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    • 1. 发明申请
    • METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES
    • 基于等离子体的短波辐射源的运行方法和布置
    • US20100078578A1
    • 2010-04-01
    • US12563305
    • 2009-09-21
    • Max Christian SchuermannBoris TkachenkoDenis BolshukhinJuergen KleinschmidtGuido Schriever
    • Max Christian SchuermannBoris TkachenkoDenis BolshukhinJuergen KleinschmidtGuido Schriever
    • G21K5/00
    • H05G2/003G03F7/70033G03F7/70841G03F7/70916
    • The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas (41) is introduced into the vacuum chamber (1) under a pressure such that a pressure-distance product in the range of 1 to 100 Pa·m is realized while taking into account the geometric radiation paths of the radiation emitted by the emitter plasma (21) within the buffer gas (41; 44), and the vacuum chamber (1) is continuously evacuated for adjusting a quasistatic pressure (42; 47) and for removing residual emitter material and buffer gas (41).
    • 本发明涉及一种用于操作具有长寿命的基于等离子体的短波长辐射源,特别是EUV辐射源的方法和用于产生基于等离子体的短波长辐射的装置。 本发明的目的是找到一种具有长寿命的基于等离子体的短波长辐射源的新型可能性,其允许广泛的碎片减轻,而不会通过使用缓冲气体严重损害主要的辐射发生过程,而不需要 需要在空间狭窄限制的方式产生分压的大量额外支出。 根据本发明,通过将氢气作为缓冲气体(41)在压力范围为1〜100Pa·m的压力下被引入真空室(1)中, 同时考虑由缓冲气体(41; 44)内的发射体等离子体(21)发射的辐射的几何辐射路径,并且真空室(1)被连续抽真空以调节准静压(42; 47)和 用于去除残留的发射体材料和缓冲气体(41)。
    • 6. 发明授权
    • Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources
    • 用于产生脉冲电流的布置,具有高重复率和高电流强度,用于气体放电泵浦辐射源
    • US07072370B2
    • 2006-07-04
    • US11020749
    • 2004-12-22
    • Vladimir KorobochkoDenis BolshukhinLutz DippmannSpencer MerzHubertus Von BergmannJuergen Kleinschmidt
    • Vladimir KorobochkoDenis BolshukhinLutz DippmannSpencer MerzHubertus Von BergmannJuergen Kleinschmidt
    • H01S3/00
    • H05G2/003H03K3/57H05B41/34
    • The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.
    • 本发明涉及一种用于产生气体放电泵浦辐射源的脉冲电流的装置,特别是具有高重复率和高电流强度用于产生等离子体发射EUV辐射。 本发明的目的是为了找到用于产生气体放电泵浦辐射源的脉冲高能电流的新型可能性,其允许使用简单电路稳定地产生高电压和可靠的电压复位,根据本发明, 所述充电电路是与仅提供气体放电所需的高电压的一半的直流电压源进行通信的LC反相充电电路,其中所述反相充电电路具有电容器组,所述电容器组具有直接平行于所述第一电容器 直流电压源和第二电容器,其在通过用于再充电第一电容器的可饱和充电电感器的触发开关同时充电到第一电容器的充电之后起作用,从而在第一电容器中提供放电所需的全部高电压 电容器组。