indicating actual usage, the licensing data, a projected amount of future usage of the software program, and criticality of the software program is determined and reported.
    • 实施例包括用于管理安装在计算机硬件系统上的软件程序的计算机系统,方法和程序产品,该软件程序受软件许可证管理。 执行数据的检索,其中数据指示软件程序和计算机硬件系统的实际使用以及计算机硬件系统的处理器能力。 此外,执行从软件许可证检索许可数据,其中许可数据指示软件程序的安装的允许数量或费用,以及计算机硬件系统的处理器功率的允许量或费用,其中 软件程序已安装。 是否根据指示实际使用的数据停止软件程序的副本,确定并报告许可数据,软件程序的预计未来使用量以及软件程序的关键性。
    • 3. 发明申请
    • SOFTWARE LICENSE RECONCILIATION WITHIN A CLOUD COMPUTING INFRASTRUCTURE
    • 云计算基础设施软件许可证重新安装
    • US20130074189A1
    • 2013-03-21
    • US13235353
    • 2011-09-17
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • G06F21/22G06F15/16
    • G06F21/105G06F9/5061
    • A method, system, and computer program product for managing software program installations in a cloud computing environment. An example method includes calculating, by a computer processor, a maximum number of software licenses that could be required according to a software license rule from a software license agreement to run a set of software program instances on a set of servers configured as a computing cloud. Each software program instance is an installation of the software program on a different logical partition, and at least two of the servers from the set of servers are capable of requiring a different number of software licenses according to the software license rule. The method also includes determining if the maximum number of software licenses exceeds an allowed number of software licenses granted in the software license agreement.
    • 一种用于管理云计算环境中的软件程序安装的方法,系统和计算机程序产品。 一个示例性方法包括由计算机处理器根据软件许可证规则从软件许可协议计算出可能需要的最大数量的软件许可证,以在配置为计算云的一组服务器上运行一组软件程序实例 。 每个软件程序实例是将软件程序安装在不同的逻辑分区上,并且来自该组服务器的至少两个服务器能够根据软件许可证规则要求不同数量的软件许可证。 该方法还包括确定软件许可证的最大数量是否超过在软件许可协议中授予的允许的软件许可数量。
    • 5. 发明授权
    • Software license reconciliation within a cloud computing infrastructure
    • 云计算基础架构内的软件许可证协调
    • US08528100B2
    • 2013-09-03
    • US13235353
    • 2011-09-17
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • H04L29/06G06F21/00
    • G06F21/105G06F9/5061
    • A method, system, and computer program product for managing software program installations in a cloud computing environment. An example method includes calculating, by a computer processor, a maximum number of software licenses that could be required according to a software license rule from a software license agreement to run a set of software program instances on a set of servers configured as a computing cloud. Each software program instance is an installation of the software program on a different logical partition, and at least two of the servers from the set of servers are capable of requiring a different number of software licenses according to the software license rule. The method also includes determining if the maximum number of software licenses exceeds an allowed number of software licenses granted in the software license agreement.
    • 一种用于管理云计算环境中的软件程序安装的方法,系统和计算机程序产品。 一个示例性方法包括由计算机处理器根据软件许可证规则从软件许可协议计算出可能需要的最大数量的软件许可证,以在配置为计算云的一组服务器上运行一组软件程序实例 。 每个软件程序实例是将软件程序安装在不同的逻辑分区上,并且来自该组服务器的至少两个服务器能够根据软件许可证规则要求不同数量的软件许可证。 该方法还包括确定软件许可证的最大数量是否超过在软件许可协议中授予的允许的软件许可数量。
    • 6. 发明申请
    • DETERMINING AN OPTION FOR DECOMMISSIONING OR CONSOLIDATING SOFTWARE
    • 确定撤销或合并软件的选项
    • US20130054492A1
    • 2013-02-28
    • US13222349
    • 2011-08-31
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • Michael K. BoudreauJamie B. MarsnikBradley T. MooreClinton W. Wright
    • G06Q40/00G06F21/22
    • G06Q10/063
    • Embodiments include a computer system, method and program product for managing a software program installed on a computer hardware system, the software program subject to a software license. A retrieval of data is performed in which the data indicates actual usage of the software program and the computer hardware system, and processor power of the computer hardware system. In addition, a retrieval of licensing data from the software license is performed in which the licensing data indicates a permitted number of or fee for installations of the software program and a permitted amount of or fee for processor power of the computer hardware system in which the software program is installed. Whether to decommission a copy of the software program based on the data indicating actual usage, the licensing data, a projected amount of future usage of the software program, and criticality of the software program is determined and reported.
    • 实施例包括用于管理安装在计算机硬件系统上的软件程序的计算机系统,方法和程序产品,该软件程序受软件许可证管理。 执行数据的检索,其中数据指示软件程序和计算机硬件系统的实际使用以及计算机硬件系统的处理器能力。 此外,执行从软件许可证检索许可数据,其中许可数据指示软件程序的安装的允许数量或费用,以及计算机硬件系统的处理器功率的允许量或费用,其中 软件程序已安装。 是否根据指示实际使用的数据停止软件程序的副本,确定并报告许可数据,软件程序的预计未来使用量以及软件程序的关键性。
    • 9. 发明授权
    • Photolithographic system including light filter that compensates for lens error
    • 光刻系统包括补偿透镜误差的滤光片
    • US06552776B1
    • 2003-04-22
    • US09183176
    • 1998-10-30
    • Derick J. WristersRobert DawsonH. Jim Fulford, Jr.Mark I. GardnerFrederick N. HauseBradley T. MooreMark W. Michael
    • Derick J. WristersRobert DawsonH. Jim Fulford, Jr.Mark I. GardnerFrederick N. HauseBradley T. MooreMark W. Michael
    • G03B2754
    • G03F7/70558G03F7/70191G03F7/706
    • A photolithographic system including a light filter that varies light intensity according to measured dimensional data that characterizes a lens error is disclosed. The light filter compensates for the lens error by reducing the light intensity of the image pattern as the lens error increases. In this manner, when the lens error causes focusing variations that result in enlarged portions of the image pattern, the light filter reduces the light intensity transmitted to the enlarged portions of the image pattern. This, in turn, reduces the rate in which regions of the photoresist layer beneath the enlarged portions of the image pattern are rendered soluble to a subsequent developer. As a result, after the photoresist layer is developed, linewidth variations that otherwise result from the lens error are reduced due to the light filter. Preferably, the light filter includes a light-absorbing film such as a semi-transparent layer such as calcium fluoride on a light-transmitting base such as a quartz plate, and the thickness of the light-absorbing film varies in accordance with the measured dimensional data to provide the desired variations in light intensity. The invention is particularly well-suited for patterning a photoresist layer that defines polysilicon gates of an integrated circuit device.
    • 公开了一种光刻系统,其包括根据测量的尺寸数据来表征透镜误差来改变光强度的滤光器。 光滤波器通过降低镜头误差增大时图像图案的光强度来补偿镜头误差。 以这种方式,当透镜错误导致导致图像图案的放大部分的聚焦变化时,光过滤器降低传输到图像图案的扩大部分的光强度。 这又降低了图像图案的放大部分之下的光致抗蚀剂层的区域变得可溶于后续显影剂的速率。 结果,在光致抗蚀剂层显影之后,由于滤光器而导致透镜误差导致的线宽变化会降低。 优选地,光滤波器包括诸如石英板等透光基底上的诸如氟化钙的半透明层的光吸收膜,并且光吸收膜的厚度根据测量的尺寸而变化 数据以提供所需的光强度变化。 本发明特别适用于图案化限定集成电路器件的多晶硅栅极的光致抗蚀剂层。
    • 10. 发明授权
    • Method of making NMOS and PMOS devices with reduced masking steps
    • 制造具有减少掩蔽步骤的NMOS和PMOS器件的方法
    • US6060345A
    • 2000-05-09
    • US844924
    • 1997-04-21
    • Frederick N. HauseRobert DawsonH. Jim Fulford, Jr.Mark I. GardnerMark W. MichaelBradley T. MooreDerick J. Wristers
    • Frederick N. HauseRobert DawsonH. Jim Fulford, Jr.Mark I. GardnerMark W. MichaelBradley T. MooreDerick J. Wristers
    • H01L21/8238H01L27/092
    • H01L21/823814
    • A method of making NMOS and PMOS devices with reduced masking steps is disclosed. The method includes providing a semiconductor substrate with a first active region of first conductivity type and a second active region of second conductivity type, forming a gate material over the first and second active regions, forming a first masking layer over the gate material, etching the gate material using the first masking layer as an etch mask to form a first gate over the first active region and a second gate over the second active region, implanting a dopant of second conductivity type into the first and second active regions using the first masking layer as an implant mask, forming a second masking layer that covers the first active region and includes an opening above the second active region, and implanting a dopant of first conductivity type into the second active region using the first and second masking layers as an implant mask. Advantageously, the dopant of first conductivity type counterdopes the dopant of second conductivity type in the second active region, thereby providing source and drain regions of second conductivity type in the first active region and source and drain regions of first conductivity type in the second active region with a single masking step and without subjecting either gate to dopants of first and second conductivity type.
    • 公开了一种制造具有减小的掩蔽步骤的NMOS和PMOS器件的方法。 该方法包括提供具有第一导电类型的第一有源区和第二导电类型的第二有源区的半导体衬底,在第一和第二有源区上形成栅极材料,在栅极材料上形成第一掩模层, 栅极材料,使用第一掩模层作为蚀刻掩模,以在第一有源区上形成第一栅极,在第二有源区上形成第二栅极,使用第一掩模层将第二导电类型的掺杂剂注入到第一和第二有源区中 作为注入掩模,形成覆盖第一有源区并且包括在第二有源区上方的开口的第二掩模层,以及使用第一和第二掩模层作为注入掩模将第一导电类型的掺杂剂注入到第二有源区中 。 有利地,第一导电类型的掺杂剂在第二有源区域中抵消第二导电类型的掺杂剂,从而在第一有源区域中提供第二导电类型的源极和漏极区域,并且在第二有源区域中提供第一导电类型的源极和漏极区域 具有单个掩蔽步骤,并且不对任一个栅极施加第一和第二导电类型的掺杂剂。