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1. 发明授权

US07805095B2 Charging device and an image forming device including the same 有权
公开(公告)号：US07805095B2
公开(公告)日：2010-09-28
申请号：US11363004
申请日：2006-02-27
申请人： Michael F. Zona , Joseph A. Swift , Dan A. Hays , Fa-Gung Fan
发明人： Michael F. Zona , Joseph A. Swift , Dan A. Hays , Fa-Gung Fan
IPC分类号： G03G15/02
CPC分类号： G03G15/0266
摘要： A charging device comprises first and second electrodes forming a charging zone. A plurality of nanostructures adhere to at least one of the first and second electrodes. A charging voltage supply couples to the electrodes to support the formation of gaseous ions in the charging zone. An aperture electrode or grid proximate to the first and second electrodes is coupled to a grid control voltage supply which grid control voltage supply, in turn, controls a flow of gaseous ions from the charging zone to thereby charge a proximately-located receptor. In one embodiment, the charging voltage supply is arranged to provide a pulsed-voltage waveform. In one variation of this embodiment, the pulsed-voltage waveform comprises a pulsed-DC waveform. In another embodiment, the charging voltage supply is arranged to provide an alternating-current waveform. In one embodiment, the charging device itself is comprised in an image forming device.

2. 发明申请

US20100119261A1 Charging device and an image forming device including the same 有权
标题翻译：充电装置和包括该充电装置的图像形成装置
公开(公告)号：US20100119261A1
公开(公告)日：2010-05-13
申请号：US11363004
申请日：2006-02-27
申请人： Michael F. Zona , Joseph A. Swift , Dan A. Hays , Fa-Gung Fan
发明人： Michael F. Zona , Joseph A. Swift , Dan A. Hays , Fa-Gung Fan
IPC分类号： G03G15/02
CPC分类号： G03G15/0266
摘要： A charging device comprises first and second electrodes forming a charging zone. A plurality of nanostructures adhere to at least one of the first and second electrodes. A charging voltage supply couples to the electrodes to support the formation of gaseous ions in the charging zone. An aperture electrode or grid proximate to the first and second electrodes is coupled to a grid control voltage supply which grid control voltage supply, in turn, controls a flow of gaseous ions from the charging zone to thereby charge a proximately-located receptor. In one embodiment, the charging voltage supply is arranged to provide a pulsed-voltage waveform. In one variation of this embodiment, the pulsed-voltage waveform comprises a pulsed-DC waveform. In another embodiment, the charging voltage supply is arranged to provide an alternating-current waveform. In one embodiment, the charging device itself is comprised in an image forming device.
摘要翻译：一种充电装置包括形成充电区的第一和第二电极。多个纳米结构粘附到第一和第二电极中的至少一个。充电电压电源耦合到电极以支持在充电区域中形成气态离子。靠近第一和第二电极的孔径电极或栅格耦合到栅格控制电压源，栅格控制电压源进而控制来自充电区的气态离子流，从而对靠近位置的受体进行充电。在一个实施例中，充电电压源设置成提供脉冲电压波形。在该实施例的一个变型中，脉冲电压波形包括脉冲DC波形。在另一个实施例中，充电电压源被设置成提供交流波形。在一个实施例中，充电装置本身包括在图像形成装置中。

3. 发明申请

US20090224679A1 NOVEL HIGH PERFORMANCE MATERIALS AND PROCESSES FOR MANUFACTURE OF NANOSTRUCTURES FOR USE IN ELECTRON EMITTER ION AND DIRECT CHARGING DEVICES 失效
标题翻译：用于电子发射器和直接充电装置的新型高性能材料和制造用于制造纳米结构的方法
公开(公告)号：US20090224679A1
公开(公告)日：2009-09-10
申请号：US12042878
申请日：2008-03-05
申请人： David H. Pan , Fa-Gung Fan , Joseph A. Swift , Dan A. Hays , Michael F. Zona
发明人： David H. Pan , Fa-Gung Fan , Joseph A. Swift , Dan A. Hays , Michael F. Zona
IPC分类号： H01J61/94
CPC分类号： H01J1/304 , H01J17/066 , H01J2201/3043 , H01J2201/30434 , H01J2201/30469 , H01J2201/30488 , H01J2201/30496
摘要： In accordance with the invention, there are electron emitters, charging devices, and methods of forming them. An electron emitter array can include a plurality of nanostructures, each of the plurality of nanostructures can include a first end and a second end, wherein the first end can be connected to a first electrode and the second end can be positioned to emit electrons, and wherein each of the plurality of nanostructures can be formed of one or more of oxidation resistant metals, doped metals, metal alloys, metal oxides, doped metal oxides, and ceramics. The electron emitter array can also include a second electrode in close proximity to the first electrode, wherein one or more of the plurality of nanostructures can emit electrons in a gas upon application of an electric field between the first electrode and the second electrode.
摘要翻译：根据本发明，存在电子发射器，充电装置及其形成方法。电子发射器阵列可以包括多个纳米结构，多个纳米结构中的每一个可以包括第一端和第二端，其中第一端可以连接到第一电极，并且第二端可以被定位成发射电子，以及其中所述多个纳米结构中的每一个可以由抗氧化金属，掺杂金属，金属合金，金属氧化物，掺杂金属氧化物和陶瓷中的一种或多种形成。电子发射器阵列还可以包括紧邻第一电极的第二电极，其中在第一电极和第二电极之间施加电场时，多个纳米结构中的一个或多个可以在气体中发射电子。

4. 发明授权

US07995952B2 High performance materials and processes for manufacture of nanostructures for use in electron emitter ion and direct charging devices 失效
标题翻译：用于制造用于电子发射体离子和直接充电装置的纳米结构的高性能材料和工艺
公开(公告)号：US07995952B2
公开(公告)日：2011-08-09
申请号：US12042878
申请日：2008-03-05
申请人： David H. Pan , Fa-Gung Fan , Joseph A. Swift , Dan A. Hays , Michael F. Zona
发明人： David H. Pan , Fa-Gung Fan , Joseph A. Swift , Dan A. Hays , Michael F. Zona
IPC分类号： G03G21/16 , H05B39/00 , G09G3/10
CPC分类号： H01J1/304 , H01J17/066 , H01J2201/3043 , H01J2201/30434 , H01J2201/30469 , H01J2201/30488 , H01J2201/30496
摘要： In accordance with the invention, there are electron emitters, charging devices, and methods of forming them. An electron emitter array can include a plurality of nanostructures, each of the plurality of nanostructures can include a first end and a second end, wherein the first end can be connected to a first electrode and the second end can be positioned to emit electrons, and wherein each of the plurality of nanostructures can be formed of one or more of oxidation resistant metals, doped metals, metal alloys, metal oxides, doped metal oxides, and ceramics. The electron emitter array can also include a second electrode in close proximity to the first electrode, wherein one or more of the plurality of nanostructures can emit electrons in a gas upon application of an electric field between the first electrode and the second electrode.
摘要翻译：根据本发明，存在电子发射器，充电装置及其形成方法。电子发射器阵列可以包括多个纳米结构，多个纳米结构中的每一个可以包括第一端和第二端，其中第一端可以连接到第一电极，并且第二端可以被定位成发射电子，以及其中所述多个纳米结构中的每一个可以由抗氧化金属，掺杂金属，金属合金，金属氧化物，掺杂金属氧化物和陶瓷中的一种或多种形成。电子发射器阵列还可以包括紧邻第一电极的第二电极，其中在第一电极和第二电极之间施加电场时，多个纳米结构中的一个或多个可以在气体中发射电子。

5. 发明授权

US08135309B2 Compact, long life charging device 有权
标题翻译：紧凑，长寿命的充电装置
公开(公告)号：US08135309B2
公开(公告)日：2012-03-13
申请号：US12472811
申请日：2009-05-27
申请人： Joseph A. Swift , Fa-Gung Fan , Richard W. Seyfried , Michael F. Zona
发明人： Joseph A. Swift , Fa-Gung Fan , Richard W. Seyfried , Michael F. Zona
IPC分类号： G03G15/20
CPC分类号： G03G15/0258 , G03G2215/027 , G03G2215/028
摘要： A coronode charging device includes a support member, a filament, an adjustment mechanism and a voltage source. The lament is disposed along the support member in a configuration that creates a plurality of active regions and a plurality of inactive regions of the filament. The active regions are simultaneously positionable adjacent the photoreceptor. The inactive regions may be farther from the photoreceptor than the active regions. The adjustment mechanism moves the filament such that portions of the filament that correspond to the active regions are moved to positions that correspond to the inactive regions, and some portions of the filament that were in the inactive regions are moved to positions that correspond to the active regions. This operations extends the life of the coronode charging device.
摘要翻译：冠状体充电装置包括支撑构件，灯丝，调节机构和电压源。该纱线沿着支撑构件设置成以形成多个有源区域和多个无效区域的构造。有源区域可以与感光体相邻定位。非活性区域可以比活性区域远离感光体。调节机构使细丝移动使得与活性区域相对应的细丝部分移动到与非活性区域对应的位置，并且处于非活性区域的丝线的一些部分被移动到与活性区域对应的位置地区。该操作延长了冠状体充电装置的使用寿命。

6. 发明授权

US08120889B2 Tailored emitter bias as a means to optimize the indirect-charging performance of a nano-structured emitting electrode 有权
标题翻译：定制的发射极偏压作为优化纳米结构发射电极的间接充电性能的手段
公开(公告)号：US08120889B2
公开(公告)日：2012-02-21
申请号：US12132913
申请日：2008-06-04
申请人： Fa-Gung Fan , Joseph A. Swift , Michael F. Zona , David H. Pan
发明人： Fa-Gung Fan , Joseph A. Swift , Michael F. Zona , David H. Pan
IPC分类号： G03G15/02 , H01H47/32 , H05F3/00
CPC分类号： G03G15/0291
摘要： Exemplary embodiments provide charging systems and methods for effectively delivering charges onto a receptor. The charging system can include a low velocity gas stream, an emitter assembly for providing cathode-to-anode field bias to generate charges from the low velocity gas stream, and an emitter-to-receptor (e.g., photoreceptor) electric bias to enhance the charge delivery to the receptor. The disclosed charging systems and methods can be used to achieve an optimal charging performance at a low projected cost for any suitable receptor that needs to be charged. Exemplary receptors can include a photoreceptor (PR) such as a belt PR or a drum PR, a toner layer, a sheet of media on which toner can be deposited, or a transfer belt in an electrophotographic printing machine.
摘要翻译：示例性实施例提供用于有效地将电荷递送到受体上的充电系统和方法。充电系统可以包括低速气流，用于提供阴极至阳极场偏压以从低速气流产生电荷的发射器组件，以及发射器 - 受体（例如，感光器）电偏压，以增强向受体充电。所公开的充电系统和方法可用于以任何需要充电的任何合适的受体以低预计成本实现最佳充电性能。示例性的受体可以包括感光体（PR），例如带PR或鼓PR，调色剂层，调色剂可以沉积的介质片，或电子照相印刷机中的转印带。

7. 发明授权

US07789734B2 Multi-orifice fluid jet to enable efficient, high precision micromachining 有权
标题翻译：多孔流体喷射，以实现高效，高精度的微机械加工
公开(公告)号：US07789734B2
公开(公告)日：2010-09-07
申请号：US12163380
申请日：2008-06-27
申请人： Joseph A. Swift , Stanley J. Wallace , Roger L. Bullock , Fa-Gung Fan
发明人： Joseph A. Swift , Stanley J. Wallace , Roger L. Bullock , Fa-Gung Fan
IPC分类号： B24C5/04
CPC分类号： B26F3/004 , B24C3/02 , B24C3/04 , B26D5/00 , Y10T83/0591 , Y10T83/364
摘要： A fluid jet based micromachining device and method include a workpiece, and fluid jets directing synchronized forces at the workpiece so as to converge forces at a dynamic contact zone on the workpiece and provide mechanical support to the workpiece during periods of contact with the fluid jets.
摘要翻译：基于流体喷射的微加工装置和方法包括工件，并且流体射流在工件处引导同步的力，以便在工件上的动态接触区域会聚力，并在与流体射流接触的时段期间向工件提供机械支撑。

8. 发明申请

US20090320661A1 MULTI-ORIFICE FLUID JET TO ENABLE EFFICIENT, HIGH PRECISION MICROMACHINING 有权
标题翻译：多功能流体喷嘴可实现高效，高精度微型喷墨
公开(公告)号：US20090320661A1
公开(公告)日：2009-12-31
申请号：US12163380
申请日：2008-06-27
申请人： Joseph A. SWIFT , Stanley J. Wallace , Roger L. Bullock , Fa-Gung Fan
发明人： Joseph A. SWIFT , Stanley J. Wallace , Roger L. Bullock , Fa-Gung Fan
IPC分类号： B26F3/00
CPC分类号： B26F3/004 , B24C3/02 , B24C3/04 , B26D5/00 , Y10T83/0591 , Y10T83/364
摘要： A fluid jet based micromachining device and method include a workpiece, and fluid jets directing synchronized forces at the workpiece so as to converge forces at a dynamic contact zone on the workpiece and provide mechanical support to the workpiece during periods of contact with the fluid jets.
摘要翻译：基于流体喷射的微加工装置和方法包括工件，并且流体射流在工件处引导同步的力，以便在工件上的动态接触区域会聚力，并在与流体射流接触的时段期间向工件提供机械支撑。

9. 发明申请

US20140027952A1 Methods for Producing Coaxial Structures Using a Microfluidic Jet 审中-公开
标题翻译：使用微流体喷嘴生产同轴结构的方法
公开(公告)号：US20140027952A1
公开(公告)日：2014-01-30
申请号：US13892241
申请日：2013-05-10
申请人： Fa-Gung Fan , David Bohling , David Michael Keicher , Marcelino Essien
发明人： Fa-Gung Fan , David Bohling , David Michael Keicher , Marcelino Essien
IPC分类号： B05D5/12 , B29C67/00
CPC分类号： B05D5/12 , B29C64/112 , B29C67/0051 , B33Y30/00
摘要： The object of the invention is the provision of methods for controlled production of continuous multi-component filaments or discreet structures using a multi-component liquid jet issuing from an orifice. A multi-component jet consists of two or more liquids. The liquids may be miscible or immiscible, and form a co-axially propagating flow along the central axis of a flow cell. The working distance between the exit orifice and a substrate can be as large as 50 mm, so that in-flight processing of the jet is possible. The coaxial flow consists of an outer sheath liquid and an inner sample liquid or composite of liquids. The flow cell and the exit channel of the deposition head are heated so that the pressurized sheath liquid temperature is raised to near or above the boiling point of the sheath liquid at the local atmospheric pressure. The jet exits the deposition head through the orifice, and the outer liquid is evaporated as the jet falls at atmospheric pressure. The sheath liquid is processed thermally, optically, or chemically during flight to form a protective or insulating layer for the inner liquid or liquids. The inner liquids may contrastingly consist of an ultraviolet (UV) curable ink that is processed in-flight or after deposition. Since UV curable inks contain no volatile components, the coaxial jetted filament can be processed without producing cracks or bubbles in the sheath layer. Line widths are produced in the range from approximately 1 to 1000 microns.
摘要翻译：本发明的目的是提供使用从孔口发出的多组分液体喷射来控制生产连续多组分细丝或离散结构的方法。多组分射流由两种或更多种液体组成。液体可以是可混溶的或不混溶的，并且沿着流动池的中心轴形成同轴传播的流。出口孔和基板之间的工作距离可以大到50mm，从而可以进行射流的飞行处理。同轴流由外护套液体和内部样品液体或液体复合物组成。加热沉积头的流动池和出口通道，使得加压的鞘液温度在局部大气压力下升高至接近或高于鞘液的沸点。喷射器通过孔口离开沉积头，当喷射流体在大气压下时，外部液体被蒸发。皮肤液体在飞行过程中被热，光学或化学处理，以形成用于内部液体或液体的保护层或绝缘层。内部液体可以对比地由在飞行中或沉积后处理的紫外线（UV）可固化油墨组成。由于紫外线固化型油墨不含有挥发性成分，所以可以在鞘层中不产生裂纹或气泡而加工同轴喷射的长丝。线宽度在约1至1000微米的范围内产生。

10. 发明授权

US06775502B1 System and method for high solids image conditioning of liquid ink images utilizing a source of high fluid pressure to configured to emit a jet of fluid 失效
标题翻译：使用高流体压力源构造成发射流体射流的液体墨水图像的高固体图像调理的系统和方法
公开(公告)号：US06775502B1
公开(公告)日：2004-08-10
申请号：US10373478
申请日：2003-02-24
申请人： Gerald A. Domoto , Donald M. Bott , Shu Chang , Palghat S. Ramesh , Fa-Gung Fan
发明人： Gerald A. Domoto , Donald M. Bott , Shu Chang , Palghat S. Ramesh , Fa-Gung Fan
IPC分类号： G03G1510
CPC分类号： G03G15/11
摘要： A system includes at least one movable image bearing member transporting a latent image in an electrophotographic printing system. A developer station associated with the at least one image bearing member deposits a developed image on the latent image. The developed image includes toner particles and carrier liquid. A transfer station associated with the at least one image bearing member transfers the developed image to a receiving medium. A liquid removal station disposed between the developer station and the transfer station includes a source of high fluid pressure emitting an open-air jet of fluid for directly and/or indirectly removing at least a portion of the carrier liquid from the developed image.
摘要翻译：系统包括在电子照相打印系统中传送潜像的至少一个可移动图像承载部件。与所述至少一个图像承载部件相关联的显影器站将显影图像沉积在潜像上。显影图像包括调色剂颗粒和载体液体。与至少一个图像承载部件相关联的传送站将显影图像传送到接收介质。设置在显影剂站和转运站之间的液体移除站包括高流体源的发射源，用于直接和/或间接地从显影图像去除载体液体的至少一部分。

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