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    • 5. 发明授权
    • Semiconductor devices and methods for generating light
    • 用于产生光的半导体器件和方法
    • US07929588B2
    • 2011-04-19
    • US12359309
    • 2009-01-24
    • Chen JiLaura Giovane
    • Chen JiLaura Giovane
    • H01S5/00
    • H01S5/18333H01S5/06226H01S5/18308H01S5/18311H01S5/2063
    • Semiconductor devices and a method for generating light in a semiconductor device are invented and disclosed. The method includes the steps of forming a vertical cavity surface emitting laser including an active region and an oxide layer, the active region separated from the oxide layer and configured to generate light in response to an injected current and introducing an implant layer adjacent and underneath the oxide layer to confine the injected current to a region of the device where charge carriers are combining to generate light. The semiconductor devices include an implant layer between the oxide layer and the active region. The implant layer prevents lateral leakage current from exiting a region of the device where charge carriers are combining to generate light.
    • 发明并公开了半导体器件和半导体器件中的光的产生方法。 该方法包括以下步骤:形成垂直腔表面发射激光器,其包括有源区和氧化物层,所述有源区与氧化物层分离并且被配置为响应于注入的电流而产生光,并且在邻近和在其下方引入注入层 氧化物层以将注入的电流限制在电荷载流子组合的器件的区域以产生光。 半导体器件包括在氧化物层和有源区之间的注入层。 注入层防止横向泄漏电流离开电荷载体组合的器件的区域以产生光。
    • 7. 发明申请
    • Semiconductor Devices and Methods for Generating Light
    • 半导体器件及其发光方法
    • US20100189147A1
    • 2010-07-29
    • US12359309
    • 2009-01-24
    • Chen JiLaura Giovane
    • Chen JiLaura Giovane
    • H01S5/026H01L21/00H01S5/125
    • H01S5/18333H01S5/06226H01S5/18308H01S5/18311H01S5/2063
    • Semiconductor devices and a method for generating light in a semiconductor device are invented and disclosed. The method includes the steps of forming a vertical cavity surface emitting laser including an active region and an oxide layer, the active region separated from the oxide layer and configured to generate light in response to an injected current and introducing an implant layer adjacent and underneath the oxide layer to confine the injected current to a region of the device where charge carriers are combining to generate light. The semiconductor devices include an implant layer between the oxide layer and the active region. The implant layer prevents lateral leakage current from exiting a region of the device where charge carriers are combining to generate light.
    • 发明并公开了半导体器件和半导体器件中的光的产生方法。 该方法包括以下步骤:形成垂直腔表面发射激光器,其包括有源区和氧化物层,所述有源区与氧化物层分离并且被配置为响应于注入的电流而产生光,并且在邻近和在其下方引入注入层 氧化物层以将注入的电流限制在电荷载流子组合的器件的区域以产生光。 半导体器件包括在氧化物层和有源区之间的注入层。 注入层防止横向泄漏电流离开电荷载体组合的器件的区域以产生光。