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1. 发明授权

US07060197B2 Micromechanical mass flow sensor and method for the production thereof 失效
标题翻译：微机械质量流量传感器及其制造方法
公开(公告)号：US07060197B2
公开(公告)日：2006-06-13
申请号：US10362654
申请日：2002-06-08
申请人： Matthias Fuertsch , Frank Fischer , Lars Metzger , Frieder Sundermeier
发明人： Matthias Fuertsch , Frank Fischer , Lars Metzger , Frieder Sundermeier
IPC分类号： C23F1/00
CPC分类号： G01F1/6845
摘要： In a mass flow sensor having a layered structure on the upper side of a silicon substrate (1), and having at least one heating element (8) patterned out of a conductive layer in the layered structure, thermal insulation between the heating element (8) and the silicon substrate (1) is achieved by way of a silicon dioxide block (5) which is produced beneath the heating element (8) either in the layered structure on the silicon substrate (1) or in the upper side of the silicon substrate (1). As a result, the sensor can be manufactured by surface micromechanics, i.e. without wafer back-side processes.
摘要翻译：在具有层叠结构的质量流量传感器中，在硅衬底（1）的上侧具有至少一层由层叠结构中的导电层构图的加热元件（8），加热元件（8））和硅衬底（1）通过二氧化硅块（5）实现，该二氧化硅块（5）在硅衬底（1）上的层状结构中或在硅的上侧在加热元件（8）下方产生基板（1）。结果，传感器可以通过表面微机械制造，即没有晶片背面工艺。

2. 发明申请

US20050098840A1 Micromechanical structural element having a diaphragm and method for producing such a structural element 有权
标题翻译：具有隔膜的微机械结构元件及其制造方法
公开(公告)号：US20050098840A1
公开(公告)日：2005-05-12
申请号：US10970069
申请日：2004-10-19
申请人： Matthias Fuertsch , Stefan Pinter , Heribert Weber , Frank Fischer , Lars Metzger , Christoph Schelling , Frieder Sundermeier
发明人： Matthias Fuertsch , Stefan Pinter , Heribert Weber , Frank Fischer , Lars Metzger , Christoph Schelling , Frieder Sundermeier
IPC分类号： B81B3/00 , B81C1/00 , H01L21/00 , H01L27/14
CPC分类号： B81B3/007 , B81B2201/0264 , B81B2203/0127 , B81C2201/0167
摘要： A micromechanical structural element, having a very stable diaphragm, implemented in a pure front process and in a layer construction on a substrate. The layer construction includes at least one sacrificial layer and one diaphragm layer above the sacrificial layer, which is structured for laying bare the diaphragm and generating stabilizing elements on the diaphragm, at least one recess being generated for a stabilizing element of the diaphragm. The structure generated in the sacrificial layer is then at least superficially closed with at least one material layer being deposited above the structured sacrificial layer, this material layer forming at least a part of the diaphragm layer and being structured to generate at least one etch hole for etching the sacrificial layer, which is removed from the region under the etch hole, the diaphragm and the at least one stabilizing element being laid bare, a cavity being created under the diaphragm.
摘要翻译：具有非常稳定的隔膜的微机械结构元件以纯正的前工艺和基底上的层结构实现。该层结构包括至少一个牺牲层和牺牲层上方的一个隔膜层，其被构造用于铺设隔膜并在隔膜上产生稳定元件，为隔膜的稳定元件产生至少一个凹槽。然后在牺牲层中产生的结构至少被表面封闭，其中至少一个材料层沉积在结构化牺牲层的上方，该材料层形成隔膜层的至少一部分并被构造成产生至少一个蚀刻孔蚀刻从蚀刻孔下方的区域去除的牺牲层，隔膜和至少一个稳定元件被裸露，在隔膜下面形成空腔。

3. 发明授权

US07148077B2 Micromechanical structural element having a diaphragm and method for producing such a structural element 有权
标题翻译：具有隔膜的微机械结构元件及其制造方法
公开(公告)号：US07148077B2
公开(公告)日：2006-12-12
申请号：US10970069
申请日：2004-10-19
申请人： Matthias Fuertsch , Stefan Pinter , Heribert Weber , Frank Fischer , Lars Metzger , Christoph Schelling , Frieder Sundermeier
发明人： Matthias Fuertsch , Stefan Pinter , Heribert Weber , Frank Fischer , Lars Metzger , Christoph Schelling , Frieder Sundermeier
IPC分类号： H01L21/00
CPC分类号： B81B3/007 , B81B2201/0264 , B81B2203/0127 , B81C2201/0167
摘要： A micromechanical structural element, having a very stable diaphragm, implemented in a pure front process and in a layer construction on a substrate. The layer construction includes at least one sacrificial layer and one diaphragm layer above the sacrificial layer, which is structured for laying bare the diaphragm and generating stabilizing elements on the diaphragm, at least one recess being generated for a stabilizing element of the diaphragm. The structure generated in the sacrificial layer is then at least superficially closed with at least one material layer being deposited above the structured sacrificial layer, this material layer forming at least a part of the diaphragm layer and being structured to generate at least one etch hole for etching the sacrificial layer, which is removed from the region under the etch hole, the diaphragm and the at least one stabilizing element being laid bare, a cavity being created under the diaphragm.
摘要翻译：具有非常稳定的隔膜的微机械结构元件以纯正的前工艺和基底上的层结构实现。该层结构包括至少一个牺牲层和牺牲层上方的一个隔膜层，其被构造用于铺设隔膜并在隔膜上产生稳定元件，为隔膜的稳定元件产生至少一个凹槽。然后在牺牲层中产生的结构至少被表面封闭，其中至少一个材料层沉积在结构化牺牲层的上方，该材料层形成隔膜层的至少一部分并被构造成产生至少一个蚀刻孔蚀刻从蚀刻孔下方的区域去除的牺牲层，隔膜和至少一个稳定元件被裸露，在隔膜下面形成空腔。

4. 发明授权

US07740459B2 Micropump having a pump diaphragm and a polysilicon layer 失效
标题翻译：微泵具有泵膜和多晶硅层
公开(公告)号：US07740459B2
公开(公告)日：2010-06-22
申请号：US10564370
申请日：2004-07-07
申请人： Matthias Fuertsch , Hubert Benzel , Stefan Finkbeiner , Stefan Pinter , Frank Fischer , Heiko Stahl , Tjalf Pirk
发明人： Matthias Fuertsch , Hubert Benzel , Stefan Finkbeiner , Stefan Pinter , Frank Fischer , Heiko Stahl , Tjalf Pirk
IPC分类号： F04B17/03
CPC分类号： F04B43/043
摘要： A method for producing a micromechanical component, preferably for fluidic applications having cavities. The component is constructed from two functional layers, the two functional layers being patterned differently using micromechanical methods. A first etch stop layer having a first pattern is applied to a base plate. A first functional layer is applied to the first etch stop layer and to the first contact surfaces of the base plate. A second etch stop layer, having a second pattern, is applied to first functional layer. A second functional layer is applied to the second etch stop layer and to the second contact surfaces of the first functional layer. An etching mask is applied to the second functional layer. The second and the first functional layer are patterned as sacrificial layers by the use of the first and the second etch stop layer by etching methods and/or by using the first and the second etch stop layer. By supplementing patterning of the base plate, additional movable fluidic elements may be implemented, using the method. The method is preferably used for producing a micropump having an epitactic polysilicon layer as the pump diaphragm.
摘要翻译：用于制造微机械部件的方法，优选用于具有空腔的流体应用。该组件由两个功能层构成，两个功能层使用微机械方法被不同地图案化。将具有第一图案的第一蚀刻停止层施加到基板。第一功能层被施加到第一蚀刻停止层和基板的第一接触表面。具有第二图案的第二蚀刻停止层被施加到第一功能层。第二功能层被施加到第二蚀刻停止层和第一功能层的第二接触表面。将蚀刻掩模施加到第二功能层。通过使用第一和第二蚀刻停止层通过蚀刻方法和/或通过使用第一和第二蚀刻停止层将第二功能层和第一功能层图案化为牺牲层。通过补充基板的图案化，可以使用该方法来实现附加的可移动流体元件。该方法优选用于制造具有外延多晶硅层作为泵膜的微型泵。

5. 发明申请

US20060186085A1 Method for the production of a micromechanical part preferably used for fluidic applications, and micropump comprising a pump membrane made of a polysilicon layer 失效
标题翻译：用于生产优选用于流体应用的微机械部件的方法以及包括由多晶硅层制成的泵膜的微型泵
公开(公告)号：US20060186085A1
公开(公告)日：2006-08-24
申请号：US10564370
申请日：2004-07-07
申请人： Matthias Fuertsch , Hubert Benzel , Stefan Finkbeiner , Stefan Pinter , Frank Fischer , Heiko Stahl , Tjalf Pirk
发明人： Matthias Fuertsch , Hubert Benzel , Stefan Finkbeiner , Stefan Pinter , Frank Fischer , Heiko Stahl , Tjalf Pirk
IPC分类号： C23F1/00 , F04B17/00
CPC分类号： F04B43/043
摘要： A method for producing a micromechanical component, preferably for fluidic applications having cavities. The component is constructed from two functional layers, the two functional layers being patterned differently using micromechanical methods. A first etch stop layer having a first pattern is applied to a base plate. A first functional layer is applied to the first etch stop layer and to the first contact surfaces of the base plate. A second etch stop layer, having a second pattern, is applied to first functional layer. A second functional layer is applied to the second etch stop layer and to the second contact surfaces of the first functional layer. An etching mask is applied to the second functional layer. The second and the first functional layer are patterned as sacrificial layers by the use of the first and the second etch stop layer by etching methods and/or by using the first and the second etch stop layer. By supplementing patterning of the base plate, additional movable fluidic elements may be implemented, using the method. The method is preferably used for producing a micropump having an epitactic polysilicon layer as the pump diaphragm.
摘要翻译：用于制造微机械部件的方法，优选用于具有空腔的流体应用。该组件由两个功能层构成，两个功能层使用微机械方法被不同地图案化。将具有第一图案的第一蚀刻停止层施加到基板。第一功能层被施加到第一蚀刻停止层和基板的第一接触表面。具有第二图案的第二蚀刻停止层被施加到第一功能层。第二功能层被施加到第二蚀刻停止层和第一功能层的第二接触表面。将蚀刻掩模施加到第二功能层。通过使用第一和第二蚀刻停止层通过蚀刻方法和/或通过使用第一和第二蚀刻停止层将第二功能层和第一功能层图案化为牺牲层。通过补充基板的图案化，可以使用该方法来实现附加的可移动流体元件。该方法优选用于制造具有外延多晶硅层作为泵膜的微型泵。

6. 发明申请

US20110108932A1 Micromechanical Capacitive Sensor Element 审中-公开
标题翻译：微机电容传感器元件
公开(公告)号：US20110108932A1
公开(公告)日：2011-05-12
申请号：US11793853
申请日：2005-11-04
申请人： Hubert Benzel , Stefan Finkbeiner , Frank Fischer , Helmut Baumann , Lars Metzger , Roland Scheuerer , Peter Brauchle , Andreas Feustel , Matthias Neubauer
发明人： Hubert Benzel , Stefan Finkbeiner , Frank Fischer , Helmut Baumann , Lars Metzger , Roland Scheuerer , Peter Brauchle , Andreas Feustel , Matthias Neubauer
IPC分类号： H01L29/84 , H01L21/02
CPC分类号： G01L9/0073
摘要： A manufacturing method for producing a micromechanical sensor element which may be produced in a monolithically integrable design and has capacitive detection of a physical quantity is described. In addition to the manufacturing method, a micromechanical device containing such. a sensor element, e.g., a pressure sensor or an acceleration sensor, is described.
摘要翻译：描述了可以以单片可集成设计制造并具有物理量的电容检测的微机械传感器元件的制造方法。除了制造方法之外，还含有这样的微机械装置。描述了传感器元件，例如压力传感器或加速度传感器。

7. 发明授权

US07495302B2 Micromechanical component having a diaphragm 失效
标题翻译：具有隔膜的微机械部件
公开(公告)号：US07495302B2
公开(公告)日：2009-02-24
申请号：US11072859
申请日：2005-03-03
申请人： Frank Fischer , Hans Artmann , Lars Metzger , Arnim Hoechst , Julian Gonska
发明人： Frank Fischer , Hans Artmann , Lars Metzger , Arnim Hoechst , Julian Gonska
IPC分类号： H01L27/00
CPC分类号： B81B7/0029 , B81B2201/0264 , B81B2203/0127 , B81B2203/0315 , B81B2203/0338 , B81C2201/0109
摘要： A micromechanical component having a diaphragm is provided, the structure of which effectively prevents the penetration of dirt particles into the cavity. A method for manufacturing such a component is also provided. The structure of the component is implemented in a layer structure which includes at least one first sacrificial layer and a layer system over the first sacrificial layer. A cavity is formed in the first sacrificial layer underneath the diaphragm. In the region of the diaphragm between the upper layer and the lower layer of the layer system situated directly above the first sacrificial layer, at least one access channel to the cavity is formed which has at least one opening in the upper layer and at least one opening in the lower layer, the opening in the upper layer and the opening in the lower layer being offset with respect to each other.
摘要翻译：提供了具有隔膜的微机械部件，其结构有效地防止了灰尘颗粒进入空腔。还提供了制造这种部件的方法。组件的结构以包括至少一个第一牺牲层和第一牺牲层上的层系统的层结构来实现。在隔膜下方的第一牺牲层中形成空腔。在位于第一牺牲层正上方的层系统的上层和下层之间的隔膜区域中，形成至少一个到空腔的通道，其在上层中具有至少一个开口，并且至少一个开口在下层中开口，上层中的开口和下层中的开口相对于彼此偏移。

8. 发明授权

US07261825B2 Method for the production of a micromechanical device, particularly a micromechanical oscillating mirror device 有权
标题翻译：用于制造微机械装置的方法，特别是微机械振荡镜装置
公开(公告)号：US07261825B2
公开(公告)日：2007-08-28
申请号：US10522694
申请日：2003-02-21
申请人： Lars Metzger , Frank Fischer
发明人： Lars Metzger , Frank Fischer
IPC分类号： H01L21/302 , C23F1/00
CPC分类号： B81C1/00142 , B81B2201/042 , B81C2201/0132 , G02B26/0833
摘要： A method for producing a micromechanical device, e.g., a micromechanical oscillating mirror device, is provided. It is provided, starting from the front side of an SOI/EOI(epipoly on insulator) substrate, to penetrate to the desired depth of the silicon substrate layer in two successive, separate deep etching steps, and to use this in its upper region that is close to the oxide layer as sacrificial layer for vertically exposing the island structures that are positioned above the oxide layer in the functional layer. The method according to the present invention of a sacrificial layer process for generating large vertical deflections utilizes purely surface micromechanical process steps.
摘要翻译：提供了一种用于制造微机械装置的方法，例如微机械振荡镜装置。提供从SOI / EOI（绝缘体上的绝缘体上）的正面开始，在两个连续的，独立的深刻蚀步骤中穿透到硅衬底层的期望深度，并且在其上部区域中使用靠近氧化层作为用于垂直曝光位于功能层中的氧化物层上方的岛状结构的牺牲层。根据本发明的用于产生大的垂直偏转的牺牲层工艺的方法利用纯表面微机械工艺步骤。

9. 发明授权

US07321156B2 Device for capacitive pressure measurement and method for manufacturing a capacitive pressure measuring device 失效
标题翻译：电容式压力测量装置及制造电容式压力测量装置的方法
公开(公告)号：US07321156B2
公开(公告)日：2008-01-22
申请号：US10897449
申请日：2004-07-22
申请人： Frank Fischer , Hans-Peter Trah , Franz Laermer , Lars Metzger
发明人： Frank Fischer , Hans-Peter Trah , Franz Laermer , Lars Metzger
IPC分类号： H01L29/82
CPC分类号： G01L9/0073
摘要： A device for manufacturing a capacitive pressure measurement includes an insulated base electrode, a mechanically deflectable counterelectrode composed of a layer made of at least one of a monocrystalline and polycrystalline semiconductor material, a contact arrangement for electrically connecting the electrodes, and at least one semiconductor component, all integrated onto a semiconductor substrate. The connection for the base electrode is formed by an electrically insulated conductive polycrystalline semiconductor layer. The method for manufactured the device includes the step of arranging a conductive polycrystalline semiconductor layer between two insulating layers on the semiconductor substrate for forming a base electrode.
摘要翻译：用于制造电容式压力测量的装置包括绝缘基极，由由单晶和多晶半导体材料中的至少一种构成的层，用于电连接电极的接触装置和至少一个半导体元件，全部集成到半导体衬底上。用于基极的连接由电绝缘的导电多晶半导体层形成。制造该器件的方法包括在用于形成基极的半导体衬底上的两个绝缘层之间布置导电多晶半导体层的步骤。

10. 发明授权

US06867061B2 Method for producing surface micromechanical structures, and sensor 失效
标题翻译：生产表面微机械结构和传感器的方法
公开(公告)号：US06867061B2
公开(公告)日：2005-03-15
申请号：US10467216
申请日：2002-02-04
申请人： Frank Fischer , Wilhelm Frey , Lars Metzger
发明人： Frank Fischer , Wilhelm Frey , Lars Metzger
IPC分类号： B81B3/00 , B81C1/00 , G01P15/08 , G01P15/125 , H01L21/00 , H01L27/20 , H01L29/82 , H01L29/84
CPC分类号： G01P15/125 , B81B2201/025 , B81C1/00619 , B81C2201/0112 , G01P15/0802 , G01P2015/0814
摘要： A method is described for producing surface micromechanical structures having a high aspect ratio, a sacrificial layer being provided between a substrate and a function layer, trenches being provided by a plasma etching process in the function layer, at least some of these trenches exposing surface regions of the sacrificial layer. To increase the aspect ratio of the trenches, an additional layer is deposited on the side walls of the trenches in at least some sections, but not on the exposed surface regions of the sacrificial layer. In addition, a sensor is described, in particular an acceleration sensor or a rotational rate sensor.
摘要翻译：描述了一种用于生产具有高纵横比的表面微机械结构的方法，牺牲层设置在衬底和功能层之间，沟槽通过功能层中的等离子体蚀刻工艺提供，这些沟槽中的至少一些暴露表面区域的牺牲层。为了增加沟槽的纵横比，在至少一些部分中的沟槽的侧壁上而不是在牺牲层的暴露的表面区域上沉积附加层。此外，描述了传感器，特别是加速度传感器或转速传感器。

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