专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07758689B2 Nano-talc with hydrophobic coating 有权
标题翻译：纳米滑石粉与疏水涂层
公开(公告)号：US07758689B2
公开(公告)日：2010-07-20
申请号：US10920747
申请日：2004-08-18
申请人： Mei Li , Qiping Zhong , Srikanth Raghunathan
发明人： Mei Li , Qiping Zhong , Srikanth Raghunathan
IPC分类号： C09C1/02
CPC分类号： C09C1/28 , B82Y30/00 , C01P2004/04 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12 , Y10T428/2982 , Y10T428/2991
摘要： In one embodiment the invention is a hydrophobic nano-talc composition that is the reaction product of nano-talc with an ammonium, pyridinium or phosponium salt. The composition is characterized by a carbon content of about 5 to about 25 wt %. The compositions are useful in preparing nano-talc/polymer composites. In another embodiment, the invention is a process for preparing a nano-talc composition of the invention.
摘要翻译：在一个实施方案中，本发明是疏水性纳米滑石组合物，其是纳米滑石与铵，吡啶鎓或磷鎓盐的反应产物。组合物的特征在于碳含量为约5至约25重量％。该组合物可用于制备纳米滑石/聚合物复合材料。在另一个实施方案中，本发明是制备本发明的纳米滑石组合物的方法。

2. 发明申请

US20100003522A1 Dry powder coating of metals, oxides and hydroxides thereof 审中-公开
标题翻译：金属粉末涂料，氧化物和氢氧化物
公开(公告)号：US20100003522A1
公开(公告)日：2010-01-07
申请号：US12154020
申请日：2008-05-20
申请人： Qiping Zhong , Srikanth Raghunathan
发明人： Qiping Zhong , Srikanth Raghunathan
IPC分类号： B32B1/00
CPC分类号： C09C1/02 , B22F1/0062 , B22F2998/00 , C01P2004/62 , C01P2006/12 , C01P2006/40 , C09C1/043 , C09C1/62 , C09C1/627 , C09C3/006 , C09C3/10 , C09C3/12 , H05K1/0373 , H05K1/162 , Y10T428/2998
摘要： The present invention includes novel compositions comprising a metal, metal oxide, or metal hydroxide powders with bonded coupling agent and polymer coatings. The invention also includes a method of making a metal, metal oxide or metal hydroxide filler composition by dry coating powders with an polymerizable monomers using a coupling agent, preferably an trialkoxysilane, as a covalent linker between the filler and the monomer coating, and inducing polymerization to provide polymer coated particles of the powders.
摘要翻译：本发明包括包含金属，金属氧化物或具有结合偶联剂和聚合物涂层的金属氢氧化物粉末的新型组合物。本发明还包括通过使用偶联剂，优选三烷氧基硅烷作为填料和单体涂层之间的共价连接体，用可聚合单体干燥粉末制备金属，金属氧化物或金属氢氧化物填料组合物的方法，并诱导聚合以提供聚合物涂覆的粉末颗粒。

3. 发明授权

US07249723B2 Organic solvent dispersed nano-talc slurry 失效
标题翻译：有机溶剂分散纳米滑石浆
公开(公告)号：US07249723B2
公开(公告)日：2007-07-31
申请号：US11018946
申请日：2004-12-21
申请人： Jianhong He , Qiping Zhong , Srikanth Raghunathan
发明人： Jianhong He , Qiping Zhong , Srikanth Raghunathan
IPC分类号： B02C19/00
CPC分类号： C09C1/28 , B02C23/06 , B82Y30/00 , C01B33/22 , C01B33/38 , C01P2004/04 , C01P2004/20 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C08K3/34 , C08K2201/011 , C09C1/021 , C09C1/405 , C09C1/407 , C09C1/42 , C09C3/04 , C09C3/041 , Y10S977/888 , Y10S977/90
摘要： The invention provides high surface area talc compositions by a novel hybrid milling method or soaking method. The hybrid milling method comprises dry milling talc powder followed by mixing with water and wet milling to provide a nano-talc slurry with high surface area, also of the invention. The soaking method comprises dry milling talc powder followed by mixing with water and soaking to provide high surface area nano-talc slurry. The slurry may be dewatered and dried to provide dry nano-talc powder. The nano-talc powder provided by the invention is a novel hydrophilic talc composition. Further embodiments of the invention include organic solvent dispersed nano-talc slurries and methods for providing the same. These slurries can be used to provide polymer nano-talc composites in the form of coatings, sealing and gasketing materials, foams, extruded thermoplastic and thermoset sheets and films, thermoplastic pellets, thermoplastic and thermoset molded polymer composite articles. Another embodiment is a polyurethane nano-talc composite article derived from the organic solvent dispersed slurries.
摘要翻译：本发明通过新的混合研磨方法或浸泡方法提供高表面积的滑石组合物。混合研磨方法包括干磨滑石粉，然后与水混合并进行湿磨以提供具有高表面积的纳米滑石浆料，也是本发明的。浸泡方法包括干磨滑石粉，随后与水混合并浸泡以提供高表面积的纳米滑石浆料。可将浆料脱水并干燥以提供干燥的纳米滑石粉末。本发明提供的纳米滑石粉是一种新型亲水滑石组合物。本发明的其它实施方案包括有机溶剂分散的纳米滑石浆料及其提供方法。这些浆料可用于提供涂料，密封和填料材料，泡沫，挤出的热塑性塑料和热固性片材和薄膜，热塑性颗粒，热塑性和热固性模塑聚合物复合制品形式的聚合物纳米滑石复合材料。另一个实施方案是衍生自分散有机溶剂浆料的聚氨酯纳米滑石复合制品。

4. 发明申请

US20060040102A1 Nano-talc with hydrophobic coating 有权
标题翻译：纳米滑石粉与疏水涂层
公开(公告)号：US20060040102A1
公开(公告)日：2006-02-23
申请号：US10920747
申请日：2004-08-18
申请人： Mei Li , Qiping Zhong
发明人： Mei Li , Qiping Zhong
IPC分类号： C09C1/02
CPC分类号： C09C1/28 , B82Y30/00 , C01P2004/04 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12 , Y10T428/2982 , Y10T428/2991
摘要： In one embodiment the invention is a hydrophobic nano-talc composition that is the reaction product of nano-talc with an ammonium, pyridinium or phosponium salt. The composition is characterized by a carbon content of about 5 to about 25 wt %. The compositions are useful in preparing nano-talc/polymer composites. In another embodiment, the invention is a process for preparing a nano-talc composition of the invention.
摘要翻译：在一个实施方案中，本发明是疏水性纳米滑石组合物，其是纳米滑石与铵，吡啶鎓或磷鎓盐的反应产物。组合物的特征在于碳含量为约5至约25重量％。该组合物可用于制备纳米滑石/聚合物复合材料。在另一个实施方案中，本发明是制备本发明的纳米滑石组合物的方法。

5. 发明申请

US20060014880A1 Nano-talc polymer composites 审中-公开
标题翻译：纳米滑石聚合物复合材料
公开(公告)号：US20060014880A1
公开(公告)日：2006-01-19
申请号：US11105341
申请日：2005-04-11
申请人： Qiping Zhong , Mei Li , Ramanujan Srinivasa , Jianhong He
发明人： Qiping Zhong , Mei Li , Ramanujan Srinivasa , Jianhong He
IPC分类号： C08K3/34
CPC分类号： C08K9/08
摘要： The invention describes a novel polymer composite comprising nano-talc characterized by an isoelectric point of about 2.5 to about 3.5, a specific surface area greater than about 70 m2/g, and surface hydroxy groups with corresponding hydroxy equivalent weight of about 210 to about 560; and a polymer phase. Specific composites include polyurethane composites prepared from aqueous nano-talc slurries and aqueous dispersible isocyanate terminated polyurethane prepolymers. The invention further embodies a polyurethane composite composition that is a primer coat, base coat or clear top coat for automobiles and metal articles.
摘要翻译：本发明描述了一种包含纳米滑石的新型聚合物复合材料，其特征在于等电点为约2.5至约3.5，比表面积大于约70m 2 / g，表面羟基与相应的羟基约210至约560的当量; 和聚合物相。具体的复合材料包括由纳米滑石粉水泥和水性分散异氰酸酯封端的聚氨酯预聚物制备的聚氨酯复合材料。本发明进一步体现了一种用于汽车和金属制品的底漆，底漆或透明面漆的聚氨酯复合组合物。

6. 发明申请

US20130026131A1 Method For Manufacturing Wraparound Shield Write Head Using Hard Masks 有权
标题翻译：使用硬掩模制造绕组屏蔽写头的方法
公开(公告)号：US20130026131A1
公开(公告)日：2013-01-31
申请号：US13193520
申请日：2011-07-28
申请人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
发明人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
摘要翻译：本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。例如，可以使用较小尺寸的光刻技术。此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

7. 发明申请

US20120127612A1 PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) 有权
公开(公告)号：US20120127612A1
公开(公告)日：2012-05-24
申请号：US12954422
申请日：2010-11-24
申请人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
发明人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
IPC分类号： G11B5/10 , G01R1/16
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

8. 发明授权

US08371019B1 Method for manufacturing a magnetic write pole having straight side walls and a well defined track-width 有权
标题翻译：用于制造具有直的侧壁和良好限定的轨道宽度的磁性写入极的方法
公开(公告)号：US08371019B1
公开(公告)日：2013-02-12
申请号：US13187370
申请日：2011-07-20
申请人： Sue Siyang Zhang , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Sue Siyang Zhang , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/3163 , G11B5/3169 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head having a write pole with a very narrow track width, straight well defined sides and a well defined trailing edge width (e.g. track-width). The method includes uses two separate chemical mechanical polishing processes that stop at separate CMP stop layers. The first CMP stop layer is deposited directly over a RIEable fill layer. A RIE mask, is formed over the fill layer and first CMP stop layer, the RIE mask having an opening. A trench then is formed in the RIEable fill layer. A second CMP stop layer is then deposited into the trench and over the RIE mask, followed by plating of a magnetic material. First and second chemical mechanical polishing processes are then performed, the first stopping at the first CMP stop and the second stopping at the second CMP stop.
摘要翻译：一种用于制造具有非常窄的轨道宽度的写入极，直的明确定义的侧面和明确的后缘宽度（例如，轨道宽度）的磁性写入头的方法。该方法包括使用在分开的CMP停止层处停止的两个单独的化学机械抛光工艺。第一CMP停止层直接沉积在RIEable填充层上。 RIE掩模形成在填充层和第一CMP停止层上，RIE掩模具有开口。然后在RIEable填充层中形成沟槽。然后将第二CMP停止层沉积到沟槽中并在RIE掩模上方，然后电镀磁性材料。然后执行第一和第二化学机械抛光工艺，首先在第一CMP停止时停止，在第二CMP停止时第二次停止。

9. 发明申请

US20110151279A1 MAGNETIC WRITE HEAD MANUFACTURED BY AN ENHANCED DAMASCENE PROCESS PRODUCING A TAPERED WRITE POLE WITH A NON-MAGNETIC SPACER AND NON-MAGNETIC BUMP 有权
标题翻译：通过增强的大面积工艺制造的磁性写头，用非磁性间隔器和非磁性块形成带状写入点
公开(公告)号：US20110151279A1
公开(公告)日：2011-06-23
申请号：US12641251
申请日：2009-12-17
申请人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/33
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3143 , G11B5/3146 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
摘要翻译：一种具有锥形后缘并具有磁性层的磁性写头，该磁性层形成在从ABS的凹陷处的写入极的后缘上，该磁性层通过薄的非磁性的方式与写入极的后缘分离层。薄的非磁性层优选地足够薄，使得磁性层可以在从ABS去除的区域中用作写入极的一部分。尾磁屏蔽形成在写极上，并且通过非磁性拖尾间隙层与写极分离。可以在磁性层之上形成非磁性间隔层，以在磁性层和尾部磁屏蔽之间提供额外的间隔。

10. 发明授权

US08547660B2 Magnetic write head manufactured by an enhanced damascene process producing a tapered write pole with a non-magnetic spacer and non-magnetic bump 有权
标题翻译：通过增强的镶嵌工艺制造的磁性写头，其产生具有非磁性间隔物和非磁性凸块的锥形写柱
公开(公告)号：US08547660B2
公开(公告)日：2013-10-01
申请号：US12641251
申请日：2009-12-17
申请人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3143 , G11B5/3146 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
摘要翻译：一种具有锥形后缘并具有磁性层的磁性写头，该磁性层形成在从ABS的凹陷处的写入极的后缘上，该磁性层通过薄的非磁性的方式与写入极的后缘分离层。薄的非磁性层优选地足够薄，使得磁性层可以在从ABS去除的区域中用作写入极的一部分。尾磁屏蔽形成在写极上，并且通过非磁性拖尾间隙层与写极分离。可以在磁性层之上形成非磁性间隔层，以在磁性层和尾部磁屏蔽之间提供额外的间隔。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式