会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Gas cabinet including integrated effluent scrubber
    • 燃气柜包括综合污水洗涤器
    • US07018448B2
    • 2006-03-28
    • US10694648
    • 2003-10-28
    • Michael J. WodjenskiJose I. Arno
    • Michael J. WodjenskiJose I. Arno
    • B01D53/04
    • B01D53/0446B01D53/0454B01D2253/104B01D2253/11B01D2253/202B01D2257/706B01D2257/93B01D2258/0216B01D2259/40009B01D2259/402B01D2259/4525
    • A gas cabinet assembly for dispensing of gas to a process facility such as a semiconductor manufacturing tool. A purge gas dry scrubber is integrated with the gas flow circuitry and a venturi pump in the gas cabinet. Purge gas is flowed through the flow circuitry in the gas cabinet subsequent to on-stream dispensing of process gas through such flow circuitry, and forms a purge effluent including the residual process gas. The purge effluent is flowed through a dry scrubber unit to sorptively remove the process gas species from the purge effluent. The resultant process gas-depleted purge effluent is vented from the gas cabinet, e.g., into the ducting of the house exhaust system of the process facility. Monitoring of the relative depletion of the dry scrubbing medium in the dry scrubber may be carried out with endpoint detection, e.g., using colorimetric change techniques, toxic gas monitor devices, or PLC/CPU arrangements.
    • 一种用于将气体分配到诸如半导体制造工具的处理设备的气柜组件。 吹扫气干燥洗涤器与气体流路和气柜中的文丘里泵集成。 在通过这种流动电路的流程分配工艺气体之后,吹扫气体通过气体柜中的流动回路流动,并形成包括剩余工艺气体的净化流出物。 清洗流出物流过干洗单元以从吹扫流出物中吸附去除工艺气体物质。 所得到的工艺废气净化流出物从气柜排出,例如进入处理设备的房屋排气系统的管道。 干洗涤器中干洗涤介质的相对耗尽的监测可以通过终点检测进行,例如使用比色改变技术,有毒气体监测装置或PLC / CPU装置。
    • 10. 发明授权
    • Photometrically modulated delivery of reagents
    • 光度调制递送试剂
    • US08244482B2
    • 2012-08-14
    • US13085476
    • 2011-04-12
    • Jose I. Arno
    • Jose I. Arno
    • H01L21/66
    • H01L22/20G01N21/3504Y10T137/0329Y10T137/2509Y10T137/87676
    • A process system adapted for processing of or with a material therein. The process system includes: a sampling region for the material; an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and process control means arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.
    • 一种适于处理其中或与其中的材料一起的过程系统。 处理系统包括:材料的采样区域; 红外测光监测器,其构造和布置成基于其与红外辐射的相互作用,将红外辐射透射通过采样区域并且响应地产生与采样区域中的材料相关的输出信号; 以及过程控制装置,其布置成接收红外测光监视器的输出并且响应地控制处理系统中的一个或多个处理条件和/或影响处理系统。