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    • 4. 发明申请
    • HIGH DIELECTRIC FILM
    • 高介电膜
    • US20120293909A1
    • 2012-11-22
    • US13522442
    • 2011-01-11
    • Mayuko TatemichiNanako TakanoMiharu OtaKouji YokotaniNobuyuki KomatsuEri MukaiMeiten Koh
    • Mayuko TatemichiNanako TakanoMiharu OtaKouji YokotaniNobuyuki KomatsuEri MukaiMeiten Koh
    • C08L27/16C08K3/22C08L1/00H01G4/30
    • H01B3/445C08J5/18C08J2327/16H01G4/1209H01G4/1254H01G4/18H01G4/186H01G4/20H01G4/206
    • The present invention provides a high dielectric film comprising: a film-forming resin (A); and inorganic particles (B), wherein the film-forming resin (A) contains a vinylidene fluoride resin (a1), an amount of the inorganic particles (B) is not less than 0.01 parts by mass and less than 10 parts by mass for each 100 parts by mass of the film-forming resin (A), and the inorganic oxide particles (B) is at least one selected from the group consisting of: (B1) inorganic oxide particles of a metallic element of Group 2, 3, 4, 12, or 13 of the Periodic Table, or inorganic oxide composite particles of these; (B2) inorganic composite oxide particles represented by formula (1): M1a1Nb1Oc1 wherein M1 represents a metallic element of Group 2, N represents a metallic element of Group 4, a1 represents 0.9 to 1.1, b1 represents 0.9 to 1.1, c1 represents 2.8 to 3.2, and the numbers of M1 and N each may be more than 1; and (B3) inorganic oxide composite particles of an oxide of a metallic element of Group 2, 3, 4, 12, or 13 of the Periodic Table and silicon oxide. The film has improved volume resistivity while maintaining a high dielectric constant owing to a VdF resin.
    • 本发明提供一种高介电膜,包括:成膜树脂(A); 和无机粒子(B),其中,成膜树脂(A)含有偏二氟乙烯树脂(a1),无机粒子(B)的量为0.01质量份以上且小于10质量份,对于 每100质量份成膜树脂(A)和无机氧化物颗粒(B)是选自以下组中的至少一种:(B1)第2,3组金属元素的无机氧化物颗粒, 4,12或13,或这些的无机氧化物复合颗粒; (B2)式(1)表示的无机复合氧化物颗粒:M1a1Nb1Oc1其中M1表示第2族的金属元素,N表示第4族的金属元素,a1表示0.9〜1.1,b1表示0.9〜1.1,c1表示2.8〜 3.2,M1和N的数量可能大于1; 和(B3)元素周期表第2,3,4,12或13族金属元素的氧化物的无机氧化物复合颗粒和氧化硅。 该膜具有改善的体积电阻率,同时由于VdF树脂而保持高的介电常数。