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    • 2. 发明授权
    • Process for the preparation of pyrazole derivatives
    • 吡唑衍生物的制备方法
    • US08288563B2
    • 2012-10-16
    • US13256564
    • 2010-03-12
    • Maximilian DochnahlMartin SukoppAlexander Korte
    • Maximilian DochnahlMartin SukoppAlexander Korte
    • C07D231/10
    • C07D231/38
    • The present invention refers to a process for the preparation of pyrazole derivatives of formula (I) wherein W is nitrogen or CR1, R1, R2, R4 and R5 are each independently selected from hydrogen, halogen, C1-C6-alkyl, C1-C6-haloalkyl, C1-C6-alkoxy, C1-C6-haloalkoxy, R7S(O)n, nitro, cyano, and pentafluorothio; R3 is hydrogen, halogen, C1-C6-alkyl, C1-C6-haloalkyl, C1-C6-alkoxy, C1-C6-haloalkoxy, R7S(O)n, nitro, cyano, pentafluorothio or phenyl which is unsubstituted or substituted by 1 to 5 members of the group consisting of halogen, C1-C6-alkyl, C1-C6-haloalkyl, C1-C6-alkoxy, C1-C6-haloalkoxy, R7S(O)n, nitro, cyano, and pentafluorothio which are the same or different; R7 is C1-C6-alkyl or C1-C6-haloalkyl; and n is 0, 1, or 2; characterized in that hydrazines of formula (II) wherein W, R2, R3, R4, and R5 are as defined for pyrazole derivatives of formula (I), are reacted with a compound of formula (III)
    • 本发明涉及一种制备式(I)的吡唑衍生物的方法,其中W是氮或CR 1,R 1,R 2,R 4和R 5各自独立地选自氢,卤素,C 1 -C 6烷基,C 1 -C 6 卤代烷基,C 1 -C 6 - 烷氧基,C 1 -C 6卤代烷氧基,R 7 S(O)n,硝基,氰基和五氟硫基; R3是氢,卤素,C1-C6-烷基,C1-C6-卤代烷基,C1-C6-烷氧基,C1-C6-卤代烷氧基,R7S(O)n,硝基,氰基,五氟硫基或未被取代或被1 至卤素,C 1 -C 6 - 烷基,C 1 -C 6 - 卤代烷基,C 1 -C 6 - 烷氧基,C 1 -C 6 - 卤代烷氧基,R 7 S(O)n,硝基,氰基和五氟硫基的5个成员相同 或不同; R7是C1-C6-烷基或C1-C6-卤代烷基; 并且n为0,1或2; 其特征在于其中W,R 2,R 3,R 4和R 5如式(I)的吡唑衍生物所定义的式(II)的肼与式(III)的化合物反应,